JPH0340390A - Manufacture of heater - Google Patents

Abstract

PURPOSE:To accomplish a heater with minute pattern by forming a thin film having a heater function on a base table through a mask, and then removing the mask. CONSTITUTION:On a base table 1 a mask 5 is formed in a pattern as enclosing areas other than a heater pattern. By plasma fusion spray, chromium is applied to the overall surface of this base table with mask 5, in particular to the portion where no mask pattern 5 is provided. The chromium is fed to a plasma gun 6 in minute and constant amount and heated by the plasma flow at a high temp. to be melted perfectly, wherewith the base table 1 is covered at a specified speed. At this time, the base table 1 is cooled from its rear surface. A chromium film 7 is affixed to the base table 1 by allowing the plasma gun 6 to scan the area on the base table 1 where no mask pattern 5 is provided. This is followed by removal of the mask 5, and the base table 1 is provided with a chromium film 7 in the desired pattern.

Description

[Detailed description of the invention] [Industrial application field]

The present invention relates to a method for manufacturing a heater.

[Conventional technology]

Conventionally, heaters made of wound nichrome wire or heat-generating lamps were often used.
It is difficult to construct these as fine heaters. Therefore, it has been considered to form a fine heater with a predetermined heater pattern by depositing a resistance heating material on a heating base.

[Problem to be solved by the invention]

By the way, methods for depositing the heat-generating material on the base include methods commonly used in semiconductor manufacturing technology such as vapor deposition, CVD, sputtering, and ion blating, as well as other methods.
There are methods such as plasma spraying, but even if these techniques are used, there is a limit to the ability to obtain a heater with a fine pattern. For example, plasma spraying uses a high-speed, high-temperature plasma stream generated by a non-transfer arc and thermal pinch effect to instantly melt and spray coating materials. It is possible to adhere inorganic substances and composites of inorganic substances and metals that cannot be applied using manufacturing techniques, and it is also possible to form dense films with high hardness and high adhesion. However, in the case of this plasma spraying method, in order to deposit the heat-generating material on the base in a predetermined pattern, the plasma gun is moved along the pattern, but the width of the pattern depends on the performance of the plasma gun. For example, the width of 5 angles is the limit. Therefore, there is a drawback that a fine pattern with a width smaller than this width cannot be formed. In view of the above points, it is an object of the present invention to provide a method for manufacturing a heater that can form a heater with a fine pattern.

[Means to solve the problem]

The method for manufacturing a heater according to the present invention is characterized in that a mask is formed on a base, a thin film having heater performance is formed on the base through the mask, and then the mask is removed. shall be.

[Effect]

In the method according to the present invention, a mask is formed on a base, and a thin film having heating performance is formed through this mask. Therefore, a fine heater having a thin film heater pattern corresponding to a mask pattern can be manufactured.

【Example】

Hereinafter, one embodiment of the present invention will be described with reference to the drawings, taking as an example a case where plasma spraying is used as a thin film deposition method. First, the heater manufactured by the method according to the present invention will be described. As shown in FIG. 4, this heater has a heater pattern made of a conductive thin film 2 formed on a base 1. The base 1 is made of a ceramic material such as alumina, which has electrical insulation and thermal conductivity. The base 1 only needs to be able to support the heater pattern, and its thickness is, for example, 0.1 to 5 mm, preferably 1 to 2 mm.
+am. The conductive thin film 2 is made of, for example, a chromium film, and is deposited on the surface of the base 1 to a thickness of, for example, 0.1 to 1000 μm, preferably 1 to 10 μm. Copper electrodes 3 and 4 are formed at both ends of the heater pattern of the conductive thin film 2. Note that an insulating film made of ceramic or the like is formed on the base 1 so as to cover the conductive thin film 2. Next, a method for manufacturing the heater shown in FIG. 4 will be described below with reference to FIGS. 1 to 3. First, as shown in FIG. 1, a mask 5 is formed on the base 1 with a mask pattern that covers areas other than the heater pattern as shown in FIG. This mask 5 can be formed using lithography technology, and the material of the mask 5 is as follows:
In addition to organic materials such as photoresist and polyimide, S L
Inorganic materials such as O2, AiJ203, etc. can be used depending on the type of coating material. Next, on the entire surface of the base 1 on which the mask 5 is formed, especially the part where the mask pattern 5 is not formed,
As shown in FIG. 2, chromium is plasma sprayed. That is, in FIG. 2, 6 is a plasma gun, and chromium, which is a conductive thin film material, is supplied in a small quantity and quantity into this plasma gun 6.
It is heated to a temperature above .degree. C. to completely melt, collides with the base 1 at a predetermined speed, and is adhered to the base 1. At this time, the base 1 is cooled by a method such as contacting a cooling plate (not shown) from its back surface, and an excessive temperature rise in the base 1 due to the formation of the deposited film is suppressed. Then, by scanning the plasma gun 6 along the portion of the base 1 where the mask pattern 5 is not formed, the chromium thin film 7 can be deposited on the base 1 as shown in FIG. In this case, if the spray width of the plasma gun 6 is larger than the area where the mask 5 is not formed, chromium is also deposited on the mask 5, but the amount is small. The base 1 coated with the chromium thin film 7 in this way is coated with, for example, an IP coating.
The mask 5 is removed by immersing it in a solvent such as A or acetone as shown in FIG. This mask 5 may be removed by etching. In this way, the chromium thin film 7 in a desired pattern can be deposited on the base 1. Although not shown, after electrodes are formed at both ends of the pattern of the chromium film 7, an insulating film made of, for example, ceramic is deposited on the base 1 on which the heater pattern of the chromium film 7 is formed, by, for example, vapor deposition. It is coated over the entire surface. By using the mask pattern as described above, it is possible to form a heater with a fine pattern whose radius is narrower than the limit width due to the performance of the plasma gun. In this example, since the heater pattern was deposited and formed by plasma spraying, it is possible to obtain a high quality heater pattern coating with little deterioration or change. Moreover, as mentioned above, it is possible to adhere inorganic substances and composites of inorganic substances and metals that cannot be applied using semiconductor manufacturing technology, and it is also possible to form a dense heater pattern film with high hardness and high adhesion. . In addition to the chromium used in the above-mentioned embodiments, materials for the conductive thin film constituting the heater pattern include nickel, platinum, tantalum, tungsten, tin, iron, lead, alumel, beryllium, antimony, indium, Chromel, cobalt, strontium, rhodium, palladium,
111 metals such as magnesium, molybdenum, lithium, rubidium, carbon-based materials such as carbon black and graphite, nichrome, stainless steel,
Materials that are electrically conductive and can function as heating resistors and become heat sources when energized, such as alloys such as stainless steel, bronze, and brass, polymer composite materials such as polymer-grafted carbon, and composite ceramic materials such as molybdenum silicide. That's fine. Furthermore, the material for the base 1 is preferably one that has good thermal conductivity and excellent electrical insulation. Examples of such materials include, in addition to the above-mentioned alumina, ceramics such as quartz, zirconia, silicon carbide, silicon nitride, and diamond, metal oxides such as rutile, and bricks such as high alumina bricks and carbon bricks. I can do it. In the above example, the heater pattern thin film was deposited by plasma spraying, but the heater pattern thin film can be deposited by sputtering, CVD, vapor deposition, etc. depending on the film material.
Of course, film forming methods used in semiconductor manufacturing techniques such as ion blating can be used. Note that the heater is not limited to the one shown in FIG. 4, and can be applied to heaters with various thin film patterns. Also, for example, without providing electrodes on the thin film pattern,
A heater using a high-frequency induction heating method, in which an induction coil is placed on the heater pattern without contact, a high-frequency signal is supplied to the induction coil, and the induced magnetic flux generated by this generates eddy current in the thin film to generate heat. This invention can also be applied. Furthermore, the present invention is also applicable to a heater in which a thin film is made of a dielectric material and generates heat by high-frequency dielectric heating.

【Effect of the invention】

As explained above, according to the present invention, after forming a mask pattern on the base, a thin film having heater performance is applied, so that a fine thin film heater pattern corresponding to the mask pattern is formed on the base. can be formed into

[Brief explanation of drawings]

1 to 3 are diagrams for explaining the method according to the present invention, and FIG. 4 is a diagram showing an example of a heater manufactured according to the present invention. 1; Base 2; Conductive thin film 5; Mask 6; Plasma gun 7; Chrome thin film

Claims (1)

[Claims] A method for manufacturing a heater, comprising forming a mask on a base, forming a thin film having heater performance on the base through the mask, and then removing the mask.