JPH03106737U - - Google Patents

Info

Publication number
JPH03106737U
JPH03106737U JP1653090U JP1653090U JPH03106737U JP H03106737 U JPH03106737 U JP H03106737U JP 1653090 U JP1653090 U JP 1653090U JP 1653090 U JP1653090 U JP 1653090U JP H03106737 U JPH03106737 U JP H03106737U
Authority
JP
Japan
Prior art keywords
cleaning
aqueous solution
wafer
hno
cleaned
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1653090U
Other languages
English (en)
Japanese (ja)
Other versions
JP2548357Y2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1990016530U priority Critical patent/JP2548357Y2/ja
Publication of JPH03106737U publication Critical patent/JPH03106737U/ja
Application granted granted Critical
Publication of JP2548357Y2 publication Critical patent/JP2548357Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

JP1990016530U 1990-02-20 1990-02-20 ウエーハの熱処理用載置治具 Expired - Lifetime JP2548357Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1990016530U JP2548357Y2 (ja) 1990-02-20 1990-02-20 ウエーハの熱処理用載置治具

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1990016530U JP2548357Y2 (ja) 1990-02-20 1990-02-20 ウエーハの熱処理用載置治具

Publications (2)

Publication Number Publication Date
JPH03106737U true JPH03106737U (enrdf_load_stackoverflow) 1991-11-05
JP2548357Y2 JP2548357Y2 (ja) 1997-09-17

Family

ID=31519792

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1990016530U Expired - Lifetime JP2548357Y2 (ja) 1990-02-20 1990-02-20 ウエーハの熱処理用載置治具

Country Status (1)

Country Link
JP (1) JP2548357Y2 (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015199619A (ja) * 2014-04-07 2015-11-12 株式会社トクヤマ 多結晶シリコンの洗浄方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59162200A (ja) * 1983-03-03 1984-09-13 Agency Of Ind Science & Technol シリコン基板表面の清浄化法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59162200A (ja) * 1983-03-03 1984-09-13 Agency Of Ind Science & Technol シリコン基板表面の清浄化法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015199619A (ja) * 2014-04-07 2015-11-12 株式会社トクヤマ 多結晶シリコンの洗浄方法

Also Published As

Publication number Publication date
JP2548357Y2 (ja) 1997-09-17

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