JPH0299841A - Eccentricity measuring apparatus for lens system - Google Patents
Eccentricity measuring apparatus for lens systemInfo
- Publication number
- JPH0299841A JPH0299841A JP63253231A JP25323188A JPH0299841A JP H0299841 A JPH0299841 A JP H0299841A JP 63253231 A JP63253231 A JP 63253231A JP 25323188 A JP25323188 A JP 25323188A JP H0299841 A JPH0299841 A JP H0299841A
- Authority
- JP
- Japan
- Prior art keywords
- lens
- image
- measured
- measurement
- lens system
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000003287 optical effect Effects 0.000 claims abstract description 15
- 238000005259 measurement Methods 0.000 abstract description 26
- 238000003384 imaging method Methods 0.000 abstract description 8
- 239000003990 capacitor Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 description 9
- 238000012545 processing Methods 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 230000000903 blocking effect Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 230000005484 gravity Effects 0.000 description 3
- 230000010287 polarization Effects 0.000 description 2
- 206010041662 Splinter Diseases 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000007429 general method Methods 0.000 description 1
- 230000001151 other effect Effects 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B5/00—Measuring arrangements characterised by the use of mechanical techniques
- G01B5/20—Measuring arrangements characterised by the use of mechanical techniques for measuring contours or curvatures
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、レンズ系の偏心測定装置に係り、特に、被測
定レンズ系がズームレンズのようにエレメント数が多く
、かつ内部に移動部分を有するレンズ系の偏心測定装置
に関する。[Detailed Description of the Invention] [Field of Industrial Application] The present invention relates to an apparatus for measuring eccentricity of a lens system, and particularly when the lens system to be measured has a large number of elements, such as a zoom lens, and has a moving part inside. The present invention relates to an eccentricity measuring device for a lens system.
従来、一般的なレンズ系の偏心測定方法としてはオート
コリメーション法が採用されている。このオートコリメ
ーション法は、第４図ａにて示すごとく、レンズ系を構
成する各レンズ面Ｓ、、Ｓｚ、Ｓｓ、Ｓ４のうち、測定
しようとする面、例えば面ＳＩの見かけの曲率中心、即
ち、被測定面と観察系との間に存在する別の面によって
生ずる被測定面の虚像の曲率中心の位１ｉＡに、オート
コリメーションによって指標１１を投影し、面Ｓによる
等倍の反射像！２をＡと同じ位置に生じさせる方式であ
る。このとき、測定の基準軸Ｂに関して全ての面に偏心
がなければ、この基準軸Ｂ上に指標像１１の反射像■２
が形成されるが、もし何れかの面に偏心が存在すれば、
基準軸Ｂと直交し図面の紙面に平行なＹ方向にΔＹ、或
いは紙面と直交するＺ方向にΔＺだけふれた位置に反射
像Ｉ２が形成されることになる。このふれ量ΔＹ及びΔ
Ｚ（以下略してΔとする）は個々の面の偏心量εに比例
するので、各面についてその見かけの曲率中心位置に投
影した指標像■１のこのようなふれ量Δの測定値を得れ
ば、計算によってこの測定基準軸已に対する各面の偏心
量εを求めることができるのである。Conventionally, an autocollimation method has been adopted as a general method for measuring eccentricity of a lens system. As shown in FIG. 4a, this autocollimation method is based on the apparent center of curvature of the surface to be measured, for example, the surface SI, among the lens surfaces S, Sz, Ss, and S4 constituting the lens system. , the index 11 is projected by autocollimation onto the center of curvature of the virtual image of the surface to be measured created by another surface existing between the surface to be measured and the observation system 1iA, and a reflection image of the same size by the surface S! This is a method in which 2 is generated at the same position as A. At this time, if there is no eccentricity on all surfaces with respect to the measurement reference axis B, the reflected image 2 of the index image 11 will be on this reference axis B.
is formed, but if there is eccentricity on either side,
The reflected image I2 is formed at a position shifted by ΔY in the Y direction perpendicular to the reference axis B and parallel to the paper surface of the drawing, or by ΔZ in the Z direction perpendicular to the paper surface. This amount of deflection ΔY and Δ
Since Z (hereinafter abbreviated as Δ) is proportional to the eccentricity ε of each surface, we can obtain the measured value of the amount of deflection Δ of the index image ■1 projected onto the apparent center of curvature of each surface. Then, the amount of eccentricity ε of each surface with respect to this measurement reference axis length can be determined by calculation.
このオートコリメーション方式には、第４図すにて示す
ごときレンズ回転法や、特公昭５１−９６２０号公報に
開示されているごときイメージローテータを応用したレ
ンズ静止方式（第４図Ｃ参照）等がある。This autocollimation method includes a lens rotation method as shown in FIG. be.
レンズ回転法は、第４図すにて示すように、軸Ｂに沿っ
て光源Ｓ、コンデンサーレンズＣにより、指標Ｉを被測
定レンズ系りの各レンズ面Ｓ、、５２＝３ ・・・、・
・の予め定められた曲率中心位置に順次投影し、この指
標Ｉを半透鏡Ｈ，コリメーターレンズＫを介して被測定
レンズ系りの該当レンズ面で反射させて等倍の反射像Ｉ
２を形成し、被測定レンズ系りを基準軸Ｂを中心に回転
させながら、反射像ｒ２を半透鏡Ｉ（により側方に反射
し結像面Ｆに反射像Ｉ２を結像させ、接眼レンズＥで、
観察し、ふれ量ΔＹ、ΔＺを求める方法である。As shown in FIG. 4, the lens rotation method uses a light source S and a condenser lens C along an axis B to move an index I to each lens surface S of the lens system to be measured, 52=3...・
The index I is sequentially projected onto the predetermined curvature center position of
2, and while rotating the lens system to be measured around the reference axis B, the reflected image r2 is reflected laterally by the semi-transparent mirror I (to form the reflected image I2 on the imaging plane F, and At E,
This is a method of observing and determining the amounts of deflection ΔY and ΔZ.
又、特公昭５ｍ−９６２０号公報に開示された技術は、
基準軸Ｂに沿って、光源Ｓ、コンデンサーレンズＣによ
り、指標■を被測定レンズ系りの各レンズ面Ｓ＋ 、Ｓ
Ｚ、３３・・・・・・の予め定められ曲率中心位置に順
次投影し、この指標■を半透鏡Ｈ，コリメークレンズＫ
を介して被測定レンズ系りの該当レンズ面で反射させ等
倍の反射像Ｉ２を形成させ、コリメータレンズにと被測
定レンズ系りの間に、半透鏡Ｈ′を斜設するとともに、
基準軸設定用光学系として、光源Ｓ′、コンデンサーレ
ンズＣ′、指標Ｉ０．コリメーターレンズに′ イメー
ジローテータＲを配設して構成したものである。かかる
構成によれば、光学系の光源Ｓ′、コンデンサーレンズ
Ｃにより、指標１°を結像面Ｆに、コリメーターレンズ
に′、イメージローテークＲ５半透鏡■２と指標１０の
像１’０を観察し、像■０□の中心から反射像Ｉ２との
座標差をとり、ふれ量ΔＹ、ΔＺを求めることができる
ものである。In addition, the technology disclosed in Japanese Patent Publication No. 5m-9620 is
Along the reference axis B, the index ■ is set to each lens surface S+, S of the lens system to be measured using the light source S and the condenser lens C.
Z, 33, etc. are sequentially projected onto the predetermined center of curvature position, and this index
is reflected on the corresponding lens surface of the lens system to be measured to form a reflected image I2 of equal magnification, and a semi-transparent mirror H' is obliquely installed between the collimator lens and the lens system to be measured,
The reference axis setting optical system includes a light source S', a condenser lens C', and an index I0. It is constructed by disposing an image rotator R on a collimator lens. According to this configuration, the light source S' of the optical system and the condenser lens C set the index 1° on the imaging plane F, the collimator lens ', the image low take R5 semi-transparent mirror 2, and the image 1'0 of the index 10. , and take the coordinate difference between the center of the image 0□ and the reflected image I2 to determine the amounts of deflection ΔY and ΔZ.
しかしながら、上記従来技術においてはそれぞれ次のよ
うな問題点があり、レンズ系の偏心量測定手段としては
満足できるものではなかった。However, each of the above conventional techniques has the following problems and is not satisfactory as a means for measuring the amount of eccentricity of a lens system.
まず、第４図すにて示すごとき回転法においては、被測
定レンズ系りがズームレンズのように内部に移動部分を
有する場合には、この移動部分のガタによる影響のため
に被測定レンズが横向（カメラレンズにおいては指標位
置）の場合には偏心量を測定できないという欠点を存し
、そのために被測定レンズを縦方向でしか測定できない
という問題点があった。First, in the rotation method shown in Figure 4, if the lens system to be measured has an internal moving part, such as a zoom lens, the lens to be measured will be affected by the backlash of this moving part. There is a drawback that the amount of eccentricity cannot be measured in the horizontal direction (at the index position in the case of a camera lens), and as a result, the lens to be measured can only be measured in the vertical direction.
又、イメージローテータを応用したレンズ静止方式（第
４図Ｃ参照）においては、イメージローテータＲによる
基準軸は、測定用コリメーターレンズにのアライメント
ずれの変化分を完全に補正できないという欠点がある。Furthermore, in the lens stationary system using an image rotator (see FIG. 4C), there is a drawback that the reference axis provided by the image rotator R cannot completely correct changes in alignment deviation of the measurement collimator lens.
何故ならば、測定用コリメーターレンズにの光路往復の
アライメントずれΔに対して、帰り分しか補正しない（
６７２分）ためである。そのために、測定用コリメータ
ーレンズにの交換、移動、調整に対して基準軸設定用光
学系の調整が必要となり、作業性２作業効率が著しく悪
くなり、しかも測定誤差が生し易くなるという問題点が
あった。This is because only the return misalignment Δ of the optical path to the measurement collimator lens is corrected (
672 minutes). Therefore, it is necessary to adjust the optical system for setting the reference axis in order to replace, move, and adjust the collimator lens for measurement, which significantly reduces work efficiency and also increases the possibility of measurement errors. There was a point.
本発明は、上記従来技術の問題点に鑑みなされたもので
あって、第４図Ｃにて示す構成を改良することにより上
記従来の問題点を解決したレンズ系の偏心測定装置を提
供することを目的とする。The present invention has been made in view of the problems of the prior art, and provides a lens system eccentricity measuring device that solves the problems of the prior art by improving the configuration shown in FIG. 4C. With the goal.
〔課題を解決するための手段］
第１図は、本発明に係るレンズ系の偏心測定装置１の基
本構成（概念図）を示す説明図である。[Means for Solving the Problems] FIG. 1 is an explanatory diagram showing the basic configuration (conceptual diagram) of a lens system eccentricity measuring device 1 according to the present invention.
図に示すように偏心測定装置１は、光源２．コンデンサ
ーレンズ３．指標４．半透鏡５．測定用コリメーターレ
ンズ６、被測定レンズ系７．結像面８と、軸設定用光学
系を構成する半透鏡９．イメージローテータ１０ コリ
メーターレンズ１１゜反射鏡１２とより構成しである。As shown in the figure, the eccentricity measuring device 1 includes a light source 2. Condenser lens 3. Indicator 4. Semi-transparent mirror 5. Collimator lens for measurement 6, lens system to be measured 7. An imaging plane 8 and a semi-transparent mirror 9 constituting an optical system for setting the axis. It consists of an image rotator 10, a collimator lens 11, and a reflecting mirror 12.
（作 用〕
上記構成においては、測定に際し、光Ｒ２と、測定用コ
リメーターレンズ６を調整して指標４を被測定レンズ系
７の被測定面に投影し、結像面８での指標４の反射像の
座標を求めるとともに、イメージローテーク１０を回転
して光源２．コリメーターレンズ１１を調整し、結像８
に指標４の反射像を映してその回転中心の座標を求め、
この両者の座標差から「ふれ量（偏心量）」が求められ
る。(Function) In the above configuration, during measurement, the light R2 and the measuring collimator lens 6 are adjusted to project the index 4 onto the surface to be measured of the lens system 7 to be measured, and the index 4 on the imaging plane 8 is projected. At the same time as determining the coordinates of the reflected image of
Project the reflected image of index 4 on the image and find the coordinates of its center of rotation,
The "amount of deflection (amount of eccentricity)" is determined from the coordinate difference between the two.
以下、図面を用いて本発明の１実施例について詳細に説
明する。なお、以下の説明において、第１図にて示した
各構成部に対応する構成部には、その構成の理解を容易
にするために同一符号を付するものとする。Hereinafter, one embodiment of the present invention will be described in detail using the drawings. In the following description, components corresponding to those shown in FIG. 1 will be given the same reference numerals to facilitate understanding of the configuration.
（第１実施例）
第２図は、本発明に係るレンズ系の偏心測定装置１の第
１実施例を示す構成説明図である。(First Embodiment) FIG. 2 is a configuration explanatory diagram showing a first embodiment of the lens system eccentricity measuring device 1 according to the present invention.
図において２で示すのは、被測定レンズ系７に指標を投
影するための光源としての半導体レーザで、本実施例に
おいては、測定に際して十分な反射像を得るために赤外
半導体レーザを用いている。In the figure, 2 indicates a semiconductor laser as a light source for projecting an index onto the lens system 7 to be measured.In this embodiment, an infrared semiconductor laser is used to obtain a sufficient reflected image during measurement. There is.
３で示すのは半導体レーザ２の集光スポントを補正する
ためのコンデンサーレンズ、５で示すのは半導体レーザ
２の偏光特性を用いて被測定レンズ系（固定しである）
７からの反射像を、指標像拡大用の対物レンズ２０．測
定用テレビカメラ（観察光学系）２１よりなる結像面部
８方向に反射するためのビームスプリッタ−（片面赤外
反射防止）、５ａで示すのはビームスプリンター５から
の直線偏光の射出光を円偏光にするためのλ／４板、６
で示すのは測定用コリメーターレンズで、矢印方向に移
動調節自在の構成となっている。９で示すのは光路をミ
ラー１２側に切り換えるためのペリクルビームスプリッ
タ−（片面赤外反射防止）で、収差の影響をできるだけ
少なくする機能を有する。２２で示すのは被測定レンズ
系７からの反射光を遮るためのシャ・ツタ−１２３で示
すのはミラー１２側からの反射光を遮るためのシャッタ
ー、２４で示すのは光量調整のための絞りである。１０
で示すのは、基準軸設定用コリメーターレンズ１１、ミ
ラー１２のアライメントを一定に保つためのイメージロ
ーテーク、１１で示すのはミラー１２からの反射像をテ
レビカメラ２１側に結像させるための基準軸設定用コリ
メーターレンズ、１２は指標を反射するためのミラーで
ある。3 is a condenser lens for correcting the condensing spot of the semiconductor laser 2, and 5 is a lens system to be measured (fixed) using the polarization characteristics of the semiconductor laser 2.
The reflected image from 7 is transferred to an objective lens 20 for enlarging the target image. A beam splitter (single-sided anti-infrared reflection) for reflecting in the imaging plane 8 direction of the measurement television camera (observation optical system) 21, denoted by 5a, circularly converts the linearly polarized light emitted from the beam splitter 5 into λ/4 plate for polarization, 6
The collimator lens for measurement is shown with a structure that can be moved and adjusted in the direction of the arrow. Reference numeral 9 denotes a pellicle beam splitter (single-sided infrared reflection prevention) for switching the optical path to the mirror 12 side, and has a function of minimizing the influence of aberrations. Reference numeral 22 indicates a shutter for blocking the reflected light from the lens system 7 to be measured. Reference numeral 123 indicates a shutter for blocking the reflected light from the mirror 12 side. Reference numeral 24 indicates a shutter for blocking the reflected light from the mirror 12 side. It's an aperture. 10
11 indicates a collimator lens 11 for setting the reference axis, and an image low-take for keeping the alignment of the mirror 12 constant. A reference axis setting collimator lens 12 is a mirror for reflecting the index.
測定用コリメーターレンズ６及び基準軸設定用コリメー
ターレンズ１１は、広い投影能力を有し、かつ操作性を
良くするために１群は凹凸交換でき、２群で調整できる
ように設定しである。The measurement collimator lens 6 and the reference axis setting collimator lens 11 have a wide projection capability, and are designed so that the first group can be replaced with convex and convex portions and the second group can be adjusted to improve operability. .
次に、上記構成に基づき被測定レンズ系７における被測
定レンズの被測定面のふれ量（偏心量）を測定する作用
について説明する。Next, the operation of measuring the amount of deflection (amount of eccentricity) of the surface to be measured of the lens to be measured in the lens system to be measured 7 based on the above configuration will be explained.
まず、基準軸設定用光学系側のシャッター２３を閉じた
状態で半導体レーザ２から光を出射させ、測定用コリメ
ーターレンズ６を調整し、被測定レンズ系７内の被測定
レンズに指標（点像）を投影する。又、ペリクルビーム
スプリンター９からの反射像をテレビカメラ２１に映し
出してその反射像の座標位置を求める。First, with the shutter 23 on the reference axis setting optical system side closed, light is emitted from the semiconductor laser 2, the measurement collimator lens 6 is adjusted, and an index (point) is placed on the lens to be measured in the lens system 7 to be measured. image). Further, the reflected image from the pellicle beam splinter 9 is projected onto the television camera 21 to determine the coordinate position of the reflected image.
次に、シャッター２２を閉じるとともにシャッター２３
を開作動させ、イメージローテーク１０を回転して基準
軸設定用コリメーターレンズ１１を調整し、テレビカメ
ラ２１に反射像を映し出す。Next, the shutter 22 is closed and the shutter 23 is closed.
is opened, the image low take 10 is rotated, the reference axis setting collimator lens 11 is adjusted, and a reflected image is projected onto the television camera 21.
この際、絞り２４を介して光量を調整する。そして、こ
のテレビカメラ２１の反射像（回転像）の中心座標位置
を求める。このようにして求めた反射像（回転像）の中
心座標位置と、前述のシャ・７ター２３を閉じて求めた
反射像の座標位置との差を求めることにより、基準軸設
定用光学系により設定される基準軸に対する指標像のふ
れ量ΔＹ。At this time, the amount of light is adjusted via the aperture 24. Then, the central coordinate position of the reflected image (rotated image) of this television camera 21 is determined. By determining the difference between the center coordinate position of the reflected image (rotated image) thus obtained and the coordinate position of the reflected image obtained by closing the shutter 23 described above, the reference axis setting optical system The amount of deviation ΔY of the index image with respect to the set reference axis.
ΔＺを求め、これによりレンズ系７の偏心量を測定する
。ΔZ is determined, and the amount of eccentricity of the lens system 7 is measured.
特に、本実施例の偏心測定装置１によれば、従来技術、
特に第４図Ｃにて示す従来技術に比して測定用コリメー
ターレンズ６のアライメントずれを完全に補正できる利
点があり、このことから、測定用コリメーターレンズ６
の交換、移動、調整に対して基準軸設定用光学系の調整
が不必要となり、作業性の向上、測定精度の大幅な向上
が図れる。又、イメージローテークｌＯを用いているの
で、基準軸設定用光学系のコリメーターレンズ１１の交
換、移動による影響を相殺できる利点がある。In particular, according to the eccentricity measuring device 1 of this embodiment, the conventional technology,
In particular, compared to the prior art shown in FIG.
There is no need to adjust the optical system for setting the reference axis when replacing, moving, and adjusting the reference axis, and work efficiency and measurement accuracy can be greatly improved. Furthermore, since the image low take lO is used, there is an advantage that the influence of exchanging or moving the collimator lens 11 of the optical system for setting the reference axis can be offset.
（第２実施例）
第３図に本発明に係る偏心測定装置１の第２実施例を示
す。本実施例の特徴は、第２図にて示す第１実施例の構
成において、シャッター２２゜２３を取り除くとともに
、測定用テレビカメラ２１を画像処理装置３０及び画像
観察用モニター３１と接続して構成した点である。画像
処理装置３０は、測定用テレビカメラ２１にて得られた
画像を処理するためのもので、加算処理機能と重心検出
機能とを有しており、イメージローテークｌＯの１回転
について８枚の画像をとって加算処理し、９点の重心を
検出することによりふれ量ΔＹ、ΔＺを求めることがで
きるように設定構成しである。その他の構成は第１実施
例と同様であるので、第２図にて示した構成部と同様の
構成部には同一符号を付してその説明を省略する。(Second Embodiment) FIG. 3 shows a second embodiment of the eccentricity measuring device 1 according to the present invention. The feature of this embodiment is that the shutters 22 and 23 are removed from the configuration of the first embodiment shown in FIG. 2, and the measurement television camera 21 is connected to an image processing device 30 and an image observation monitor 31. This is the point. The image processing device 30 is for processing images obtained by the measurement television camera 21, and has an addition processing function and a center of gravity detection function, and processes eight images per rotation of the image low take lO. The configuration is such that the amounts of deflection ΔY and ΔZ can be determined by taking images, performing addition processing, and detecting the centers of gravity at nine points. Since the other configurations are the same as those of the first embodiment, the same reference numerals are given to the same components as those shown in FIG. 2, and the explanation thereof will be omitted.
本実施例の作用は、第１実施例とほぼ同様である。即ち
、まず、半導体レーザ２から光を出射させ、測定用コリ
メーターレンズ６を調整し、被測定レンズ系７内の被測
定レンズに指標（点像）を投影し、テレビカメラ２１に
反射像を映し出す。The operation of this embodiment is almost the same as that of the first embodiment. That is, first, light is emitted from the semiconductor laser 2, the measurement collimator lens 6 is adjusted, an index (point image) is projected onto the lens to be measured in the lens system 7 to be measured, and a reflected image is projected onto the television camera 21. Project.
次に、イメージローテーク１０を回転し、コリメーター
レンズ１１と絞り２４を調整し、同様にテレビカメラ２
１に反射像（回転像）を映し出す。Next, rotate the image low take 10, adjust the collimator lens 11 and the aperture 24, and similarly
A reflected image (rotated image) is projected on 1.
そして、イメージローテーク１回転について８枚の画像
をとって加算処理し、９点の重心を検出することにより
、ふれ量ΔＹ、ΔＺを求めるものである。Then, by taking eight images for one rotation of the image low-take and performing addition processing, and detecting the centers of gravity at nine points, the amounts of deflection ΔY and ΔZ are determined.
本実施例によれば、第１実施例における大型の２個のシ
ャッター２２．２３を不必要化できる利点がある。その
他の効果は、第１実施例同一であるのでその説明を省略
する。According to this embodiment, there is an advantage that the two large shutters 22 and 23 in the first embodiment can be made unnecessary. Other effects are the same as those of the first embodiment, so their explanation will be omitted.
以上のように本発明によれば、測定用コリメーターレン
ズのアライメントずれを完全に補正することができ、測
定用コリメーターレンズの交換。As described above, according to the present invention, it is possible to completely correct the misalignment of the measurement collimator lens, and the measurement collimator lens can be replaced.
移動、調整に対して、基準軸設定用光学系の調整不必要
となり、作業性１作業効率の向上、測定精度の向上が図
れる。There is no need to adjust the reference axis setting optical system for movement and adjustment, and work efficiency and measurement accuracy can be improved.
第１図は、本発明に係る装置の基本構成説明図、第２図
は、本発明に係る装置の第１実施例を示す構成説明図、
第３図は、本発明に係る装置の第２実施例を示す構成説
明図、
第４図ａ、ｂ、ｃは、従来技術の説明図である。
２・・・光源
３・・・コンデンサーレンズ
４・・・指標
５・・・半透鏡
６・・・測定用コリメーターレンズ
７・・・被測定レンズ系
８・・・結像面
９・・・半透鏡
１０・・・イメージローテーク
１１・・・コリメーターレンズ
１２・・・反射鏡FIG. 1 is an explanatory diagram of the basic configuration of the apparatus according to the present invention, FIG. 2 is an explanatory diagram of the configuration of a first embodiment of the apparatus according to the present invention, and FIG. FIGS. 4A, 4B, and 4C are explanatory views of the prior art. 2... Light source 3... Condenser lens 4... Index 5... Semi-transparent mirror 6... Collimator lens for measurement 7... Lens system to be measured 8... Imaging surface 9... Semi-transparent mirror 10...Image low take 11...Collimator lens 12...Reflector
Claims (1)
、レンズ系内の被測定面による反射像の基準軸からのふ
れ量を観察光学系を用いて測定し、計算により各レンズ
面の偏心量を求めるように構成してなるレンズ系の偏心
測定装置において、 被測定レンズを固定構成し、被測定レンズと測定用コリ
メーターレンズ系との間に、半透鏡、イメージローテー
タ、コリメーターレンズ、反射鏡よりなる基準軸設定用
光学系を配設するとともにその反射像の回転中心を基準
軸とし、被測定レンズ系からの反射像の前記基準軸に対
するふれ量を求めることにより偏心量を測定しうるよう
に構成したことを特徴とするレンズ系の偏心測定装置。[Scope of Claims] Projecting an index image onto a pre-calculated position of a lens system to be measured, and measuring the amount of deflection from a reference axis of an image reflected by a surface to be measured in the lens system using an observation optical system, In a lens system eccentricity measuring device configured to calculate the eccentricity of each lens surface, the lens to be measured is fixed and a semi-transparent mirror, An optical system for setting a reference axis consisting of an image rotator, a collimator lens, and a reflecting mirror is provided, and the center of rotation of the reflected image is set as the reference axis, and the amount of deviation of the reflected image from the lens system to be measured with respect to the reference axis is determined. What is claimed is: 1. A lens system eccentricity measuring device, characterized in that it is configured to be able to measure an amount of eccentricity.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63253231A JP2621119B2 (en) | 1988-10-07 | 1988-10-07 | Method and apparatus for measuring eccentricity of lens system |
| KR1019890014342A KR920009802B1 (en) | 1988-10-07 | 1989-10-06 | Eccentricity measuring apparatus for lens system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63253231A JP2621119B2 (en) | 1988-10-07 | 1988-10-07 | Method and apparatus for measuring eccentricity of lens system |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0299841A true JPH0299841A (en) | 1990-04-11 |
| JP2621119B2 JP2621119B2 (en) | 1997-06-18 |
Family
ID=17248394
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63253231A Expired - Fee Related JP2621119B2 (en) | 1988-10-07 | 1988-10-07 | Method and apparatus for measuring eccentricity of lens system |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP2621119B2 (en) |
| KR (1) | KR920009802B1 (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0443936A (en) * | 1990-06-08 | 1992-02-13 | Olympus Optical Co Ltd | Instrument and method for measuring eccentricity quantity of lens system |
| JPH0472539A (en) * | 1990-07-13 | 1992-03-06 | Olympus Optical Co Ltd | Off-center measuring device for lens system |
| US5844670A (en) * | 1995-07-28 | 1998-12-01 | Ricoh Co., Ltd. | Method of and systems for measuring eccentricity of an aspherical lens surface |
| US7511803B2 (en) | 2004-05-28 | 2009-03-31 | Canon Kabushiki Kaisha | Method for displaying result of measurement of eccentricity |
| CN113203553A (en) * | 2021-04-22 | 2021-08-03 | 西安工业大学 | Lens center error measuring system and measuring method |
| CN114624010A (en) * | 2022-05-16 | 2022-06-14 | 嘉兴中润光学科技股份有限公司 | Eccentricity testing method |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4474150B2 (en) | 2003-11-28 | 2010-06-02 | キヤノン株式会社 | Eccentricity measurement method |
| WO2022224344A1 (en) * | 2021-04-20 | 2022-10-27 | オリンパス株式会社 | Eccentricity measurement method and eccentricity measurement device |
-
1988
- 1988-10-07 JP JP63253231A patent/JP2621119B2/en not_active Expired - Fee Related
-
1989
- 1989-10-06 KR KR1019890014342A patent/KR920009802B1/en not_active IP Right Cessation
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0443936A (en) * | 1990-06-08 | 1992-02-13 | Olympus Optical Co Ltd | Instrument and method for measuring eccentricity quantity of lens system |
| JPH0472539A (en) * | 1990-07-13 | 1992-03-06 | Olympus Optical Co Ltd | Off-center measuring device for lens system |
| US5844670A (en) * | 1995-07-28 | 1998-12-01 | Ricoh Co., Ltd. | Method of and systems for measuring eccentricity of an aspherical lens surface |
| US7511803B2 (en) | 2004-05-28 | 2009-03-31 | Canon Kabushiki Kaisha | Method for displaying result of measurement of eccentricity |
| CN113203553A (en) * | 2021-04-22 | 2021-08-03 | 西安工业大学 | Lens center error measuring system and measuring method |
| CN113203553B (en) * | 2021-04-22 | 2023-07-14 | 西安工业大学 | Lens center error measuring system and measuring method |
| CN114624010A (en) * | 2022-05-16 | 2022-06-14 | 嘉兴中润光学科技股份有限公司 | Eccentricity testing method |
| CN114624010B (en) * | 2022-05-16 | 2022-08-23 | 嘉兴中润光学科技股份有限公司 | Eccentricity testing method |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2621119B2 (en) | 1997-06-18 |
| KR900006758A (en) | 1990-05-08 |
| KR920009802B1 (en) | 1992-10-22 |
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