JPH0316008A - Thin film magnetic head - Google Patents

Thin film magnetic head

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Publication number
JPH0316008A
JPH0316008A JP14990189A JP14990189A JPH0316008A JP H0316008 A JPH0316008 A JP H0316008A JP 14990189 A JP14990189 A JP 14990189A JP 14990189 A JP14990189 A JP 14990189A JP H0316008 A JPH0316008 A JP H0316008A
Authority
JP
Japan
Prior art keywords
magnetic head
lead
thin film
film
edge
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14990189A
Other languages
Japanese (ja)
Other versions
JP2742298B2 (en
Inventor
Mikio Matsuzaki
幹男 松崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TDK Corp
Original Assignee
TDK Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TDK Corp filed Critical TDK Corp
Priority to JP1149901A priority Critical patent/JP2742298B2/en
Publication of JPH0316008A publication Critical patent/JPH0316008A/en
Application granted granted Critical
Publication of JP2742298B2 publication Critical patent/JP2742298B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Abstract

PURPOSE:To prevent a crack from being generated in a protective film being in the vicinity of a take-out electrode by protruding an end edge of a lead conductor by >=5mum from an end edge of the take-out electrode. CONSTITUTION:An end edge B of lead conductors 7, 8 is protruded by protrusion length l1, l2 to both its sides in the minor axis direction Y from an end edge A of overhang parts 91, 101 of take-out electrodes 9, 10, and protruded by protrusion length l3 to one side in the major axis direction X. The protrusion length l1, l2 and l3 is selected to >=5mum, and >=10mum desirably. When the protrusion length l1, l2 and l3 become smaller than 5mum, the influence exerted by a shadow action of the overhang parts 91, 101 starts to appear, and a crack comes to be generated easily. In such a way, since the end edge of the lead conductors 7, 8 is protruded by >=5mum from the end edge of the take-out electrodes 9, 10, the thin film magnetic head being free from a crack in a protective film 11 being in the periphery of the take-out electrodes 9, 10 is obtained.

Description

【発明の詳細な説明】 く産業上の利用分野〉 本発明は、薄膜磁気ヘッドに関し、導体コイル膜に導通
させたリード導体の@縁を、外部導体接続用の取出電極
の端縁よりも、5μm以上突出させることにより、取出
電極のまわりで保護膜にクラックが発生するのを防止で
きるようにしたものである。
[Detailed Description of the Invention] Industrial Application Fields The present invention relates to a thin-film magnetic head, and relates to a thin-film magnetic head in which the edge of a lead conductor electrically connected to a conductor coil film is connected to By protruding by 5 μm or more, it is possible to prevent cracks from occurring in the protective film around the extraction electrode.

く従来の技術〉 第5図は特開昭55−84020号公報等によりよく知
られている薄膜磁気ヘッドの要部の斜視図、第6図は同
じく要部の拡大断面図である。図において、1はA12
0s・TiC等のセラミックで構戒された基体、2は下
部磁性膜、3はアルくナ等でなるギャップ膜、4は上部
磁性膜、5は導体コイル膜、6はノボラック樹脂等の有
機樹脂で構成された絶縁膜、7、8はリード導体、9、
10は取出電極、11は全体を覆うアルミナ等の保護膜
である 下部磁性膜2及び上部磁性膜4の先端部は、微小厚みの
ギャップ膜3を隔てて対向するボール部21、41とな
っており、ボール部21、41において読み書きを行な
う。22、42はヨーク部であり、ボール部21、41
とは反対側の端部で結合させてある。
5. Prior Art> FIG. 5 is a perspective view of a main part of a thin film magnetic head well known from Japanese Patent Laid-Open No. 55-84020, etc., and FIG. 6 is an enlarged sectional view of the same main part. In the figure, 1 is A12
A substrate made of ceramic such as 0s/TiC, 2 a lower magnetic film, 3 a gap film made of alumina, 4 an upper magnetic film, 5 a conductive coil film, and 6 an organic resin such as novolac resin. an insulating film composed of; 7 and 8 are lead conductors; 9;
10 is an extraction electrode, 11 is a protective film such as alumina that covers the whole, and the tips of the lower magnetic film 2 and the upper magnetic film 4 form ball parts 21 and 41 facing each other with a gap film 3 of minute thickness in between. Reading and writing are performed in the ball parts 21 and 41. 22 and 42 are yoke parts, and ball parts 21 and 41
They are joined at the opposite end.

絶縁膜6は複数層の絶縁膜6t〜63から構成されてい
て、絶縁fl!at、62の上に、ヨーク部22、42
の結合部のまわりを渦巻状にまわるように、導体コイル
膜5を形成してある。導体コイル膜5は、通常、下地膜
とCulliとの2層構造となっている。
The insulating film 6 is composed of a plurality of layers of insulating films 6t to 63, and has an insulation fl! yoke portions 22, 42 on top of at, 62.
A conductive coil film 5 is formed so as to spiral around the joint portion. The conductor coil film 5 usually has a two-layer structure of a base film and a Culli film.

リード導体7、8も、導体コイル膜5と同様の2層構造
となっていて、導体コイルWA5の両端にそれぞれ導通
接続させてある。
The lead conductors 7 and 8 also have a two-layer structure similar to the conductor coil film 5, and are electrically connected to both ends of the conductor coil WA5.

取出電極9、10は、後でリード線等の外部導体が接続
される部分である。この取出電極9、10は、リード導
体7、8の表面に形成されたメッキ下地震上にCuメッ
キ膜として形戒される。
The extraction electrodes 9 and 10 are parts to which external conductors such as lead wires will be connected later. The lead electrodes 9 and 10 are formed as Cu plating films on the plating layers formed on the surfaces of the lead conductors 7 and 8.

第7図は取出電極9、10の拡大断面図である。図示す
るように、取出電極9、lOは、オーバハング部91、
101を有していて、オーバハング部91、101とリ
ード導体7、8の表面との間に空洞部92、102を有
する傘状となっている。オーパハング部92、102の
端縁Aは、リード導体7、8の端縁Bとほぼ同一位置か
それよりも内側に位置している.12、13は取出電極
9、10の表面に設けられた金を主戒分とする金BWA
である. く発明が解決しようとする課題〉 ところが従来の薄膜磁気ヘッドは、特開昭59−165
219号、特開昭59−165221号公報等で知られ
るように、第7図に示すような、取出電極9、10の付
近における保謹膜11のクラック14が発生する。上述
のようなクラック14があると、クラック14内に塵埃
が入り込んだり、取出電極9、10が剥離し易くなる等
の問題点を生Qる。
FIG. 7 is an enlarged sectional view of the extraction electrodes 9 and 10. As shown in the figure, the extraction electrode 9, IO has an overhang portion 91,
101, and has an umbrella shape with hollow portions 92, 102 between overhang portions 91, 101 and the surfaces of lead conductors 7, 8. The edge A of the overhang portions 92, 102 is located at approximately the same position as the edge B of the lead conductors 7, 8, or on the inside thereof. 12 and 13 are gold BWAs whose main ingredient is gold provided on the surfaces of the extraction electrodes 9 and 10.
It is. Problems to be Solved by the Invention> However, the conventional thin film magnetic head
As is known from Japanese Patent Laid-open No. 219 and JP-A-59-165221, cracks 14 occur in the protection film 11 near the extraction electrodes 9 and 10 as shown in FIG. If there is a crack 14 as described above, problems such as dust entering the crack 14 and easy peeling of the lead electrodes 9 and 10 occur.

クラック14は、主として、リード導体7、8に対する
取出電極9、10の形状と、取出電極9、10の形戊工
程に起因して発生する。第8図は従来の電極形成工程を
示している。まず、第8図(a) に示すように、ウエ
ハーである基板i上に、取出電極パターンP,を残して
リード導体7、8を覆うように、レジストマスク15を
フォトリソグラフィによって形戒する。レジストマスク
15の厚みdlは、フォトリソグラフイ高精度バターニ
ング化の可能な5〜10μmである二図示はされていな
いが、レジストマスク15は、第5図及び第6図に示し
た薄膜磁気ヘッド素子をも覆うように付着させる。
The cracks 14 occur mainly due to the shape of the lead electrodes 9, 10 relative to the lead conductors 7, 8, and the shaping process of the lead electrodes 9, 10. FIG. 8 shows a conventional electrode forming process. First, as shown in FIG. 8(a), a resist mask 15 is formed by photolithography on a substrate i, which is a wafer, so as to cover the lead conductors 7 and 8 while leaving the extraction electrode pattern P. The thickness dl of the resist mask 15 is 5 to 10 μm, which enables high-precision patterning using photolithography.Although not shown, the resist mask 15 is suitable for use with the thin film magnetic head shown in FIGS. 5 and 6. It is attached so as to cover the element as well.

次に、メッキ処理を行なうことにより、第8図(b) 
に示すように、レジストマスク15によって画定された
パターンpt内に、取出電極となるCuメッキ膜9、1
0を戒長させる。Cuメツキ@Q    1Q tr1
rWik r4  AL士  岳認的に 3 0 〜 
4 0μmの厚みを有する取出電極が得られるような厚
みまで、戒長させる。
Next, by performing plating treatment, as shown in Fig. 8(b)
As shown in FIG.
Promote 0. Cu Metsuki @Q 1Q tr1
rWik r4 AL person Gakukenni 3 0 ~
It is made to have a thickness such that a lead-out electrode having a thickness of 40 μm can be obtained.

ここで、レジストマスク15の厚みd,が5〜10μm
であるのに対し、Cuメッキ膜9、10の厚みd2が少
なくとも30〜40μm以上であることから、Cuメッ
キIIi9、10はレジストマスク15を越えて成長さ
せる必要がある.Cuメッキ膜9、10は等方的に成長
するから、レジストマスク15の厚みdl−5〜10μ
mからリード導体7、8の厚み(数μm)を差し引いた
厚みを越えた後は、レジストマスク15の表面に沿って
も成長し、オーバハング郎91、101が発生する(第
8図(b)参照).Cuメッキlli9、10は、オー
バハング部91、101の端縁Aがリード導体7、8の
端縁Bとほぼ同一位置か、またはそれよりも外側の位置
まで戒長する。
Here, the thickness d of the resist mask 15 is 5 to 10 μm.
On the other hand, since the thickness d2 of the Cu plating films 9 and 10 is at least 30 to 40 μm, the Cu plating IIi 9 and 10 must be grown beyond the resist mask 15. Since the Cu plating films 9 and 10 grow isotropically, the thickness of the resist mask 15 is dl-5 to 10μ.
After exceeding the thickness obtained by subtracting the thickness (several μm) of the lead conductors 7 and 8 from m, it also grows along the surface of the resist mask 15, and overhangs 91 and 101 occur (FIG. 8(b)) reference). The Cu plating lli 9, 10 extends so that the edge A of the overhang portion 91, 101 is approximately at the same position as the edge B of the lead conductor 7, 8, or to a position outside of it.

このため、レジストマスク15を除去した場合、第8図
(C)に示す如く、オーバハング部91、101の下に
レジストマスク15の厚みd1からリード導体7、8の
厚みを差し引いた厚みdaに相当する空洞部92、10
2があって、しかも、オーバハング部91,101の噛
縁Aがリード導体7、8の端AiBとほぼ同一位置かそ
れよりも外側に突出する取出電極9、10が得られる。
Therefore, when the resist mask 15 is removed, as shown in FIG. 8(C), the thickness below the overhang parts 91 and 101 corresponds to the thickness da obtained by subtracting the thickness of the lead conductors 7 and 8 from the thickness d1 of the resist mask 15. Cavity parts 92, 10
2, and in addition, the lead-out electrodes 9, 10 are obtained in which the meshing edges A of the overhang parts 91, 101 are approximately at the same position as the ends AiB of the lead conductors 7, 8, or protrude outward from them.

上述の取出電極9、10に対して、第8図(d)に示す
如く、保護膜11をスパッタリングした場合、取出電極
9、10のオーバハング部91、101、更にその上に
スパッタリングされた保謹1iiが、その下のリード導
体7、8に対するシャドウとなる. しかも、取出電極9、10は、オーバハング部91、1
01の端a A b< IJ − F導体7、8の端縁
Bとほぼ同一位置か、またはそれよりも外側に出るよう
に形成されているから、リード導体7、8に対するシャ
ドウ作用が極めて高くなる.このため、リード導体7、
8と取出電極9、10との間のステップカバリングが悪
くなり、クラック14を発生する。
When a protective film 11 is sputtered on the above-mentioned extraction electrodes 9 and 10 as shown in FIG. 1ii serves as a shadow for the lead conductors 7 and 8 below. Moreover, the extraction electrodes 9 and 10 have overhang portions 91 and 1
01 end a A b < IJ - F Since it is formed at almost the same position as the end edge B of the conductors 7 and 8, or so as to extend outward from it, the shadow effect on the lead conductors 7 and 8 is extremely high. Become. For this reason, the lead conductor 7,
Step covering between 8 and the extraction electrodes 9 and 10 deteriorates, and cracks 14 occur.

そこで、本発明のi!!1題は、上述する従来の問題点
を解決し、取出電極の付近の保護膜にクラックが発生す
るのを防止し得るようにした薄lII磁気ヘッドを提供
することである。
Therefore, the i! ! One problem is to provide a thin II magnetic head that solves the above-mentioned conventional problems and can prevent cracks from occurring in the protective film near the extraction electrode.

く課題を解決するための手段〉 上述する課題解決のため、本発明に係る薄11!磁気ヘ
ツは、磁性膜及び導体コイル膜による磁気回路を有する
薄膜磁気ヘッド素子と、前記導体コイル膜に導通させた
リード導体と、前記リード導体上に形成された取出電極
と、前記取出電極の外部導体接続面を残して全体を覆う
保護膜と、全体を支持する基板とを有する薄膜磁気ヘッ
ドであって、 前記リード導体の端縁が前記取出電極の端縁よりも、5
μm以上突出していること を特徴とする。
Means for Solving the Problems> In order to solve the above problems, thin 11! The magnetic head includes a thin film magnetic head element having a magnetic circuit including a magnetic film and a conductor coil film, a lead conductor electrically connected to the conductor coil film, an extraction electrode formed on the lead conductor, and an external part of the extraction electrode. A thin film magnetic head having a protective film that covers the entire surface except for a conductor connection surface, and a substrate that supports the entire surface, wherein the edge of the lead conductor is 5.5 mm larger than the edge of the extraction electrode.
It is characterized by a protrusion of more than μm.

く作用〉 リード導体の端縁が、取出電極の端縁よりも、5μm以
上突出していると、リード導体の5μm以上突出してい
る端縁部は、保護膜スパッタリングの際、取出電極によ
るシャドウ作用を受けることかない。このため、ステッ
プカバリングが良くなり、保護膜にクラックが発生しな
くなる。本発明は、面内記録再生用薄膜磁気ヘッドに限
らず、垂直記録再生用薄膜磁気ヘッドにも適用が可能で
ある. く実施例〉 第1図は本発明に係る薄lli磁気ヘッドの要部におけ
る斜視図、第2図は第1図において取出電極9、10の
長径方向X上で切断した拡大断面図、第3図は第1図に
おいて短径方向Y上で切断した拡大断面図である。図に
おいて、第5図〜第7図と同一の参照符号は同一性ある
構成部分を示している。図示は省略したが、薄膜磁気ヘ
ッド素子は第6図に示す構造となっている. リード導体7、8の端縁Bは、取出電極9、10のオー
バハング部91、101の端縁Aよりも、短径方向Yで
その両側に突出長さj21 、J22だけ突出させ、長
径方向Xで片側に突出長さ℃3だけ突出させる.突出長
さfll,ft2、113は、5μm以上、望ましくは
10μm以上に選定する。突出長さJll、J22、j
23が5μmより小さくなると、オーバハング郎91、
101のシャドウ作用による影響が現われ始め、クラッ
クが発生し易くなる。
Effect> If the edge of the lead conductor protrudes by 5 μm or more from the edge of the extraction electrode, the edge of the lead conductor that protrudes by 5 μm or more will be affected by the shadow effect of the extraction electrode during protective film sputtering. I'll never accept it. Therefore, step covering is improved and cracks do not occur in the protective film. The present invention is applicable not only to thin-film magnetic heads for longitudinal recording and reproduction, but also to thin-film magnetic heads for perpendicular recording and reproduction. Embodiment> FIG. 1 is a perspective view of a main part of a thin llI magnetic head according to the present invention, FIG. 2 is an enlarged cross-sectional view taken along the long axis direction The figure is an enlarged sectional view taken along the minor axis direction Y in FIG. 1. In the figures, the same reference numerals as in FIGS. 5 to 7 indicate the same components. Although not shown, the thin film magnetic head element has the structure shown in FIG. The end edges B of the lead conductors 7 and 8 are made to protrude from the end edges A of the overhang parts 91 and 101 of the extraction electrodes 9 and 10 by protruding lengths j21 and J22 on both sides in the short axis direction Y, and are extended in the long axis direction X. Make it protrude by a protrusion length of ℃3 on one side. The protrusion lengths fll, ft2, 113 are selected to be 5 μm or more, preferably 10 μm or more. Projection length Jll, J22, j
23 is smaller than 5 μm, overhang 91,
The influence of the shadow effect of 101 begins to appear, and cracks are more likely to occur.

リード導体7、8の端縁Bが、取出電極9、10の端縁
Aよりも、5μm以上突出していると、リード導体7、
8の5μm以上突出している端縁部は、保護膜11をス
パッタリングする際、取出電極9、10のオーバハング
部91、101によるシャドウ作用を受けることがない
。このため、リード導体7、8と取出電極9、10との
間のステップカバリングが良くなり、第4図(a)に示
すように、保謹膜11にクラックが発生しなくなる.従
って、第4図(b)に示すように、保iia膜11の表
面を研磨して、取出電極9、10を面出しすることによ
り、クラックのない薄膜磁気ヘッドを得ることができる
If the edge B of the lead conductors 7 and 8 protrudes from the edge A of the extraction electrodes 9 and 10 by 5 μm or more, the lead conductor 7,
The edge portions of the electrodes 8 that protrude by 5 μm or more are not affected by the shadow effect caused by the overhang portions 91 and 101 of the extraction electrodes 9 and 10 when the protective film 11 is sputtered. Therefore, the step covering between the lead conductors 7, 8 and the extraction electrodes 9, 10 is improved, and as shown in FIG. 4(a), cracks do not occur in the protection film 11. Therefore, as shown in FIG. 4(b), by polishing the surface of the IIA film 11 and exposing the extraction electrodes 9 and 10, a crack-free thin film magnetic head can be obtained.

オーバハング郎91、101とリード導体7、8の表面
との間に形成される空洞部92、102の垂直方向の間
隔d,を、取出電極9、10の高さd2の1/1 0以
下にすると、上述のステップカバリング性が一層向上す
る。
The vertical distance d of the cavities 92, 102 formed between the overhangs 91, 101 and the surfaces of the lead conductors 7, 8 is set to 1/10 or less of the height d2 of the extraction electrodes 9, 10. This further improves the step coverage described above.

く発明の効果〉 以上述べたように、本発明は、薄膜磁気ヘッド素子と、
前記薄膜磁気ヘッド素子の導体コイル膜に導通ずるリー
ド導体と、リード導体上に形成された取出電極と、取出
電極の外部導体接続面を残して全体を覆う保護膜と、全
体を支持する基板とを有する薄膜磁気ヘッドであって、
リード導体の瑞縁が取出電極の端縁よりも、5μ鳳以上
突出しているので、取出電極の周りの保護膜にクラック
のない薄膜磁気ヘッドを撞供できる。
Effects of the Invention> As described above, the present invention provides a thin film magnetic head element,
A lead conductor electrically connected to the conductor coil film of the thin-film magnetic head element, an extraction electrode formed on the lead conductor, a protective film covering the entire extraction electrode except for an external conductor connection surface, and a substrate supporting the whole. A thin film magnetic head having:
Since the leading edge of the lead conductor protrudes beyond the edge of the lead-out electrode by 5 μm or more, a thin-film magnetic head without cracks in the protective film around the lead-out electrode can be provided.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明に係る薄膜磁気ヘッドの要部の斜視図、
第2図は第1図において取出電極の長径方向X上で切断
した拡大断面図、第3図は第1図において取出電極の短
径方向Y上で切断した拡大断面図、第4図(a).(b
)は保護膜スパッタリングを示す断面図、第5図は従来
の薄膜磁気ヘッドの要部における斜視図、第6図は同じ
く要部の断面図、第7図は同じく取出電極部分における
拡大断面図、第8図(a)〜(d)は従来の取出電極形
成方法を示す図である. 1・・・基板    2、4・・・・磁性膜5・・・導
体コイル膜 6、61〜63・・・絶Mlli 7、8・ ・ ・リード導体 9、IO・・・取出電極 11・・・保護膜 −二J
FIG. 1 is a perspective view of the main parts of a thin film magnetic head according to the present invention;
Figure 2 is an enlarged sectional view taken along the major axis direction X of the extraction electrode in Figure 1, Figure 3 is an enlarged sectional view taken along the minor axis direction Y of the extraction electrode in Figure 1, and Figure 4 (a ). (b
) is a sectional view showing protective film sputtering, FIG. 5 is a perspective view of the main part of a conventional thin film magnetic head, FIG. 6 is a sectional view of the main part, and FIG. 7 is an enlarged sectional view of the extraction electrode part. FIGS. 8(a) to 8(d) are diagrams showing a conventional method for forming an extraction electrode. 1... Substrate 2, 4... Magnetic film 5... Conductor coil film 6, 61-63... Absolute Mlli 7, 8... Lead conductor 9, IO... Extracting electrode 11...・Protective film-2J

Claims (3)

【特許請求の範囲】[Claims] (1)磁性膜及び導体コイル膜による磁気回路を有する
薄膜磁気ヘッド素子と、前記導体コイル膜に導通するリ
ード導体と、前記リード導体上に形成された取出電極と
、前記取出電極の外部導体接続面を残して全体を覆う保
護膜と、全体を支持する基板とを有する薄膜磁気ヘッド
であって、前記リード導体の端縁が前記取出電極の端縁
よりも、5μm以上突出していること を特徴とする薄膜磁気ヘッド。
(1) A thin film magnetic head element having a magnetic circuit including a magnetic film and a conductor coil film, a lead conductor electrically connected to the conductor coil film, an extraction electrode formed on the lead conductor, and an external conductor connection of the extraction electrode. A thin film magnetic head having a protective film covering the entire surface except for a surface, and a substrate supporting the whole, characterized in that the edge of the lead conductor protrudes from the edge of the extraction electrode by 5 μm or more. Thin film magnetic head.
(2)前記取出電極は、前記リード導体の表面との間に
空洞部を生じさせるオーバハング部を有しており、 前記リード導体の端縁は、前記オーバハング部の端縁よ
りも5μm以上突出していることを特徴とする特許請求
の範囲第1項に記載の薄膜磁気ヘッド。
(2) The extraction electrode has an overhang portion that creates a cavity between it and the surface of the lead conductor, and the edge of the lead conductor protrudes from the edge of the overhang portion by 5 μm or more. 2. A thin film magnetic head according to claim 1, characterized in that:
(3)前記空洞部は、前記オーバハング部と前記リード
導体の表面との間の間隔が前記取出電極の高さの1/1
0以下であることを特徴とする特許請求の範囲第2項に
記載の薄膜磁気ヘッド。
(3) In the hollow portion, the distance between the overhang portion and the surface of the lead conductor is 1/1 of the height of the extraction electrode.
3. The thin film magnetic head according to claim 2, wherein the magnetic field is 0 or less.
JP1149901A 1989-06-12 1989-06-12 Thin film magnetic head Expired - Lifetime JP2742298B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1149901A JP2742298B2 (en) 1989-06-12 1989-06-12 Thin film magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1149901A JP2742298B2 (en) 1989-06-12 1989-06-12 Thin film magnetic head

Publications (2)

Publication Number Publication Date
JPH0316008A true JPH0316008A (en) 1991-01-24
JP2742298B2 JP2742298B2 (en) 1998-04-22

Family

ID=15485081

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1149901A Expired - Lifetime JP2742298B2 (en) 1989-06-12 1989-06-12 Thin film magnetic head

Country Status (1)

Country Link
JP (1) JP2742298B2 (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63217513A (en) * 1987-03-05 1988-09-09 Sony Corp Formation of terminal electrode of thin film magnetic head

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63217513A (en) * 1987-03-05 1988-09-09 Sony Corp Formation of terminal electrode of thin film magnetic head

Also Published As

Publication number Publication date
JP2742298B2 (en) 1998-04-22

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