JPH028153U - - Google Patents

Info

Publication number
JPH028153U
JPH028153U JP8550288U JP8550288U JPH028153U JP H028153 U JPH028153 U JP H028153U JP 8550288 U JP8550288 U JP 8550288U JP 8550288 U JP8550288 U JP 8550288U JP H028153 U JPH028153 U JP H028153U
Authority
JP
Japan
Prior art keywords
electrode
semi
semiconductor substrate
insulating semiconductor
dielectric layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8550288U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP8550288U priority Critical patent/JPH028153U/ja
Publication of JPH028153U publication Critical patent/JPH028153U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Semiconductor Integrated Circuits (AREA)
  • Junction Field-Effect Transistors (AREA)

Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図及び第2図は本考案の第1及び第2の実
施例を説明するための半導体チツプの断面図、第
3図は従来の半導体装置を説明するための半導体
チツプの断面図である。 1……半絶縁性GaAs基板、2……酸化シリ
コン膜、3……窒化シリコン膜、4……電極、5
……酸化シリコン膜、6……開孔部、7……窒化
シリコン膜、8……開孔部、9……Au/Pt/
Ti層、10……Au層、11……開孔部、12
……Au/Pt/Ti層、13……窒化シリコン
層、14……Au/Pt/Ti層、15……Au
層。
1 and 2 are cross-sectional views of a semiconductor chip for explaining the first and second embodiments of the present invention, and FIG. 3 is a cross-sectional view of a semiconductor chip for explaining a conventional semiconductor device. . DESCRIPTION OF SYMBOLS 1... Semi-insulating GaAs substrate, 2... Silicon oxide film, 3... Silicon nitride film, 4... Electrode, 5
...Silicon oxide film, 6...Opening part, 7...Silicon nitride film, 8...Opening part, 9...Au/Pt/
Ti layer, 10... Au layer, 11... Opening part, 12
...Au/Pt/Ti layer, 13...Silicon nitride layer, 14...Au/Pt/Ti layer, 15...Au
layer.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 半絶縁性半導体基板と、前記半絶縁性半導体基
板の上面に設けた番1の電極と、前記半絶縁性半
導体基板の下面に設けて前記第1の電極の下面を
露出させる開孔部と、前記開孔部内に設けて前記
第1の電極と接続する第2の電極と、前記第1の
電極の上面又は前記第2の電極の下面に設けた誘
電体層と、前記第1及び第2の電極を容量部の一
方の電極とし前記誘電体層を介して設けた容量部
の他方の電極とを有することを特徴とする半導体
装置。
a semi-insulating semiconductor substrate, a first electrode provided on the top surface of the semi-insulating semiconductor substrate, and an opening provided on the bottom surface of the semi-insulating semiconductor substrate to expose the bottom surface of the first electrode; a second electrode provided in the opening and connected to the first electrode; a dielectric layer provided on the upper surface of the first electrode or the lower surface of the second electrode; A semiconductor device characterized in that the electrode is one electrode of a capacitive part and the other electrode of the capacitive part is provided with the dielectric layer interposed therebetween.
JP8550288U 1988-06-27 1988-06-27 Pending JPH028153U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8550288U JPH028153U (en) 1988-06-27 1988-06-27

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8550288U JPH028153U (en) 1988-06-27 1988-06-27

Publications (1)

Publication Number Publication Date
JPH028153U true JPH028153U (en) 1990-01-19

Family

ID=31310170

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8550288U Pending JPH028153U (en) 1988-06-27 1988-06-27

Country Status (1)

Country Link
JP (1) JPH028153U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0399461A (en) * 1989-09-12 1991-04-24 Mitsubishi Electric Corp Semiconductor device provided with mim capacitor

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0399461A (en) * 1989-09-12 1991-04-24 Mitsubishi Electric Corp Semiconductor device provided with mim capacitor

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