JPH0326099U - - Google Patents
Info
- Publication number
- JPH0326099U JPH0326099U JP8578189U JP8578189U JPH0326099U JP H0326099 U JPH0326099 U JP H0326099U JP 8578189 U JP8578189 U JP 8578189U JP 8578189 U JP8578189 U JP 8578189U JP H0326099 U JPH0326099 U JP H0326099U
- Authority
- JP
- Japan
- Prior art keywords
- plasma generation
- generation chamber
- chamber
- magnet
- coaxial waveguide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004020 conductor Substances 0.000 claims description 4
- 239000002245 particle Substances 0.000 claims 1
- 230000005855 radiation Effects 0.000 claims 1
- 239000006091 Macor Substances 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000012774 insulation material Substances 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
Landscapes
- Electron Sources, Ion Sources (AREA)
- Plasma Technology (AREA)
Description
第１図は、本考案の一実施例の断面図である。
図中、１……マイクロ波導入用同軸コネクター
、２……中心導体、３……外導体、４……金属円
筒、５……第２の磁石、６……第１の磁石、７…
…プラズマ生成室、８……イオンビーム引出電極
、９……マコール断熱材。
FIG. 1 is a sectional view of one embodiment of the present invention. In the figure, 1... Coaxial connector for introducing microwaves, 2... Center conductor, 3... Outer conductor, 4... Metal cylinder, 5... Second magnet, 6... First magnet, 7...
...Plasma generation chamber, 8...Ion beam extraction electrode, 9...Macor insulation material.
Claims (1)
ら荷電粒子を引き出す引出口付近に配置された中
空の第１の磁石、この中空の第１の磁石の中心軸
上に前記第１の磁石と対向して、前記プラズマ生
成室中に配置された第２の磁石、この第２の磁石
を支持しマイクロ波輻射系を構成する同軸導波管
の内導体、及び前記同軸導波管の外導体がプラズ
マ生成室の他端に接続されて構成されるプラズマ
発生装置。 a plasma generation chamber; a hollow first magnet disposed near an outlet for drawing out charged particles from one end of the plasma generation chamber; , a second magnet disposed in the plasma generation chamber, an inner conductor of a coaxial waveguide that supports the second magnet and constitutes a microwave radiation system, and an outer conductor of the coaxial waveguide for plasma generation. A plasma generator connected to the other end of the chamber.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8578189U JPH0326099U (en) | 1989-07-21 | 1989-07-21 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8578189U JPH0326099U (en) | 1989-07-21 | 1989-07-21 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0326099U true JPH0326099U (en) | 1991-03-18 |
Family
ID=31635082
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8578189U Pending JPH0326099U (en) | 1989-07-21 | 1989-07-21 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0326099U (en) |
-
1989
- 1989-07-21 JP JP8578189U patent/JPH0326099U/ja active Pending
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