JPH0341848U - - Google Patents
Info
- Publication number
- JPH0341848U JPH0341848U JP10209889U JP10209889U JPH0341848U JP H0341848 U JPH0341848 U JP H0341848U JP 10209889 U JP10209889 U JP 10209889U JP 10209889 U JP10209889 U JP 10209889U JP H0341848 U JPH0341848 U JP H0341848U
- Authority
- JP
- Japan
- Prior art keywords
- reaction chamber
- electrode
- heater
- plasma cvd
- reaction gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005268 plasma chemical vapour deposition Methods 0.000 claims description 4
- 239000000758 substrate Substances 0.000 claims description 2
- 239000012495 reaction gas Substances 0.000 claims 3
- 238000010438 heat treatment Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
- 239000000376 reactant Substances 0.000 description 1
Landscapes
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10209889U JPH0341848U (de) | 1989-08-31 | 1989-08-31 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10209889U JPH0341848U (de) | 1989-08-31 | 1989-08-31 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0341848U true JPH0341848U (de) | 1991-04-22 |
Family
ID=31651017
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10209889U Pending JPH0341848U (de) | 1989-08-31 | 1989-08-31 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0341848U (de) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63119520A (ja) * | 1986-11-07 | 1988-05-24 | Agency Of Ind Science & Technol | 非晶質シリコン合金堆積法及び装置 |
| JPH0217555B2 (de) * | 1979-08-23 | 1990-04-20 | Sankyo Co | |
| JPH02236279A (ja) * | 1989-03-08 | 1990-09-19 | Fujitsu Ltd | アモルファスシリコン系薄膜の形成装置 |
-
1989
- 1989-08-31 JP JP10209889U patent/JPH0341848U/ja active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0217555B2 (de) * | 1979-08-23 | 1990-04-20 | Sankyo Co | |
| JPS63119520A (ja) * | 1986-11-07 | 1988-05-24 | Agency Of Ind Science & Technol | 非晶質シリコン合金堆積法及び装置 |
| JPH02236279A (ja) * | 1989-03-08 | 1990-09-19 | Fujitsu Ltd | アモルファスシリコン系薄膜の形成装置 |
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