JPH0346969B2 - - Google Patents

Info

Publication number
JPH0346969B2
JPH0346969B2 JP57116711A JP11671182A JPH0346969B2 JP H0346969 B2 JPH0346969 B2 JP H0346969B2 JP 57116711 A JP57116711 A JP 57116711A JP 11671182 A JP11671182 A JP 11671182A JP H0346969 B2 JPH0346969 B2 JP H0346969B2
Authority
JP
Japan
Prior art keywords
photoresist
photoresist film
exposure energy
exposure
determined
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57116711A
Other languages
English (en)
Japanese (ja)
Other versions
JPS597953A (ja
Inventor
Tetsuo Ito
Masaya Tanuma
Yasuo Morooka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP57116711A priority Critical patent/JPS597953A/ja
Publication of JPS597953A publication Critical patent/JPS597953A/ja
Publication of JPH0346969B2 publication Critical patent/JPH0346969B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP57116711A 1982-07-07 1982-07-07 フォトレジストプロセスにおける露光エネルギ決定方法 Granted JPS597953A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57116711A JPS597953A (ja) 1982-07-07 1982-07-07 フォトレジストプロセスにおける露光エネルギ決定方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57116711A JPS597953A (ja) 1982-07-07 1982-07-07 フォトレジストプロセスにおける露光エネルギ決定方法

Publications (2)

Publication Number Publication Date
JPS597953A JPS597953A (ja) 1984-01-17
JPH0346969B2 true JPH0346969B2 (enExample) 1991-07-17

Family

ID=14693917

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57116711A Granted JPS597953A (ja) 1982-07-07 1982-07-07 フォトレジストプロセスにおける露光エネルギ決定方法

Country Status (1)

Country Link
JP (1) JPS597953A (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61100754A (ja) * 1984-10-23 1986-05-19 Fujitsu Ltd 適正露光時間の検出方法
JPH0797549B2 (ja) * 1987-08-28 1995-10-18 東京エレクトロン九州株式会社 露光方法及びその装置
JP5867822B2 (ja) 2012-03-19 2016-02-24 スズキ株式会社 変速機のリバースアイドラ軸支持構造

Also Published As

Publication number Publication date
JPS597953A (ja) 1984-01-17

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