JPH03251464A - Formation of glaze having paratial projection - Google Patents

Formation of glaze having paratial projection

Info

Publication number
JPH03251464A
JPH03251464A JP2933090A JP2933090A JPH03251464A JP H03251464 A JPH03251464 A JP H03251464A JP 2933090 A JP2933090 A JP 2933090A JP 2933090 A JP2933090 A JP 2933090A JP H03251464 A JPH03251464 A JP H03251464A
Authority
JP
Japan
Prior art keywords
glazed
resist
substrate
liquid
dipping
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2933090A
Other languages
Japanese (ja)
Inventor
Osamu Miyazawa
Tsumoru Nagira
Yoshimasa Hayashi
Keiichiro Nishi
Tadashi Betsumune
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Materials Corp
Original Assignee
Mitsubishi Materials Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Materials Corp filed Critical Mitsubishi Materials Corp
Priority to JP2933090A priority Critical patent/JPH03251464A/en
Publication of JPH03251464A publication Critical patent/JPH03251464A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To manufacture a high quality high performance glazed substrate which is excellent in printing performance by a method wherein a glazed partial projection is formed by using a photoresist, which is further rounded.
CONSTITUTION: After spraying glass powder uniformly onto a ground alumina substrate 1, a smooth glazed layer 2 is formed by baking. Then photoresist liquid is applied onto the surface of this glazed layer, and a resist film 3 is formed by drying. Thereafter, a photomask is put on the resist film, and ultraviolet rays are irradiated. The resist of an unexposed part is removed by developing by further dipping into developer, and the glazed substrate with a resist patter is obtained. By dipping this substrate into etching liquid, an exposed glazed surface part is etched. Then, after sufficiently washing with water, it is dipped into resist peeling liquid, and the resist is throughly peeled off. A rounding process is performed by heat processing of the glazed substrate having respectively formed rectangular partial projections.
COPYRIGHT: (C)1991,JPO&Japio
JP2933090A 1990-02-08 1990-02-08 Formation of glaze having paratial projection Pending JPH03251464A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2933090A JPH03251464A (en) 1990-02-08 1990-02-08 Formation of glaze having paratial projection

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2933090A JPH03251464A (en) 1990-02-08 1990-02-08 Formation of glaze having paratial projection

Publications (1)

Publication Number Publication Date
JPH03251464A true JPH03251464A (en) 1991-11-08

Family

ID=12273221

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2933090A Pending JPH03251464A (en) 1990-02-08 1990-02-08 Formation of glaze having paratial projection

Country Status (1)

Country Link
JP (1) JPH03251464A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009226765A (en) * 2008-03-24 2009-10-08 Nikko Co Method for manufacturing partially convexed protrusion type glazed substrate for thermal head

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009226765A (en) * 2008-03-24 2009-10-08 Nikko Co Method for manufacturing partially convexed protrusion type glazed substrate for thermal head

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