JPH0346431B2 - - Google Patents
Info
- Publication number
- JPH0346431B2 JPH0346431B2 JP7064484A JP7064484A JPH0346431B2 JP H0346431 B2 JPH0346431 B2 JP H0346431B2 JP 7064484 A JP7064484 A JP 7064484A JP 7064484 A JP7064484 A JP 7064484A JP H0346431 B2 JPH0346431 B2 JP H0346431B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- single crystal
- substrate
- compound
- compound film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000013078 crystal Substances 0.000 claims description 64
- 239000000758 substrate Substances 0.000 claims description 52
- 238000000034 method Methods 0.000 claims description 39
- 150000001875 compounds Chemical class 0.000 claims description 38
- 230000008569 process Effects 0.000 claims description 14
- 238000001816 cooling Methods 0.000 claims description 10
- 239000000463 material Substances 0.000 claims description 9
- 230000008018 melting Effects 0.000 claims description 8
- 238000002844 melting Methods 0.000 claims description 8
- 239000011248 coating agent Substances 0.000 claims description 7
- 238000000576 coating method Methods 0.000 claims description 7
- 239000007791 liquid phase Substances 0.000 claims description 6
- 238000010438 heat treatment Methods 0.000 claims description 5
- 238000004857 zone melting Methods 0.000 claims description 4
- 239000000155 melt Substances 0.000 claims description 3
- -1 for example Substances 0.000 description 11
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 10
- 229910052738 indium Inorganic materials 0.000 description 10
- 229910052698 phosphorus Inorganic materials 0.000 description 10
- 239000011574 phosphorus Substances 0.000 description 9
- 238000001953 recrystallisation Methods 0.000 description 9
- 238000000151 deposition Methods 0.000 description 8
- 238000001704 evaporation Methods 0.000 description 8
- 230000008020 evaporation Effects 0.000 description 8
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 8
- 230000008021 deposition Effects 0.000 description 7
- 239000000126 substance Substances 0.000 description 7
- 239000011521 glass Substances 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 5
- 230000008859 change Effects 0.000 description 4
- 239000012535 impurity Substances 0.000 description 4
- 238000007740 vapor deposition Methods 0.000 description 4
- 238000005162 X-ray Laue diffraction Methods 0.000 description 3
- 239000000470 constituent Substances 0.000 description 3
- 238000002425 crystallisation Methods 0.000 description 3
- 230000008025 crystallization Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000010410 layer Substances 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 229910005542 GaSb Inorganic materials 0.000 description 2
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 2
- 229910000673 Indium arsenide Inorganic materials 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 229910052733 gallium Inorganic materials 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- WPYVAWXEWQSOGY-UHFFFAOYSA-N indium antimonide Chemical compound [Sb]#[In] WPYVAWXEWQSOGY-UHFFFAOYSA-N 0.000 description 2
- RPQDHPTXJYYUPQ-UHFFFAOYSA-N indium arsenide Chemical compound [In]#[As] RPQDHPTXJYYUPQ-UHFFFAOYSA-N 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 230000001737 promoting effect Effects 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 238000007738 vacuum evaporation Methods 0.000 description 2
- 229910005540 GaP Inorganic materials 0.000 description 1
- 108010083687 Ion Pumps Proteins 0.000 description 1
- 239000000370 acceptor Substances 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 229940125782 compound 2 Drugs 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000000407 epitaxy Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000001451 molecular beam epitaxy Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000007790 solid phase Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/40—AIIIBV compounds wherein A is B, Al, Ga, In or Tl and B is N, P, As, Sb or Bi
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
- C30B11/002—Crucibles or containers for supporting the melt
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7064484A JPS60215593A (ja) | 1984-04-09 | 1984-04-09 | 単結晶膜成長方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7064484A JPS60215593A (ja) | 1984-04-09 | 1984-04-09 | 単結晶膜成長方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60215593A JPS60215593A (ja) | 1985-10-28 |
| JPH0346431B2 true JPH0346431B2 (cs) | 1991-07-16 |
Family
ID=13437559
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7064484A Granted JPS60215593A (ja) | 1984-04-09 | 1984-04-09 | 単結晶膜成長方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60215593A (cs) |
-
1984
- 1984-04-09 JP JP7064484A patent/JPS60215593A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60215593A (ja) | 1985-10-28 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US5871580A (en) | Method of growing a bulk crystal | |
| US7175706B2 (en) | Process of producing multicrystalline silicon substrate and solar cell | |
| JPS61272922A (ja) | 半導体装置ウエハ−基板とその製造方法 | |
| WO1999059199A1 (en) | CdTe CRYSTAL OR CdZnTe CRYSTAL AND METHOD FOR PREPARING THE SAME | |
| JPS6046539B2 (ja) | シリコン結晶膜の製造方法 | |
| JPH0346431B2 (cs) | ||
| JP2555847B2 (ja) | 低抵抗半導体結晶基板及びその製造方法 | |
| JPH01197399A (ja) | 単結晶テルル化カドミウム水銀層を作製する方法 | |
| JPH04298020A (ja) | シリコン薄膜結晶の製造方法 | |
| Okimura et al. | Dendritic crystal regrowth and electrical properties of InSb thin films prepared by vacuum evaporation | |
| US4632723A (en) | Orientation filtering for crystalline films | |
| JP2679708B2 (ja) | 有機膜の作製方法 | |
| JPH01149483A (ja) | 太陽電池 | |
| Sharma et al. | The preparation of InSb films | |
| JPS6126598A (ja) | ゲルマニウム薄膜結晶の製造方法 | |
| Yoshioka et al. | Homo-epitaxial growth of CdTe by sublimation under low pressure | |
| JP2556159B2 (ja) | 半導体結晶の製造方法 | |
| JPS61179523A (ja) | 単結晶薄膜形成方法 | |
| JPS60235795A (ja) | 単結晶膜の製造方法 | |
| JPH02184594A (ja) | 単結晶薄膜の製造方法 | |
| Burton et al. | CdSiAs/sub 2/thin films for solar cell applications. Final report, April 9, 1979-April 8, 1980 | |
| JPH0545072B2 (cs) | ||
| JPS5954687A (ja) | 酸化物単結晶の製造方法 | |
| JPH01132114A (ja) | 単結晶薄膜の形成方法 | |
| JPH01297814A (ja) | 単結晶薄膜の製造方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |