JPH0284249U - - Google Patents

Info

Publication number
JPH0284249U
JPH0284249U JP16416188U JP16416188U JPH0284249U JP H0284249 U JPH0284249 U JP H0284249U JP 16416188 U JP16416188 U JP 16416188U JP 16416188 U JP16416188 U JP 16416188U JP H0284249 U JPH0284249 U JP H0284249U
Authority
JP
Japan
Prior art keywords
ion source
source chamber
coil
magnetic field
microwave oscillator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16416188U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP16416188U priority Critical patent/JPH0284249U/ja
Publication of JPH0284249U publication Critical patent/JPH0284249U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Electron Sources, Ion Sources (AREA)

Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本考案のイオン源の概略断面図。第2
図は第1図中の―断面図。第3図はスタブを
出入れした時の基本モードTE11の軸直角面に
おける電気力線の変化を示す図。aはもとのTE
11モード、bは90°の方向にスタブを入れた
もの、cは45°の方向にスタブを入れたもの。
dは0°の方向にスタブを入れたもの。第4図は
従来のイオン源チヤンバの略断面図。 1…イオン源チヤンバ、2…コイル、3…引出
電極、4…誘電体、5…導波管、6…整合器(ス
リースタブチユーナー)、7…方向性結合器、8
…アイソレータ、9…マイクロ波発振器、10…
テーパー導波管、11…スタブ機構、12…ガス
導入系。
FIG. 1 is a schematic cross-sectional view of the ion source of the present invention. Second
The figure is a sectional view in Figure 1. FIG. 3 is a diagram showing changes in the lines of electric force in a plane perpendicular to the axis of the fundamental mode TE 11 when the stub is moved in and out. a is the original TE
11 mode, b is the one with the stub inserted in the 90° direction, c is the one with the stub inserted in the 45° direction.
d is a stub inserted in the 0° direction. FIG. 4 is a schematic cross-sectional view of a conventional ion source chamber. DESCRIPTION OF SYMBOLS 1... Ion source chamber, 2... Coil, 3... Extracting electrode, 4... Dielectric, 5... Waveguide, 6... Matching device (three stub tuner), 7... Directional coupler, 8
...Isolator, 9...Microwave oscillator, 10...
Tapered waveguide, 11... stub mechanism, 12... gas introduction system.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 真空に引く事ができ導入されたガスをプラズマ
にする空間を与えるイオン源チヤンバ1と、イオ
ン源チヤンバ1に軸方向の磁場を生ずるためのコ
イル2と、イオン源チヤンバ1からイオンビーム
を引出すため、イオン源チヤンバ1の出口側に設
けられた引出電極3と、前記磁場による電子のサ
イクロトロン周波数にほぼ等しい周波数のマイク
ロ波を生ずるマイクロ波発振器9と、マイクロ波
発振器9で生じたマイクロ波をイオン源チヤンバ
1の中へ広い誘電体4の窓を通して導入するため
の拡径するテーパー導波管10と、テーパー導波
管10の途中に進退自在に設けられた導体の棒で
ある複数のスタブからなるスタブ機構11とより
なる事を特徴とするイオン源。
An ion source chamber 1 that can be evacuated and provides a space for turning introduced gas into plasma, a coil 2 for generating an axial magnetic field in the ion source chamber 1, and a coil 2 for extracting an ion beam from the ion source chamber 1. , an extraction electrode 3 provided on the exit side of the ion source chamber 1, a microwave oscillator 9 that generates microwaves with a frequency approximately equal to the cyclotron frequency of electrons due to the magnetic field, and a microwave oscillator 9 that generates ions. A tapered waveguide 10 with an expanding diameter is introduced into the source chamber 1 through a wide window of the dielectric 4, and a plurality of stubs, which are conductor rods, are provided in the middle of the tapered waveguide 10 so as to be able to advance and retreat. An ion source characterized by comprising a stub mechanism 11.
JP16416188U 1988-12-19 1988-12-19 Pending JPH0284249U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16416188U JPH0284249U (en) 1988-12-19 1988-12-19

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16416188U JPH0284249U (en) 1988-12-19 1988-12-19

Publications (1)

Publication Number Publication Date
JPH0284249U true JPH0284249U (en) 1990-06-29

Family

ID=31449530

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16416188U Pending JPH0284249U (en) 1988-12-19 1988-12-19

Country Status (1)

Country Link
JP (1) JPH0284249U (en)

Similar Documents

Publication Publication Date Title
KR940010844B1 (en) Ion source
JPS6276137A (en) Ion source
JPH10229000A (en) Plasma generator and ion source using it
US6812647B2 (en) Plasma generator useful for ion beam generation
JPS62229641A (en) Electron cyclotron resonance ion source
CA1248643A (en) Process and apparatus for igniting an ultra-high frequency ion source
US4757237A (en) Electron cyclotron resonance negative ion source
JPH0284249U (en)
JPS63119198A (en) Plasma generator
JPS63171954U (en)
JPH01264141A (en) Ion source
JPH0262650U (en)
JPS60243953A (en) Coaxial microwave ion source
JPH0785996A (en) Ecr plasma generating device
JP3585512B2 (en) Microwave plasma generator
JPH0252252U (en)
JP2581053B2 (en) Microwave ion source
JPS60243957A (en) Microwave ion source
JPH06267472A (en) Microwave ion source
JPH0644006Y2 (en) Ion source
JP2727747B2 (en) Microwave plasma generator
JPH03201703A (en) Microwave antenna for generating plasma
JPH0831443B2 (en) Plasma processing device
JPH06101308B2 (en) Microwave plasma processing equipment
JPH01141759U (en)