JP3296829B2 - Soft magnetic multilayer film and magnetic head - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a soft magnetic multilayer film and a magnetic head, in particular, a metal-in-gap (MIG) type magnetic head, an enhanced dual-gap-length (EDG) type magnetic head, and a thin-film magnetic head. About the head.

[0002]

2. Description of the Related Art A MIG type magnetic head having a soft magnetic thin film such as Sendust having a higher saturation magnetic flux density Bs than a core on at least one of opposing surfaces of a gap portion of a first core and a second core made of ferrite is known. Have been. In this magnetic head, since a strong magnetic flux can be applied to the magnetic recording medium from the soft magnetic thin film, effective recording can be performed on a medium having a high coercive force.

Further, a flying type thin film magnetic head having excellent characteristics such as high density recording and high speed data transfer has been put to practical use. In order to generate a high-density magnetic flux even in a thin-film magnetic head, a soft magnetic thin film such as Permalloy or Sendust having a high saturation magnetic flux density Bs is used for the upper and lower magnetic pole layers.

It is known that laminating a soft magnetic thin film via a non-magnetic thin film improves the magnetic permeability μ and the frequency characteristics of μ as compared with a single layer. For this reason, attempts have been made to use a soft magnetic multilayer film in which soft magnetic thin films are laminated via a non-magnetic thin film, instead of a single-layer soft magnetic thin film.

The saturation magnetic flux density Bs of such a soft magnetic thin film used for a magnetic head is at most 12,000.
It is about G. For this reason, conventional magnetic heads have insufficient electromagnetic conversion characteristics such as overwrite characteristics. In particular, in the case of a magnetic recording medium having a high coercive force, a higher saturation magnetic flux density Bs is required.

[0006] Further, it is known that an Fe-based soft magnetic thin film having a strong (100) orientation has excellent soft magnetic properties due to small crystal magnetic anisotropy. However, even when a Fe-based soft magnetic thin film is formed by a general vapor phase method such as sputtering, the (100) orientation cannot be strengthened, and mainly (11)
0) A plane oriented or non-oriented thin film is formed. Therefore, (10
0) In order to form a film having a strong orientation, a substrate of a specific material, for example, ZnSe or a single crystal substrate such as GaAs having a strong (100) orientation or a strong (100) orientation must be used. No.

As described above, a film having a strong (100) orientation is as follows.
Since it is realized only under limited conditions, it is very difficult to increase the (100) orientation or the (100) orientation of the soft magnetic thin film of the magnetic head.

By the way, when Fe is targeted, Ar and N
_By sputtering in the mixed gas of No. _2, an Fe--N soft magnetic thin film having a higher saturation magnetic flux density Bs than Sendust can be obtained. This is achieved by mixing N
This is because Fe crystal grains are refined and magnetic anisotropy dispersion is reduced.

For example, Japanese Patent Application Laid-Open No. 64-15907 discloses that Fe is mainly used, and Fe ₄ N and / or Fe ₃ N
A soft magnetic thin film containing iron nitride comprising: The soft magnetic thin film has a saturation magnetic flux density of 150.
00G or more, the coercive force Hc is low, and it has magnetic properties suitable for the magnetic head.

However, the Fe—N soft magnetic thin film has low heat resistance, and the crystal grain size increases at a temperature of about 350 ° C., and the coercive force Hc sharply increases.

[0011] Therefore, by heat treatment such as glass welding, 4
It is used as a multilayer film in a MIG type magnetic head or an EDG type magnetic head which is kept at a temperature of about 50 to 700 ° C., or a thin film magnetic head which is kept at a temperature of about 350 ° C. or more in a film forming process by sputtering or the like. It is difficult. In addition, if this soft magnetic thin film is formed on a normal substrate only by a vapor phase method such as sputtering, it is difficult to form (10)
0) The orientation cannot be strengthened.

[0012]

SUMMARY OF THE INVENTION It is an object of the present invention to provide a soft magnetic multilayer film having high heat resistance and corrosion resistance, high saturation magnetic flux density Bs, excellent soft magnetic characteristics, and excellent frequency characteristics. It is an object of the present invention to provide a magnetic head having such a soft magnetic multilayer film, particularly a MIG type magnetic head, an EDG type magnetic head, and a thin film magnetic head.

[0013]

This and other objects are achieved by the present invention which is defined below as (1) to (9). (1) After laminating a soft magnetic thin film having an atomic ratio composition represented by the following formula via a non-magnetic thin film,
It has an atomic ratio composition represented by the following formula, obtained by performing a heat treatment at a temperature of 100 ° C., and has a Fe (110)
The relative intensity ratio of the Fe (200) peak to the peak is 1
A soft magnetic multi-layered film characterized by laminating soft magnetic thin films of at least / 3 via a non-magnetic thin film. Formula Fe _100-xyz M _x Ni _y N _z (where M is Mg, Ca, Ti, Zr, Hf,
At least one selected from V, Nb, Ta, Cr, Mo, W, Mn and B, 0.1 ≦ x ≦ 15, 0 ≦ y ≦ 1
0, 0.1 ≦ z ≦ 15. (2) After laminating a soft magnetic thin film having an atomic ratio composition represented by the following formula via a nonmagnetic thin film,
It has an atomic ratio composition represented by the following formula, obtained by performing a heat treatment at a temperature of 100 ° C., and is obtained by electron diffraction.
A soft magnetic multilayer film comprising a soft magnetic thin film having a plane orientation laminated via a non-magnetic thin film. Formula Fe _100-xyz M _x Ni _y N _z (where M is Mg, Ca, Ti, Zr, Hf,
At least one selected from V, Nb, Ta, Cr, Mo, W, Mn and B, 0.1 ≦ x ≦ 15, 0 ≦ y ≦ 1
0, 0.1 ≦ z ≦ 15. (3) The soft magnetic multilayer film according to the above (1) or (2), wherein a soft magnetic thin film having an atomic ratio composition represented by the following formula is laminated via a nonmagnetic thin film. Formula Fe _100-xyz M _x Ni _y N _z (where M is Mg, Ca, Ti, Zr, Hf,
One or more selected from V, Nb, Ta, Cr, Mo, W, Mn, and B, and 8 ≦ x ≦ 14, 0 ≦ y ≦ 10,
2 ≦ z ≦ 4. (4) The soft magnetic multilayer film according to any one of the above (1) to (3), wherein the nonmagnetic thin film is a thin film containing at least one selected from C, N and 0. (5) The saturation magnetic flux density Bs is 14000G or more,
(1) to (4), wherein the coercive force Hc is 2 Oe or less.
A soft magnetic multilayer film according to any one of the above. (6) A magnetic head comprising the soft magnetic multilayer film according to any one of (1) to (5) between a pair of cores. (7) The working temperature Tw is 450 to 70 for the pair of cores.
(6) The magnetic head according to the above (6), wherein the magnetic head is welded and integrated with a 0 ° C welding glass. (8) A thin-film magnetic head having an upper magnetic pole layer, a lower magnetic pole layer, and a protective layer, wherein the upper magnetic pole layer and the lower magnetic pole layer are the soft magnetic recording medium according to any one of (1) to (5). A magnetic head comprising a magnetic multilayer film. (9) A magnetic head, wherein a magnetic circuit is formed of the soft magnetic multilayer film according to any one of (1) to (5) formed on a substrate.

[0014]

[0015]

[0016]

[0017]

[0018]

[0019]

[0020]

[0021]

[0022]

[0023]

[0024]

The soft magnetic multilayer film of the present invention is formed by laminating a predetermined soft magnetic thin film via a non-magnetic thin film, and has a higher permeability μ and a higher coercive force Hc than a single-layer soft magnetic thin film. Low and good μ frequency characteristics.

In this case, since the soft magnetic thin film used in the present invention is of the Fe-N type, the saturation magnetic flux density Bs is very high and the coercive force Hc is low.

By adding an appropriate amount of a predetermined element to Fe and N, a soft magnetic thin film having a strong (100) orientation or a high degree of orientation can be formed on any substrate. For this reason, the soft magnetic characteristics are significantly improved.

In addition, since this additive element forms a nitride more stable than Fe, the saturation magnetic flux density Bs is about 1400.
Heat resistance and corrosion resistance are remarkably improved at 0 G or more, especially 16000 G or more.

Here, assuming that the temperature at which the coercive force rapidly changes due to the heat treatment, for example, the heat treatment temperature at which the coercive force Hc becomes 2 Oe, is the heat-resistant temperature, the heat-resistant temperature of the soft magnetic thin film used in the present invention is about 500 ° C. or more. Yes, sufficient heat resistance can be obtained even if the layers are laminated.

Therefore, the soft magnetic multilayer film of the present invention has excellent soft magnetic properties in which the saturation magnetic flux density Bs is high, the coercive force Hc is low, and the magnetic permeability μ is high.

Therefore, the magnetic head of the present invention having such a soft magnetic multilayer film has an overwrite characteristic,
It has high reproduction sensitivity and the like, good frequency characteristics, and excellent electromagnetic conversion characteristics.

In addition, since the soft magnetic multilayer film of the present invention is excellent in corrosion resistance and wear resistance, a highly reliable magnetic head is realized.

JP-A-60-218820 and JP-A-60-220913 disclose Fe, 2 to 10% by weight of Al, 3 to 16% by weight of Si, 0.005 to
A single-layer magnetic thin film containing 4% by weight of nitrogen is disclosed. It is described that the saturation magnetic flux density Bs can be improved by replacing part of Fe with Co, and the magnetic permeability μ can be kept high without reducing Bs by replacing Ni with Ni. .

However, the specific example shown in the embodiment has a high heat-resistant temperature, but has a saturation magnetic flux density Bs of at most about 12000 G.

As described above, there is no known soft magnetic multilayer film having a high saturation magnetic flux density Bs, a low coercive force Hc, a high magnetic permeability μ, and excellent heat resistance.

[0035]

[Specific Configuration] Hereinafter, a specific configuration of the present invention will be described in detail.

FIG. 1 shows a preferred example of a soft magnetic multilayer film particularly suitable for a magnetic head according to the present invention. The soft magnetic multilayer film 4 is configured by laminating a soft magnetic thin film 41 via a non-magnetic thin film 43,
It is formed on a base 45.

The soft magnetic thin film 41 has an atomic ratio composition represented by the following formula. Formula Fe _100-xyz M _x Ni _y N _z

In the above formula, M is Mg, Ca, Ti, Z
At least one selected from r, Hf, V, Nb, Ta, Cr, Mo, W, Mn and B.

Elements other than these, such as Ru, reduce the saturation magnetic flux density Bs and the soft magnetic characteristics.

Of these, Zr alone or V alone, especially Zr, is preferred for enhancing the (100) orientation.
Alone or Zr and / or V 20% in M
The above is occupied, and a combination with any of the above elements other than Zr and V is preferable.

Further, x is 0.1 to 15. In this case, the upper limit of x is preferably 14. If it is less than the above range, heat resistance is insufficient. For this reason, the coercive force Hc tends to increase significantly by heat treatment or the like. If it exceeds the above range, the saturation magnetic flux density Bs decreases. Therefore, when applied to a magnetic head, the overwrite characteristics tend to deteriorate.

In order to form a soft magnetic thin film having a strong (100) orientation or a high degree of orientation, x is 2.5 or more, particularly 3 or more, further 5 or more, more preferably 7 or more, and most preferably 8 or more. It is preferred that

When x is in the above range, the soft magnetic properties are remarkably improved. In addition, heat resistance is improved, Hc is 2 Oe or more,
In particular, the heat-resistant temperature of 1 Oe or more is 700 ° C., especially 75
Reach 0 ° C.

Y is 0 to 10, preferably 0 to 5.
By adding Ni, the magnetic permeability μ can be improved. However, if it exceeds the above range, the saturation magnetic flux density Bs
Tends to decrease. When Ni is contained as an essential component, the content y is preferably 1 to 10, more preferably 1 to 5.

Z is 0.1 to 15.

Below the above range, the fineness of the crystal grains by N is insufficient, and there is a tendency that soft magnetic characteristics cannot be obtained. If it exceeds the above range, soft magnetic characteristics tend not to be obtained because nitrides of Fe, Ni and M are generated more than necessary.
In this case, the lower limit of z is preferably 1, especially 2, and the upper limit of z is 10, especially 5, especially 4.
It is preferably 5, especially 4. In such a range, the (100) orientation is more preferable.

If necessary, oxygen may be contained in an amount of 5 at% or less in addition to nitrogen.

The soft magnetic thin film 4 constituting the present invention as described above
The composition of 1 is, for example, Electron Probe Micro Analysis
What is necessary is just to measure by the (EPMA) method.

The thickness of the soft magnetic thin film 41 may be appropriately selected according to the application and the like, but is usually about 0.01 to 10 μm.

The soft magnetic thin film 41 can be used as a single layer because sufficient soft magnetic properties can be obtained even with a single layer. In this case, the film thickness may be appropriately selected according to the application and the like, but is usually about 0.1 to 50 μm.

To form the soft magnetic thin film 41 used in the present invention, various gas phase methods such as vapor deposition, sputtering, ion plating, and CVD may be used.

Of these, it is particularly preferable to form a film by a sputtering method. For example, the film may be formed as follows. As the target, an alloy cast, a sintered body, or a multi-target is used. Then, sputtering is performed in an atmosphere of an inert gas such as Ar.

When performing reactive sputtering,
The composition of the target may be substantially the same as the one containing no N in the above formula.

Then, the sputtering is performed using N ₂ in Ar.
In an atmosphere containing 0.1 to 15% by volume, preferably 2 to 10% by volume. If the ratio is outside the above range, soft magnetic properties tend not to be obtained.

There is no particular limitation on the method of sputtering, and there is no limitation on the sputtering apparatus to be used, and a normal sputtering method may be used. The operating pressure is usually 0.1 to 1.0.
It should be about Pa. In this case, various conditions such as a sputter input voltage and a current are appropriately determined according to the sputtering method and the like.

Next, the non-magnetic thin film 43 constituting the present invention is not particularly limited, and various kinds of non-magnetic thin films conventionally used for soft magnetic multilayer films, for example, one kind selected from C, N and O A non-magnetic thin film containing the above may be used. In this case, the metal, semimetal or semiconductor element of the non-magnetic thin film is Mg, Ca, Y, Ti, Zr, Hf, V, N
One or more selected from b, Ta, Cr, Mo, W, Mn, B, Al, Ga and Si are preferred. Then, a non-magnetic thin film is formed from one or more of carbides, nitrides, oxides, or mixtures thereof of these metals, semimetals, and semiconductors. In this case, the carbides, nitrides, and oxides may be stoichiometric or deviate therefrom.

The thickness of the non-magnetic thin film 43 may be appropriately selected according to the application and the like.
It is about μm.

In order to form the nonmagnetic thin film 43, various vapor phase methods such as vapor deposition, sputtering, ion plating, and CVD may be used.

The soft magnetic thin film 41 of the soft magnetic multilayer film 4 of the present invention
The number of layers of the soft magnetic thin film 43 is not particularly limited, and may be appropriately selected depending on the purpose, application, and the like. Degree. The total thickness of the soft magnetic multilayer film 4 is not particularly limited, and may be appropriately selected depending on the purpose and application, but is usually about 0.1 to 30 μm. In addition, the soft magnetic thin film 41 and the nonmagnetic thin film 43 are each formed from the viewpoint of workability and the like.
Usually, they have the same composition and the same film thickness, but depending on the case, the composition and the film thickness may be different. In this case, films having a plurality of compositions and film thicknesses may be regularly laminated.

After the soft magnetic thin films 41 and the nonmagnetic thin films 43 are alternately formed, the soft magnetic thin films are subjected to a heat treatment. By the heat treatment, the (100) orientation or degree of orientation of the soft magnetic thin film is increased, the soft magnetic properties are remarkably improved, and the saturation magnetic flux density Bs is also improved.

Specifically, when the X-ray diffraction chart of the soft magnetic thin film is viewed, before heat treatment, it is usually amorphous and has no peak. The relative intensity ratio of the peak is 1/3
As described above, by increasing the heat treatment temperature, the number is increased to 2 or more, further 3 or more, and in some cases to infinity, and the saturation magnetic flux density Bs is further improved.

In this case, a soft magnetic thin film having a strong (100) orientation can be obtained by forming a film on any substrate or film such as a magnetic material such as ferrite, a nonmagnetic ceramic, or a polymer film. A soft magnetic multilayer film having a soft magnetic thin film is realized.

That is, (10) of the soft magnetic thin film
0) In the electron diffraction pattern, the orientation is Fe (2
It can be confirmed from the fact that the diffraction ring from the (00) plane is discontinuous.

In the present invention, the X-ray diffraction chart of the film
The relative intensity ratio of the Fe (200) peak to the Fe (110) peak becomes １ ／ or more, and the (100) orientation increases from the non-oriented state, and especially this value is 1 or more, more preferably 2 or more, and Preferably, it is 3 or more. Note that, in the X-ray diffraction chart, Fe (11
0) The peak 2θ (θ is the diffraction angle) is about 44.7 degrees when CuKα is used, and the 2θ of the Fe (200) peak is
It is about 65 degrees.

The following conditions are particularly preferable as the heat treatment conditions.

Heating rate: about 2 to 8 ° C./min Holding temperature: about 200 to 700 ° C., particularly about 400 to 650 ° C., and further about 400 to 600 ° C. Holding time: about 10 to 60 minutes Cooling rate: about 2 to 8 ℃ / minute

The atmosphere may be an inert gas such as Ar. By performing the heat treatment under the above conditions, a soft magnetic multilayer film having more excellent soft magnetic properties can be obtained.

The heat treatment conditions for a single-layer soft magnetic thin film are as follows: holding temperature: about 200 to 800 ° C., more preferably about 400 to 750 ° C., and still more preferably 400 to 750 ° C.
The temperature is preferably about 00 ° C., and other conditions are preferably the same as in the case of the multilayer film.

The single-layer soft magnetic thin film has a thickness of, for example, 1 μm.
When it is about 5 μm, it has the following characteristics.

Coercive force Hc (50 Hz): about 0.1 to 2 Oe, especially about 0.1 to 1 Oe Initial permeability μ _i (5 MHz): about 1000 to 5000, especially about 2000 to 5000 Saturation magnetic flux density Bs ( DC): 14000-20,000G
Degree, especially about 16000 to 20000G, and even 17
About 000 to 19000G Average grain size D of crystal grains: about 50 to 500A, especially about 100 to 300A, further about 150 to 250A

The following characteristics are obtained with the soft magnetic multilayer film of the present invention. Coercive force Hc (50 Hz): about 0.1 to 2 Oe, especially about 0.1 Oe.
About 1 to 1 Oe Initial permeability μ _i (5 MHz): about 1000 to 6000, especially about 2000 to 6000
The soft magnetic characteristics are improved, and the frequency characteristics are improved. In this case, Bs and D are equivalent to the single-layer film.

The measurement of the magnetic properties of the soft magnetic thin film or the soft magnetic multilayer film is performed, for example, when applied to a magnetic head, by forming a film on a non-magnetic substrate under the same conditions as when forming the magnetic head. After the heat treatment described above, the heat treatment may be performed as follows.

Initial permeability (μ _i ): Measured with an applied magnetic field of 5 mOe using a figure 8 coil permeability measuring device Coercive force (Hc): Measured with BH tracer Saturated magnetic flux density (Bs): VSM Used and measured in 10,000G magnetic field

The average crystal grain size D of the crystal grains may be determined by measuring the Fe (200) peak half-width W ₅₀ of the X-ray diffraction line and using the following Scherrer equation. Formula D = 0.9λ / W ₅₀ cosθ

In the above equation, λ is the wavelength of the X-ray used, and θ is the diffraction angle. When CuKα is used as described above, 2θ of the Fe (200) peak is about 65 degrees.

The soft magnetic multilayer film of the present invention can be applied to various magnetic heads such as a MIG (metal-in-gap) magnetic head and a thin-film magnetic head. And
In addition to the magnetic head, the present invention can be applied to various soft magnetic components such as a thin film inductor. In such a case, as mentioned above,
It can also be used as a single layer film.

Next, the magnetic head of the present invention will be described. FIG. 2 shows a preferred embodiment of the MIG type magnetic head of the present invention.
And FIG.

The magnetic head shown in FIG.
And a second core 2 on which a soft magnetic multilayer film 4 is formed on the surface facing the gap portion. Both cores are joined via a gap 5 and are integrated by welding glass 3.

The magnetic head shown in FIG. 3 is of a type in which a soft magnetic multilayer film 4 is formed on both surfaces of the first core 1 and the second core 2 facing the gap.

In the present invention, the cores 1 and 2 are preferably made of ferrite. In this case, the ferrite used is not particularly limited, but it is preferable to use Mn-Zn ferrite or Ni-Zn ferrite according to the purpose.

As the Mn-Zn ferrite, Fe ₂ O
_{3 About} 50 to 60 mol%, ZnO about 8 to 25 mol%,
Those whose balance is substantially MnO are preferred. Also, Ni
-Zn ferrite is exhibits excellent characteristics particularly in a high frequency region, as the preferred composition, Fe ₂ O ₃
Is 30 to 60 mol%, NiO is 15 to 50 mol%, Zn
O is about 5 to 40 mol%.

Saturation magnetic flux density Bs of cores 1 and 2 at DC
Is preferably 3,000 to 6,000 G. When the saturation magnetic flux density is less than the above range, the overwrite characteristics are reduced, and in such a composition having the saturated magnetic flux density, the Curie temperature is lowered, so that the thermal stability is lowered. If the ratio is outside the above range, the magnetostriction increases and the characteristics as a magnetic head deteriorate, or the magnetic head is easily magnetized.

The initial magnetic permeability μ _i of the cores 1 and 2 at DC is 1,
Preferably, the coercive force Hc is not less than 000 and not more than 0.3 Oe.

The surfaces of the cores 1 and 2 facing the gap are
It is preferable that the surface is smoothed by mirror polishing or the like so that a soft magnetic multilayer film 4 and a base film described later are easily formed.

The soft magnetic multilayer film 4 is provided in order to generate a high density magnetic flux at the time of recording and to perform effective recording on a magnetic recording medium having a high coercive force. As the soft magnetic multilayer film 4, the above-described soft magnetic multilayer film of the present invention is used.

When the magnetic head is completed, the saturation magnetic flux density Bs of the soft magnetic multilayer film 4 is 14000 G or more, more preferably 1
It is preferably at least 6000 G, particularly preferably at least 17000 G. If it is less than the above range, the overwrite characteristics deteriorate, and it is particularly difficult to record on a magnetic recording medium having a high coercive force.

The soft magnetic thin film of the soft magnetic multilayer film 4 is
(100) Strong orientation. When the (100) orientation is strong,
The soft magnetic characteristics of the soft magnetic multilayer film 4 are improved, and high recording / reproducing sensitivity is obtained.

Further, the average crystal grain size of the crystal grains of the soft magnetic thin film of the soft magnetic multilayer film 4 is 500 A or less, more preferably 3A or less.
It is preferably 00A or less, particularly about 100 to 300A. In the above range, the soft magnetic characteristics are improved, and high recording / reproducing sensitivity is obtained.

In this case, the soft magnetic characteristics, that is, the coercive force Hc at 50 Hz of the soft magnetic multilayer film 4 when the magnetic head is completed is 2 Oe or less, more preferably 1 Oe or less, and particularly preferably 0.8 Oe or less. It is preferred that The initial magnetic permeability μ _i of the soft magnetic multilayer film 4 at 5 MHz is 10
It is preferably at least 00, more preferably at least 1500, particularly preferably at least 2,000. When the coercive force Hc exceeds said range or if the initial permeability mu _i is less than the above range, the recording and reproducing sensitivity tends to decrease.

The film thickness of the soft magnetic multilayer film 4 is preferably set at 0.1.
The thickness is 2 to 5 μm, more preferably 0.5 to 3 μm.
When the film thickness is less than the above range, the volume of the entire soft magnetic multilayer film 4 is insufficient, and the soft magnetic multilayer film 4 is easily saturated, and it is difficult to sufficiently fulfill the function of the MIG type magnetic head.

With such a soft magnetic multilayer film 4, the magnetic head of the present invention can perform effective recording on a magnetic recording medium having a coercive force of 800 Oe or more.

If the core 1, the core 2, and the soft magnetic multilayer film 4 have the above-described magnetic characteristics, a high output and a high resolution can be obtained as a magnetic head. Also, a good value of -35 dB or less is obtained for the overwrite characteristics. The resolution means, for example, that the output of the 1f signal is V _1f , 2f
When the signal output is V _2f , (V _2f / V _1f ) × 100
It is represented by [%]. The overwrite characteristic is, for example, a 1f signal output with respect to a 2f signal output when a 2f signal is overwritten on a 1f signal.

The gap 5 is formed from a non-magnetic material. In particular, it is preferable to use an adhesive glass for the gap 5 in order to increase the adhesive strength.
Glass shown in No. 1506 is suitable. Further, the gap 5 may be formed only of the adhesive glass, but is preferably formed of two layers of the gap 51 and the gap 53 as shown in the figure in order to increase the gap formation speed and the gap strength. In this case, the gap 51 has S
It is preferable to use iO _{2 and} to use an adhesive glass for the gap 53.

In the case of a magnetic head of a type in which a welding glass 3 to be described later flows into both sides of the gap, the gap 5 may be formed only of silicon oxide. Gap 5
Although there is no particular limitation on the method of forming, it is preferable to use a sputtering method. Gap length is usually 0.2-2.0μ
m.

As shown in FIGS. 2 and 3, the MIG type magnetic head of the present invention has a first core 1 and a second core 2 joined and integrated via a gap 5. The bonding of the cores is usually performed by pouring the welding glass 3 at the same time as the thermocompression bonding with the adhesive glass in the gap 53. The working temperature Tw of the welding glass 3 used is 450-70.
The temperature is preferably 0 ° C, particularly preferably about 460 to 650 ° C. Here, the working temperature Tw is a temperature at which the viscosity of the glass becomes 10 ⁴ poise, as is well known.

In the present invention, since the soft magnetic multilayer film 4 having high heat resistance is used, the coercive force Hc is 2 Oe or less, particularly 1 Oe or less even when welding is performed using such a glass having Tw.
Further, the value is maintained at 0.80c or less. Welding glass 3
Is not particularly limited, but it is preferable to use lead silicate glass. Among them, for example, the following glass is suitable.

PbO: about 67.5 to 87.5% by weight B ₂ O ₃ : about 4.0 to 8.1% by weight SiO ₂ : about 7.5 to 16.6% by weight Al ₂ O ₃ : about 0.1% by weight about 3 to 0.8 wt% ZnO: from 2.2 to 3.3 wt% of Bi ₂ O _3: 0 to 0.1 wt% of _{Na 2 O, K 2 O,} CaO or the like: about 0-4 wt% sb ₂ O _3: about 0-1 wt%

The welding is performed by a usual method with the welding temperature set at around the working temperature Tw. In this case, the welding process may also serve as a heat treatment for the soft magnetic multilayer film 4.

Further, in the present invention, as shown in FIG. 4, a low saturation magnetic flux density alloy thin film 6 having a lower saturation magnetic flux density Bs than the core is formed on the first core 1 and the soft core described above is formed on the second core 2. A so-called EDG-type MI having a magnetic multilayer film 4 formed thereon
It can be a G-type magnetic head. Then, the same effect as that of the above-described MIG type magnetic head can be obtained.
In this case, as the low saturation magnetic flux density alloy thin film 6, for example, a low saturation magnetic flux density amorphous thin film described in Japanese Patent Application No. 63-311591 can be used, and excellent overwrite characteristics and high sensitivity can be obtained. Can be

The magnetic head of the present invention is integrated with a slider, if necessary, and assembled to form a head assembly. Floppy heads for overwriting such as tunnel erasing type such as so-called laminate type or bulk type or read / write type without erasing head, monolithic type or composite type floating type computer head, and rotary type VTR It is used as various magnetic heads such as a head and an R-DAT head. In this manner, various known overwrite recording methods can be performed using the magnetic head of the present invention.

Next, the thin film magnetic head of the present invention will be described.

FIG. 5 shows a flying type thin film magnetic head according to a preferred embodiment of the present invention. The thin film magnetic head shown in FIG. 5 has an insulating layer 81, a lower magnetic pole layer 91,
Gap layer 10, insulating layer 83, coil layer 11, insulating layer 8
5, an upper magnetic pole layer 95 and a protective layer 12 are sequentially provided.

In the present invention, the slider 7 may be made of various materials known in the art, such as ceramics and ferrite. In this case, ceramics, particularly ceramics mainly containing Al ₂ O ₃ —TiC, ceramics mainly containing ZrO ₂ , Si
Ceramics mainly composed of C or ceramics mainly composed of AlN are preferred. These may contain Mg, Y, ZrO ₂ , TiO _{2 and the} like as additives. Various conditions such as the shape and size of the slider 7 may be any known conditions, and are appropriately selected according to the application.

On the slider 7, an insulating layer 81 is formed. As the material of the insulating layer 81, any conventionally known material can be used. For example, when a thin film is formed by a sputtering method, SiO ₂ , glass, Al ₂ O ₃ or the like can be used. The thickness and pattern of the insulating layer 81 may be any known ones.
Make it about μm.

The magnetic poles are usually formed as shown in the figure.
1 and an upper magnetic pole layer 95. In the present invention,
In the lower magnetic pole layer 91 and the upper magnetic pole layer 95, respectively,
The soft magnetic multilayer film of the present invention is used as in the case of the above-described MIG type magnetic head or EDG type MIG type magnetic head.
Therefore, a magnetic head having excellent overwrite characteristics and high recording / reproducing sensitivity can be obtained. Note that film formation, heat treatment, and the like may be performed in the same manner as described above.

The pattern and thickness of the lower and upper pole layers 91 and 95 may be any known ones. For example, the thickness of the lower magnetic pole layer 91 may be about 1 to 5 μm, and the thickness of the upper magnetic pole layer 95 may be about 1 to 5 μm. The gap layer 10 is formed between the lower magnetic pole layer 91 and the upper magnetic pole layer 95.

For the gap layer 10, Al ₂ O ₃ , SiO
Various known materials such as ₂ may be used. Further, the pattern, the film thickness, etc. of the gap layer 10 may be any known one. For example, the thickness of the gap 10 is 0.2 to 1.0.
It may be about μm.

The material of the coil layer 11 is not particularly limited.
A commonly used metal such as Al and Cu may be used. There are no restrictions on the winding pattern or winding density of the coil,
Known ones may be appropriately selected and used. For example, the winding pattern may be any of a spiral type, a lamination type, a zigzag type, and the like. For forming the coil layer 11, various vapor deposition methods such as a sputtering method, a plating method, or the like may be used.

In the illustrated example, the coil layer 11 is a so-called spiral type, and the lower and upper pole layers 9 are spirally formed.
Insulating layers 83 and 85 are provided between the coil layer 11 and the lower and upper magnetic pole layers 91 and 95.

As the material of the insulating layers 83 and 85, any of conventionally known materials can be used. For example, when a thin film is formed by a sputtering method, SiO ₂ , glass, A
l ₂ O ₃ or the like can be used.

On the upper pole layer 95, a protective layer 12 is provided. As the material of the protective layer 12, any conventionally known material can be used, and for example, Al ₂ O ₃ or the like can be used. In this case, any conventionally known pattern and film thickness of the protective layer 12 can be used. For example, the film thickness may be about 10 to 50 μm. In the present invention, various resin coat layers may be further laminated.

The manufacturing process of such a thin film magnetic head is as follows.
Usually, it is performed by forming a thin film and forming a pattern.
As described above, a thin film of each layer may be formed by a vapor deposition method, which is a conventionally known technique, for example, a vacuum deposition method, a sputtering method, a plating method, or the like.

The pattern formation of each layer of the thin-film magnetic head is performed as follows.
It can be performed by selective etching or selective deposition, which is a conventionally known technique.

The etching can be performed by wet etching or dry etching.

The thin-film magnetic head of the present invention is used in combination with a conventionally known assembly such as an arm.

Further, various types of overwrite recording can be performed using the thin-film magnetic head of the present invention. In this case, recording / reproduction can be effectively performed on a magnetic recording medium having a coercive force Hc of 800 Oe or more.

Further, in the present invention, a soft magnetic multilayer film is formed in a pattern between non-magnetic substrates, or a pair of core halves having a soft magnetic multilayer film formed between non-magnetic substrates are abutted against each other. A magnetic head may be formed by forming a magnetic circuit with the soft magnetic multi-layer film described above. The above-mentioned various magnetic heads may have a single-layer soft magnetic thin film instead of the soft magnetic multilayer film.

[0118]

EXAMPLES Hereinafter, the present invention will be described in more detail with reference to specific examples of the present invention.

Embodiment 1 As shown in FIG. 2, a first core 1 and a second core 2 having a soft magnetic multilayer film 4 formed on a surface facing a gap portion are joined and integrated via a gap 5. An MIG type magnetic head was manufactured. The material of the core 1, 2 and Mn-Zn ferrite, saturation magnetic flux density Bs of the DC is 5000 G, the initial permeability mu _i 3000, coercive force Hc was 0.1 Oe.

The soft magnetic multilayer layer 4 was formed by alternately laminating 10 soft magnetic thin films and 10 nonmagnetic thin films. The soft magnetic thin film is formed by RF magnetron sputtering,
The thickness was 0.1 μm. In this case, sputtering targets an alloy of Fe ₈₅ Zr ₁₅ (atomic ratio),
The test was performed in an atmosphere containing 10% by volume of N ₂ . The operating pressure was 0.4 Pa. The non-magnetic thin film is RF
Formed by magnetron sputtering with a thickness of 0.01μ
m.

The composition of the soft magnetic thin film, the saturation magnetic flux density Bs at direct current of the nonmagnetic thin film and the soft magnetic multilayer film, the coercive force Hc at a frequency of 50 Hz, and the initial permeability μ _i at a frequency of 5 MHz are shown below.

[0122] In addition, Bs, Hc and μ _i is the value of the post-weld heat treatment. In this case, the heat treatment temperature was 600 ° C., and the holding time was 60 minutes. The measurement of the magnetic properties and the like was performed by forming the soft magnetic multilayer film 4 on a non-magnetic substrate under the same conditions as those for manufacturing the head. And EPM is used for composition analysis.
A, the Bs measurements were made using VSM, the Hc measurement B-H tracer, mu _i 8 of shaped coils permeability measuring instrument to measure the (applied magnetic field 5 moe).

The gap 51 was formed by sputtering using SiO ₂ , and the film thickness was 0.3 μm. Adhesive glass having a working temperature Tw of 650 ° C. was used for the gap 53. The gap 53 was formed by sputtering, and the thickness was set to 0.1 μm.

The welding glass 3 has a working temperature Tw of 60
72.50 PbO-7.05 B ₂ O ₃ -14.57 SiO ₂ -0.55 Al ₂ O ₃ -2.75Z at 0 ° C
Using nO-0.05Bi ₂ O ₃ -2.50Na ₂ O-0.30Sb ₂ O ₃ (wt%)
Welding was performed at 600 ° C.

The number of coil turns was 20 × 2. And fixed to the calcium titanate slider
Sealing was performed to obtain a composite type floating magnetic head.

The magnetic head manufactured in this manner is referred to as Sample No. 1. With this sample, the coercive force was 150
Track width 14μ using a hard disk of 0 Oe
The following characteristics were measured at m. When measuring,
The first core 1 was on the hard disk leading side.

(Overwrite characteristics) 1 of 1.25 MHz
The f signal was recorded, and then a 2.5 MHz 2f signal was overwritten from above. The output of the 1f signal with respect to the output of the 2f signal was calculated, and the overwrite characteristics were evaluated.

(Measurement of Recording / Reproduction Sensitivity) A signal of 5 MHz is recorded, and then the recorded signal is reproduced, and the reproduction output voltage value V ′ _PP (peak-to-peak) at that time is measured.
And calculate the V _pp normalized to V _'pp.

The results are as follows.

Soft magnetic thin film: Fe ₈₇ Zr ₁₀ N ₃ (atomic ratio) Nonmagnetic thin film: ZrNBs: 17,000 G Hc: 0.3 Oe μ _i (5 MHz): 4000 Overwrite characteristics: -40
dB V _PP : 1.30 μV / μm / turn

The sample was prepared at a concentration of 5% (weight percentage).
After immersing in a sodium chloride aqueous solution for 168 hours, the surface of the soft magnetic thin film was observed with an electron microscope. As a result, in Sample No. 1 of the present invention, almost no rust was observed. Further, when heat treatment was performed at 700 ° C. for 60 minutes, Hc was less than 1 Oe. Μ _i and V
The frequency characteristics of _pp were also good.

FIG. 6 shows an X-ray diffraction chart of the soft magnetic thin film of Sample No. 1 after the heat treatment. Looking at this chart, it can be seen that Fe (200) with respect to Fe (110) peak.
The relative intensity ratio of the peak was 3.1, and the sample No. 1
Can be confirmed that (100) orientation is strong. Also,
The (100) orientation was also confirmed from the electron diffraction pattern.

Comparative Example 1 The same sample No. as in Example 1 was used except that the soft magnetic multilayer film of Example 1 was changed to a single-layer soft magnetic thin film having a thickness of 1 μm. When the sample No. 2 was produced, the following results were obtained. _{Bs: 17,000G Hc: 0.5Oe μ i} (5MHz): 3000 overwrite _{characteristics: -40 dB V PP: 1.20μV /} μm / turn

Further, the sample No. 2 was immersed in a 5% (weight percentage) aqueous sodium chloride solution for 168 hours, and the surface of the soft magnetic thin film was observed with an electron microscope.
Similar to Sample No. 1 of the present invention, almost no rust was observed. Further, when heat treatment was performed at 700 ° C. for 60 minutes, Hc was less than 1 Oe. Also, μ
The frequency characteristics of _i and V _pp It was worse than one.

The X-ray diffraction chart of the soft magnetic thin film of Sample No. 2 after the heat treatment is shown in Sample No. 2. As in Example 1, the (100) orientation was also recognized from the electron diffraction pattern.

Comparative Example 2 Example 1 Target Composition of Soft Magnetic Thin Film and N _{2 in} Atmosphere
Fe ₇₅ Zr under the same conditions as in Example 1 except that the amount was changed.
₇ sample of N ₁₈ No. As a result, the following results were obtained.

Bs: 16,000 G Hc: 0.7 Oe μ _i (5 MHz): 2000 Overwrite characteristics: −37 dB V _PP : 1.0 μV / μm / turn

This sample No. Fe of soft magnetic thin film 3
The relative intensity ratio of the Fe (200) peak to the (110) peak was 0. From these results, Fe (10
0) The effect of the orientation is clear.

Example 2 In the same manner as in Example 1, the metal-in-gap type magnetic head sample No. 4, 6, 8, 10, 12,
14, 16, and 18 and Comparative Sample No. 5, 7, 9, 11, 13, 15, 17, 17 and 19 were produced, and similar measurements were made.

The composition of the soft magnetic thin film was Fe _97-xyw M _x Ni
_As shown in Table 1, M, x, y and w were changed in yN ₃ Ow, and were combined with the non-magnetic thin film shown in Table 1.

[0141]

[Table 1]

[0142]

[Table 2]

The Fe of the soft magnetic thin films of Sample Nos. 4 to 19
The relative intensity ratio of the Fe (200) peak to the (110) peak was about 1 to 10, and the (100) orientation was observed from the electron diffraction pattern. In addition, the sample of the present invention has a μ _i compared to a comparative sample using a single-layer film.
And V _P - frequency characteristics of _P was good. Sample No. Nos. 4 to 19 also had good corrosion resistance.

In addition, when each sample having the different M in the above composition formula, each sample having a different number of stacked soft magnetic thin films and film thickness, and each sample having a different nonmagnetic thin film were manufactured, the same result was obtained. .

Embodiment 3 As shown in FIG. 4, a first core 1 in which a low saturation magnetic flux density alloy thin film 6 having a lower saturation magnetic flux density Bs than the core is formed on a surface facing a gap portion, and a soft magnetic multilayer film 4 And the second core 2 on which is formed is bonded and integrated via the gap 5,
An EDG-type metal-in-gap magnetic head was manufactured. Then, when the same measurement as in Example 1 was performed,
Comparable results were obtained.

Embodiment 4 As shown in FIG. 5, an insulating layer 8 is sequentially formed on the slider 7.
1. A thin-film magnetic head having a lower magnetic pole layer 91, a gap layer 10, an insulating layer 83, a coil layer 11, an insulating layer 85, an upper magnetic pole layer 95, and a protective layer 12 was manufactured. In this case, a sputtering method is used to form each layer, and a pattern is formed
Dry etching was used.

For the slider 7, Al ₂ O ₃ —TiC was used. The insulating layer 81 is made of Al ₂ O _{3 and} has a thickness of 30.
μm. The lower and upper pole layers 91 and 95 have F
e _{97 -xyw} M _x Ni _y N ₃ Ow: soft magnetic thin film having a thickness of 0.1 μm and a non-magnetic thin film having a thickness of 0.01 μm as shown in Table 3 alternately laminated in 30 layers. A multilayer film or a single-layer soft magnetic thin film having a thickness of 3 μm was used.

[0148]

[Table 3]

The saturation magnetic flux density Bs of the lower and upper magnetic pole layers 91 and 95 at DC, the coercive force Hc at a frequency of 50 Hz,
The initial magnetic permeability μ _i at a frequency of 5 MHz is as shown in Table 4. The heat treatment conditions were a heat treatment temperature of 350 ° C. and a holding time of 60 minutes.

The gap layer 10 was made of SiO _{2 and} had a thickness of 0.25 μm. The coil layer 11 was formed in a spiral shape using Cu, as shown in the figure. Insulating layer 8
Al ₂ O ₃ was used for ₃ and 85. The protective layer 12
Al ₂ O ₃ was used, and the film thickness was 40 μm.

As described above, the thin film magnetic head sample No.
20 to No. 38 were produced. The same measurement as in Example 1 was performed using each of these samples and a hard disk having a coercive force of 1500 Oe. The results are as shown in Table 4.

[0152]

[Table 4]

In addition, Sample Nos. 20, 21 and 23
The soft magnetic thin films of the lower and upper magnetic pole layers 91 and 95 of FIGS. 38 to 38 have a relative intensity ratio of the Fe (200) peak to the Fe (110) peak of 1 to 1 when viewed from the X-ray diffraction chart.
It was about 0, and the (100) orientation was recognized from the electron diffraction pattern. In contrast, Sample No. 20 was different from Sample No. 20 in that no heat treatment was performed. In 22,
Fe to the Fe (110) peak of the soft magnetic thin film
The relative intensity ratio of the (200) peak was 0.

The sample of the present invention has μ _i and V, respectively, as compared with the comparative sample using a single-layer film.
The frequency characteristics of _PP were good. Sample No.
Nos. 20 to 38 had good corrosion resistance.

In addition, when each sample having the different M in the above composition formula, each sample having a different number of layers of the soft magnetic thin film and the film thickness, and each sample having a different non-magnetic thin film were manufactured, the same result was obtained. .

The effects of the present invention are clear from the above results.

[0157]

The soft magnetic multilayer film of the present invention has a high saturation magnetic flux density Bs. In addition, because of its high heat resistance and particularly strong (100) orientation, its coercive force Hc is low and its magnetic permeability μ is high.
Has excellent soft magnetic properties. Further, as compared with the case of a single layer, the magnetic permeability μ is higher and the frequency characteristics are better. For this reason, the magnetic head of the present invention has high overwrite characteristics, recording / reproducing sensitivity, etc., good frequency characteristics, and excellent electromagnetic conversion characteristics.

Since the soft magnetic multilayer thin film of the present invention is excellent in corrosion resistance and wear resistance, a highly reliable magnetic head is realized.

[Brief description of the drawings]

FIG. 1 is a sectional view showing an example of a soft magnetic multilayer film of the present invention.

FIG. 2 is a partial sectional view showing one example of a MIG type magnetic head of the present invention.

FIG. 3 is a partial sectional view showing one example of a MIG type magnetic head of the present invention.

FIG. 4 is a partial sectional view showing one example of an EDG type MIG type magnetic head of the present invention.

FIG. 5 is a partial sectional view showing an example of the thin-film magnetic head of the present invention.

FIG. 6 is a graph showing an X-ray diffraction chart of the soft magnetic thin film of the soft magnetic multilayer film of the present invention.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 1st core 2 2nd core 3 Deposition glass 4 Soft magnetic multilayer film 41 Soft magnetic thin film 43 Nonmagnetic thin film 45 Substrate 5, 51, 53 Gap 6 Low saturation magnetic flux density alloy thin film 7 Slider 81, 83, 85 Insulating layer 91 Lower part Magnetic pole layer 95 Upper magnetic pole layer 10 Gap layer 11 Coil layer 12 Protective layer

──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. ⁷ Identification code FI H01F 1/147 H01F 1/14 B

Claims (9)

(57) [Claims] 1. After laminating a soft magnetic thin film having an atomic ratio composition represented by the following formula via a non-magnetic thin film,
It has an atomic ratio composition represented by the following formula and obtained by heat treatment at a temperature of 700 ° C.
10) A soft magnetic multilayer film comprising a soft magnetic thin film having a relative intensity ratio of an Fe (200) peak to a peak of 1/3 or more laminated via a nonmagnetic thin film. Formula Fe _100-xyz M _x Ni _y N _z (where M is Mg, Ca, Ti, Zr, Hf,
At least one selected from V, Nb, Ta, Cr, Mo, W, Mn and B, 0.1 ≦ x ≦ 15, 0 ≦ y ≦ 1
0, 0.1 ≦ z ≦ 15. ) 2. After laminating a soft magnetic thin film having an atomic ratio composition represented by the following formula via a nonmagnetic thin film,
It has an atomic ratio composition represented by the following formula obtained by performing a heat treatment at a temperature of 700 ° C.
00) A soft magnetic multilayer film comprising a soft magnetic thin film having a plane orientation laminated via a non-magnetic thin film. Formula Fe _100-xyz M _x Ni _y N _z (where M is Mg, Ca, Ti, Zr, Hf,
At least one selected from V, Nb, Ta, Cr, Mo, W, Mn and B, 0.1 ≦ x ≦ 15, 0 ≦ y ≦ 1
0, 0.1 ≦ z ≦ 15. ) 3. The soft magnetic multilayer film according to claim 1, wherein a soft magnetic thin film having an atomic ratio composition represented by the following formula is laminated via a nonmagnetic thin film. Formula Fe _100-xyz M _x Ni _y N _z (where M is Mg, Ca, Ti, Zr, Hf,
One or more selected from V, Nb, Ta, Cr, Mo, W, Mn, and B, and 8 ≦ x ≦ 14, 0 ≦ y ≦ 10,
2 ≦ z ≦ 4. ) 4. The soft magnetic multilayer film according to claim 1, wherein said non-magnetic thin film is a thin film containing at least one selected from C, N and 0. 5. The method according to claim 1, wherein a saturation magnetic flux density Bs is 14000 G or more and a coercive force Hc is 2 Oe or less.
A soft magnetic multilayer film according to any one of the above. 6. A magnetic head comprising the soft magnetic multilayer film according to claim 1 between a pair of cores. 7. The pair of cores are operated at a working temperature Tw of 450.
7. The method according to claim 6, wherein the glass is welded and integrated with a glass at a temperature of about 700.degree.
3. The magnetic head according to claim 1. 8. A thin-film magnetic head having an upper magnetic pole layer, a lower magnetic pole layer, and a protective layer, wherein the upper magnetic pole layer and the lower magnetic pole layer are formed in a thin film magnetic head.
A magnetic head formed of the soft magnetic multilayer film according to any one of the above. 9. A magnetic head comprising a magnetic circuit formed of the soft magnetic multilayer film according to claim 1 formed on a substrate.