JPH0350131A - 分子線エピタキシ装置 - Google Patents

分子線エピタキシ装置

Info

Publication number
JPH0350131A
JPH0350131A JP2064599A JP6459990A JPH0350131A JP H0350131 A JPH0350131 A JP H0350131A JP 2064599 A JP2064599 A JP 2064599A JP 6459990 A JP6459990 A JP 6459990A JP H0350131 A JPH0350131 A JP H0350131A
Authority
JP
Japan
Prior art keywords
crucible
beam source
molecular beam
molecular
chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2064599A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0525835B2 (enrdf_load_stackoverflow
Inventor
Takuji Sonoda
琢二 園田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP2064599A priority Critical patent/JPH0350131A/ja
Publication of JPH0350131A publication Critical patent/JPH0350131A/ja
Publication of JPH0525835B2 publication Critical patent/JPH0525835B2/ja
Granted legal-status Critical Current

Links

Classifications

    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00—Technologies relating to the processing of minerals
    • Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57—Improving the yield, e-g- reduction of reject rates

Landscapes

  • Crystals, And After-Treatments Of Crystals (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
JP2064599A 1990-03-15 1990-03-15 分子線エピタキシ装置 Granted JPH0350131A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2064599A JPH0350131A (ja) 1990-03-15 1990-03-15 分子線エピタキシ装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2064599A JPH0350131A (ja) 1990-03-15 1990-03-15 分子線エピタキシ装置

Publications (2)

Publication Number Publication Date
JPH0350131A true JPH0350131A (ja) 1991-03-04
JPH0525835B2 JPH0525835B2 (enrdf_load_stackoverflow) 1993-04-14

Family

ID=13262881

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2064599A Granted JPH0350131A (ja) 1990-03-15 1990-03-15 分子線エピタキシ装置

Country Status (1)

Country Link
JP (1) JPH0350131A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPH0525835B2 (enrdf_load_stackoverflow) 1993-04-14

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term