JPH0336424B2 - - Google Patents

Info

Publication number
JPH0336424B2
JPH0336424B2 JP58227545A JP22754583A JPH0336424B2 JP H0336424 B2 JPH0336424 B2 JP H0336424B2 JP 58227545 A JP58227545 A JP 58227545A JP 22754583 A JP22754583 A JP 22754583A JP H0336424 B2 JPH0336424 B2 JP H0336424B2
Authority
JP
Japan
Prior art keywords
reducing
image
alkali
resin layer
force
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58227545A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60119553A (ja
Inventor
Shigenori Nagahara
Satoshi Imahashi
Yoshio Kato
Shinichi Tanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyobo Co Ltd
Original Assignee
Toyobo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyobo Co Ltd filed Critical Toyobo Co Ltd
Priority to JP58227545A priority Critical patent/JPS60119553A/ja
Publication of JPS60119553A publication Critical patent/JPS60119553A/ja
Publication of JPH0336424B2 publication Critical patent/JPH0336424B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G03F1/56—Organic absorbers, e.g. of photo-resists

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP58227545A 1983-12-01 1983-12-01 画像形成材料用減力液 Granted JPS60119553A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58227545A JPS60119553A (ja) 1983-12-01 1983-12-01 画像形成材料用減力液

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58227545A JPS60119553A (ja) 1983-12-01 1983-12-01 画像形成材料用減力液

Publications (2)

Publication Number Publication Date
JPS60119553A JPS60119553A (ja) 1985-06-27
JPH0336424B2 true JPH0336424B2 (enEXAMPLES) 1991-05-31

Family

ID=16862574

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58227545A Granted JPS60119553A (ja) 1983-12-01 1983-12-01 画像形成材料用減力液

Country Status (1)

Country Link
JP (1) JPS60119553A (enEXAMPLES)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI685718B (zh) * 2016-06-20 2020-02-21 日商三菱製紙股份有限公司 阻焊劑圖型之形成方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1516687A (en) * 1974-10-17 1978-07-05 Energy Conversion Devices Inc Imaging method
JPS5797534A (en) * 1980-12-10 1982-06-17 Mitsubishi Chem Ind Ltd Picture erasing agent for planographic printing plate

Also Published As

Publication number Publication date
JPS60119553A (ja) 1985-06-27

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