JPH0287692A - Semiconductor optical element - Google Patents
Semiconductor optical elementInfo
- Publication number
- JPH0287692A JPH0287692A JP24010088A JP24010088A JPH0287692A JP H0287692 A JPH0287692 A JP H0287692A JP 24010088 A JP24010088 A JP 24010088A JP 24010088 A JP24010088 A JP 24010088A JP H0287692 A JPH0287692 A JP H0287692A
- Authority
- JP
- Japan
- Prior art keywords
- changing
- electrodes
- waveguide
- electrode
- oscillation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title claims description 7
- 230000003287 optical effect Effects 0.000 title claims description 6
- 230000010355 oscillation Effects 0.000 claims abstract description 14
- 230000000694 effects Effects 0.000 description 3
- 238000005253 cladding Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 229910000530 Gallium indium arsenide Inorganic materials 0.000 description 1
- 240000002329 Inga feuillei Species 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
Landscapes
- Semiconductor Lasers (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は半導体光素子に関し、特に半導体レーザの発
振波長の制御方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a semiconductor optical device, and particularly to a method for controlling the oscillation wavelength of a semiconductor laser.
第2図(al、 (blは例えばアブライドフイジツク
スレータズ48巻、 1725頁(1986年)に示さ
れた従来の分布帰還(DFB)型ツイン・ストライプレ
ーザの端面の構造と、そのA−AあるいはB−B断面図
を示す。図において、1は上部電極、2はp型InGa
AsPDンタクト層、3はp型!nPクラッド層、4は
p型1 nGaAs Pアンチメルトバック層、5はア
ンドープInGaAsP活性層、6はn型InGaAs
P導波路層、7はn型InP基板、8は下部電極、9は
絶縁層、10はFeドープ半絶縁rnPうめこみ層であ
る。Figure 2 (al, (bl) shows the structure of the end face of a conventional distributed feedback (DFB) type twin stripe laser shown in Abride Physics Lasers, Vol. 48, p. 1725 (1986), and its A. -A or BB sectional view is shown. In the figure, 1 is an upper electrode, 2 is a p-type InGa
AsPD contact layer, 3 is p type! nP cladding layer, 4 is p-type 1 nGaAs P anti-meltback layer, 5 is undoped InGaAsP active layer, 6 is n-type InGaAs
A P waveguide layer, 7 an n-type InP substrate, 8 a lower electrode, 9 an insulating layer, and 10 an Fe-doped semi-insulating rnP buried layer.
次に動作について説明する。Next, the operation will be explained.
本分布帰還(DFB)型レーザの2つの導波路AとBは
、その幅が異なり、そのため有効屈折率n e f f
も異なる値となる。ここで回折格子の周期を八とすると
き発振波長は近似的に
λ=2nerrΔ/m (m:整数)で与えられる。The two waveguides A and B of the present distributed feedback (DFB) laser have different widths, so that the effective refractive index n e f f
will also have different values. Here, when the period of the diffraction grating is 8, the oscillation wavelength is approximately given by λ=2nerrΔ/m (m: integer).
従ってn@ffが異なるので2つの導波路から異なった
波長のレーザ光が得られる。Therefore, since n@ff is different, laser beams of different wavelengths can be obtained from the two waveguides.
従来の分布帰還型レーザ装置は以上のように作りつけの
屈折率ガイド型の導波路を有するものであるため、発振
する位置は固定であった。Since the conventional distributed feedback laser device has a built-in refractive index guide type waveguide as described above, the oscillation position is fixed.
この発明は上記のような問題点を解消するためになされ
たもので、発振波長と発振位置とを任意に制御できる半
導体光素子を得ることを目的とする。The present invention has been made to solve the above-mentioned problems, and an object of the present invention is to provide a semiconductor optical device in which the oscillation wavelength and oscillation position can be arbitrarily controlled.
この発明に係る半導体光素子は、レーザの導波路を利得
ガイド型とし、複数のストライプ電極を近接させ並べて
設けたものである。In the semiconductor optical device according to the present invention, the laser waveguide is of a gain guide type, and a plurality of stripe electrodes are arranged in close proximity to each other.
この発明においては、作りつけの導波路をもたないため
に、電流注入の仕方をかえることにより実効的な導波路
幅を変えることが出来る。In this invention, since there is no built-in waveguide, the effective waveguide width can be changed by changing the method of current injection.
以下、この発明の一実施例を図について説明する。 An embodiment of the present invention will be described below with reference to the drawings.
第1図において3本のストライプ電極をもった分布帰還
型、利得導波レーザを考える。ここで3本の電極1に流
す電流をそれぞれrl、Iz+ rlとする。In FIG. 1, consider a distributed feedback gain waveguide laser having three stripe electrodes. Here, it is assumed that the currents flowing through the three electrodes 1 are rl and Iz+rl, respectively.
これら上部電極1は近接して形成されており、また導波
路は利得導波型であるので、まず中央の電極1に電流■
2を注入してレーザ発振させておき、その左右の電極に
も電流■1や、■、を注入することにより実効的な導波
路幅を変化させることができる。従ってこれにより有効
屈折率や共振器損失を変化させて、発振波長を変化させ
ることが出来る。These upper electrodes 1 are formed close to each other, and since the waveguide is a gain waveguide type, the current is first applied to the central electrode 1.
2 is injected to cause laser oscillation, and by injecting currents 1 and 2 to the left and right electrodes, the effective waveguide width can be changed. Therefore, by changing the effective refractive index and cavity loss, it is possible to change the oscillation wavelength.
この際、発光位置はI、−13とすることによりI2電
極の下に、また11と!、の大きさをかえることにより
、中心から左右にふることができる。At this time, the light emitting position is set to I, -13, so that it is under the I2 electrode, and 11! By changing the size of , you can move left and right from the center.
以上のように、この発明によれば、分布帰還型構造の半
導体光素子において、複数の利得導波路を近接して形成
するようにしたので、各電極に流す電流を変えることに
より有効屈折率や内部損失を変化させて、発振波長及び
、発振位置を変えることが出来る効果がある。As described above, according to the present invention, a plurality of gain waveguides are formed close to each other in a semiconductor optical device having a distributed feedback structure, so that the effective refractive index can be changed by changing the current flowing through each electrode. It has the effect of changing the oscillation wavelength and oscillation position by changing the internal loss.
第1図はこの発明の一実施例によるレーザの端面を示す
図、第2図(a)は従来の分布帰還型ツイン・ストライ
プレーザの端面を示す図、第2図(b)はそのA−A、
あるいはB−B断面図である。
1は上部電極、2はp型1nGaAsP:2ンタクト層
、3はp型InPクラッド層、4はp型InGaAsP
アンチメルトバック層、5はアンドープInGaAsP
活性層、6はn型I nGaAsP導波路層、7はn型
InP基板、8は下部電極、9は絶縁層、10はFeド
ープ半絶縁InPうめこみ層である。
なお図中同一符号は同−又は相当部分を示す。
第2図(Q)
第2図(b)FIG. 1 shows an end face of a laser according to an embodiment of the present invention, FIG. 2(a) shows an end face of a conventional distributed feedback twin stripe laser, and FIG. 2(b) shows an A- A,
Or it is a BB sectional view. 1 is an upper electrode, 2 is a p-type 1nGaAsP:2 contact layer, 3 is a p-type InP cladding layer, 4 is a p-type InGaAsP
Anti-meltback layer, 5 is undoped InGaAsP
The active layer is an n-type InGaAsP waveguide layer 6, an n-type InP substrate 7, a lower electrode 8, an insulating layer 9, and an Fe-doped semi-insulating InP buried layer 10. Note that the same reference numerals in the figures indicate the same or equivalent parts. Figure 2 (Q) Figure 2 (b)
Claims (1)
成したレーザダイオードにおいて、 各導波路に注入する電流レベルを変化させることにより
発振波長を制御するようにしたことを特徴とする半導体
光素子。(1) A semiconductor characterized in that, in a laser diode with a distributed feedback structure and a plurality of gain waveguides formed closely together, the oscillation wavelength is controlled by changing the current level injected into each waveguide. optical element.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP24010088A JPH0287692A (en) | 1988-09-26 | 1988-09-26 | Semiconductor optical element |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP24010088A JPH0287692A (en) | 1988-09-26 | 1988-09-26 | Semiconductor optical element |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0287692A true JPH0287692A (en) | 1990-03-28 |
Family
ID=17054494
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP24010088A Pending JPH0287692A (en) | 1988-09-26 | 1988-09-26 | Semiconductor optical element |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0287692A (en) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS556385A (en) * | 1978-06-26 | 1980-01-17 | Xerox Corp | Light beam scanning device |
JPS5994486A (en) * | 1983-10-31 | 1984-05-31 | Hitachi Ltd | Semiconductor laser device and driving method therefor |
JPS6360588A (en) * | 1986-09-01 | 1988-03-16 | Fujitsu Ltd | Semiconductor laser |
JPS63128691A (en) * | 1986-11-08 | 1988-06-01 | エスティーシー ピーエルシー | Distributed feedback laser |
-
1988
- 1988-09-26 JP JP24010088A patent/JPH0287692A/en active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS556385A (en) * | 1978-06-26 | 1980-01-17 | Xerox Corp | Light beam scanning device |
JPS5994486A (en) * | 1983-10-31 | 1984-05-31 | Hitachi Ltd | Semiconductor laser device and driving method therefor |
JPS6360588A (en) * | 1986-09-01 | 1988-03-16 | Fujitsu Ltd | Semiconductor laser |
JPS63128691A (en) * | 1986-11-08 | 1988-06-01 | エスティーシー ピーエルシー | Distributed feedback laser |
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