JPH0329187B2 - - Google Patents
Info
- Publication number
- JPH0329187B2 JPH0329187B2 JP58125288A JP12528883A JPH0329187B2 JP H0329187 B2 JPH0329187 B2 JP H0329187B2 JP 58125288 A JP58125288 A JP 58125288A JP 12528883 A JP12528883 A JP 12528883A JP H0329187 B2 JPH0329187 B2 JP H0329187B2
- Authority
- JP
- Japan
- Prior art keywords
- channel
- transistors
- basic cell
- basic
- region
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000000034 method Methods 0.000 claims description 8
- 238000009792 diffusion process Methods 0.000 description 14
- 239000012535 impurity Substances 0.000 description 14
- 230000005540 biological transmission Effects 0.000 description 10
- 238000010586 diagram Methods 0.000 description 10
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 4
- 101150110971 CIN7 gene Proteins 0.000 description 3
- 101150110298 INV1 gene Proteins 0.000 description 3
- 101100397044 Xenopus laevis invs-a gene Proteins 0.000 description 3
- 101100286980 Daucus carota INV2 gene Proteins 0.000 description 2
- 101100397045 Xenopus laevis invs-b gene Proteins 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
- Design And Manufacture Of Integrated Circuits (AREA)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58125288A JPS6017930A (ja) | 1983-07-09 | 1983-07-09 | マスタ・スライス方式に於ける基本セル |
DE8484304668T DE3477312D1 (de) | 1983-07-09 | 1984-07-09 | Masterslice semiconductor device |
KR1019840003972A KR890004568B1 (ko) | 1983-07-09 | 1984-07-09 | 마스터슬라이스형 반도체장치 |
EP84304668A EP0131463B1 (fr) | 1983-07-09 | 1984-07-09 | Dispositif semi-conducteur du type "master slice" |
US07/008,042 US4816887A (en) | 1983-07-09 | 1987-01-21 | CMOS gate array with orthagonal gates |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58125288A JPS6017930A (ja) | 1983-07-09 | 1983-07-09 | マスタ・スライス方式に於ける基本セル |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6017930A JPS6017930A (ja) | 1985-01-29 |
JPH0329187B2 true JPH0329187B2 (fr) | 1991-04-23 |
Family
ID=14906364
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58125288A Granted JPS6017930A (ja) | 1983-07-09 | 1983-07-09 | マスタ・スライス方式に於ける基本セル |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6017930A (fr) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2868016B2 (ja) * | 1988-12-28 | 1999-03-10 | 沖電気工業株式会社 | ゲートアレイの基本セル |
EP0394598B1 (fr) * | 1989-04-28 | 1996-03-06 | International Business Machines Corporation | Cellule d'un réseau de transistors prédéposés composé de transistors à effet de champ à géométries différentes et optimisées |
JPH03251338A (ja) * | 1990-02-27 | 1991-11-08 | Canon Inc | 試料移送装置 |
US5300790A (en) * | 1990-06-15 | 1994-04-05 | Seiko Epson Corporation | Semiconductor device |
JP3186059B2 (ja) * | 1990-06-15 | 2001-07-11 | セイコーエプソン株式会社 | 半導体装置 |
-
1983
- 1983-07-09 JP JP58125288A patent/JPS6017930A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS6017930A (ja) | 1985-01-29 |
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