JPH0284249U - - Google Patents
Info
- Publication number
- JPH0284249U JPH0284249U JP16416188U JP16416188U JPH0284249U JP H0284249 U JPH0284249 U JP H0284249U JP 16416188 U JP16416188 U JP 16416188U JP 16416188 U JP16416188 U JP 16416188U JP H0284249 U JPH0284249 U JP H0284249U
- Authority
- JP
- Japan
- Prior art keywords
- ion source
- source chamber
- coil
- magnetic field
- microwave oscillator
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 150000002500 ions Chemical class 0.000 claims 6
- 239000004020 conductor Substances 0.000 claims 1
- 238000000605 extraction Methods 0.000 claims 1
- 238000010884 ion-beam technique Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 1
Landscapes
- Electron Sources, Ion Sources (AREA)
Description
第1図は本考案のイオン源の概略断面図。第2
図は第1図中の―断面図。第3図はスタブを
出入れした時の基本モードTE11の軸直角面に
おける電気力線の変化を示す図。aはもとのTE
11モード、bは90°の方向にスタブを入れた
もの、cは45°の方向にスタブを入れたもの。
dは0°の方向にスタブを入れたもの。第4図は
従来のイオン源チヤンバの略断面図。
1…イオン源チヤンバ、2…コイル、3…引出
電極、4…誘電体、5…導波管、6…整合器(ス
リースタブチユーナー)、7…方向性結合器、8
…アイソレータ、9…マイクロ波発振器、10…
テーパー導波管、11…スタブ機構、12…ガス
導入系。
FIG. 1 is a schematic cross-sectional view of the ion source of the present invention. Second
The figure is a sectional view in Figure 1. FIG. 3 is a diagram showing changes in the lines of electric force in a plane perpendicular to the axis of the fundamental mode TE 11 when the stub is moved in and out. a is the original TE
11 mode, b is the one with the stub inserted in the 90° direction, c is the one with the stub inserted in the 45° direction.
d is a stub inserted in the 0° direction. FIG. 4 is a schematic cross-sectional view of a conventional ion source chamber. DESCRIPTION OF SYMBOLS 1... Ion source chamber, 2... Coil, 3... Extracting electrode, 4... Dielectric, 5... Waveguide, 6... Matching device (three stub tuner), 7... Directional coupler, 8
...Isolator, 9...Microwave oscillator, 10...
Tapered waveguide, 11... stub mechanism, 12... gas introduction system.
Claims (1)
にする空間を与えるイオン源チヤンバ1と、イオ
ン源チヤンバ1に軸方向の磁場を生ずるためのコ
イル2と、イオン源チヤンバ1からイオンビーム
を引出すため、イオン源チヤンバ1の出口側に設
けられた引出電極3と、前記磁場による電子のサ
イクロトロン周波数にほぼ等しい周波数のマイク
ロ波を生ずるマイクロ波発振器9と、マイクロ波
発振器9で生じたマイクロ波をイオン源チヤンバ
1の中へ広い誘電体4の窓を通して導入するため
の拡径するテーパー導波管10と、テーパー導波
管10の途中に進退自在に設けられた導体の棒で
ある複数のスタブからなるスタブ機構11とより
なる事を特徴とするイオン源。 An ion source chamber 1 that can be evacuated and provides a space for turning introduced gas into plasma, a coil 2 for generating an axial magnetic field in the ion source chamber 1, and a coil 2 for extracting an ion beam from the ion source chamber 1. , an extraction electrode 3 provided on the exit side of the ion source chamber 1, a microwave oscillator 9 that generates microwaves with a frequency approximately equal to the cyclotron frequency of electrons due to the magnetic field, and a microwave oscillator 9 that generates ions. A tapered waveguide 10 with an expanding diameter is introduced into the source chamber 1 through a wide window of the dielectric 4, and a plurality of stubs, which are conductor rods, are provided in the middle of the tapered waveguide 10 so as to be able to advance and retreat. An ion source characterized by comprising a stub mechanism 11.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16416188U JPH0284249U (en) | 1988-12-19 | 1988-12-19 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16416188U JPH0284249U (en) | 1988-12-19 | 1988-12-19 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0284249U true JPH0284249U (en) | 1990-06-29 |
Family
ID=31449530
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16416188U Pending JPH0284249U (en) | 1988-12-19 | 1988-12-19 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0284249U (en) |
-
1988
- 1988-12-19 JP JP16416188U patent/JPH0284249U/ja active Pending
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