JPH03122531U - - Google Patents
Info
- Publication number
- JPH03122531U JPH03122531U JP3049790U JP3049790U JPH03122531U JP H03122531 U JPH03122531 U JP H03122531U JP 3049790 U JP3049790 U JP 3049790U JP 3049790 U JP3049790 U JP 3049790U JP H03122531 U JPH03122531 U JP H03122531U
- Authority
- JP
- Japan
- Prior art keywords
- quartz
- silicon wafer
- heat treatment
- high temperature
- quartz boat
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010453 quartz Substances 0.000 claims description 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 10
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 5
- 229910052710 silicon Inorganic materials 0.000 claims description 5
- 239000010703 silicon Substances 0.000 claims description 5
- 238000010438 heat treatment Methods 0.000 claims 2
- 230000017525 heat dissipation Effects 0.000 claims 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
Landscapes
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Description
第１図は従来の石英ボートの構造を示す側面略
図、第２図Ａ，Ｂは本考案による石英ボートの構
造の１例を示す平面図及び側面図、第３図は本考
案に用いられる石英丸棒の変形例を示す側面図で
ある。
１…石英ボート、２…シリコンウエーハを立て
る溝、３…シリコンウエーハ、４…シリコンウエ
ーハを支える石英丸棒あるいはパイプ、５…石英
丸棒の加工溝。
Fig. 1 is a schematic side view showing the structure of a conventional quartz boat, Fig. 2 A and B are a plan view and side view showing an example of the structure of a quartz boat according to the present invention, and Fig. 3 is a quartz boat used in the present invention. It is a side view which shows the modification of a round bar. 1...Quartz boat, 2...Groove for standing the silicon wafer, 3...Silicon wafer, 4...Quartz round bar or pipe that supports the silicon wafer, 5...Processing groove for the quartz round bar.
Claims (1)
で熱処理するために、少なくとも２本の石英棒が
前記シリコンウエーハの直径より小なる間隔をお
いて互いに平行で水平に配置された高温度熱処理
用石英ボート。 (2) 熱の放散特性を改善するために前記石英棒
の下側に溝が形成されていることを特徴とする請
求項(1)に記載の高温度熱処理用石英ボート。[Claims for Utility Model Registration] (1) In order to place a silicon wafer horizontally and heat treat it at a high temperature, at least two quartz rods are arranged parallel to each other with an interval smaller than the diameter of the silicon wafer. Quartz boat for high temperature heat treatment placed horizontally. (2) The quartz boat for high-temperature heat treatment according to claim 1, wherein a groove is formed on the lower side of the quartz rod to improve heat dissipation characteristics.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3049790U JPH03122531U (en) | 1990-03-27 | 1990-03-27 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3049790U JPH03122531U (en) | 1990-03-27 | 1990-03-27 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH03122531U true JPH03122531U (en) | 1991-12-13 |
Family
ID=31533208
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3049790U Pending JPH03122531U (en) | 1990-03-27 | 1990-03-27 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03122531U (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62252932A (en) * | 1986-04-25 | 1987-11-04 | Matsushita Electric Ind Co Ltd | Heat-treating apparatus for semiconductor wafer |
-
1990
- 1990-03-27 JP JP3049790U patent/JPH03122531U/ja active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62252932A (en) * | 1986-04-25 | 1987-11-04 | Matsushita Electric Ind Co Ltd | Heat-treating apparatus for semiconductor wafer |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPH03122531U (en) | ||
| JPS633137U (en) | ||
| JPS62120340U (en) | ||
| JPH0468520U (en) | ||
| JPS63185223U (en) | ||
| JPS60133631U (en) | Infrared heat treatment equipment | |
| JPS63127121U (en) | ||
| JPS635641U (en) | ||
| JPH01120339U (en) | ||
| JPS63101060U (en) | ||
| JPS62190337U (en) | ||
| JPH0373430U (en) | ||
| JPS63114024U (en) | ||
| JPS6422026U (en) | ||
| JPS62177031U (en) | ||
| JPS63162871U (en) | ||
| JPS63167726U (en) | ||
| JPS6333624U (en) | ||
| JPS60181025U (en) | Boat for heat treatment of semiconductor device substrates | |
| JPH01108926U (en) | ||
| JPH03124633U (en) | ||
| RU96112327A (en) | METHOD FOR MANUFACTURING A KEEPER | |
| JPH03110832U (en) | ||
| JPS6188233U (en) | ||
| JPS6315042U (en) |