JPH03196000A - Beam splitter for soft x-ray - Google Patents

Beam splitter for soft x-ray

Info

Publication number
JPH03196000A
JPH03196000A JP33477289A JP33477289A JPH03196000A JP H03196000 A JPH03196000 A JP H03196000A JP 33477289 A JP33477289 A JP 33477289A JP 33477289 A JP33477289 A JP 33477289A JP H03196000 A JPH03196000 A JP H03196000A
Authority
JP
Japan
Prior art keywords
rays
soft
ray
thin film
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP33477289A
Other languages
Japanese (ja)
Inventor
Masaaki Sudo
正昭 須藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP33477289A priority Critical patent/JPH03196000A/en
Publication of JPH03196000A publication Critical patent/JPH03196000A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To enable splitting a soft X-ray beam in at least two directions, a strong reflected X-ray and a transmitted X-ray, on the whole, by forming a multi-layered film containing a Be or Al thin film of a specific thickness, on a metal mesh of a pitch through which the soft X-rays can pass. CONSTITUTION:On a metal mesh 1 of a pitch through which a soft X-ray can pass, a Be or A thin film 2 of 1000Angstrom to 1 mum thick, is formed. Moreover, on the thin film 2, a multilayer film 5 two kinds of materials 3 and 4 of which refraction indices differ one another, is formed. As materials 3 and 4, materials one of which complex refraction index is high and the other is low, are selected, and also it is much preferable that the difference of the two complex refraction indices is great, and those absorption factors are low. For example, as the material 3, one of Mo, W, Au, Pt, Rh and so on, is used, and as the material 4, one of C, Si, Be, Al and so on, is used. The soft X-rays is intensified by reflected X-rays from each layer of the multilayered film 5 and interference is induced and thereby a strong reflected X-ray can be obtained, on the whole, and, at the same time, transmitted X-rays which pass through the multilayered film 5 penetrate furthermore the thin film 2 and thereby the transmitted X-rays can be obtained. Consequently, the soft X-ray beam can be splitted in at least two directions.

Description

【発明の詳細な説明】 〔発明の目的〕 (産業上の利用分野) この発明は、X線リングラフイー X線顕微鏡、シンク
ロトロン放射分光、X線レーザ等の軟X線用光学系とし
て用いられる軟X線用ビームスプリッタに関する。
[Detailed Description of the Invention] [Object of the Invention] (Industrial Field of Application) This invention is used as an optical system for soft X-rays such as X-ray phosphorography, X-ray microscopes, synchrotron radiation spectroscopy, and X-ray lasers. The present invention relates to a soft X-ray beam splitter.

(従来の技術) 光を2方向あるいはそれ以上に分割するビームスプリッ
タとして従来知られているものに次のようなものがある
(Prior Art) The following are conventionally known beam splitters that split light into two or more directions.

a、ガラスなどの透明な基板上に金属などの薄膜を蒸着
することによって適当な透過率・と反射率を持たせた半
透明鏡。(可視光が対象)b、ポリエチレンシートや金
属メツシュなどの透過・反射特性を利用したもの。(遠
赤外線が対象) c、2個の直角プリズムを僅かに隔てて対峙させた全反
射利用半透明鏡。
a. A semi-transparent mirror that has appropriate transmittance and reflectance by depositing a thin film of metal or the like on a transparent substrate such as glass. (Applicable to visible light)b.Things that utilize the transmission/reflection properties of polyethylene sheets, metal mesh, etc. (targets far infrared rays) c. A semi-transparent mirror that utilizes total internal reflection, consisting of two right-angled prisms facing each other with a slight distance between them.

ところが、前述したビームスプリッタは、波長数画Å〜
1人の軟X線領域ではあらゆる物質に対しても垂直入射
させた時の反射率がほとんどゼロになってしまうため、
すべて波長領域がレーザ光から可視光までのものしか適
用できない。
However, the beam splitter mentioned above has a wavelength of several orders of magnitude Å~
In the soft X-ray region of one person, the reflectance of any material when incident perpendicularly becomes almost zero.
All wavelengths can only be applied to wavelengths from laser light to visible light.

また、軟X線と称される波長数画Å〜1人の光を対象と
し、この軟X線を反射する高反射率光学素子としては、
例えば特開昭62−297800号公報が知られている
。これは白金属の金属の一種以上を含む第1の層と、B
e、B、CおよびSLのうち一種以上の元素を含む第2
の層とが交互に積層されたものであり、80〜120人
の波長のX線に対しても反射率が大きいという特徴があ
る。
In addition, high reflectivity optical elements that reflect soft X-rays, which target light with a wavelength of several angstroms to one person, are called soft X-rays.
For example, Japanese Patent Application Laid-Open No. 62-297800 is known. This includes a first layer containing one or more of the metals of platinum;
A second compound containing one or more elements among e, B, C and SL
layers are laminated alternately, and is characterized by a high reflectance even for X-rays with a wavelength of 80 to 120 people.

(発明が解決しようとする課題) しかしながら、前述した高反射率光学素子は、厚い基板
上に多層膜を積層したものであるため、高い反射率が得
られても透過率が得られない。
(Problems to be Solved by the Invention) However, since the above-described high reflectance optical element is a multilayer film laminated on a thick substrate, even if high reflectance is obtained, transmittance cannot be obtained.

この発明は、前記事情に着目してなされたもので、その
目的とするところは、波長数召Å〜■人の光を対象とし
、この軟X線を2つまたはそれ以上に分割することがで
きる軟X線用ビームスプリッタを提供することにある。
This invention was made with attention to the above-mentioned circumstances, and its purpose is to target human light with a wavelength of 1 to 100 yen, and to split this soft X-ray into two or more. The object of the present invention is to provide a beam splitter for soft X-rays that can be used.

〔発明の構成〕[Structure of the invention]

(課題を解決するための手段及び作用)この発明は、前
記目的を達成するために、軟X線が透過できる間隔の金
属メツシュ上に、厚さ1000Å〜1μmのBeまたは
AIの薄膜を形成し、この薄膜上に互いに屈折率が異な
る2種類の物質よりなる多層膜を形成したことを特徴と
する。
(Means and effects for solving the problem) In order to achieve the above object, the present invention forms a thin film of Be or AI with a thickness of 1000 Å to 1 μm on a metal mesh with intervals that allow soft X-rays to pass through. , is characterized in that a multilayer film made of two types of substances with mutually different refractive indexes is formed on this thin film.

ビームスプリッタに軟X線を入射させると、多層膜の各
層からの反射Xwaが強め合い干渉を起こして全体とし
て強い反射X線が得られる。これと同時に多層膜を透過
したX線はさらにBeまたはAlの薄膜をも透過し、透
過X線が得られ、軟X線を少なくとも2方向に分割でき
る。
When soft X-rays are incident on the beam splitter, the reflections Xwa from each layer of the multilayer film constructively interfere with each other, resulting in strong reflected X-rays as a whole. At the same time, the X-rays that have passed through the multilayer film also pass through the Be or Al thin film, yielding transmitted X-rays, and the soft X-rays can be split into at least two directions.

(実施例) 以下、この発明の一実施例を図面に基づいて説明する。(Example) Hereinafter, one embodiment of the present invention will be described based on the drawings.

第1図はビームスプリッタの断面を示し、第2図はビー
ムスプリッタの全体を示す。第1図に示すように、1は
軟X線が十分に透過できる間隔を持った金属メツシュで
あり、この金属メツシュ1の上には厚さ1000Å〜1
μmのBeまたはlの薄膜2が形成されている。さらに
、この薄膜2上には互いに屈折率が異なる2種類の物質
、すなわち第1の物質3・・・と第2の物質4・・・が
積層され、多層膜5が形成されている。
FIG. 1 shows a cross section of the beam splitter, and FIG. 2 shows the entire beam splitter. As shown in FIG.
A thin film 2 of Be or l of μm is formed. Further, on this thin film 2, two types of substances having mutually different refractive indexes, that is, a first substance 3... and a second substance 4... are laminated to form a multilayer film 5.

前記第1の物質3と第2の物質4は、屈折率が異なるよ
うに軟X線に対する複素屈折率が高いものと低いものと
を選択し、その差が大きいこと、かつ低吸収率であるこ
とが望ましく、例えば第1の物質3は(Mo、W、Au
、P t、Rh)などで、第2の物質4は(C,St、
Be、AN)などである。
The first substance 3 and the second substance 4 are selected to have a high complex refractive index and a low complex refractive index for soft X-rays so that the refractive index is different, and the difference is large and the absorption rate is low. For example, the first substance 3 is (Mo, W, Au
, P t, Rh), and the second substance 4 is (C, St,
Be, AN), etc.

前記各々の層の膜厚は交互に等しい膜厚であっても全て
膜厚を変えても差し支えないが、それぞれの層中におけ
る軟X線の吸収による振幅の現象およびそれぞれの層の
界面における反射xIjlの位相の重なりによる強め合
いの両者を考慮し、少ない層数かつ薄い膜厚で多層膜に
おける全体の反射率が最も高くなるような厚さとするこ
とが望ましい。ただし、異種物質により層を形成する場
合に、界面拡散が生じてくるので一層の膜厚としては少
なくともIOλ以上が良い。
The thickness of each of the layers may be alternately the same or the thickness may be changed, but the phenomenon of amplitude due to absorption of soft X-rays in each layer and reflection at the interface of each layer In consideration of both the reinforcement due to the overlapping of the phases of xIjl, it is desirable to set the thickness such that the overall reflectance in the multilayer film is the highest with a small number of layers and a thin film thickness. However, when forming a layer of different materials, interfacial diffusion occurs, so the thickness of one layer is preferably at least IOλ or more.

一方、積層数が多いほど理論的に反射率は増大するが、
多層膜の反射率と同時に透過率も考慮しなければならな
い。
On the other hand, the reflectance theoretically increases as the number of layers increases, but
Transmittance must be considered at the same time as reflectance of the multilayer film.

反射率と透過率は相反するものであるが、高反射率と高
透過率の両条件を満たすためには多層膜5の積層数とし
ては数層から多くても数10層程度が望ましい。さらに
、多層膜5内を透過したX線を弱めることなく、かつ多
層膜5を形成させるための基板として軟X線が十分に通
過しうる間隔を持つ金属メツシュ1上に、BeまたはA
IIの厚さ1000Å〜1μm程度の薄い膜を形成させ
たものを用いる。金属メツシュ1上に形成させる膜とし
てはX線透過率の高い物質が好ましい。また、金属メツ
シュ1上に薄い膜を形成させるのはBeまたはAIの膜
と多層膜5を合わせてもその膜厚は極めて薄いため単体
として成り立たないので、この欠点を補うのに有効であ
る。
Although reflectance and transmittance are contradictory, in order to satisfy both conditions of high reflectance and high transmittance, the number of laminated layers of the multilayer film 5 is desirably from several layers to several tens at most. Furthermore, Be or A
A thin film having a thickness of approximately 1000 Å to 1 μm is formed using II. The film formed on the metal mesh 1 is preferably a material with high X-ray transmittance. Furthermore, forming a thin film on the metal mesh 1 is effective in compensating for this drawback, since even if the Be or AI film and the multilayer film 5 are combined, the film thickness is extremely thin and cannot stand as a single unit.

以上のBe膜または、/l膜と2種類の物質よりなる多
層膜5は、真空蒸着法やスノ(・ツタ法などが用いられ
る。すなわち、まず最初に金属メツシュ1上にBe膜ま
たはl膜2を成膜し、その後2種類の物質を多層膜状に
交互に、かつ高精度に膜厚制御しながら成膜していく。
The multilayer film 5 made of the Be film or the /l film and two types of substances is formed by a vacuum evaporation method, a snow ivy method, or the like. That is, the Be film or the l film is first deposited on the metal mesh 1. 2 is formed into a film, and then two types of substances are formed into a multilayer film alternately while controlling the film thickness with high precision.

前述のように構成されたビームスプリッタに軟X@Lを
入射させると、多層膜5の各層からの反射X線が強め合
い干渉を起こして全体として強(1反射X @ L 、
が得られる。これと同時に多層膜5を透過した透過X線
はさらにBeまたはAIIの薄膜をも透過し、透過X線
L2が得られ、軟X、ilLを少なくとも2方向に分割
できる。
When soft X@L is incident on the beam splitter configured as described above, the reflected X-rays from each layer of the multilayer film 5 constructively interfere with each other, resulting in a strong overall effect (1 reflection X@L,
is obtained. At the same time, the transmitted X-rays that have passed through the multilayer film 5 are further transmitted through the thin film of Be or AII to obtain transmitted X-rays L2, and the soft X and IL can be divided into at least two directions.

なお、前述のように構成されたビームスプリッタは、多
層膜の各層における膜厚を適宜設定して特定波長のみを
反射し、それ以外は透過させるというフィルタというも
利用できる。すなわち、多層膜およびBe層またはA1
層内でのX線の吸収または界面における散乱を無視すれ
ば、第3図および第4図に示すようにフィルタ的特性が
得られる。なお、第3図および第4図において実線は反
射率、破線は透過率である。
Note that the beam splitter configured as described above can also be used as a filter that reflects only a specific wavelength and transmits other wavelengths by appropriately setting the thickness of each layer of the multilayer film. That is, the multilayer film and Be layer or A1
If X-ray absorption within the layer or scattering at the interface is ignored, filter-like characteristics are obtained as shown in FIGS. 3 and 4. In addition, in FIG. 3 and FIG. 4, the solid line is the reflectance, and the broken line is the transmittance.

[発明の効果] 以上説明したように、この発明によれば、軟X線を多層
膜の各層からの反射X線が強め合い干渉を起こして全体
として強い反射X線が得られると同時に多層膜を透過し
た透過X線はさらにBeまたはAfiの薄膜をも透過し
、透過X線が得られ、軟X線を少なくとも2方向に分割
できる。したがって、より波長の短い軟X線の干渉作用
に必要なビームスプリッタは、干渉計のill定精度お
よび分解能の向上に大きな飛躍が期待できるという効果
がある。
[Effects of the Invention] As explained above, according to the present invention, the reflected X-rays from each layer of the multilayer film constructively interfere with each other to obtain strong reflected X-rays as a whole, and at the same time, the multilayer film The transmitted X-rays further pass through the Be or Afi thin film to obtain transmitted X-rays, and the soft X-rays can be split into at least two directions. Therefore, the beam splitter required for the interference effect of soft X-rays having a shorter wavelength has the effect that a great leap forward can be expected in improving the illumination precision and resolution of the interferometer.

【図面の簡単な説明】[Brief explanation of drawings]

第1図はこの発明の一実施例を示すビームスプリッタの
断面図、第2図は同じくビームスプリッタの側面図、第
3図は広帯域フィルタの特性図、第4図は狭帯域フィル
タの特性図である。 1・・・金属メツシュ、2・・・薄膜、3・・・第1の
物質、4・・・第2の物質、5・・・多層膜。
Fig. 1 is a sectional view of a beam splitter showing an embodiment of the present invention, Fig. 2 is a side view of the beam splitter, Fig. 3 is a characteristic diagram of a wideband filter, and Fig. 4 is a characteristic diagram of a narrowband filter. be. DESCRIPTION OF SYMBOLS 1... Metal mesh, 2... Thin film, 3... First substance, 4... Second substance, 5... Multilayer film.

Claims (1)

【特許請求の範囲】[Claims] 軟X線が透過できる間隔の金属メッシュ上に、厚さ10
00Å〜1μmのBeまたはAlの薄膜を形成し、この
薄膜上に互いに屈折率が異なる2種類の物質よりなる多
層膜を形成したことを特徴とする軟X線用ビームスプリ
ッタ。
10 mm thick on a metal mesh with intervals that allow soft X-rays to pass through.
A beam splitter for soft X-rays, characterized in that a thin film of Be or Al with a thickness of 00 Å to 1 μm is formed, and a multilayer film made of two types of substances having mutually different refractive indexes is formed on this thin film.
JP33477289A 1989-12-26 1989-12-26 Beam splitter for soft x-ray Pending JPH03196000A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP33477289A JPH03196000A (en) 1989-12-26 1989-12-26 Beam splitter for soft x-ray

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP33477289A JPH03196000A (en) 1989-12-26 1989-12-26 Beam splitter for soft x-ray

Publications (1)

Publication Number Publication Date
JPH03196000A true JPH03196000A (en) 1991-08-27

Family

ID=18281060

Family Applications (1)

Application Number Title Priority Date Filing Date
JP33477289A Pending JPH03196000A (en) 1989-12-26 1989-12-26 Beam splitter for soft x-ray

Country Status (1)

Country Link
JP (1) JPH03196000A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006111319A2 (en) * 2005-04-20 2006-10-26 Carl Zeiss Smt Ag Projection exposure system, method for manufacturing a micro-structured structural member by the aid of such a projection exposure system and polarization-optical element adapted for use in such a system
CN100337135C (en) * 2004-10-19 2007-09-12 同济大学 Soft x-ray transmission type multilayer film wide-band phase shift sheet and its preparing method
US7432517B2 (en) 2004-11-19 2008-10-07 Asml Netherlands B.V. Pulse modifier, lithographic apparatus, and device manufacturing method
CN101936776A (en) * 2010-07-28 2011-01-05 哈尔滨工业大学 Method and device for detecting broadband microwave/infrared signals by beam splitting

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100337135C (en) * 2004-10-19 2007-09-12 同济大学 Soft x-ray transmission type multilayer film wide-band phase shift sheet and its preparing method
US7432517B2 (en) 2004-11-19 2008-10-07 Asml Netherlands B.V. Pulse modifier, lithographic apparatus, and device manufacturing method
WO2006111319A2 (en) * 2005-04-20 2006-10-26 Carl Zeiss Smt Ag Projection exposure system, method for manufacturing a micro-structured structural member by the aid of such a projection exposure system and polarization-optical element adapted for use in such a system
WO2006111319A3 (en) * 2005-04-20 2007-05-10 Zeiss Carl Smt Ag Projection exposure system, method for manufacturing a micro-structured structural member by the aid of such a projection exposure system and polarization-optical element adapted for use in such a system
US7982854B2 (en) 2005-04-20 2011-07-19 Carl Zeiss Smt Gmbh Projection exposure system, method for manufacturing a micro-structured structural member by the aid of such a projection exposure system and polarization-optical element adapted for use in such a system
JP2012060178A (en) * 2005-04-20 2012-03-22 Carl Zeiss Smt Gmbh Projection exposure system, method for manufacturing configuration member of microstructure by assistance of the same, and polarization optical element adapted to be used in the same
US8854606B2 (en) 2005-04-20 2014-10-07 Carl Zeiss Smt Gmbh Projection exposure system, method for manufacturing a micro-structured structural member by the aid of such a projection exposure system and polarization-optical element adapted for use in such a system
CN101936776A (en) * 2010-07-28 2011-01-05 哈尔滨工业大学 Method and device for detecting broadband microwave/infrared signals by beam splitting

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