JPH0348853U - - Google Patents
Info
- Publication number
- JPH0348853U JPH0348853U JP10975289U JP10975289U JPH0348853U JP H0348853 U JPH0348853 U JP H0348853U JP 10975289 U JP10975289 U JP 10975289U JP 10975289 U JP10975289 U JP 10975289U JP H0348853 U JPH0348853 U JP H0348853U
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- coolant
- chamber
- coolant chamber
- implanted
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000003507 refrigerant Substances 0.000 claims description 3
- 239000002826 coolant Substances 0.000 claims 3
- 238000001816 cooling Methods 0.000 claims 2
- 150000002500 ions Chemical class 0.000 claims 2
- 238000010884 ion-beam technique Methods 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10975289U JPH0348853U (de) | 1989-09-20 | 1989-09-20 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10975289U JPH0348853U (de) | 1989-09-20 | 1989-09-20 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0348853U true JPH0348853U (de) | 1991-05-10 |
Family
ID=31658321
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10975289U Pending JPH0348853U (de) | 1989-09-20 | 1989-09-20 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0348853U (de) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010153734A (ja) * | 2008-12-26 | 2010-07-08 | Tokyo Electron Ltd | アニール装置およびアニール方法 |
| JP2012044041A (ja) * | 2010-08-20 | 2012-03-01 | Tokyo Electron Ltd | 基板処理装置及び温度調節方法 |
| WO2012124246A1 (ja) * | 2011-03-11 | 2012-09-20 | パナソニック株式会社 | 薄膜の製造方法及び製造装置 |
-
1989
- 1989-09-20 JP JP10975289U patent/JPH0348853U/ja active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010153734A (ja) * | 2008-12-26 | 2010-07-08 | Tokyo Electron Ltd | アニール装置およびアニール方法 |
| JP2012044041A (ja) * | 2010-08-20 | 2012-03-01 | Tokyo Electron Ltd | 基板処理装置及び温度調節方法 |
| WO2012124246A1 (ja) * | 2011-03-11 | 2012-09-20 | パナソニック株式会社 | 薄膜の製造方法及び製造装置 |
| JP5058396B1 (ja) * | 2011-03-11 | 2012-10-24 | パナソニック株式会社 | 薄膜の製造方法及び製造装置 |
| CN103392025A (zh) * | 2011-03-11 | 2013-11-13 | 松下电器产业株式会社 | 薄膜的制造方法和制造装置 |
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