JPH03248342A - Optical disk substrate and its manufacture - Google Patents
Optical disk substrate and its manufactureInfo
- Publication number
- JPH03248342A JPH03248342A JP2046121A JP4612190A JPH03248342A JP H03248342 A JPH03248342 A JP H03248342A JP 2046121 A JP2046121 A JP 2046121A JP 4612190 A JP4612190 A JP 4612190A JP H03248342 A JPH03248342 A JP H03248342A
- Authority
- JP
- Japan
- Prior art keywords
- optical disk
- disk
- recording
- substrate
- manufacturing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 38
- 239000000758 substrate Substances 0.000 title claims abstract description 36
- 238000004519 manufacturing process Methods 0.000 title claims description 22
- 239000011521 glass Substances 0.000 claims abstract description 32
- 229920002120 photoresistant polymer Polymers 0.000 claims abstract description 31
- 230000001154 acute effect Effects 0.000 claims abstract description 14
- 238000000034 method Methods 0.000 claims description 30
- 238000000576 coating method Methods 0.000 claims description 12
- 238000007747 plating Methods 0.000 claims description 9
- 238000000465 moulding Methods 0.000 claims description 7
- 230000035945 sensitivity Effects 0.000 claims description 6
- 230000001681 protective effect Effects 0.000 abstract description 11
- 230000001678 irradiating effect Effects 0.000 abstract description 3
- 238000010586 diagram Methods 0.000 description 8
- 239000011248 coating agent Substances 0.000 description 4
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、光ディスク基板とその製造方法、特に、情報
の読みだし専用であるビデオディスク。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to an optical disc substrate and a method for manufacturing the same, particularly a video disc that is used exclusively for reading information.
CDやCD−ROM、情報の追記可能な追記型光ディス
ク、情報の書換え可能な書換え可能型光ディスクなどの
光ディスク基板とその製造方法に関する。The present invention relates to optical disk substrates such as CDs, CD-ROMs, write-once optical disks on which information can be written once upon a time, and rewritable optical disks on which information can be rewritten, and methods for manufacturing the same.
従来の光ディスク基板は、第6図に示すような工程で製
造されている。Conventional optical disc substrates are manufactured through the steps shown in FIG.
以下、順を追って説明する。The following is a step-by-step explanation.
囚 ガラス円盤製作工程では、カラス円盤1の表面を研
磨し、洗浄を行う。In the glass disk manufacturing process, the surface of the glass disk 1 is polished and cleaned.
(B) ホトレジスト塗布工程では、表面研磨し、洗
浄されたガラス円盤1の表面にホトレジスト13を塗布
し、これを乾燥する。(B) In the photoresist coating step, a photoresist 13 is coated on the surface of the glass disk 1, which has been polished and cleaned, and then dried.
レーザ光による記録工程では、記録すべき情報をレーザ
光4の強度変調によりガラス円盤1に塗布されたホトレ
ジス)13に照射し、露光(C)
を行う。In the recording process using laser light, the information to be recorded is irradiated onto the photoresist 13 coated on the glass disk 1 by intensity modulation of the laser light 4, thereby performing exposure (C).
(D) 現像工程では、ホトレジスト13の現像を行
う。露光されていない部分のホトレジス)13は現像処
理で反応せず、レーザ光4により露光された部分のホト
レジスト13は現像処理で反応してピット14ができる
。このようにしてできたガラス円盤をガラス原盤という
。(D) In the developing step, the photoresist 13 is developed. The photoresist 13 in the unexposed portions does not react during the development process, and the photoresist 13 in the areas exposed to the laser beam 4 reacts during the development process to form pits 14. The glass disk made in this way is called a glass master disk.
(E) メッキ工程では、ガラス原盤にメッキを行う
。(E) In the plating process, plating is performed on the glass master disk.
このメッキをした金属を剥すと、ガラス原盤のピット等
の凹凸が反転して転写されている。これをスタンバ15
という。When this plated metal is peeled off, the pits and other irregularities of the glass master disk are reversed and transferred. This is standby 15
That's what it means.
(F) 成形工程では、前述のスタンバ15を用いて
、ポリカーボネート等のプラスチック材料を射出成形等
の技術で転写し、あるいはフォトポリマー(2P)法等
で転写して光ディスク基板16の成形をする。このとき
、スタンバ15の凹凸は反転して転写されるので、最終
的に成形される光ディスク基板16の凹凸は、ガラス原
盤と一致する。(F) In the molding process, the above-mentioned standber 15 is used to mold an optical disk substrate 16 by transferring a plastic material such as polycarbonate using a technique such as injection molding or by a photopolymer (2P) method. At this time, the unevenness of the stand bar 15 is reversed and transferred, so that the unevenness of the optical disc substrate 16 that is finally formed matches that of the glass master disk.
以上のように製作される光ディスク基板16には、そ九
ぞれの光ティスフの用途に応じて反射膜、保護膜、記録
膜等が成膜される。On the optical disk substrate 16 manufactured as described above, a reflective film, a protective film, a recording film, etc. are formed depending on the use of each optical disk.
第9図は、従来の光ディスク基板16を用いて光磁気テ
ィスフとしたときの一例であり、トラッキングサーボを
動作させるための溝19.トラッキングやセクターのア
ドレス等の情報を記録してし・るピット17(基板のへ
こみのこと)が形成された光ディスク基板16上に、中
間膜8.磁性記録膜9.保護膜10が構成される。この
ような従来の光ディスク基板16は、ピッ)17や溝1
9はほぼ緩やかな曲面で形成されているが、ピット17
の底部に鋭角部分18を有している。この光ディスク基
板17の鋭角部分18は、光ディスク基板16上に成膜
される中間膜8.記録膜9.保護膜10にも影響を与え
、急峻な断差を形成する。FIG. 9 shows an example of a magneto-optical disk using a conventional optical disk substrate 16, in which a groove 19 for operating a tracking servo. An intermediate film 8. Magnetic recording film 9. A protective film 10 is configured. Such a conventional optical disc substrate 16 has pits 17 and grooves 1.
9 is formed with an almost gently curved surface, but pit 17
It has an acute angle portion 18 at the bottom. The acute-angled portion 18 of the optical disc substrate 17 forms an intermediate film 8 formed on the optical disc substrate 16. Recording film 9. This also affects the protective film 10, forming a steep difference.
光ディスクでは、媒体に断差を生ずるような欠陥やゴミ
があるとその部分から記録膜や保護膜の剥離や腐食が起
こりやすい傾向があり、上記鋭角部分18も剥離や腐食
を起こしやすくなる傾向を持つ。In an optical disk, if there is a defect or dust that causes a gap in the medium, the recording film or protective film tends to peel off or corrode from that part, and the acute angle portion 18 also tends to peel off or corrode. have
光ディスク基板16にこのような鋭角部分18が存在す
る理由は、以下の製造方法によるためである。The reason why such an acute angle portion 18 exists on the optical disc substrate 16 is due to the following manufacturing method.
前述したように、従来の光ディスク基板製造工程は、第
6図に示す工程で作られる。第7図は、第6図(C)の
拡大図であるが、ガラス円盤l上にホトレジスト11が
塗布されて構成されたガラス原盤上に、レーザ光4を照
射して記録が行われる。As mentioned above, the conventional optical disc substrate manufacturing process is performed by the steps shown in FIG. FIG. 7 is an enlarged view of FIG. 6(C), and recording is performed by irradiating a laser beam 4 onto a glass master disc, which is composed of a glass disc l coated with a photoresist 11.
このガラス原盤を現像処理すると第8図のようになる。When this glass master disk is developed, it becomes as shown in FIG.
ピット14はガラス円盤1が露出するため、鋭角部分が
発生する。このガラス原盤から、第6図の(E)メッキ
工程、(F)成形工程を経て光ディスク基板を作成する
と、第9図に示すようなピット17の底部に鋭角部分1
8が発生する。Since the glass disk 1 is exposed in the pit 14, an acute angle portion is generated. When an optical disk substrate is produced from this glass master through the (E) plating process and (F) molding process shown in FIG.
8 occurs.
第6図の(C)レーザ光による記録工程で、ガラス円盤
1が露出しないように弱いレーザ光を照射して現像処理
すると、ピットのエツジがなだらかになりすぎるために
、再生信号強度が取れず、また情報の記録密度も低下す
る。したがって、ピットエツジをなだらかにすることが
出来ない。In the (C) laser beam recording process in Figure 6, if the glass disk 1 is irradiated with a weak laser beam for development so as not to be exposed, the edges of the pits become too smooth, making it impossible to obtain the reproduced signal strength. , the information recording density also decreases. Therefore, it is not possible to make the pit edge gentle.
以上から、従来の光ディスク基板製造方法では、ピット
部に鋭角部分を作らずに光ディスク基板を作成すること
ができなかった。From the above, with the conventional optical disc substrate manufacturing method, it has not been possible to produce an optical disc substrate without creating an acute angle portion in the pit portion.
しかしながら、このような従来の光ディスク基板および
その製造方法は、記録膜や保護膜の剥離や腐食が起りや
すく長期信頼性に欠けるという欠点がある。However, such conventional optical disc substrates and their manufacturing methods have the disadvantage that the recording film and protective film are likely to peel off or corrode, resulting in a lack of long-term reliability.
(1)本発明の光ディスク基板は、情報をピットの有無
で記録してある光ディスク基板において、ピットの底部
が鋭角を有せずに曲面で形成されて構成される。(1) The optical disk substrate of the present invention is an optical disk substrate on which information is recorded with or without pits, and the bottoms of the pits are formed as curved surfaces without having acute angles.
(2)本発明の光ディスク基板製造方法は、情報をピッ
トの有無で記録してある光ディスク基板の製造方法にお
いて、ガラス円盤製作工程、ホトレジスト塗布工程、レ
ーザ光による記録工程。(2) The optical disk substrate manufacturing method of the present invention is a method for manufacturing an optical disk substrate in which information is recorded with or without pits, including a glass disk manufacturing step, a photoresist coating step, and a recording step using laser light.
現像工程2メッキ工程および成形工程からなり、前記ホ
トレジスト塗布工程において感度特性の異なる2種類以
上のホトレジストを使用して構成される。The developing process consists of two plating processes and a molding process, and is constructed by using two or more types of photoresists with different sensitivity characteristics in the photoresist coating process.
次に、本発明の実施例について、図面を参照して詳細に
説明する。Next, embodiments of the present invention will be described in detail with reference to the drawings.
第1図は本発明の一実施例を示す製造工程図である。FIG. 1 is a manufacturing process diagram showing an embodiment of the present invention.
第1図に示す光ディスク基板製造方法は、従来の光ディ
スク基板製造工程とはホトレジスト塗布工程が異なり、
第1ホトレジスト塗布工程B1と第2ホトレジスト塗布
工程B2の2段階の工程からなる。The optical disk substrate manufacturing method shown in FIG. 1 differs from the conventional optical disk substrate manufacturing process in the photoresist coating process.
The process consists of two steps: a first photoresist coating process B1 and a second photoresist coating process B2.
第2図は、第1ホトレジスト塗布工程B1と第2ホトレ
ジスト塗布工程B2を終了した後のガラス原盤に、レー
ザ光4を照射して露光する図である。ガラス原盤上には
、第1ホトレジスト層2と第2ホトレジスト層3が積層
されている。この第1ホトレジスト層2と第2ホトレジ
スト層3の感度特性を第3図に示す。これにレーザビー
ム4を照射して露光するが、このとき、レーザビーム4
の露光パワーは、現像処理後に第4図に示すようにピッ
ト5でカラス基板1が露出しない露光パワーを用いる。FIG. 2 is a diagram showing the glass master disk after the first photoresist coating step B1 and the second photoresist coating step B2 are irradiated with laser light 4 for exposure. A first photoresist layer 2 and a second photoresist layer 3 are laminated on the glass master disk. The sensitivity characteristics of the first photoresist layer 2 and the second photoresist layer 3 are shown in FIG. This is exposed by irradiating the laser beam 4. At this time, the laser beam 4
The exposure power used is such that the glass substrate 1 is not exposed at the pits 5 after the development process, as shown in FIG.
これにより、ピット底部は鋭角を有せずに、緩やかな曲
面で構成される。このとき、第2ホトレジスト膜3の露
光感度は、第1ホトレジスト膜2の露光感度よりも高い
ので、ピットのエツジは急峻にすることができるため、
従来例とは異なって、充分な再生信号強度を得ることが
てき、また情報の記録密度を低下することもない。As a result, the bottom of the pit has a gently curved surface without having an acute angle. At this time, since the exposure sensitivity of the second photoresist film 3 is higher than that of the first photoresist film 2, the edges of the pits can be made steep.
Unlike the conventional example, sufficient reproduction signal strength can be obtained, and the recording density of information is not reduced.
第4図に示したガラス原盤から第1図に示すメッキ工程
Eと成形工程Fを経て、本発明による鋭角を有せずに曲
面でへこんでいるピットの光ディスク基板が作成できる
。From the glass master disk shown in FIG. 4 through the plating step E and molding step F shown in FIG. 1, an optical disk substrate having pits having no acute angles but concave curved surfaces according to the present invention can be produced.
この発明による光ティスフ基板を使用して、光磁気ディ
スクとしたときの実施例の断面図を第5図に示す。FIG. 5 shows a cross-sectional view of an embodiment of a magneto-optical disk using the optical tiff substrate according to the present invention.
第5図の本発明による光ティスフ基板7にはトラッキン
グサーボを動作させるための溝12.トラックやセクタ
ーのアドレス等の情報を記録しているピット11が形成
され、その上に中間膜8゜磁性記録膜9.保護膜lOが
構成される。このとき基板のピット11には第9図に示
したような鋭角部分18がないため、記録膜や保護膜の
剥離や腐食は起こらなくなる。The optical TiSF substrate 7 according to the present invention shown in FIG. 5 has a groove 12 for operating a tracking servo. A pit 11 for recording information such as track and sector addresses is formed, and an intermediate film 8° and a magnetic recording film 9 are formed thereon. A protective film IO is formed. At this time, since the pits 11 of the substrate do not have acute angle portions 18 as shown in FIG. 9, peeling and corrosion of the recording film and protective film will not occur.
本発明の光ディスク基板とその製造方法は、ビット底部
の鋭角部のない基板の提供が可能になるため、記録膜や
保護膜の剥離や腐食が起こらなくなり、長期信頼性を向
上できるという効果がある。The optical disc substrate of the present invention and its manufacturing method can provide a substrate without an acute angle at the bottom of the bit, so that peeling and corrosion of the recording film and protective film will not occur, and long-term reliability can be improved. .
第1図は本発明の一実施例を示す製造工程図、第2図は
第1図に示す記録工程におけるガラス原盤およびレーザ
照射状態を示す断面図、第3図は第2図に示す各レジス
ト膜の感度特性図、第4図は第1図に示す現像工程後の
ガラス原盤の断面図、第5図は第1図に示す製造工程を
経て製造された光ティスフ基板を用いて製作された光磁
気ディスクの断面図、第6図は従来の一例を示す製造工
程図、第7図は第6図に示す記録工程におけるガラス原
盤およびレーザ照射状態を示す断面図、第8図は第6図
に示す現像工程後のガラス原盤の断面図、第9図は第6
図に示す製造工程を経て製造された光ティスフ基板を用
いて製作された光磁気ディスクの断面図である。
G、Gl・・・・・ガラス原盤、1・・・・ガラス円盤
、2・・・・・・第1ホトレジスト層、3・・・・・・
第2ホトレジスト層、4・・・・・・レーザ光、5,1
1,14.17・・・・・ピット、6.15・・・・・
・スタンバ、7.16・・・・・・光ディスク基板、8
・・・・・・中間膜、9・・・・・・磁性記録膜、lO
・・・・・・保護膜、12.19・・・・・・溝、13
・・・・・ホトレジスト、18・・・・・・鋭角部分、
A・・・・カラス円盤製造工程、B1・・・・・第1ホ
トレジスト塗布工程、B2・・・・・・第2ホトレジス
ト塗布工程、B・・・・・ホトレジスト塗布工程、C・
・・・−記録工程、D・・・・・現像工程、E・・・・
・・メッキ工程、F・・・・・・成形工程、
1・・・・・・残膜厚、■・・・・・・露光量。FIG. 1 is a manufacturing process diagram showing an embodiment of the present invention, FIG. 2 is a sectional view showing the glass master disk and laser irradiation state in the recording process shown in FIG. 1, and FIG. 3 is a diagram showing each resist shown in FIG. 2. Figure 4 is a cross-sectional view of the glass master disk after the development process shown in Figure 1. Figure 5 is a sensitivity characteristic diagram of the film. Figure 5 is a diagram showing the sensitivity characteristics of the film. Figure 5 is a cross-sectional view of the glass master disk after the development process shown in Figure 1. A cross-sectional view of a magneto-optical disk, FIG. 6 is a manufacturing process diagram showing an example of the conventional method, FIG. 7 is a cross-sectional view showing a glass master disk and laser irradiation state in the recording process shown in FIG. 6, and FIG. 8 is a diagram showing a state of laser irradiation. A cross-sectional view of the glass master disk after the development process shown in FIG.
FIG. 2 is a cross-sectional view of a magneto-optical disk manufactured using an optical TiSF substrate manufactured through the manufacturing process shown in the figure. G, Gl...Glass master disc, 1...Glass disk, 2...First photoresist layer, 3...
Second photoresist layer, 4... Laser light, 5, 1
1, 14.17...Pit, 6.15...
・Standber, 7.16... Optical disk board, 8
...Intermediate film, 9...Magnetic recording film, lO
...Protective film, 12.19 ...Groove, 13
...Photoresist, 18...Acute angle part,
A... Crow disk manufacturing process, B1... First photoresist coating process, B2... Second photoresist coating process, B... Photoresist coating process, C...
...-Recording process, D...Development process, E...
...Plating process, F...Molding process, 1...Remaining film thickness, ■...Exposure amount.
Claims (2)
板において、ピットの底部が鋭角を有せずに曲面で形成
されていることを特徴とする光ディスク基板。(1) An optical disc substrate on which information is recorded with or without pits, characterized in that the bottoms of the pits are formed as curved surfaces without having acute angles.
度特性の異なる2種類以上のホトレジストを使用するホ
トレジスト塗布工程と、レーザ光による記憶を行なう記
録工程と、前記記録の現像を行なう現像工程と、前記ガ
ラス円盤上に現像により現われた記録にメッキを施すメ
ッキ工程と、前記メッキにより形成されたスタンパによ
り光ディスクを成形する成形工程とを含むことを特徴と
する光ディスク基板の製造方法。(2) A glass disk manufacturing process for manufacturing a glass disk, a photoresist coating process using two or more types of photoresists with different sensitivity characteristics, a recording process for memorizing with laser light, and a developing process for developing the recording. A method for manufacturing an optical disc substrate, comprising: a plating step of plating the recording that appears on the glass disk by development; and a molding step of molding an optical disc using a stamper formed by the plating.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2046121A JP2689672B2 (en) | 1990-02-26 | 1990-02-26 | Manufacturing method of optical disk substrate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2046121A JP2689672B2 (en) | 1990-02-26 | 1990-02-26 | Manufacturing method of optical disk substrate |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH03248342A true JPH03248342A (en) | 1991-11-06 |
JP2689672B2 JP2689672B2 (en) | 1997-12-10 |
Family
ID=12738161
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2046121A Expired - Fee Related JP2689672B2 (en) | 1990-02-26 | 1990-02-26 | Manufacturing method of optical disk substrate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2689672B2 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL1021760C2 (en) * | 2002-10-28 | 2004-05-03 | Otb Groep B V | Main plate for manufacturing a stamp plate as well as a stamp plate and storage medium and a method for manufacturing the master plate, stamp plate and storage medium. |
US8040764B2 (en) * | 2008-05-30 | 2011-10-18 | Sony Corporation | Optical disc apparatus and correction servo control signal generation method |
US8274875B2 (en) | 2008-05-26 | 2012-09-25 | Sony Corporation | Optical disc device and focus control method |
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---|---|---|---|---|
JPS5266407A (en) * | 1975-11-29 | 1977-06-01 | Victor Co Of Japan Ltd | Disc form information signal recording medium |
JPS5495391A (en) * | 1978-01-13 | 1979-07-27 | Fujikura Ltd | Method of manufacturing overhead cable clad with pipe |
JPS5862451U (en) * | 1981-10-20 | 1983-04-27 | ティーディーケイ株式会社 | optical recording medium |
JPS61153850A (en) * | 1984-12-26 | 1986-07-12 | Matsushita Electric Ind Co Ltd | Original disk for optical disk and its manufacture |
JPH0229955A (en) * | 1988-07-18 | 1990-01-31 | Nec Corp | Production of optical disk |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL1021760C2 (en) * | 2002-10-28 | 2004-05-03 | Otb Groep B V | Main plate for manufacturing a stamp plate as well as a stamp plate and storage medium and a method for manufacturing the master plate, stamp plate and storage medium. |
WO2004038714A1 (en) * | 2002-10-28 | 2004-05-06 | Singulus Mastering B.V. | Master plate for fabricating a stamper plate, stamper plate, storage medium, and method for fabricating the master plate, stamper plate and storage medium |
US8274875B2 (en) | 2008-05-26 | 2012-09-25 | Sony Corporation | Optical disc device and focus control method |
US8040764B2 (en) * | 2008-05-30 | 2011-10-18 | Sony Corporation | Optical disc apparatus and correction servo control signal generation method |
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JP2689672B2 (en) | 1997-12-10 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |