JPH031961U - - Google Patents

Info

Publication number
JPH031961U
JPH031961U JP6349789U JP6349789U JPH031961U JP H031961 U JPH031961 U JP H031961U JP 6349789 U JP6349789 U JP 6349789U JP 6349789 U JP6349789 U JP 6349789U JP H031961 U JPH031961 U JP H031961U
Authority
JP
Japan
Prior art keywords
substrate
holder
rotation mechanism
rotating
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6349789U
Other languages
English (en)
Japanese (ja)
Other versions
JPH0748667Y2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1989063497U priority Critical patent/JPH0748667Y2/ja
Publication of JPH031961U publication Critical patent/JPH031961U/ja
Application granted granted Critical
Publication of JPH0748667Y2 publication Critical patent/JPH0748667Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
JP1989063497U 1989-05-31 1989-05-31 成膜装置の基板回転機構 Expired - Lifetime JPH0748667Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1989063497U JPH0748667Y2 (ja) 1989-05-31 1989-05-31 成膜装置の基板回転機構

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1989063497U JPH0748667Y2 (ja) 1989-05-31 1989-05-31 成膜装置の基板回転機構

Publications (2)

Publication Number Publication Date
JPH031961U true JPH031961U (US20030204162A1-20031030-M00001.png) 1991-01-10
JPH0748667Y2 JPH0748667Y2 (ja) 1995-11-08

Family

ID=31593599

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1989063497U Expired - Lifetime JPH0748667Y2 (ja) 1989-05-31 1989-05-31 成膜装置の基板回転機構

Country Status (1)

Country Link
JP (1) JPH0748667Y2 (US20030204162A1-20031030-M00001.png)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006057183A (ja) * 2004-08-20 2006-03-02 Jds Uniphase Corp 蒸着システム用の磁気ラッチ

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5418985A (en) * 1977-07-07 1979-02-13 Unitika Ltd Production of spun like knitted fabric
JPS6029167U (ja) * 1983-08-04 1985-02-27 日本電子株式会社 エッチング装置等用試料駆動装置
JPS6393862A (ja) * 1986-10-07 1988-04-25 Ulvac Corp 自公転式基板ホルダ取付装置
JPS6428371A (en) * 1987-07-24 1989-01-30 Oki Electric Ind Co Ltd Substrate turning mechanism

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5418985A (en) * 1977-07-07 1979-02-13 Unitika Ltd Production of spun like knitted fabric
JPS6029167U (ja) * 1983-08-04 1985-02-27 日本電子株式会社 エッチング装置等用試料駆動装置
JPS6393862A (ja) * 1986-10-07 1988-04-25 Ulvac Corp 自公転式基板ホルダ取付装置
JPS6428371A (en) * 1987-07-24 1989-01-30 Oki Electric Ind Co Ltd Substrate turning mechanism

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006057183A (ja) * 2004-08-20 2006-03-02 Jds Uniphase Corp 蒸着システム用の磁気ラッチ

Also Published As

Publication number Publication date
JPH0748667Y2 (ja) 1995-11-08

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