JPH03265147A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPH03265147A
JPH03265147A JP2063862A JP6386290A JPH03265147A JP H03265147 A JPH03265147 A JP H03265147A JP 2063862 A JP2063862 A JP 2063862A JP 6386290 A JP6386290 A JP 6386290A JP H03265147 A JPH03265147 A JP H03265147A
Authority
JP
Japan
Prior art keywords
semiconductor device
pads
junctions
substrate
width
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2063862A
Other languages
Japanese (ja)
Inventor
Akira Saito
明 斉藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Priority to JP2063862A priority Critical patent/JPH03265147A/en
Publication of JPH03265147A publication Critical patent/JPH03265147A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/02Bonding areas ; Manufacturing methods related thereto
    • H01L24/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L24/05Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/0212Auxiliary members for bonding areas, e.g. spacers
    • H01L2224/02122Auxiliary members for bonding areas, e.g. spacers being formed on the semiconductor or solid-state body
    • H01L2224/02163Auxiliary members for bonding areas, e.g. spacers being formed on the semiconductor or solid-state body on the bonding area
    • H01L2224/02165Reinforcing structures
    • H01L2224/02166Collar structures
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/00014Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01015Phosphorus [P]

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Wire Bonding (AREA)

Abstract

PURPOSE:To prevent the function of a semiconductor device from being lost even if edge short circuit occurs and to eliminate generation of a defective in an assembly process by a method wherein pads are provided on the outer peripheral part of the device regardless of the function of the device and P-N junctions having a width of a pad width or wider are formed in a semiconductor substrate which is positioned under these pads. CONSTITUTION:A plurality of pieces more than the number of pads 13 of P-N junctions 10 having a width of at least a pad width or wider are formed in the outer peripheral part, which is positioned in the vicinity of the pads 13 on an N-type substrate 11, of the N-type substrate 11. According to such a manner, even if a plurality of edge short circuits are generated, an electrical short between a wiring and the substrate can be prevented from being generated by the plurality of P-N junctions formed in the outer peripheral part, which is positioned in the vicinity of the pads, of a semiconductor device and at the same time, it becomes possible that an inter-wiring short is also prevented from being generated.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は、半導体装置の構造に関するちのである。[Detailed description of the invention] [Industrial application field] The present invention relates to the structure of a semiconductor device.

[発明の概要1 本発明は、半導体装置外周部に半導体装置の本来の機能
とは関係なく、パッド部外周部にパッド幅以上の複数の
PN接合が形成されている事を特徴とする。
[Summary of the Invention 1 The present invention is characterized in that a plurality of PN junctions having a width equal to or larger than the pad width are formed at the outer periphery of a pad portion, regardless of the original function of the semiconductor device.

[従来の技術] 従来構造の半導体装置外周部は、第2図又は第3図のよ
うになっていた。
[Prior Art] The outer periphery of a semiconductor device having a conventional structure was as shown in FIG. 2 or 3.

第2図は最も一般的な構造であり、半導体装置外周部2
0には、特に意識的にPN接合が形成されていない。こ
の場合には、半導体装置内電極であるパッド23からの
この半導体装置と外部装置を接続する、例えば金線、ア
ルミ綿、TABのリード、ビームリード電極のリード等
の配線が、外周部20に接触する事により、パッド23
と基板21が電気的にショートしてしまうため、半導体
装置の本来の機能が損なわれてしまう。
Figure 2 shows the most common structure, in which the outer peripheral part 2 of the semiconductor device
0, no PN junction is intentionally formed. In this case, wires such as gold wire, aluminum cotton, TAB leads, beam lead electrode leads, etc., which connect this semiconductor device and external devices from pads 23 which are internal electrodes of the semiconductor device, are connected to the outer peripheral portion 20. By contacting the pad 23
Since the substrate 21 is electrically short-circuited, the original function of the semiconductor device is impaired.

第3図は、第2図の構造を改良したちのであり、半導体
装置外周部30に連続したPN接合が作られている。こ
のような構造とする事により、半導体装置と外部装置を
接続する、例えば金線、アルミ線、TABのリード、ビ
ームリード電極のノード等のパッド33からの配線が、
外周部30に接触しても、ここにPN接合が形成されて
いる事により、パッド33と基板31との電気的ショー
トを防ぐ事ができ、半導体装置の機能は損なわれない。
FIG. 3 shows an improved structure of FIG. 2, in which a continuous PN junction is formed in the outer peripheral portion 30 of the semiconductor device. With this structure, the wiring from the pad 33, such as gold wire, aluminum wire, TAB lead, beam lead electrode node, etc., which connects the semiconductor device and external device, can be
Even if it comes into contact with the outer peripheral portion 30, the PN junction formed here prevents an electrical short between the pad 33 and the substrate 31, and the function of the semiconductor device is not impaired.

しかし、パッド33からの配線が複数本基板31と接触
した場合には、それらのパッド間での電気的ショートと
なり、半導体装置の機能は損なわれてしまう。
However, if a plurality of wirings from the pads 33 come into contact with the substrate 31, an electrical short will occur between the pads, and the functionality of the semiconductor device will be impaired.

[発明が解決しようとする課題] 半導体装置と外部装置を接続する方式は、金縁又はアル
ミ線を利用したワイヤボンディング方式が一般的である
。しかし近年は、半導体装置の薄型化、配線数の増加(
多ビン化)により、TAB方式の配線方法ら増えてきて
いる。−射的にTAB方式では、半導体装置と外部装置
を接続する配線数が多いため、基板と接触する配線ら複
数となる可能性が高いちのとなる。
[Problems to be Solved by the Invention] A wire bonding method using a gold edge or aluminum wire is generally used to connect a semiconductor device and an external device. However, in recent years, semiconductor devices have become thinner and the number of interconnects has increased (
Due to the increase in the number of bins), wiring methods such as the TAB method are increasing. - In the TAB method, the number of wires connecting the semiconductor device and external devices is large, so there is a high possibility that a plurality of wires will come into contact with the substrate.

本発明は、このように同一半導体装置の中で、複数本の
パッドからの配線が基板と接触して6半導体装置の機能
を損なわない事を目的とする。
An object of the present invention is to prevent the wiring from a plurality of pads from coming into contact with the substrate in the same semiconductor device and impairing the functions of the six semiconductor devices.

[課題を解決するための手段1 具体的には、パッドからの配線が複数本基板と接触して
も、パッドからの配線間、及びパッドからの配線と基板
間の電気的ショートを防ぐために、半導体装置外周部に
複数のPN接合を配するものとする。
[Means for Solving the Problem 1] Specifically, in order to prevent electrical shorts between the wirings from the pads and between the wirings from the pads and the board even if multiple wirings from the pads come into contact with the board, It is assumed that a plurality of PN junctions are arranged around the outer periphery of the semiconductor device.

[実 施 例] 第1図は、本発明の1実施例であり、半導体装置の基板
としてN型基板を利用し、PN接合はPNPの3つの接
合からなる例を示しである。
[Embodiment] FIG. 1 is an embodiment of the present invention, and shows an example in which an N-type substrate is used as the substrate of a semiconductor device, and the PN junction is composed of three PNP junctions.

第1図(a)は断面側面図であり、N型基板11のパッ
ド13近傍外周部にPN接合10が形成されている。
FIG. 1(a) is a cross-sectional side view, in which a PN junction 10 is formed on the outer periphery of an N-type substrate 11 near a pad 13. As shown in FIG.

第2図(b)は断面正面図であり、パッド近傍半導体装
置の基板11の外周部には、少なくともパッド幅以上の
幅を持ったPN接合10が、少なくとも半導体装置内の
パッド13の数取上、複数個形成されている。しかし、
これは1実施例であり、半導体装置の基板の種類(P型
、N型等)やPN接合の数、半導体装置内のトータルの
PN接合数にこだわる必要はない6基本的には、このP
N接合は二重以上であればその機能を果たす事ができる
ため、最低限として、二重接合以上が本発明の条件とな
る。
FIG. 2(b) is a cross-sectional front view, in which a PN junction 10 having a width at least equal to or larger than the pad width is formed on the outer periphery of the substrate 11 of the semiconductor device in the vicinity of the pad. Above, multiple pieces are formed. but,
This is just one example, and there is no need to be particular about the type of substrate of the semiconductor device (P type, N type, etc.), the number of PN junctions, or the total number of PN junctions in the semiconductor device.6 Basically, this P
Since the N-junction can fulfill its function if it is double or more, the minimum condition of the present invention is that the N-junction is double or more.

また半導体装置内のトータルPN接合の数は、製造上側
々に分離されたものが、半導体装置内の外部に接続され
るパッドの数と同数である事が最低限の条件となる。
Further, the minimum condition for the total number of PN junctions in a semiconductor device is that the number of PN junctions separated on each side during manufacturing is the same as the number of pads connected to the outside of the semiconductor device.

〔発明の効果〕〔Effect of the invention〕

以上のような構造とする事により、仮に複数本のエッヂ
ショートが発生しても、パッド近傍半導体装置外周部に
形成された複数のPN接合により、配線と基板との電気
的ショートが防げるだけでなく、配線間の電気的ショー
トも防ぐ事ができる。
With the above structure, even if multiple edge shorts occur, the multiple PN junctions formed on the outer periphery of the semiconductor device near the pads will simply prevent electrical shorts between the wiring and the substrate. This also prevents electrical shorts between wiring lines.

これにより仮にエッヂショートが発生しても、半導体装
置はその機能を失う事がなく、半導体装置の組立工程で
の不良発生の低減及び半導体装置の信頼性向上が得られ
るという大きな効果を有する。
As a result, even if an edge short occurs, the semiconductor device will not lose its functionality, and this has the great effect of reducing the occurrence of defects in the assembly process of the semiconductor device and improving the reliability of the semiconductor device.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は、本発明の実施例を示す半導体装置の(a)は
側面、(b)は正面の断面図。 第2図は、エッヂショートに対して何ら考慮されていな
い半導体装置の(a)は側面、(b)は正面の断面図。 第3図は、半導体装置外周部全体にPN接合を形成し、
エッヂショートに対し一部考慮された半導体装置の(a
)は側面、(b)は正面の断面図。 10 ・ 11 ・ l 2 ・ l 3 ・ 20 ・ 2 l ・ 22 ・ 23 ・ 本発明の実施例である半導体装置外 周部に形成されたPN接合 半導体装置基板 絶縁膜 パッド 半導体装置外周部 半導体装置基板 絶縁膜 パッド 30 ・ PN接合が形成された半導体装置外 周部 31 ・ ・半導体装置外周部 32 ・ 33 ・ ・絶縁膜 ・パッド 以 上
FIG. 1 is a cross-sectional view of a semiconductor device showing an embodiment of the present invention, with (a) a side view and (b) a front view. FIG. 2 is a cross-sectional view of (a) a side view and (b) a front view of a semiconductor device in which no consideration is given to edge shorts. FIG. 3 shows that a PN junction is formed on the entire outer periphery of the semiconductor device,
(a) of semiconductor devices with some consideration for edge shorts
) is a side view, and (b) is a front cross-sectional view. 10 ・ 11 ・ l 2 ・ l 3 ・ 20 ・ 2 l ・ 22 ・ 23 ・ PN junction semiconductor device substrate insulating film pad formed on the outer periphery of the semiconductor device according to the embodiment of the present invention Semiconductor device outer periphery semiconductor device substrate insulation Membrane pad 30 - Semiconductor device outer peripheral part 31 in which PN junction is formed - Semiconductor device outer peripheral part 32 - 33 - Insulating film pad or more

Claims (1)

【特許請求の範囲】[Claims]  半導体装置の外周部に半導体装置の本来の機能とは関
係のない、半導体装置から外部装置に取り出す電極(以
下パッドと呼ぶ)幅以上の幅を持った複数のPN接合が
形成されている事を特徴とする半導体装置。
A plurality of PN junctions are formed on the outer periphery of a semiconductor device, which are unrelated to the original function of the semiconductor device and have a width greater than the width of the electrode (hereinafter referred to as a pad) taken out from the semiconductor device to an external device. Characteristic semiconductor devices.
JP2063862A 1990-03-14 1990-03-14 Semiconductor device Pending JPH03265147A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2063862A JPH03265147A (en) 1990-03-14 1990-03-14 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2063862A JPH03265147A (en) 1990-03-14 1990-03-14 Semiconductor device

Publications (1)

Publication Number Publication Date
JPH03265147A true JPH03265147A (en) 1991-11-26

Family

ID=13241559

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2063862A Pending JPH03265147A (en) 1990-03-14 1990-03-14 Semiconductor device

Country Status (1)

Country Link
JP (1) JPH03265147A (en)

Similar Documents

Publication Publication Date Title
KR100321594B1 (en) Semiconductor device
US6946747B1 (en) Semiconductor device and its manufacturing method
JPH1056093A (en) Semiconductor device and electronic device where the semiconductor device is incorporated
US6703251B2 (en) Semiconductor wafer
US5349233A (en) Lead frame and semiconductor module using the same having first and second islands and three distinct pluralities of leads and semiconductor module using the lead frame
JPH04273451A (en) Semiconductor device
US6864587B2 (en) Semiconductor device
JPH03265147A (en) Semiconductor device
IE53794B1 (en) Large scale integration semiconductor device having monitor element and method of manufacturing the same
JP2685135B2 (en) Semiconductor integrated circuit
JPH0469425B2 (en)
JPS5854646A (en) Hybrid integrated circuit device
JPH08250620A (en) Semiconductor device
JPH0438852A (en) Semiconductor device with multi-layer wiring
JPH02164057A (en) Pin grid array semiconductor package
JPH03185730A (en) Semiconductor device
JPH0567646A (en) Semiconductor integrated circuit device
JPS62179736A (en) Connecting terminal
KR19980031515A (en) Semiconductor devices
JPS5870557A (en) Integrated circuit package
JPS6341036A (en) Semiconductor device
JPH07183320A (en) Connecting structure of bonding wire and connecting method of bonding wire
JPS6380543A (en) Integrated circuit device
KR19980033867A (en) Semiconductor devices
JPH0344046A (en) Electrode periphery structure of semiconductor device