JPH0265371U - - Google Patents
Info
- Publication number
- JPH0265371U JPH0265371U JP14338788U JP14338788U JPH0265371U JP H0265371 U JPH0265371 U JP H0265371U JP 14338788 U JP14338788 U JP 14338788U JP 14338788 U JP14338788 U JP 14338788U JP H0265371 U JPH0265371 U JP H0265371U
- Authority
- JP
- Japan
- Prior art keywords
- discharge
- main discharge
- electrode
- saturable reactor
- capacitors
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000003990 capacitor Substances 0.000 claims description 6
- 239000004020 conductor Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
Landscapes
- Lasers (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14338788U JPH0265371U (uk) | 1988-11-04 | 1988-11-04 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14338788U JPH0265371U (uk) | 1988-11-04 | 1988-11-04 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0265371U true JPH0265371U (uk) | 1990-05-16 |
Family
ID=31410166
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14338788U Pending JPH0265371U (uk) | 1988-11-04 | 1988-11-04 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0265371U (uk) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2023181207A1 (ja) * | 2022-03-23 | 2023-09-28 | ギガフォトン株式会社 | ガスレーザ装置及び電子デバイスの製造方法 |
-
1988
- 1988-11-04 JP JP14338788U patent/JPH0265371U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2023181207A1 (ja) * | 2022-03-23 | 2023-09-28 | ギガフォトン株式会社 | ガスレーザ装置及び電子デバイスの製造方法 |
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