JPH0330968B2 - - Google Patents
Info
- Publication number
- JPH0330968B2 JPH0330968B2 JP58169018A JP16901883A JPH0330968B2 JP H0330968 B2 JPH0330968 B2 JP H0330968B2 JP 58169018 A JP58169018 A JP 58169018A JP 16901883 A JP16901883 A JP 16901883A JP H0330968 B2 JPH0330968 B2 JP H0330968B2
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- thin film
- pole
- main
- head support
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000035699 permeability Effects 0.000 claims description 19
- 239000010409 thin film Substances 0.000 claims description 16
- 238000000034 method Methods 0.000 claims description 14
- 239000000463 material Substances 0.000 claims description 7
- 229910000889 permalloy Inorganic materials 0.000 claims description 4
- 238000004544 sputter deposition Methods 0.000 claims description 4
- 238000007747 plating Methods 0.000 claims description 3
- 238000007740 vapor deposition Methods 0.000 claims description 3
- 230000005389 magnetism Effects 0.000 claims 1
- 239000000758 substrate Substances 0.000 description 12
- 239000010408 film Substances 0.000 description 7
- 230000005415 magnetization Effects 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000005284 excitation Effects 0.000 description 2
- 239000000696 magnetic material Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000700 radioactive tracer Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/1278—Structure or manufacture of heads, e.g. inductive specially adapted for magnetisations perpendicular to the surface of the record carrier
Landscapes
- Magnetic Heads (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physical Vapour Deposition (AREA)
- Thin Magnetic Films (AREA)
Description
【発明の詳細な説明】
本発明の垂直磁気記録用ヘツド（以下、垂直ヘ
ツド）の製造方法に関するもので、その主磁極に
用いられる高透磁率薄膜の磁気異方性の向きを作
成時に制御することにより垂直ヘツドの信頼性を
高め、歩留まりを向上させることを目的とする。[Detailed Description of the Invention] This relates to a method for manufacturing a perpendicular magnetic recording head (hereinafter referred to as a perpendicular head) according to the present invention, in which the direction of magnetic anisotropy of a high magnetic permeability thin film used for the main magnetic pole is controlled at the time of manufacture. The aim is to increase the reliability of vertical heads and improve yields.
近年、磁気記録の高密度化の要求とともに、磁
気記録媒体の厚み方向に磁気記録する、いわゆる
垂直磁気記録方式が注目されている。 In recent years, with the demand for higher density magnetic recording, the so-called perpendicular magnetic recording method, which performs magnetic recording in the thickness direction of a magnetic recording medium, has been attracting attention.
この垂直磁気記録に使用される垂直ヘツドには
さまざまなタイプのものが提案されているが、基
本的には高透磁率薄膜からなる主磁極と、フエラ
イト等からなる比較的厚い補助磁極及び励磁コイ
ルによつて構成されている。 Various types of vertical heads have been proposed for use in perpendicular magnetic recording, but basically they consist of a main pole made of a thin film with high magnetic permeability, a relatively thick auxiliary pole made of ferrite, etc., and an excitation coil. It is composed of.
これらの垂直ヘツドのうち、代表的な補助磁極
励磁型垂直磁気ヘツドを第１図に示す。記録時に
はコイル２に記録電流を流して補助磁極の磁性体
３を励磁し、これによつて励磁された主磁極１の
高透磁率薄膜と垂直磁性媒体５との相互作用によ
つて記録される。また、再生時には記録時と逆の
過程を経てコイル２に再生電流が流れる。７はヘ
ツド支持台である。この時、高密度記録になる
程、主磁極を通る磁束の反転速度が速くなり、主
磁極の高透磁率薄膜の応答速度または実効透磁率
の低下が問題となつてくる。つまり、主磁極の高
透磁率薄膜の磁気特性は、磁化反転速度の遅い磁
化容易軸を用いるよりも、磁化反転速度の速い磁
化困難軸を用いれば良い。つまり、垂直磁性媒体
に対して磁化困難軸を向ければ良い。 Among these vertical heads, a typical auxiliary pole excitation type vertical magnetic head is shown in FIG. During recording, a recording current is passed through the coil 2 to excite the magnetic body 3 of the auxiliary magnetic pole, and recording is performed by the interaction between the high permeability thin film of the main magnetic pole 1 excited by this and the perpendicular magnetic medium 5. . Furthermore, during reproduction, a reproduction current flows through the coil 2 through a process reverse to that during recording. 7 is a head support stand. At this time, the higher the recording density becomes, the faster the reversal speed of the magnetic flux passing through the main pole becomes, and a decrease in the response speed or effective magnetic permeability of the high magnetic permeability thin film of the main pole becomes a problem. In other words, for the magnetic properties of the high permeability thin film of the main pole, it is better to use the hard axis of magnetization, which has a faster magnetization reversal speed, than to use the easy axis, which has a slower magnetization reversal speed. In other words, it is sufficient to direct the axis of difficult magnetization to the perpendicular magnetic medium.
一方、この主磁極の高透磁率薄膜はスパツタ、
蒸着、メツキ法等の方法で作成されるが、その生
成膜は膜作成時の環境、特に周囲に存在する微弱
な磁場によつて敏感に反応してその磁気異方性の
向きを決定するため、作成された高透磁率薄膜の
磁気異方性の方法がとかく一定しない。従つて従
来は高透磁率薄膜を形成した後、Ｂ−Ｈループト
レーサーにより薄膜の磁気異方性を測定し、磁化
困難軸の方向にパターンが向くようエツチング処
理をしていた。しかしこの方法では膜形成時の環
境の微妙な変化により高透磁率薄膜の磁気特性に
かなりのバラツキを生じていた。 On the other hand, the high magnetic permeability thin film of this main pole is spattered,
It is created using methods such as vapor deposition and plating, but the resulting film reacts sensitively to the environment at the time of film creation, especially the weak magnetic field that exists around it, and determines the direction of its magnetic anisotropy. However, the method of magnetic anisotropy of the produced high magnetic permeability thin film is not constant. Therefore, conventionally, after forming a high magnetic permeability thin film, the magnetic anisotropy of the thin film was measured using a B-H loop tracer, and etching treatment was performed so that the pattern was oriented in the direction of the axis of hard magnetization. However, with this method, the magnetic properties of the high permeability thin film vary considerably due to subtle changes in the environment during film formation.
本発明はこの問題を解決するために、成膜時に
高透磁率材料からなるヨーク板８，８′を第２図
ａの様にヘツド支持台となる基板７の両側に配置
することによつて、周囲に存在する浮遊磁場をこ
のヨーク板８，８′に導き、その方向を常にヨー
ク板の挾持の方向に一定にし、それによつて作成
される高透磁率薄膜の磁気異方性の向きを任意に
制御するようにしたものである。 The present invention solves this problem by arranging yoke plates 8, 8' made of a high magnetic permeability material on both sides of the substrate 7, which serves as a head support, as shown in FIG. 2a during film formation. , the stray magnetic field existing in the surroundings is guided to these yoke plates 8, 8', and its direction is always kept constant in the direction of the sandwiching of the yoke plates, thereby controlling the direction of the magnetic anisotropy of the high magnetic permeability thin film created. It is designed to be controlled arbitrarily.
以下、本発明をその実施例について更に詳細に
説明する。 Hereinafter, the present invention will be described in more detail with reference to embodiments thereof.
第２図は本発明の一実施例であり、６は高周波
スパツタ法用基板ホルダーである。基板ホルダー
６上に高透磁率材料のヨーク板（パーマロイ）
８，８′を第２図に示す様に平行に配置する。こ
のヨーク板８，８′の設置により、それらに導か
れてヘツド支持台となる基板７表面付近の浮遊磁
場の向きは、第２図ｃに示す様な形となり、例え
ば高周波スパツタにより高透磁率薄膜を基板７上
に付着するとき、その部分には特定方向即ちヨー
クが挾む方向の平行磁場がかかることになる。こ
の基板ホルダーを用いて高周波スパツタ法により
基板上にパーマロイ膜を形成させたものをＢ−Ｈ
ループトレーサーにかけて得られたＢ−Ｈループ
は第３図の様になり、磁化容易軸は平行磁場の方
向を向き、磁化困難軸はそれに直交する方向とな
つた。 FIG. 2 shows an embodiment of the present invention, and 6 is a substrate holder for high frequency sputtering. A yoke plate made of high magnetic permeability material (permalloy) is placed on the substrate holder 6.
8 and 8' are arranged in parallel as shown in FIG. By installing the yoke plates 8 and 8', the direction of the floating magnetic field near the surface of the substrate 7, which is guided by them and becomes the head support, becomes as shown in Fig. 2c. When a thin film is deposited on the substrate 7, a parallel magnetic field in a specific direction, that is, in the direction sandwiched by the yoke, is applied to that part. Using this substrate holder, a permalloy film was formed on the substrate using the high frequency sputtering method.
The B-H loop obtained by applying the loop tracer was as shown in Figure 3, with the easy axis of magnetization oriented in the direction of the parallel magnetic field, and the axis of hard magnetization in the direction perpendicular to it.
以上述べた様に本発明によれば、あらかじめ決
定した方向に磁気異方性を持つ高透磁率薄膜を作
成でき、主磁極の信頼性を高め、歩留まりを大幅
に向上させることができた。 As described above, according to the present invention, a high magnetic permeability thin film having magnetic anisotropy in a predetermined direction can be created, the reliability of the main magnetic pole can be improved, and the yield can be significantly improved.
ただし、本実施例では高透磁率材料のヨーク板
としてパーマロイを用いたが、ヨーク板は高透磁
率材料であれば良く、材料には制限されない。ま
た、ヨーク板の構造も非磁性体上に単に高透磁率
材料の膜を付着させただけのものでも良く、本実
施例に制限されるものではない。さらにヨーク板
の形状についても基板上で平行磁場を生じさせる
ものであれば良く、これも本実施例に制限されな
い。 However, in this embodiment, permalloy is used as the yoke plate made of a high magnetic permeability material, but the material of the yoke plate is not limited as long as it is made of a high magnetic permeability material. Further, the structure of the yoke plate may also be one in which a film of a high magnetic permeability material is simply adhered on a non-magnetic material, and is not limited to this embodiment. Further, the shape of the yoke plate may be any shape as long as it generates a parallel magnetic field on the substrate, and is not limited to this embodiment.
本実施例では高周波スパツタ法を用いたが、
DCマグネトロンスパツタ法、、蒸着法、イオンブ
レーテイング法、メツキ法等によつても同様な結
果が得られる。薄膜形成方法においても本発明は
本実施例に制限されない。 In this example, a high-frequency sputtering method was used, but
Similar results can be obtained by the DC magnetron sputtering method, vapor deposition method, ion blating method, plating method, etc. The present invention is not limited to the present embodiment in the thin film forming method either.
簡単な方法によつて顕著な効果をあげる、本発
明の工業的価値は高い。 The industrial value of the present invention is high as it achieves remarkable effects through a simple method.
第１図は典型的な垂直ヘツドの例である。第２
図は本発明の一実施例であり、ａは正面図、ｂは
断面図、ｃはヨーク板を通る磁力線を示した図で
ある。第３図ａは、第２図ａの磁気的要部を示す
図。第３図ｂは本発明の一実施例において得られ
た高透磁率薄膜を第３図ａの１０，１１の各方向
についてＢ−Ｈループを測定して得られたグラフ
の一例である。
１……主磁極、２……コイル、３……補助磁極
の磁性体、４……ベースフイルム、５……垂直磁
性媒体、６……基板ホルダー、７……（基板即
ち）ヘツド支持台、８……ヨーク板、９……磁力
線、１０……基板上の磁力線方向、１１……基板
上の磁力線方向に垂直な方向。
FIG. 1 is an example of a typical vertical head. Second
The figures show one embodiment of the present invention, in which a is a front view, b is a sectional view, and c is a diagram showing lines of magnetic force passing through a yoke plate. FIG. 3a is a diagram showing the magnetic main part of FIG. 2a. FIG. 3b is an example of a graph obtained by measuring the B-H loop in each direction of 10 and 11 in FIG. 3a for the high magnetic permeability thin film obtained in one embodiment of the present invention. DESCRIPTION OF SYMBOLS 1... Main magnetic pole, 2... Coil, 3... Magnetic material of auxiliary magnetic pole, 4... Base film, 5... Vertical magnetic medium, 6... Substrate holder, 7... (Substrate, i.e., head support stand), 8... Yoke plate, 9... Lines of magnetic force, 10... Direction of lines of magnetic force on the substrate, 11... Direction perpendicular to the direction of lines of magnetic force on the substrate.
Claims (1)
磁気記録用ヘツドの主磁極をヘツド支持台表面に
パーマロイで薄膜状に作成するに際して、該ヘツ
ド支持台表面に一定方向に浮遊平行磁界をつくる
ように、該方向で該ヘツド支持台表面を挟持する
如き複数の高透磁率材料よりなるヨーク板を設
け、該主磁極の磁気異方性の向きを一定方向に制
御することを特徴とする垂直磁気記録ヘツド主磁
極の作成方法。1. When forming the main magnetic pole of a perpendicular magnetic recording head as a thin film of permalloy on the surface of the head support using the sputtering method, vapor deposition method, or plating method, a floating parallel magnetic field is created in a fixed direction on the surface of the head support. A perpendicular magnetism characterized in that a yoke plate made of a plurality of high magnetic permeability materials is provided to sandwich the surface of the head support in the direction, and the direction of the magnetic anisotropy of the main pole is controlled in a constant direction. How to create a recording head main magnetic pole.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16901883A JPS60136903A (en) | 1983-09-13 | 1983-09-13 | Method for forming main magnetic pole of vertical magnetic recording head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16901883A JPS60136903A (en) | 1983-09-13 | 1983-09-13 | Method for forming main magnetic pole of vertical magnetic recording head |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60136903A JPS60136903A (en) | 1985-07-20 |
| JPH0330968B2 true JPH0330968B2 (en) | 1991-05-01 |
Family
ID=15878802
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16901883A Granted JPS60136903A (en) | 1983-09-13 | 1983-09-13 | Method for forming main magnetic pole of vertical magnetic recording head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60136903A (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57207308A (en) * | 1981-06-15 | 1982-12-20 | Akai Electric Co Ltd | Amorphous soft magnetic thin film |
-
1983
- 1983-09-13 JP JP16901883A patent/JPS60136903A/en active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57207308A (en) * | 1981-06-15 | 1982-12-20 | Akai Electric Co Ltd | Amorphous soft magnetic thin film |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60136903A (en) | 1985-07-20 |
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