JPH0287067U - - Google Patents
Info
- Publication number
- JPH0287067U JPH0287067U JP16492088U JP16492088U JPH0287067U JP H0287067 U JPH0287067 U JP H0287067U JP 16492088 U JP16492088 U JP 16492088U JP 16492088 U JP16492088 U JP 16492088U JP H0287067 U JPH0287067 U JP H0287067U
- Authority
- JP
- Japan
- Prior art keywords
- film forming
- substrate
- heater
- heating
- source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims description 4
- 238000010438 heat treatment Methods 0.000 claims 3
- 239000000463 material Substances 0.000 claims 2
- 238000004544 sputter deposition Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
Landscapes
- Physical Vapour Deposition (AREA)
- Electrodes Of Semiconductors (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Description
第１図はこの考案の一実施例による赤外ランプ
と防曇板との位置関係を示す斜視図、第２図は第
１図の防曇板を施したスパツタリング装置の要部
の正面断面図、第３図は従来のスパツタリング装
置の要部の正面断面図である。図において、１は
基板、２はトレー、３はローラー、４は赤外ラン
プ、５はターゲツト、６は陽極、７，８，９はマ
グネツト、１０は流水槽、１１は流水管、１２は
スパツタ槽、２１は防曇板を示す。なお、図中、
同一符号は同一、または相当部分を示す。
Fig. 1 is a perspective view showing the positional relationship between an infrared lamp and an anti-fog plate according to an embodiment of the invention, and Fig. 2 is a front cross-sectional view of the main parts of the sputtering device equipped with the anti-fog plate of Fig. 1. , FIG. 3 is a front sectional view of the main parts of a conventional sputtering device. In the figure, 1 is a substrate, 2 is a tray, 3 is a roller, 4 is an infrared lamp, 5 is a target, 6 is an anode, 7, 8, 9 are magnets, 10 is a water tank, 11 is a water pipe, and 12 is a sputter. Tank 21 indicates an anti-fog plate. In addition, in the figure,
The same reference numerals indicate the same or equivalent parts.
Claims (1)
、前記基板加熱用ヒーターが如何なる箇所から見
ても成膜材料源が見えないように、前記基板加熱
用ヒーターと前記成膜材料源との間を遮ぎるよう
にしたことを特徴とする成膜装置。 In a film forming apparatus having a heater for heating a substrate, there is a space between the heater for heating the substrate and the source of the film forming material so that the source of the film forming material is not visible no matter where the heater for heating the substrate is viewed from. A film forming apparatus characterized by being shielded.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16492088U JPH0287067U (en) | 1988-12-19 | 1988-12-19 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16492088U JPH0287067U (en) | 1988-12-19 | 1988-12-19 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0287067U true JPH0287067U (en) | 1990-07-10 |
Family
ID=31450943
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16492088U Pending JPH0287067U (en) | 1988-12-19 | 1988-12-19 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0287067U (en) |
-
1988
- 1988-12-19 JP JP16492088U patent/JPH0287067U/ja active Pending
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