JPH0322569B2 - - Google Patents
Info
- Publication number
- JPH0322569B2 JPH0322569B2 JP1007269A JP726989A JPH0322569B2 JP H0322569 B2 JPH0322569 B2 JP H0322569B2 JP 1007269 A JP1007269 A JP 1007269A JP 726989 A JP726989 A JP 726989A JP H0322569 B2 JPH0322569 B2 JP H0322569B2
- Authority
- JP
- Japan
- Prior art keywords
- circuit board
- main body
- body case
- case
- temperature
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Measuring Temperature Or Quantity Of Heat (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1007269A JPH01229922A (ja) | 1989-01-13 | 1989-01-13 | 電子体温計 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1007269A JPH01229922A (ja) | 1989-01-13 | 1989-01-13 | 電子体温計 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP63319144A Division JPH01229920A (ja) | 1988-12-16 | 1988-12-16 | 電子体温計 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH01229922A JPH01229922A (ja) | 1989-09-13 |
JPH0322569B2 true JPH0322569B2 (enrdf_load_html_response) | 1991-03-27 |
Family
ID=11661310
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1007269A Granted JPH01229922A (ja) | 1989-01-13 | 1989-01-13 | 電子体温計 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01229922A (enrdf_load_html_response) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7115499B2 (en) | 2002-02-26 | 2006-10-03 | Applied Materials, Inc. | Cyclical deposition of tungsten nitride for metal oxide gate electrode |
US7208413B2 (en) | 2000-06-27 | 2007-04-24 | Applied Materials, Inc. | Formation of boride barrier layers using chemisorption techniques |
US7352048B2 (en) | 2001-09-26 | 2008-04-01 | Applied Materials, Inc. | Integration of barrier layer and seed layer |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0636835Y2 (ja) * | 1989-09-29 | 1994-09-28 | 東京電気株式会社 | 低周波治療器 |
JP5381943B2 (ja) * | 2010-09-17 | 2014-01-08 | オムロンヘルスケア株式会社 | 電子体温計およびその製造方法 |
-
1989
- 1989-01-13 JP JP1007269A patent/JPH01229922A/ja active Granted
Non-Patent Citations (1)
Title |
---|
COSMOPOLITANpt¨¸´¨=1982 * |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7208413B2 (en) | 2000-06-27 | 2007-04-24 | Applied Materials, Inc. | Formation of boride barrier layers using chemisorption techniques |
US7352048B2 (en) | 2001-09-26 | 2008-04-01 | Applied Materials, Inc. | Integration of barrier layer and seed layer |
US7115499B2 (en) | 2002-02-26 | 2006-10-03 | Applied Materials, Inc. | Cyclical deposition of tungsten nitride for metal oxide gate electrode |
Also Published As
Publication number | Publication date |
---|---|
JPH01229922A (ja) | 1989-09-13 |
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