JPH0342697B2 - - Google Patents
Info
- Publication number
- JPH0342697B2 JPH0342697B2 JP60240461A JP24046185A JPH0342697B2 JP H0342697 B2 JPH0342697 B2 JP H0342697B2 JP 60240461 A JP60240461 A JP 60240461A JP 24046185 A JP24046185 A JP 24046185A JP H0342697 B2 JPH0342697 B2 JP H0342697B2
- Authority
- JP
- Japan
- Prior art keywords
- mask
- substrate
- cassette
- unit
- fork
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000758 substrate Substances 0.000 claims description 41
- 238000001514 detection method Methods 0.000 claims description 11
- 230000003287 optical effect Effects 0.000 claims description 11
- 238000010586 diagram Methods 0.000 description 12
- 238000003825 pressing Methods 0.000 description 12
- 239000004065 semiconductor Substances 0.000 description 7
- 210000000078 claw Anatomy 0.000 description 6
- 239000000428 dust Substances 0.000 description 5
- 230000007246 mechanism Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 230000001105 regulatory effect Effects 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 3
- 101100269850 Caenorhabditis elegans mask-1 gene Proteins 0.000 description 2
- 238000003708 edge detection Methods 0.000 description 2
- 230000001276 controlling effect Effects 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
- G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries
Landscapes
- Engineering & Computer Science (AREA)
- Library & Information Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Warehouses Or Storage Devices (AREA)
- Specific Conveyance Elements (AREA)
- Sheets, Magazines, And Separation Thereof (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60240461A JPS62102538A (ja) | 1985-10-29 | 1985-10-29 | マスクまたはレチクル基板の搬送装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60240461A JPS62102538A (ja) | 1985-10-29 | 1985-10-29 | マスクまたはレチクル基板の搬送装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62102538A JPS62102538A (ja) | 1987-05-13 |
| JPH0342697B2 true JPH0342697B2 (enrdf_load_stackoverflow) | 1991-06-28 |
Family
ID=17059846
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60240461A Granted JPS62102538A (ja) | 1985-10-29 | 1985-10-29 | マスクまたはレチクル基板の搬送装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62102538A (enrdf_load_stackoverflow) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005340315A (ja) * | 2004-05-25 | 2005-12-08 | Nikon Corp | 位置合わせ装置、露光装置、位置合わせ方法及び露光方法、並びにデバイス製造方法及び較正用（工具）レチクル |
| KR100770147B1 (ko) | 2006-01-04 | 2007-10-30 | 코리아테크노(주) | 마스크 인출장치 |
| CN106527062B (zh) * | 2017-01-11 | 2018-11-27 | 惠科股份有限公司 | 一种曝光机及其图像偏移防治方法和系统 |
-
1985
- 1985-10-29 JP JP60240461A patent/JPS62102538A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62102538A (ja) | 1987-05-13 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |