JPH03296475A - 洗浄装置 - Google Patents
洗浄装置Info
- Publication number
- JPH03296475A JPH03296475A JP9884790A JP9884790A JPH03296475A JP H03296475 A JPH03296475 A JP H03296475A JP 9884790 A JP9884790 A JP 9884790A JP 9884790 A JP9884790 A JP 9884790A JP H03296475 A JPH03296475 A JP H03296475A
- Authority
- JP
- Japan
- Prior art keywords
- cleaning
- gas
- air
- nozzle
- liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004140 cleaning Methods 0.000 title claims abstract description 151
- 239000007788 liquid Substances 0.000 claims abstract description 34
- 239000003595 mist Substances 0.000 claims abstract description 17
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 42
- 238000011086 high cleaning Methods 0.000 abstract description 4
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 abstract description 2
- 230000000694 effects Effects 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 239000008399 tap water Substances 0.000 description 6
- 235000020679 tap water Nutrition 0.000 description 6
- 238000005406 washing Methods 0.000 description 6
- 230000003068 static effect Effects 0.000 description 4
- 239000000654 additive Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- 238000005507 spraying Methods 0.000 description 3
- 230000006378 damage Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 238000011144 upstream manufacturing Methods 0.000 description 2
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 230000002730 additional effect Effects 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 238000000889 atomisation Methods 0.000 description 1
- KYKAJFCTULSVSH-UHFFFAOYSA-N chloro(fluoro)methane Chemical compound F[C]Cl KYKAJFCTULSVSH-UHFFFAOYSA-N 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Landscapes
- Nozzles (AREA)
- Cleaning By Liquid Or Steam (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9884790A JPH03296475A (ja) | 1990-04-13 | 1990-04-13 | 洗浄装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9884790A JPH03296475A (ja) | 1990-04-13 | 1990-04-13 | 洗浄装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH03296475A true JPH03296475A (ja) | 1991-12-27 |
| JPH0586274B2 JPH0586274B2 (enExample) | 1993-12-10 |
Family
ID=14230636
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9884790A Granted JPH03296475A (ja) | 1990-04-13 | 1990-04-13 | 洗浄装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03296475A (enExample) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0596252A (ja) * | 1991-10-03 | 1993-04-20 | Kao Corp | 洗浄方法 |
| NL1019212C2 (nl) * | 2001-10-23 | 2002-08-20 | Theodorus Alphonsius Niemeijer | Werkwijze en inrichting voor het behandelen van oppervlakken. |
| JP2002239425A (ja) * | 2001-02-21 | 2002-08-27 | Shibuya Kogyo Co Ltd | 気液混合流の噴射装置 |
| JP2003071331A (ja) * | 2001-08-30 | 2003-03-11 | Shibuya Kogyo Co Ltd | 気液混合流の噴射装置 |
| US8685174B2 (en) | 2009-08-19 | 2014-04-01 | Conopco, Inc. | Process for cleaning hard surfaces |
| US8800089B2 (en) | 2009-08-19 | 2014-08-12 | Conopco, Inc. | Process for cleaning teeth |
| US8910889B2 (en) | 2009-08-19 | 2014-12-16 | Conopco, Inc. | Process and a device to clean substrates |
-
1990
- 1990-04-13 JP JP9884790A patent/JPH03296475A/ja active Granted
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0596252A (ja) * | 1991-10-03 | 1993-04-20 | Kao Corp | 洗浄方法 |
| JP2002239425A (ja) * | 2001-02-21 | 2002-08-27 | Shibuya Kogyo Co Ltd | 気液混合流の噴射装置 |
| JP2003071331A (ja) * | 2001-08-30 | 2003-03-11 | Shibuya Kogyo Co Ltd | 気液混合流の噴射装置 |
| NL1019212C2 (nl) * | 2001-10-23 | 2002-08-20 | Theodorus Alphonsius Niemeijer | Werkwijze en inrichting voor het behandelen van oppervlakken. |
| EP1306136A1 (en) * | 2001-10-23 | 2003-05-02 | Theodorus Alphonsius Niemeijer | Method and arrangement for treating surfaces |
| US8685174B2 (en) | 2009-08-19 | 2014-04-01 | Conopco, Inc. | Process for cleaning hard surfaces |
| US8800089B2 (en) | 2009-08-19 | 2014-08-12 | Conopco, Inc. | Process for cleaning teeth |
| US8910889B2 (en) | 2009-08-19 | 2014-12-16 | Conopco, Inc. | Process and a device to clean substrates |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0586274B2 (enExample) | 1993-12-10 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20081210 Year of fee payment: 15 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20081210 Year of fee payment: 15 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20091210 Year of fee payment: 16 |
|
| LAPS | Cancellation because of no payment of annual fees |