JPH03293722A - Film growing apparatus for semiconductor device - Google Patents

Abstract

PURPOSE:To reduce direct influence of contaminant of conveying belt on a wafer and to reduce characteristic malfunction of the wafer due to dusts by supplying and incorporating the wafer and a tray as a pair. CONSTITUTION:A supply elevator 1 as a semiconductor wafer supply unit, a containing elevator 3 as a container, a preheater 8, a reaction chamber 2, and a conveying belt 5 are provided. A wafer 20 is supported to the tray 4 of a conveying jig to be conveyed in a series of processing steps of supplying the wafer 20, releasing the wafer 20 and incorporating the wafer 20. Thus, characteristic malfunction of the wafer 20 due to the dusts of the belt 5 can be reduced.

Description

DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a film growth apparatus for a semiconductor device, and particularly to a film growth apparatus for a semiconductor device used for forming a film on a semiconductor wafer.

[Conventional technology]

Conventionally, in this type of film growth apparatus for semiconductor devices, semiconductor wafers 20 (hereinafter abbreviated as wafers) are supplied onto a conveyor belt 5 from a supply elevator l which intermittently delivers the wafers 20, and are sent to the reaction chamber 2.

After film formation on the wafer 20 in the reaction chamber 2, the wafer 20 is accommodated in the accommodation elevator 3. Note that the conveyor belt 5 is passed through a cleaning tank 10 and cleaned in order to remove reaction products adhering to the surface.

Further, as a means for preventing the conveyor belt 5 from sagging, there is a structure in which tension is applied by several rollers 11, and the conveyor belt 5 is rotated while closely contacting an auxiliary plate 12.

[Problem to be solved by the invention]

The conventional film growth apparatus for semiconductor devices described above uses several rollers 11 to give tension to the conveyor belt 5 and brings the conveyor belt 5 into close contact with an auxiliary plate 12 provided at the bottom of the conveyor belt 5. Since the conveyor belt 5 is prevented from sagging, friction occurs between the conveyor belt 5, the roller 11, and the auxiliary plate 12. As a result, the roller 11 and the auxiliary plate 12 are scraped by the conveyor belt 5 and dust is generated, and the attached dust that adheres to the conveyor belt 5 is cleaned in the cleaning tank 10, but the cleaning liquid becomes contaminated in a short time. The cleaning effect cannot be maintained unless the cleaning solution is replaced frequently. Also,
Since the conveyor belt 5 passes between several rollers 11 even after cleaning, the cleaning effect was reduced.

As described above, the conventional film growth apparatus for semiconductor devices has a problem in that the characteristics of the wafer 20 may be deteriorated due to dust.

An object of the present invention is to provide a film growth apparatus for a semiconductor device that solves the above problems.

[Means to solve the problem]

In order to achieve the above object, the film growth apparatus for semiconductor devices according to the present invention includes a tray as a transport jig, a semiconductor wafer supply section and a storage section, a preheating section, a transport belt, and a transfer section. A film growth apparatus for a semiconductor device having: the tray supports the semiconductor wafer during a series of processing steps consisting of supplying the semiconductor wafer, forming a film on the semiconductor wafer, and storing the semiconductor wafer; The wafer supply section and storage section are for supplying or storing semiconductor wafers supported on the tray, and the preheating section is for preheating the semiconductor wafers supplied from the semiconductor wafer supply section. The conveyor belt is installed between the semiconductor wafer supply section and the storage section through a reaction chamber for forming a film on the semiconductor wafer, and the transfer section is arranged between the semiconductor wafer supply section and the storage section. The tray is transferred to the conveyor belt via the preheating section, and the tray is transferred from the transfer belt to the semiconductor wafer storage section.

〔Example〕

Embodiments of the present invention will be described below with reference to the drawings.

(Example 1) FIG. 1 is a perspective view showing Example 1 of the present invention. In the figure, a film growth apparatus according to the present invention includes a supply elevator 1 as a semiconductor wafer supply section and a storage elevator as a storage section. 3, a preheating section 8, a reaction chamber 2, a conveyor belt 5, and a transfer section, and consists of supplying semiconductor wafers (hereinafter referred to as wafers) 20, forming a film on the wafers 20, and storing the wafers 20. A supply elevator 1 and a storage elevator 3 are used to transport wafers 20 while supporting them on a tray 4 as a transport jig in a series of processing steps. Each time the trays 4 arranged in the upper and lower stages are supplied and stored, they are raised or lowered by a pinch corresponding to the trays 4.

The preheating section 8 preheats the wafer 2o that is supplied from the supply elevator 1 while being supported on the tray 4.

The conveyor belt 5 is laid between the semiconductor wafer supply section and the storage section, passing through the reaction chamber 2 in which a film is formed on the wafer 20.

Transfer sections are provided on the supply side and storage side of the wafers 20, respectively. The transfer section on the supply side of the wafer 20 includes a supply cylinder 9 that pushes out the tray 4 in the supply elevator 1, and a supply cylinder 9 that is installed in the preheating section 81 and transfers the pushed out tray 4 to the conveyor belt 5.
It has rails 21a21a that guide the trays to the side, and rails 77 that are laid at a constant pitch on the conveyor belt 5 to position and hold the trays 4. The tray 4 is extruded and passed through the preheating section 8 and transferred toward the conveyor belt 5 side by the rollers 21a and 2+a, and the tray 4 is held on the conveyor belt 5 by being engaged with the tray rail 77 of the conveyor belt 5.

On the other hand, the transfer section on the storage side of the wafers 20 includes a shaft section 22 provided perpendicularly to the conveyor belt 5, and a moving body 23 that is supported by the shaft section 22 and reciprocates between the accommodation elevator 3 and the conveyor belt 5. and a storage arm 6 that locks onto the tray 4 held on the conveyor belt 5.
The tray 4 is locked and moved toward the storage elevator 3 by the movable body 23, and the tray 4 is pushed into the storage elevator 3 and stored.

A tray 4 carrying several wafers 20 is arranged in advance in the supply elevator 1, and the supply cylinder 9 intermittently pushes the tray 4 to the preheating section 8, and further pushes the tray 4 onto the tray rail 7 on the conveyor belt 5. Tray 4 is conveyor belt 5
The tray 4 transported from the reaction chamber 2 is accommodated in the accommodation elevator 3 by the accommodation arm 6.

(Example 2) FIG. 2 is a front view showing a second embodiment of the present invention.

In this embodiment, a tray 4 carrying wafers 20 is sent from a supply elevator 1 to a preheating section 8 by a supply cylinder 9.
The wafer 20 and tray 4 are heated for a certain period of time. Next, the supply arm 13 moves left and right to transfer the tray 4 to the conveyor belt 5.
The tray 4 is transported to the upper installation position, and the supply arm 13 moves up and down to position the tray 4 on the conveyor belt 5. After positioning, it is sent to the reaction chamber 2 by the conveyor belt 5 similarly to Example 1, and a film is formed thereon. The wafer 20 and tray 4 after film formation are accommodated in the accommodation elevator 3 by vertical and horizontal movement of the accommodation arm 6A. Note that the difference from Example 1 is that the tray 4 is fed without sliding.

It has the advantage of being accommodating.

〔Effect of the invention〕

As described above, the present invention has the effect that dirt on the conveyor belt has less direct influence on the wafers by supplying and storing the wafers and trays as a pair, thereby reducing defects in wafer characteristics due to dirt.

[Brief explanation of drawings]

1 is a perspective view showing a first embodiment of the present invention, FIG. 2 is a front view showing a second embodiment of the present invention, and FIG. 3 is a front view showing a conventional film growth apparatus for a semiconductor device. 1... Supply elevator 2... Reaction chamber 3... Accommodation elevator 5... Conveyor belt 6A... Accommodation arm 8... Preheating section 10... Cleaning tank 12... Auxiliary plate 20. ... Wafer 22 ... Shaft 4 ... Tray 6 ... Accommodation arm 7 ... Tray rail 9 ... Supply cylinder 11 ... Roller 13 ... Supply arm 21a ... Rail 23 ...・・Mobile object

Claims (1)

[Claims] (1) A film growth apparatus for a semiconductor device including a tray as a transport jig, a semiconductor wafer supply section and a storage section, a preheating section, a transport belt, and a transfer section, wherein the tray is used for semiconductor wafers. The tray supports the semiconductor wafer during a series of processing steps consisting of supplying the semiconductor wafer, forming a film on the semiconductor wafer, and storing the semiconductor wafer. The preheating section preheats the semiconductor wafers supplied from the semiconductor wafer supply section, and the conveyor belt connects the semiconductor wafer supply section and the storage section. The transfer section transfers the tray from the semiconductor wafer supply section to the conveyor belt via the preheating section; 1. A film growth apparatus for a semiconductor device, characterized in that the tray is transferred to a storage section for semiconductor wafers.