JPH0317212B2 - - Google Patents

Info

Publication number
JPH0317212B2
JPH0317212B2 JP60008694A JP869485A JPH0317212B2 JP H0317212 B2 JPH0317212 B2 JP H0317212B2 JP 60008694 A JP60008694 A JP 60008694A JP 869485 A JP869485 A JP 869485A JP H0317212 B2 JPH0317212 B2 JP H0317212B2
Authority
JP
Japan
Prior art keywords
gap
diffraction grating
light
detection signal
signal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60008694A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61168226A (ja
Inventor
Atsunobu Une
Makoto Inoshiro
Nobuyuki Takeuchi
Kimikichi Deguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP60008694A priority Critical patent/JPS61168226A/ja
Priority to US06/695,698 priority patent/US4656347A/en
Priority to EP85300622A priority patent/EP0151032B1/en
Priority to DE3587921T priority patent/DE3587921T2/de
Priority to CA000473187A priority patent/CA1226682A/en
Publication of JPS61168226A publication Critical patent/JPS61168226A/ja
Publication of JPH0317212B2 publication Critical patent/JPH0317212B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7065—Production of alignment light, e.g. light source, control of coherence, polarization, pulse length, wavelength
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Control Of Position Or Direction (AREA)
JP60008694A 1984-01-30 1985-01-21 回折格子による２物体の相対位置調整装置 Granted JPS61168226A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP60008694A JPS61168226A (ja) 1985-01-21 1985-01-21 回折格子による２物体の相対位置調整装置
US06/695,698 US4656347A (en) 1984-01-30 1985-01-28 Diffraction grating position adjuster using a grating and a reflector
EP85300622A EP0151032B1 (en) 1984-01-30 1985-01-30 Method of adjusting relative positions of two objects by using diffraction grating and control apparatus therefor
DE3587921T DE3587921T2 (de) 1984-01-30 1985-01-30 Verfahren für die gegenseitige Ausrichtung zweier Objekte mittels eines Beugungsgitters, sowie die Steuervorrichtung dafür.
CA000473187A CA1226682A (en) 1984-01-30 1985-01-30 Method of adjusting relative positions of two objects by using diffraction grating and control apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60008694A JPS61168226A (ja) 1985-01-21 1985-01-21 回折格子による２物体の相対位置調整装置

Publications (2)

Publication Number Publication Date
JPS61168226A JPS61168226A (ja) 1986-07-29
JPH0317212B2 true JPH0317212B2 (enrdf_load_stackoverflow) 1991-03-07

Family

ID=11700025

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60008694A Granted JPS61168226A (ja) 1984-01-30 1985-01-21 回折格子による２物体の相対位置調整装置

Country Status (1)

Country Link
JP (1) JPS61168226A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5967924B2 (ja) 2011-12-21 2016-08-10 キヤノン株式会社 位置検出装置、インプリント装置およびデバイス製造方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5698829A (en) * 1980-01-10 1981-08-08 Toshiba Corp Gap setting device
JPS59158521A (ja) * 1983-02-26 1984-09-08 Nippon Telegr & Teleph Corp <Ntt> ２重回折格子による位置合せ制御法
JPS59188920A (ja) * 1983-04-11 1984-10-26 Nippon Telegr & Teleph Corp <Ntt> ２重回折格子によるギヤツプ・位置合せ制御法

Also Published As

Publication number Publication date
JPS61168226A (ja) 1986-07-29

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