JPH0279551U - - Google Patents
Info
- Publication number
- JPH0279551U JPH0279551U JP15975388U JP15975388U JPH0279551U JP H0279551 U JPH0279551 U JP H0279551U JP 15975388 U JP15975388 U JP 15975388U JP 15975388 U JP15975388 U JP 15975388U JP H0279551 U JPH0279551 U JP H0279551U
- Authority
- JP
- Japan
- Prior art keywords
- source chamber
- ion source
- generates
- microwaves
- coil
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 claims description 5
- 150000002500 ions Chemical group 0.000 claims 8
- 238000010586 diagram Methods 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
Landscapes
- Electron Sources, Ion Sources (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15975388U JPH0279551U (enExample) | 1988-12-07 | 1988-12-07 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15975388U JPH0279551U (enExample) | 1988-12-07 | 1988-12-07 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0279551U true JPH0279551U (enExample) | 1990-06-19 |
Family
ID=31441229
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15975388U Pending JPH0279551U (enExample) | 1988-12-07 | 1988-12-07 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0279551U (enExample) |
-
1988
- 1988-12-07 JP JP15975388U patent/JPH0279551U/ja active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| DK642888A (da) | Hoejfrekvensionkilde | |
| KR890013820A (ko) | 막막 형성 장치 및 이온원 | |
| ATE102395T1 (de) | Vorrichtung zur oberflaechenbehandlung von werkstuecken. | |
| KR900014639A (ko) | 마이크로파 플라스마 에칭방법 및 장치 | |
| JPH0279551U (enExample) | ||
| JP2000200698A5 (enExample) | ||
| JPS62109448U (enExample) | ||
| JPS59121747A (ja) | イオンミリング方法 | |
| JPH0345633U (enExample) | ||
| JPH028853U (enExample) | ||
| JPH038429U (enExample) | ||
| JPH01141759U (enExample) | ||
| JPH0265858U (enExample) | ||
| JPS63153525U (enExample) | ||
| JPH0267633U (enExample) | ||
| JPS61188352U (enExample) | ||
| JPH0176032U (enExample) | ||
| JPH0176033U (enExample) | ||
| JPS62107439U (enExample) | ||
| JPH071788Y2 (ja) | プラズマ装置 | |
| JPH02115244U (enExample) | ||
| JPS63171954U (enExample) | ||
| JPH06168699A (ja) | Ecrプラズマ処理装置 | |
| JPS59158523A (ja) | プラズマ励起装置 | |
| JPH0262650U (enExample) |