JPH03241509A - Thin-film magnetic head and production thereof - Google Patents

Thin-film magnetic head and production thereof

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Publication number
JPH03241509A
JPH03241509A JP3603290A JP3603290A JPH03241509A JP H03241509 A JPH03241509 A JP H03241509A JP 3603290 A JP3603290 A JP 3603290A JP 3603290 A JP3603290 A JP 3603290A JP H03241509 A JPH03241509 A JP H03241509A
Authority
JP
Japan
Prior art keywords
magnetic
thin film
core
magnetic head
thin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3603290A
Other languages
Japanese (ja)
Inventor
Yuiko Matsubara
松原 結子
Nobuo Arai
信夫 新井
Yoshitsugu Miura
義從 三浦
Takeshi Miura
三浦 岳史
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP3603290A priority Critical patent/JPH03241509A/en
Publication of JPH03241509A publication Critical patent/JPH03241509A/en
Pending legal-status Critical Current

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  • Magnetic Heads (AREA)

Abstract

PURPOSE:To provide the thin-film magnetic head which has high heat resistance and good soft magnetic characteristics as well as improved recording and reproducing characteristics and the production thereof by constituting cores of materials consisting of different compsns. using a high saturation magnetic flux density material for either of the upper and lower magnetic cores forming a gap. CONSTITUTION:The leakage of a magnetic flux is liable to arise in the thin-film magnetic head as the sectional area decreases near the magnetic gap. The improvement in recording and reproducing efficiency is, therefore, resulted by the improved saturation magnetic flux density of the magnetic core. The material (1.2 to 1.4T saturation magnetic flux density), such as Co, Ta or Zr, having the relatively high heat resistance is adopted only for the upper magnetic core 2 of the thin-film magnetic head forming the gap 6 by the two upper and lower magnetic cores 2, 1 consisting of the metallic thin films formed on a nonmagnetic substrate 4. The material which has the saturation magnetic flux density lower than the saturation magnetic flux density of the material used for the upper magnetic core 2 but has the good heat resistance and sufficiently withstands the heat history during the process is used for the lower magnetic core 1. The recording and reproducing efficiency is thereby improved over the entire part of the head.

Description

【発明の詳細な説明】 〔薦栗上の利用分野〕 本発明は、ビデオテープV、−ダ(以下、77″″t4
族磁気ヘツドに関わり、臀に、配鰍再生脣性の同上に好
適な薄膜m気ヘッド及びそのH4造方法に圓する。
[Detailed Description of the Invention] [Recommended Field of Use] The present invention provides video tape V, -da (hereinafter referred to as 77''t4
The present invention is concerned with the family of magnetic heads, and is concerned with a thin film magnetic head and its H4 manufacturing method, which is also suitable for magnetic head reproduction.

〔従来の技傭〕[Traditional skill hire]

従来04nttb磁気ヘッドの製造方法として1例え(
昭和60年5月11日)P41〜p49の凧ム氏らによ
る「ハードディスクjjtifUll膜−気へ1ド」と
1聰する編又で報告されているものかある。これら従来
の薄績−気へ1ドにおいては、上下の磁気コア&C同じ
―性有料パーマaイを用いていた。
An example of a manufacturing method for a conventional 04nttb magnetic head (
May 11, 1985) P41-P49, published by Mr. Kitemu et al., in an edition titled ``Hard disk jjtifUll film - Qihe 1 de''. In these conventional low-quality perm-dos, upper and lower magnetic cores & C same-sex paid perm a were used.

このような−気ヘッドにおいては、磁気コアの特注を出
すために、クエ/′−−工楊の′R軒段で所望の一気異
万性を付与するため、出来伝播方向に対し血円審直方向
に一出界を印加し、出湯中島処塩を胤していた。
In such a magnetic head, in order to make a custom magnetic core, in order to give the desired instantaneous versatility at the Kue/'--Ko-Yang'R eave step, the blood circle judgment is made in the direction of propagation. A field was applied in the direct direction, and the salt of Nakajima was generated.

〔発明がM1決しようとする#&龜〕 VTRの−m負化のため、一般に配転媒体の保磁力を増
大させる精同にある。これに対応し磁気ヘッドも磁気コ
アの*、tgmlLM良を向上する必豐ができている。
[The invention attempts to determine M1] In order to make the -m negative of a VTR, the coercive force of the rotating medium is generally increased. In response to this, it has become necessary for magnetic heads to improve the *, tgmllm quality of the magnetic core.

前記従来例では磁性材料としてパーマロイ(飽和磁束密
度1.2 T )を用いているが、VTRのように飯触
債勧タイプの磁気ヘッドにおいては、パーマロイは耐J
#耗性が他の材料に比べ劣るため通量な有料とはいえな
い。
In the conventional example described above, permalloy (saturation magnetic flux density 1.2 T) is used as the magnetic material, but permalloy has a high resistance to J.
#It cannot be said to be a regular charge because its wear resistance is inferior to other materials.

このため、VTR用薄展磁気ヘッドとしては、一般KC
6Aアモルファス有料か使用されている。
For this reason, general KC
6A amorphous is used for a fee.

しかしはからs ”0  禾アモルファス材料は耐熱性
においてはパーマロイに劣り、かつ飽和磁束密度の同上
とともに耐熱性か低下するという問題点がある。従って
s CO糸アモルファス材料を用いた博l1k−気ヘッ
ドでは、飽和磁束@友1.OT以上で耐#&温腋が48
Ω℃以下の有料については、プaセス中熱履歴に耐えら
れず結晶化するものかあり、。
However, the heat resistance of amorphous materials is inferior to that of permalloy, and the heat resistance decreases as the saturation magnetic flux density increases. Then, the saturation magnetic flux @tomo 1.At over OT, the resistance # & warm armpit is 48
For charges below Ω℃, some may not be able to withstand the heat history during the process and may crystallize.

使用されていなかった。It had not been used.

一方、上紀従来孜侑によると、ウェハー1Qセスの歳終
嵐で熱処理を鵬して磁気コアの特性な艮好にするため、
熱逃埋条件を遇ぶ必要がある。
On the other hand, according to Keisuke Joki, in order to perform heat treatment during the wafer 1Q process to give the magnetic core a unique appearance,
It is necessary to meet heat escape conditions.

制約となる条件として。as a constraining condition.

41)  11i1i気コアの特性を良好にする温度を
遇ぶこと。
41) To provide a temperature that improves the properties of the 11i1i core.

t2)非a性展と磁気コア、コイルの相互拡i&を最少
瓢してヘッド特性を劣化させないこと。または1層1i
la@離や各層の割れ等変形かおこらないこと。
t2) Minimize the non-aqueous expansion and mutual expansion of the magnetic core and coil so as not to deteriorate the head characteristics. or 1 layer 1i
No deformation such as separation or cracking of each layer occurs.

02つかある。(1Jの条件では一般に熱感@温度を高
温にした方が良好であり、釦では低温にした万が良好で
あるという傾向がある。このため、熱逃堀温友はJIE
馬5ΩΩ℃もしくはそれ以下に選ぶのが一般的である。
There are 02. (Under the conditions of 1J, it is generally better to set the heat sensation@temperature to a high temperature, and for buttons, there is a tendency that a lower temperature is better.
It is common to choose a temperature of 5ΩΩ℃ or lower.

従ってコア磁性材料としては、熱逃@温度に500℃よ
り高いT!度がtL累される材料は不過当であった。
Therefore, as a core magnetic material, the heat release @T is higher than 500℃! The material in which the degree of tL was accumulated was unreasonable.

本発明の9的は、耐熱性が高く艮好な軟磁気特性な有し
、飽和磁束密度の高い薄JRをコア材料にfj&用する
ため、広く材料を選びコア砿気脣性を良好にし、記録再
生骨性を良好にした薄膜磁気ヘッド及びその秦遺方法な
提供することにある。
The ninth aspect of the present invention is to use thin JR as the core material, which has high heat resistance, good soft magnetic properties, and high saturation magnetic flux density. An object of the present invention is to provide a thin film magnetic head with good recording and reproducing properties and a method thereof.

〔a題を解決するための手段〕[Means for solving problem a]

上記呂的を:A成するために本発明では、以下の基準に
基づいて上部もしくは下部コアのいずれかに高飽和6束
密度材料を選定した。さらに、高飽和磁束@皮材群な配
したコアを出肯にして走行方行を固定とすることにより
、記録再生効率を向上させることができる。
In order to achieve the above objective, in the present invention, a highly saturated 6-bundle density material was selected for either the upper or lower core based on the following criteria. Furthermore, recording and reproducing efficiency can be improved by fixing the traveling direction by using a core arranged with a high saturation magnetic flux @ skin material group.

(1)  下部コアIHc、高温度で熱感@を循丁こと
で良好なIIkm fie性が得られ、その恢の熱a歴
によってもその軟硫気臀性が損なわれない材料として、
窒化CaNbZr他のCo系アモルファスの麓化物また
はセンダス) 、 Fg−5i系の藩Mを選択する。
(1) Lower core IHc, as a material that can obtain good II km fie properties by circulating thermal sensation @ at high temperatures, and its soft sulfur properties are not impaired even by the heat a history of the same.
Select nitrided CaNbZr and other Co-based amorphous oxides (or Sendus), Fg-5i-based iron M.

は) 上部コア備に、プaセス中熱履歴を受けて長時間
になると結晶化による特性劣化かおこるが低温でもしく
はm時閏受ばても劣化かおこさない材料として、 Ca
Zr (Mu 、 Nb 、 Ta 、 iij’、Y
)。
) In the upper core, Ca is used as a material that deteriorates in properties due to crystallization when subjected to thermal history during the process for a long time, but does not deteriorate even if subjected to low temperature or time.
Zr (Mu, Nb, Ta, iij', Y
).

等のCo  系非晶質合金な選択する。Select a Co-based amorphous alloy such as

また、製造方法として、上sm’:a、コア形成中に下
部磁気コアの特性が劣化しないよう、上、下コアの材料
を遇ぶと共に、その熱逃埋温度についても上部磁気コア
の熱処理温度が下部―気コアの熱処理はF!Lを超えた
いように設定する@〔作用〕 磁気コアの#面積S#コイルターンtXN 、 :y 
イル’il&&、コア透1iB″4μ、ギャップ断面積
Sl。
In addition, as a manufacturing method, we selected the materials for the upper and lower cores so that the characteristics of the lower magnetic core would not deteriorate during core formation, and also set the heat treatment temperature of the upper magnetic core to the heat escape temperature. But the heat treatment of the lower part - Qi core is F! Set so that it exceeds L @ [Action] # Area of magnetic core S # Coil turn tXN , :y
Il'il&&, core throughput 1iB''4μ, gap cross-sectional area Sl.

―略i9.j、ギャフプ閣隔5j  とすると、ギャッ
プiilに発生する、記録磁界Hp  は、下記の式で
表わされる。
- Abbreviation i9. j and the gap 5j, the recording magnetic field Hp generated in the gap iil is expressed by the following equation.

磁気コアにおいてはμすなわち22!−率が大であれば
よい。μは ただし、−気コアの飽和磁化M。
In the magnetic core, μ or 22! - It is sufficient if the ratio is large. μ is the saturation magnetization M of the − air core.

コイルが発生する磁界H。Magnetic field H generated by the coil.

コアが飽和する磁界H0 であられされるから、Ms  t’大きくすると、記録
−界B、が大きくなり記録効率が向上する。
Since the core is exposed to a saturated magnetic field H0, increasing Ms t' increases the recording field B and improves the recording efficiency.

ところが磁気コア中で断面積が小さく一束が飽和すると
、磁束はギャップ先端まで到達せず%磁気コア間で磁束
漏えいが起る。
However, when the cross-sectional area in the magnetic core is small and one flux is saturated, the magnetic flux does not reach the tip of the gap and magnetic flux leakage occurs between the magnetic cores.

特に磁気iB気ヘッドでは、磁気ギャップ付近で断面積
が小さくなることで、磁束の漏えいが起り員い。
In particular, in the magnetic iB magnetic head, the cross-sectional area becomes small near the magnetic gap, which causes leakage of magnetic flux.

従って%磁気コアの一部もしくは全部で飽和磁束密度を
同上させることにより、自己録再における記録再生効率
が向上する。
Therefore, by increasing the saturation magnetic flux density in some or all of the magnetic cores, the recording and reproducing efficiency in self-recording and reproducing is improved.

薄膜磁気ヘッドでは、前述したようにヘッド全体として
の耐熱温度が低いため、艮好な軟tia気特性を得るた
めの熱処理温度が500℃以上となる材料(例えばセン
ダスト等)では、他の材料と見直しを行なう必要が生じ
る。
In thin-film magnetic heads, the heat resistance temperature of the head as a whole is low as mentioned above, so materials that require heat treatment temperatures of 500°C or higher to obtain good soft tear characteristics (such as sendust) cannot be used with other materials. A review will be necessary.

しかし、下部磁気コアのみに、該磁性材料を採用するこ
とで%磁束の禰洩童も減少し、他の構成材料の制約を受
けることなく熱処理を施すことかできる艮好な軟磁気特
性を優ることができる。
However, by using this magnetic material only for the lower magnetic core, the leakage of % magnetic flux is reduced, and it has superior soft magnetic properties that allow heat treatment to be performed without being constrained by other constituent materials. be able to.

一方でS CO系非晶貿合金で飽和磁束密度1.0T”
以上のものがある。しかし、耐熱性が低いため。
On the other hand, the saturation magnetic flux density is 1.0T in the SCO-based amorphous alloy.
There is more than that. However, it has low heat resistance.

高温良の薄膜側ニブaセスを長時間にわたり経ることに
より結晶化をおこしたり軟磁気特性が劣化することがあ
る。
Experiencing high-temperature, thin-film side nib a for a long time may cause crystallization or deterioration of soft magnetic properties.

このため、良形成後のプaセス時間を諷少させるため、
上記磁気コアにのみ、耐熱性が比較的高いCO# Tc
L# z、等の材料(飽和磁束密度1.2T〜1.aT
)t−採用し、下部磁気コアには上s磁気コアに用いた
材料より飽和磁束密度が低くとも耐熱性が良好でプロセ
ス中熱履歴に元弁耐える材料を用いることにより、ヘッ
ド全体として記録再生効率を同上させることができる。
Therefore, in order to reduce the process time after good formation,
CO# Tc, which has relatively high heat resistance, is used only in the above magnetic core.
L#z, etc. materials (saturation magnetic flux density 1.2T~1.aT
) The lower magnetic core is made of a material that has a lower saturation magnetic flux density than the material used for the upper magnetic core, but has good heat resistance and can withstand the heat history during the process, making it possible to record and play as a whole head. Efficiency can be increased as above.

〔笑厖例〕[Laughter example]

以下、不発明の一笑施filを図面によって続開する。 Below, the uninvented joke will be continued with drawings.

く実Mf!i1> 第1図は、不発F!Aによる薄膜磁気へクドの一実施例
を示す斜視図である。鳳2図及び纂5図は本発明の一実
厖例による薄膜磁気へフドのafL万砥を続開する図で
ある。
Kumi Mf! i1> Figure 1 shows unexploded F! FIG. 3 is a perspective view showing an example of a thin film magnetic hecdometry according to A. Figures 2 and 5 are diagrams showing the subsequent development of an afL mill of a thin film magnetic head according to an embodiment of the present invention.

第1幽中、1は下部磁気コア、2は上部磁気コア、4は
非磁性基板、5は薄膜コイル、6は磁気ギヤ1プであっ
て、磁気コア中の磁束伝帰万同はSの矢印に一式する。
In the first core, 1 is a lower magnetic core, 2 is an upper magnetic core, 4 is a non-magnetic substrate, 5 is a thin film coil, 6 is a magnetic gear 1, and the magnetic flux transmission in the magnetic core is S. Set it on the arrow.

下siB気コア1及び上部&i磁気コアはCO系非晶質
合金の1つであるCo  Nb  Zr 8にで、DC
対同マグネトーンスパッタリング法により%Co。
The lower SiB magnetic core 1 and the upper &i magnetic core are made of CoNb Zr 8, which is one of the CO-based amorphous alloys, and are made of DC
%Co by the same magnetone sputtering method.

#b15 Zrsの合金ターゲットを用いて形成したも
のである。臀に下部磁気コア1は通常のスパッタリング
ガスであるアルゴンガス中に、10〜100%の割合で
童素ガス奮混入して形成した窒化層で形成する。この時
、形成した2徳の磁性膜の特性な表1に示す。窒化+!
1l171Iii+性は、層形成rIL盪テは、保磁力
大で磁気コア材として不適当である。
It was formed using a #b15 Zrs alloy target. The lower magnetic core 1 on the buttock is formed of a nitride layer formed by mixing 10 to 100% hydrogen gas into argon gas, which is a normal sputtering gas. Table 1 shows the characteristics of the two-dimensional magnetic film formed at this time. Nitriding +!
The 1l171Iii+ property has a large coercive force and is unsuitable as a magnetic core material.

以下本実M例における下部−気コア1の形成方法を第2
図を用いて胱男する。纂2蝕において■は展形成波@場
中熱処理途中の形状、■は加工により余分な磁性塵を除
去し基IF5中に埋設した下部気コア部分12を示す。
Below, the method for forming the lower core 1 in this practical example will be explained in the second example.
Bladder man with diagram. In the 2nd coring, ■ indicates the shape of an expanded wave during in-situ heat treatment, and ■ indicates the lower air core portion 12 embedded in the base IF5 after removing excess magnetic dust by processing.

まず溝加工を厖した非磁性基板4上に、付漕力を同上さ
せるための下地編(−示せず)を形成したのち、磁性膜
11を50P成膜する。m気骨性向上のために、以下の
熱処理を厖す。すなわち、第1段として孫体摺動面に法
線方向に平行な#J’FH1■を印加し600℃で60
分間熱熱処理kM丁。第2段として、6束伝戴方向に曲
内垂直方向の磁界口■奮印加し、550℃で50分〜l
FE&閾熱処理な厖丁。以上の熱処理を以下2このよう
にして帰られた濃は、初透感’4KしてI MHzで2
000  程度の%性が得られる。また味磁力も0.4
01以下の艮好な時性が得られた。
First, a base film (-not shown) for increasing the applied force is formed on the non-magnetic substrate 4 which has been grooved, and then a 50P magnetic film 11 is formed. In order to improve the toughness, the following heat treatment is performed. That is, as a first step, #J'FH1■ parallel to the normal direction is applied to the sliding surface of the grand body, and the temperature is increased at 600°C.
Heat treatment for minutes. As the second stage, a magnetic field in the direction perpendicular to the track was applied in the direction of the 6-bundle transmission, and the temperature was kept at 550°C for 50 minutes to l.
FE & threshold heat treated knife. The heat treatment described above was performed as follows.
A percentage of about 000 is obtained. Also, the taste magnetism is 0.4
A good timing of 01 or less was obtained.

&1  、a気コア材の磁気骨性 もちろん、膜形成方法はRFスパッタリング法DC(t
たはRF)マグネトaンスバブタリング汰の他、電子ビ
ーム蒸ytt時に2索ガスtt導入するイオンビームス
バグタ法で窒素ガスを混合する等。
&1, magnetic bone properties of the a-core material, and of course, the film formation method is the RF sputtering method DC (t
(or RF) In addition to magneto vaporization, nitrogen gas is mixed using the ion beam vaporization method in which two gases are introduced during electron beam vaporization.

他のスパッタリング方式でも同様の結果か穫られる。Similar results can be obtained with other sputtering methods.

fた、熱処理により憬磁力か小さくならない虐曾は、 
Co  系非、alfX合金を2化した場合に生じる柱
状構造を分断するように、層間材を入れ多層構造にする
ことも必璧となる。層間材としては、前記弁室化膜の他
、パーマロイ薄g Co 、 Ih等の磁性材料、 A
d # No 、 Sin、の非磁性材料のうちから壜
当に適訳することで、軟磁気時性を向上させることがで
きる。
Furthermore, if the magnetic force is not reduced by heat treatment,
It is also necessary to insert an interlayer material to create a multilayer structure so as to divide the columnar structure that occurs when a Co 2 -based non-alfX alloy is made into two. In addition to the above-mentioned valve chamber membrane, interlayer materials include magnetic materials such as permalloy thin g Co, Ih, etc.
By appropriately translating the non-magnetic materials d # No, Sin, etc., the soft magnetic time characteristics can be improved.

もちろん、創配下部価気コア1に使用する磁性族は、セ
ンダント等のlIi飽和−束着度600℃程度までの耐
熱性を有する軟磁性材料を用いても本実施例と同様の効
果が侮られるのは言うまでもない。
Of course, even if a soft magnetic material such as Sendant, which has heat resistance up to about 600°C in lIi saturation and flux density, is used as the magnetic group for the magnetic core 1, the same effect as in this example will not be obtained. Needless to say, it can be done.

第S図に、本実施例による薄膜磁気ヘッドの表1゜遣方
法を示す。
FIG. S shows how to use the thin film magnetic head according to this embodiment.

前記下v磁気コア1を形成したのち((i))、5LO
1等の非磁性絶縁層61を介して、Cb等の非磁性低抵
抗材料で、薄膜コイル5を蒸庸等により形成しく■)、
さらにMIO、S寡O8系(7オルステ2イト・ステア
タイト)寺の非磁性セラミックスで層間絶縁層62とし
く■)、リア飯統部、15のみ絶縁層61 t−除去し
て、上部磁気コア2な2Ωμ馬厚で形成する(■)。
After forming the lower v magnetic core 1 ((i)), 5LO
A thin film coil 5 is formed by vaporization or the like using a non-magnetic low resistance material such as Cb via a non-magnetic insulating layer 61 such as No. 1).
Furthermore, an interlayer insulating layer 62 is made of MIO, S-poor O8-based (7-orsteite steatite) non-magnetic ceramic. Formed with a thickness of 2Ωμ (■).

前述したように、上部磁気コア2はC’o −Nb −
Zrの非7&貞合貧を用いる。j:都砿気コア2は7オ
トリソグラフイにより、Pj′r望の形状に成形した後
、フォルステライト寺のセラミックス材によりial膜
(図示せず)を形成する。さらに、摺動柱を考慮し、保
護板(図示せず)奮ガラスボンディングにより接層する
。このとき、上部磁気コア2の時性な同上させ安定な%
性が得られる@度として450℃50  分で、かつ、
磁束伝搬方向KrkJ内垂直方向に平行に靜価薯を印加
し、熱処理を行った(■)。
As mentioned above, the upper magnetic core 2 has C'o -Nb -
Use Zr's non-7 & Teigopo. J: The core 2 is formed into the desired shape by 7 otolithography, and then an ial film (not shown) is formed using a forsterite ceramic material. Furthermore, considering the sliding column, a protective plate (not shown) is bonded to the protective plate by glass bonding. At this time, the temporal ditto of the upper magnetic core 2 and the stable %
temperature at 450°C for 50 minutes, and
Heat treatment was performed by applying a heat treatment in parallel to the perpendicular direction within the magnetic flux propagation direction KrkJ (■).

さらに、チップカフ1.組立を行ない、/Illの磁気
ヘッドを優る。
Furthermore, tip cuff 1. Assembles and outperforms the /Ill magnetic head.

累4図に、得られた磁気ヘッドで再生出力な測定した給
米を示す。第48は、[坏珠磁力1500オーイー 0− のテープで、相対速度5 、887 JF g 
Cで自己録再により再生出力を測定した結果である。本
実施例は(す■に示す。従来例(cL)には、今回用い
た上siB気コア材料と同じ材料を下sa気ココア用い
た磁気ヘッドを使用した。
Figure 4 shows the rice feeding measured by the reproduction output of the obtained magnetic head. No. 48 is a tape with magnetic force of 1500 ohy 0-, relative velocity 5, 887 JF g
This is the result of measuring the playback output by self-recording and playback in C. The present example is shown in (3). In the conventional example (cL), a magnetic head was used in which the lower saline cocoa material was made of the same material as the upper SiB core material used this time.

これによると、飽和磁束密度が向上した分低域(I M
Hz )で1.8dB出力が向上した。
According to this, the improved saturation magnetic flux density improves the low frequency range (I M
Hz), the output was improved by 1.8dB.

ただし、記録の際には、下s磁気コア側か出歯となるよ
うに、走行方向を固定した。再生時も同方向で走行させ
た。
However, during recording, the traveling direction was fixed so that the lower magnetic core side was the protruding tooth. The vehicle was run in the same direction during playback.

本実施例によれば、さらに、以下のような効果が優られ
た。丁なわち、向じターゲットを掬いて。
According to this example, the following effects were further improved. In other words, scoop up the target.

鼠素ガス導入重により、地利磁束密度を0.75  か
ら1.0’r@gで向上させられた。さらに、電化する
ことにより仮置が増重ためか、耐摩耗性が同上する。
By introducing methane gas, the magnetic flux density was improved from 0.75 to 1.0'r@g. Furthermore, the abrasion resistance increases due to the increased weight of temporary storage due to electrification.

従って、a45図(α)に示すように、P[化膜αを上
siB気コア2もしくは下部磁気コア1の一部にのみ用
いて(2(! 、 1α)、単位断面横1りの磁束W!
i度を向上させ、かつ、摩耗寿命な改讐することが可能
である。
Therefore, as shown in Figure A45 (α), if the P[oxide film α is used only in a part of the upper SiB magnetic core 2 or the lower magnetic core 1 (2(!, 1α)), the magnetic flux of 1 horizontally per unit cross section is W!
It is possible to improve the degree of wear and improve the wear life.

く実施例2〉 先の実施例同様、下部及び上sMi気コアについてそれ
ぞれ使用する磁性層の特性を表2に示す。
Example 2 As in the previous example, Table 2 shows the characteristics of the magnetic layers used for the lower and upper SMi cores.

表2.m性換%性 下部磁気コアにおいて、熱処理は、450℃で、磁束伝
搬糸路に対し面内mK万同に4IB場を印加し50分間
熱処理を厖丁ことにより容易に比透磁率≧4000 (
I MHz )の艮好な特性が得られる。
Table 2. For the lower magnetic core, heat treatment can be easily carried out at 450°C by applying a 4IB field to the magnetic flux propagation path at all in-plane mK and heat-treating for 50 minutes to obtain a relative permeability ≧4000 (
The excellent characteristics of I MHz) can be obtained.

上部磁気コアについては、 81 htで400℃50
分、第2段で550℃1時間で前記12段階MAJを滝
丁ことにより、良好な特性が得られかつ下部コアの特性
な劣化させない。
For the upper magnetic core, 400℃50 at 81ht
By heating the 12-step MAJ at 550° C. for 1 hour in the second stage, good characteristics were obtained and the characteristics of the lower core were not deteriorated.

磁気ヘッドの構成は、前記実施例と肉等であり製造方法
も前記実施例に準じる〇 以上の方法により得られた薄pij&m気ヘッドで再生
出力の測定を行った石来を第4−に示す。
The configuration of the magnetic head is the same as that of the above embodiment, and the manufacturing method is also similar to that of the above embodiment.The 4th section shows the results of measurement of the reproduction output using the thin pij&m head obtained by the above method. .

第4図のうち、(b)■が本爽励例により得られたヘッ
ドの出力結果である。ヘッド磁気コアの飽和磁束VPj
Hの同上により、低域の出力は従来例に比べ5dB同上
した。
In FIG. 4, (b) (■) shows the output results of the head obtained in this excitation example. Saturation magnetic flux VPj of head magnetic core
Due to the above, the low frequency output was increased by 5 dB compared to the conventional example.

尚測定は、先の実施例と同じ条件で行った。Note that the measurements were performed under the same conditions as in the previous example.

〔発明の効果〕〔Effect of the invention〕

本発明によれば、癖厚耗性の面でパーマロイに比べ慣れ
るCo′ 系非晶實合象t−用い、しρ)も高飽和磁束
@度材料をコア材に2M用できるので、記録再生特性が
大mに同上する。
According to the present invention, since it is possible to use a Co'-based amorphous material (t) which is more familiar than permalloy in terms of wear resistance, a high saturation magnetic flux @ 2M material can be used as the core material, so recording and reproducing are possible. The characteristics are the same as those of large m.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の一実旙例による薄膜磁気ヘッドの糾視
図%w&2図は本発明の一実施例による下部磁気コアの
製造方法1に説明するー、第5図は本発明の一実施例に
よる薄t&磁気へクドの製造方法を説明する図、第4図
は本発明の一実施例による博族−気ヘッドで再生出力を
測定した給米を示す図、第5図は本発明の他の実施例を
示す図である・1・・・下W磁気コア   2−・上s
m磁気コア・−非磁性基板    5・・・薄膜コイル
6−(fi気ギャップ   7・・・媒体摺動面粥1図 1−”?”1戸石そ銭コr Z−J二音戸着右じ汽コT 5−−一石rtJイ天#2方向 4−4#磁a寡級 7−媒体Jn緬 5−一〉唇l更jイノL・ G−−一不ム3℃十+γ)゛
FIG. 1 is a close-up view of a thin film magnetic head according to an embodiment of the present invention. FIG. 4 is a diagram illustrating a method of manufacturing a thin T&magnetic hekkudo according to an embodiment of the present invention, FIG. It is a diagram showing another embodiment of the invention. 1. Lower W magnetic core 2- Upper s.
m Magnetic core - non-magnetic substrate 5... Thin film coil 6 - (fi air gap 7... Medium sliding surface gruel 1 Figure 1 - "?" Train T 5--Ichikoku rtJ Iten #2 direction 4-4 #magnetic a low class 7-medium Jn Burma 5-1〉lip l change l ino L・G--ichifumu 3℃ 10+γ)゛

Claims (1)

【特許請求の範囲】 1、金属薄膜より成る上部、下部2つの磁気コアと、薄
膜コイルとを非磁性基板上に形成し、上部、下部磁気コ
アによってギャップを構成する薄膜磁気ヘッドにおいて
、前記上記磁気コアと下部磁気コアとが組成の具なる材
料、又は構成元素の異なる材料でつくられていることを
特徴とする薄膜磁気ヘッド。 2、請求項1において、前記2つの一気コアのうち少な
くとも一方を、飽和磁束密度1.0T以上の磁性薄膜に
より構成したことを特徴とする薄膜磁気ヘッド。 3、請求項2において、前記磁性薄膜はCo系非晶質合
金の窒化物より成ることを特徴とする薄膜磁気ヘッド。 4、請求項3記載のCo系非晶質合金の窒化物を、スパ
ッタリングガスとして10〜100%の窒素ガスと残り
のアルゴル等の不活性スパッタリングガスとを混合ある
いは同時に導入した空間内でスパッタリングにより形成
した後、450〜650℃の範囲の高温度で熱処理して
作成することを特徴とする薄膜磁気ヘッドの製造方法。 5、請求項1において、前記2つの磁気コアを構成する
材料のうち一方をCo−Ta−Zr、他方をCo−Ta
−Nbとしたことを特徴とする薄膜磁気ヘッド。 6、金属薄膜より成る2つの磁気コアと、薄膜コイルと
、非磁性金属もしくは非磁性絶縁膜より成る磁気ギャッ
プとを備えた薄膜磁気ヘッドにおいて、前記磁気コアの
うち、一方の磁気コアの基板表面付近の一部もしくは全
部と、他方の磁気コアの前記非磁性金属もしくは非磁性
絶縁膜と接触する一部または全部とが、Co系非晶質合
金の窒化物で構成されていることを特徴とする薄膜磁気
ヘッド。
[Claims] 1. A thin film magnetic head in which two upper and lower magnetic cores made of metal thin films and a thin film coil are formed on a non-magnetic substrate, and a gap is formed by the upper and lower magnetic cores. A thin film magnetic head characterized in that a magnetic core and a lower magnetic core are made of materials having a certain composition or materials having different constituent elements. 2. A thin film magnetic head according to claim 1, wherein at least one of the two cores is made of a magnetic thin film having a saturation magnetic flux density of 1.0 T or more. 3. A thin film magnetic head according to claim 2, wherein the magnetic thin film is made of a nitride of a Co-based amorphous alloy. 4. The Co-based amorphous alloy nitride according to claim 3 is sputtered in a space in which 10 to 100% nitrogen gas and the remaining inert sputtering gas such as Algol are mixed or simultaneously introduced as a sputtering gas. A method of manufacturing a thin film magnetic head, which comprises forming a thin film magnetic head and then performing heat treatment at a high temperature in the range of 450 to 650°C. 5. In claim 1, one of the materials constituting the two magnetic cores is Co-Ta-Zr and the other is Co-Ta.
A thin film magnetic head characterized in that -Nb is used. 6. In a thin film magnetic head comprising two magnetic cores made of thin metal films, a thin film coil, and a magnetic gap made of a nonmagnetic metal or a nonmagnetic insulating film, the substrate surface of one of the magnetic cores. A part or all of the vicinity and a part or all of the other magnetic core in contact with the non-magnetic metal or the non-magnetic insulating film are composed of a nitride of a Co-based amorphous alloy. Thin film magnetic head.
JP3603290A 1990-02-19 1990-02-19 Thin-film magnetic head and production thereof Pending JPH03241509A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3603290A JPH03241509A (en) 1990-02-19 1990-02-19 Thin-film magnetic head and production thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3603290A JPH03241509A (en) 1990-02-19 1990-02-19 Thin-film magnetic head and production thereof

Publications (1)

Publication Number Publication Date
JPH03241509A true JPH03241509A (en) 1991-10-28

Family

ID=12458376

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3603290A Pending JPH03241509A (en) 1990-02-19 1990-02-19 Thin-film magnetic head and production thereof

Country Status (1)

Country Link
JP (1) JPH03241509A (en)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6035316A (en) * 1983-08-04 1985-02-23 Nec Corp Thin film magnetic head
JPS60151814A (en) * 1984-01-20 1985-08-09 Hitachi Ltd Thin film magnetic head
JPS6180612A (en) * 1984-09-28 1986-04-24 Hitachi Ltd Thin film magnetic head
JPS62107416A (en) * 1985-11-05 1987-05-18 Hitachi Ltd Thin film magnetic head
JPS6414708A (en) * 1987-07-08 1989-01-18 Matsushita Electric Ind Co Ltd Thin film magnetic head

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6035316A (en) * 1983-08-04 1985-02-23 Nec Corp Thin film magnetic head
JPS60151814A (en) * 1984-01-20 1985-08-09 Hitachi Ltd Thin film magnetic head
JPS6180612A (en) * 1984-09-28 1986-04-24 Hitachi Ltd Thin film magnetic head
JPS62107416A (en) * 1985-11-05 1987-05-18 Hitachi Ltd Thin film magnetic head
JPS6414708A (en) * 1987-07-08 1989-01-18 Matsushita Electric Ind Co Ltd Thin film magnetic head

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