JPH03294180A - Patterning method for low melting point glass - Google Patents
Patterning method for low melting point glassInfo
- Publication number
- JPH03294180A JPH03294180A JP9262690A JP9262690A JPH03294180A JP H03294180 A JPH03294180 A JP H03294180A JP 9262690 A JP9262690 A JP 9262690A JP 9262690 A JP9262690 A JP 9262690A JP H03294180 A JPH03294180 A JP H03294180A
- Authority
- JP
- Japan
- Prior art keywords
- melting point
- low melting
- point glass
- glass layer
- resist film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011521 glass Substances 0.000 title claims abstract description 42
- 238000002844 melting Methods 0.000 title claims abstract description 38
- 230000008018 melting Effects 0.000 title claims abstract description 38
- 238000000034 method Methods 0.000 title claims description 7
- 238000000059 patterning Methods 0.000 title claims description 5
- 238000005488 sandblasting Methods 0.000 claims abstract description 8
- 239000000758 substrate Substances 0.000 claims description 8
- 239000011248 coating agent Substances 0.000 abstract 2
- 238000000576 coating method Methods 0.000 abstract 2
- 239000000463 material Substances 0.000 description 7
- 238000010586 diagram Methods 0.000 description 3
- 239000003082 abrasive agent Substances 0.000 description 2
- 239000011324 bead Substances 0.000 description 2
- 238000007650 screen-printing Methods 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
Landscapes
- Surface Treatment Of Glass (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は基板上に所定形状の低融点ガラス層を設ける低
融点ガラスのパターニング方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method of patterning low melting point glass, which provides a low melting point glass layer of a predetermined shape on a substrate.
ガラス基板上に低融点ガラスをバターニングする方法と
して、従来はペースト状の低融点ガラスをスクリーン印
刷等で基板上に印刷する方法がとられていた。Conventionally, as a method for patterning low melting point glass onto a glass substrate, a method has been used in which paste-like low melting point glass is printed onto the substrate by screen printing or the like.
しかし上記従来の方法では低融点ガラスを微細なパター
ンでかつ厚く印刷することが不可能である。However, with the above-mentioned conventional methods, it is impossible to print low melting point glass in fine patterns and thickly.
〔課題を解決するための手段ゴ
本発明は上記従来の課題を解決するための手段として、
基板上に全面的に低融点ガラス層を形成し、該低融点ガ
ラス層表面を所定パターンを有するレジスト膜で被覆保
護した上でサンドブラスト装置で該低融点ガラスを彫刻
することにより、該低融点ガラスに所定パターンを形成
させる低融点ガラスのバターニング方法提供するもので
ある。[Means for Solving the Problems] The present invention provides, as means for solving the above-mentioned conventional problems,
The low melting point glass is formed by forming a low melting point glass layer on the entire surface of the substrate, covering and protecting the surface of the low melting point glass layer with a resist film having a predetermined pattern, and then engraving the low melting point glass with a sandblasting device. The present invention provides a method for patterning low melting point glass to form a predetermined pattern.
本発明を以下に詳細に説明する。The invention will be explained in detail below.
本発明に用いられる基材としてはガラス、金属。Base materials used in the present invention include glass and metal.
セラミックス等があり、第１図に示すように基材（１）
上には全面的に低融点ガラス層（２）が形成される。該
基材（１）上に全面的に低融点ガラス層（２）を形成す
るにはペースト状の低融点ガラスをスクリーン印刷、ナ
イフコーター、ロールコータ−等により基材（１）表面
に塗布し乾燥固化させるのである。There are ceramics, etc., and as shown in Figure 1, the base material (1)
A low melting point glass layer (2) is formed on the entire surface. To form a low melting point glass layer (2) on the entire surface of the substrate (1), a paste of low melting point glass is applied to the surface of the substrate (1) by screen printing, a knife coater, a roll coater, etc. It is dried and solidified.
上記低融点ガラス層（２）表面は所定パターンを有する
レジスト膜（４）で被覆保護される。このようなレジス
ト膜（４）としては１例えば特願平１−２２６１８４号
、特願平１−２２６１８５号、特願平１−２２６１８６
号等によって開示される方法で製造されたものが用いら
れる。The surface of the low melting point glass layer (2) is covered and protected with a resist film (4) having a predetermined pattern. Examples of such a resist film (4) include Japanese Patent Application No. 1-226184, Japanese Patent Application No. 1-226185, and Japanese Patent Application No. 1-226186.
Those manufactured by the method disclosed in No. et al. are used.
上記レジスト膜（４）で保護された低融点ガラス層（２
）に対してアルミナ、カーボランダム、ガラスピーズ等
の望ましくは２００番よりも細かい研磨材を用いてサン
ドブラスト装置で彫刻を行なう。Low melting point glass layer (2) protected by the above resist film (4)
) is engraved with a sandblasting device using an abrasive material such as alumina, carborundum, glass beads, etc., preferably finer than No. 200.
このようにして第２図に示すようにレジスト膜（４）で
保護された低融点ガラス層（２）部分以外の部分を完全
に削除して低融点ガラス層（２）に所定のパターンを彫
刻する。上記低融点ガラス層（２）の彫刻において基材
（１）を傷付けないようにする場合には、基材（］）の
硬度と同等、もしくは基材（１）より低い硬度であり、
かつ低融点ガラス層（２）より高い硬度の研磨材（例え
ばガラスピーズ）を用いることが望ましい。In this way, as shown in Figure 2, the parts other than the low melting point glass layer (2) protected by the resist film (4) are completely removed and a predetermined pattern is engraved on the low melting point glass layer (2). do. In order not to damage the base material (1) when engraving the low melting point glass layer (2), the hardness is equal to or lower than the base material (1),
Moreover, it is desirable to use an abrasive material (for example, glass beads) that has a higher hardness than the low melting point glass layer (2).
このようにして基材（１）表面にレジスト膜（４）によ
って被覆された所定のパターンを有する低融点ガラス層
（２）が形成されるが、更にこれを焼成すれば、低融点
ガラス層（２）は溶融する。In this way, a low melting point glass layer (2) having a predetermined pattern is formed on the surface of the base material (1) and covered with a resist film (4). If this is further fired, the low melting point glass layer ( 2) is melted.
このようにして第３図に示すように基材（１）表面に低
融点ガラス層（２）によるパターンが形成される。In this way, a pattern of the low melting point glass layer (2) is formed on the surface of the base material (1) as shown in FIG.
したがって本発明においては微細なパターンが彫刻出来
るサンドブラスト装置により低融点ガラス層を彫刻する
ので、基材表面に例えば微細なパターンで厚い低融点ガ
ラス層を形成させることが出来る。Therefore, in the present invention, since the low melting point glass layer is engraved using a sandblasting device capable of engraving fine patterns, it is possible to form a thick low melting point glass layer with, for example, a fine pattern on the surface of the substrate.
第１図〜第３図は本発明の詳細な説明する一実施例を示
すものであり、第１図はサンドブラスト前の説明図、第
２図はサンドブラスト後の説明図。
第３図は焼成後の説明図である。
図中、（１）・・・基材、（２）・・・低融点ガラス層
、（４）・・・レジスト膜1 to 3 show an embodiment of the present invention, in which FIG. 1 is an explanatory diagram before sandblasting, and FIG. 2 is an explanatory diagram after sandblasting. FIG. 3 is an explanatory diagram after firing. In the figure, (1)...Base material, (2)...Low melting point glass layer, (4)...Resist film
Claims (1)
ラス層表面を所定パターンを有するレジスト膜で被覆保
護した上でサンドブラスト装置で該低融点ガラスを彫刻
することにより、該低融点ガラスに所定パターンを形成
させることを特徴とする低融点ガラスのパターニング方
法The low melting point glass is formed by forming a low melting point glass layer on the entire surface of the substrate, covering and protecting the surface of the low melting point glass layer with a resist film having a predetermined pattern, and then engraving the low melting point glass with a sandblasting device. A method for patterning low melting point glass, characterized by forming a predetermined pattern in
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2092626A JPH0722893B2 (en) | 1990-04-06 | 1990-04-06 | Method for patterning low melting glass |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2092626A JPH0722893B2 (en) | 1990-04-06 | 1990-04-06 | Method for patterning low melting glass |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH03294180A true JPH03294180A (en) | 1991-12-25 |
| JPH0722893B2 JPH0722893B2 (en) | 1995-03-15 |
Family
ID=14059655
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2092626A Expired - Fee Related JPH0722893B2 (en) | 1990-04-06 | 1990-04-06 | Method for patterning low melting glass |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0722893B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5910396A (en) * | 1994-09-06 | 1999-06-08 | U.S. Philips Corporation | Method of patterned eroding of a coating provided on a substrate |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54113619A (en) * | 1978-02-24 | 1979-09-05 | Matsushita Electric Works Ltd | Preparation of frosted glass |
| JPS58109270A (en) * | 1981-12-17 | 1983-06-29 | Hiroshi Osada | Sandblast carving method |
| JPS61142072A (en) * | 1984-12-11 | 1986-06-28 | Ishizuka Glass Ltd | Method of decoratively machining for glass product |
-
1990
- 1990-04-06 JP JP2092626A patent/JPH0722893B2/en not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54113619A (en) * | 1978-02-24 | 1979-09-05 | Matsushita Electric Works Ltd | Preparation of frosted glass |
| JPS58109270A (en) * | 1981-12-17 | 1983-06-29 | Hiroshi Osada | Sandblast carving method |
| JPS61142072A (en) * | 1984-12-11 | 1986-06-28 | Ishizuka Glass Ltd | Method of decoratively machining for glass product |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5910396A (en) * | 1994-09-06 | 1999-06-08 | U.S. Philips Corporation | Method of patterned eroding of a coating provided on a substrate |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0722893B2 (en) | 1995-03-15 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |