JPH01100432U - - Google Patents
Info
- Publication number
- JPH01100432U JPH01100432U JP19561787U JP19561787U JPH01100432U JP H01100432 U JPH01100432 U JP H01100432U JP 19561787 U JP19561787 U JP 19561787U JP 19561787 U JP19561787 U JP 19561787U JP H01100432 U JPH01100432 U JP H01100432U
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- heating heater
- plasma
- utility
- scope
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims description 4
- 238000010438 heat treatment Methods 0.000 claims description 2
- 238000010586 diagram Methods 0.000 description 3
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 2
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19561787U JPH01100432U (de) | 1987-12-23 | 1987-12-23 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19561787U JPH01100432U (de) | 1987-12-23 | 1987-12-23 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01100432U true JPH01100432U (de) | 1989-07-05 |
Family
ID=31486288
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19561787U Pending JPH01100432U (de) | 1987-12-23 | 1987-12-23 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01100432U (de) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013503464A (ja) * | 2009-08-25 | 2013-01-31 | アイクストロン、エスイー | Ｃｖｄ方法およびｃｖｄ反応炉 |
-
1987
- 1987-12-23 JP JP19561787U patent/JPH01100432U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013503464A (ja) * | 2009-08-25 | 2013-01-31 | アイクストロン、エスイー | Ｃｖｄ方法およびｃｖｄ反応炉 |