JPH027397B2 - - Google Patents
Info
- Publication number
- JPH027397B2 JPH027397B2 JP22178382A JP22178382A JPH027397B2 JP H027397 B2 JPH027397 B2 JP H027397B2 JP 22178382 A JP22178382 A JP 22178382A JP 22178382 A JP22178382 A JP 22178382A JP H027397 B2 JPH027397 B2 JP H027397B2
- Authority
- JP
- Japan
- Prior art keywords
- evaporation
- molten metal
- oxide film
- receiver
- vacuum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/246—Replenishment of source material
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22178382A JPS59113179A (ja) | 1982-12-20 | 1982-12-20 | 真空蒸着装置およびそのスタ−トアツプ法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22178382A JPS59113179A (ja) | 1982-12-20 | 1982-12-20 | 真空蒸着装置およびそのスタ−トアツプ法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS59113179A JPS59113179A (ja) | 1984-06-29 |
JPH027397B2 true JPH027397B2 (en:Method) | 1990-02-16 |
Family
ID=16772128
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP22178382A Granted JPS59113179A (ja) | 1982-12-20 | 1982-12-20 | 真空蒸着装置およびそのスタ−トアツプ法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59113179A (en:Method) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1967604A1 (en) * | 2007-03-08 | 2008-09-10 | Applied Materials, Inc. | Evaporation crucible and evaporation apparatus with directional evaporation |
CN103249860B (zh) * | 2010-12-13 | 2016-03-16 | Posco公司 | 连续涂布设备 |
-
1982
- 1982-12-20 JP JP22178382A patent/JPS59113179A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS59113179A (ja) | 1984-06-29 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US6315829B1 (en) | Apparatus for hot-dip coating a steel strip | |
US2926103A (en) | Aluminum cladding process and apparatus | |
US4552092A (en) | Vacuum vapor deposition system | |
JPH027397B2 (en:Method) | ||
JPH027395B2 (en:Method) | ||
JPH0620618B2 (ja) | 連続鋳造方法及びその装置 | |
JPH02118064A (ja) | 真空蒸着装置 | |
JPH0252716B2 (en:Method) | ||
JP2706936B2 (ja) | 真空昇華精製装置 | |
US3736175A (en) | Vacuum coating method | |
US4253860A (en) | Heated lance roof cleaning process | |
US4081262A (en) | Use of reducing gas curtain for start of glass forming process | |
JPH0237428B2 (ja) | Shinkujochakusochi | |
JPS6342701B2 (en:Method) | ||
JP3074811B2 (ja) | 真空アルミニウムろう付け炉 | |
JPS6120128B2 (en:Method) | ||
JPH0217385A (ja) | 脱ワックス焼結炉 | |
JP2002011564A (ja) | 溶融金属回収装置 | |
JPH0660372B2 (ja) | 連続式合金メツキ装置 | |
JPH0216382B2 (en:Method) | ||
CA1221232A (en) | Vacuum vapor deposition system | |
JPH051069Y2 (en:Method) | ||
JPH04103781A (ja) | リン酸エッチング処理装置 | |
JPH0413853B2 (en:Method) | ||
GB2036423A (en) | Method of heat-treating semi-conductor components |