JPH03126218A - Enlarging exposure apparatus - Google Patents

Abstract

PURPOSE:To transfer an exposure pattern onto a large area board by one exposure by providing a photomask, an enlarging optical system optically connected to the photomask, a nonplanar board securing base and a position aligning mechanism. CONSTITUTION:The position of an alignment mark 5 formed on a board 6 is aligned by aligning it by using a laser light to be emitted from a position aligning mechanism 4. The board 6 is so secured as to have the same nonplanar shape as that of a board securing base 3. The base 3 is formed in a curved surface in a direction (x). The curved surface is desirably part of a circle. It is linear in a direction (y). That is, the base 3 is formed in shape in which part of the cylindrical shape is cut. when an exposure pattern on a photomask 2 is transferred on the board 6 on the base 3, it can prevent the focus of the pattern from being unfocused in the entire board by using the cylindrical shape.

Description

DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] This invention relates to an exposure apparatus for transferring an exposure pattern onto a large-area substrate.

[Prior Art] Conventionally, an exposure apparatus has been known that transfers an exposure pattern drawn on a photomask onto a substrate at a magnification of 1:1.

[Problem to be solved by the invention J However, since the conventional technology has a 1x magnification ratio, K, which transfers the exposure pattern onto a large-area substrate, divides the substrate into multiple areas and exposes each area separately. method was used. This method requires multiple exposures for one substrate, resulting in poor throughput (and requires sophisticated technology to achieve continuity between each area, resulting in expensive equipment) There was a problem with this.

Therefore, the present invention solves these problems,
The objective is to provide an inexpensive enlargement exposure apparatus that can transfer an exposure pattern onto a large-area substrate in one exposure.

[Means for Solving the Problems] The magnification opening device of the present invention includes a photomask, a magnification optical system optically connected to the photomask, a non-planar substrate fixing table, and an alignment mechanism system. [Embodiment] An embodiment of the present invention will be described based on the drawings. FIG. 1 shows an enlarged exposure apparatus according to the present invention. A photomask 2 with an exposure pattern drawn on a glass substrate is held between a light source system 1α having a light source ( ) and an enlargement system 1b equipped with an enlargement mechanism.
Together, they form a magnifying optical system. A positioning mechanism system 4 comprising a laser light source mechanically coupled to the magnifying optical system is held. The light emitted from the light source thread 1α passes through the photomask 2, is enlarged by the enlarging system 1b, and is irradiated onto the non-planar substrate fixing table 3.

FIG. 2 shows the substrate fixing table 5 of the enlargement exposure apparatus shown in FIG.
A state in which a substrate 5 on which a photosensitive resist is applied is held is shown. Description of common parts between FIG. 1 and FIG. 2 will be omitted. Alignment is performed by aligning the positions of the alignment marks 5 formed on the substrate 6 using laser light emitted from the alignment mechanism system 4. Position adjustment of the substrate can be performed by moving the substrate fixing table 6 that holds the substrate 5. Also, the board 6
is fixed so as to have the same non-planar shape as the substrate fixing table 6. This fixing method can be performed, for example, by a vacuum chuck method in which a groove is provided on the surface of the substrate fixing table 3 and the groove is evacuated.

Cross-sectional views of the substrate fixing table shown in FIG. 12 in the x and y directions (shown in FIGS. 1 and 2) are shown in FIGS. 3α and 3b, respectively. As shown in FIG. 6 (α), it is a curved surface in the X direction. Preferably, this curved surface is part of a circle. Figure 3Cb)
As shown, the y direction is a straight line. That is,
The substrate fixing stand 3 shown in FIGS. 1(α) and Cb) has a shape in which a part of a cylindrical shape is cut out. By using the cylindrical shape, when the exposure pattern on the photomask 2 is transferred onto the substrate 6 on the substrate fixing table 3, it is possible to prevent the exposure pattern from being out of focus over the entire surface of the substrate. If a cylindrical (or flat) substrate fixing table 3 is used, the center and periphery of the substrate 6 will have a large distance from the magnification system 1b (different distances), resulting in a shift in focus, resulting in blurring of the focus. If the focus is blurred, the size of the exposed pattern on the substrate 6 will shift, making it impossible to transfer a uniform exposure pattern onto the substrate 6. By using the cylindrical substrate fixing table 3, For the first time, a uniform exposure pattern can be transferred onto the substrate 3. Furthermore, it is desirable that the enlarging system 1b be provided at the center of the circle formed by the cylinder.

Further, FIGS. 4(α) and (b) CC') show other configuration examples of the substrate fixing table 3 used in the enlarged exposure apparatus according to the present invention. FIG. 4 <cL> is a view of the substrate fixing table 3 viewed from the same direction as FIGS. 1 and 2, and FIGS. 4(b) and 4(C) show the X shown in FIG.

FIG. 3 is a cross-sectional view in the y direction. Although it is a straight line in the X direction, it is a curved surface in the Y direction. Preferably, this curved surface is part of a circle. That is, Fig. 4(α)#
The substrate fixing stand 3 shown in (b)t(C) has a cylindrical shape with a part cut out. When the substrate fixing table 6 shown in FIGS. 1 and 2 is rotated by 90 degrees, it becomes the substrate fixing table shown in FIG. 4.

Further, FIG. 5(α)j(b)jCt shows another example of the structure of the substrate fixing table 3 used in the enlargement exposure apparatus according to the present invention. FIG. 5(α) is a diagram of the substrate fixing table 3 viewed from the same direction as FIGS. 1 and 2, and FIG. 5(5) and (C) are x and y shown in FIG. FIG. X
It is a co-curved surface in the y direction. Preferably, these curved surfaces are part of a circle. That is, Fig. 5 (α), (
b) It is desirable that the substrate fixing table 3 shown in (C) has a curved surface that is part of a sphere. It is desirable that the center of the sphere be located in the enlarged system 1b.

Similarly to the substrate fixing table 3 shown in FIG. 12, the substrate fixing table 3 shown in FIGS. can be fixed to. Similarly, the exposure pattern on the photomask 2 can be transferred onto the substrate 6 without being out of focus.

The curved surface of the board fixing base 3 shown in Figures 1, 2. Any curved surface may be used as long as it can prevent the blurring of the focus.Also, the center of the cylinder or sphere does not necessarily have to be in the magnifying system 1b (but can be placed in another position, such as the photomask 2). It may also be located in the light source system 1α.

・・・・・・Photomask・・・・・・Board fixing base・・・・・・Positioning mechanism system・・・・・・Alignment mark・・・・・・...
...Substrate [Effects of the Invention] The enlargement exposure apparatus of the present invention is an inexpensive apparatus that can transfer an exposure pattern once onto a large-area substrate.

[Brief explanation of the drawing]

FIG. 1 shows an enlarged exposure apparatus according to the present invention. FIG. 2 shows a substrate fixed to an enlarged exposure apparatus according to the invention.
Figure (α) l (h) is a cross-sectional view of the board fixing table in the x and y directions,
Figure 4 (α), (b). (C) is a diagram showing the configuration of another board fixing stand, Figure 5 (α)
Cb)mcc) is a diagram showing the configuration of another substrate fixing stand. 1α...Light source system 1b...Enlargement system

Claims (1)

[Claims] A magnification exposure apparatus comprising a photomask, a magnification optical system optically connected to the photomask, a non-planar substrate fixing table, and an alignment mechanism system.