JPH0261131B2 - - Google Patents

Info

Publication number
JPH0261131B2
JPH0261131B2 JP63099840A JP9984088A JPH0261131B2 JP H0261131 B2 JPH0261131 B2 JP H0261131B2 JP 63099840 A JP63099840 A JP 63099840A JP 9984088 A JP9984088 A JP 9984088A JP H0261131 B2 JPH0261131 B2 JP H0261131B2
Authority
JP
Japan
Prior art keywords
mask
light source
optical system
slit
image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP63099840A
Other languages
English (en)
Japanese (ja)
Other versions
JPS63288014A (ja
Inventor
Minokichi Ban
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP63099840A priority Critical patent/JPS63288014A/ja
Publication of JPS63288014A publication Critical patent/JPS63288014A/ja
Publication of JPH0261131B2 publication Critical patent/JPH0261131B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP63099840A 1988-04-22 1988-04-22 焼付け装置 Granted JPS63288014A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63099840A JPS63288014A (ja) 1988-04-22 1988-04-22 焼付け装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63099840A JPS63288014A (ja) 1988-04-22 1988-04-22 焼付け装置

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP3157978A Division JPS54123877A (en) 1978-03-18 1978-03-18 Baking unit

Publications (2)

Publication Number Publication Date
JPS63288014A JPS63288014A (ja) 1988-11-25
JPH0261131B2 true JPH0261131B2 (ru) 1990-12-19

Family

ID=14257997

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63099840A Granted JPS63288014A (ja) 1988-04-22 1988-04-22 焼付け装置

Country Status (1)

Country Link
JP (1) JPS63288014A (ru)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3316704B2 (ja) 1993-06-10 2002-08-19 株式会社ニコン 投影露光装置、走査露光方法、及び素子製造方法
US11332621B1 (en) 2020-11-30 2022-05-17 Sumitomo Osaka Cement Co., Ltd. Zinc oxide powder, dispersion, paint, and cosmetic
US11325840B1 (en) 2020-11-30 2022-05-10 Sumitomo Osaka Cement Co., Ltd. Zinc oxide powder, dispersion, paint, and cosmetic
JP2023111131A (ja) 2022-01-31 2023-08-10 住友大阪セメント株式会社 酸化亜鉛粉体、分散液、塗料、化粧料

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4917191U (ru) * 1972-05-17 1974-02-13
JPS5046080A (ru) * 1973-08-28 1975-04-24
JPS5226902A (en) * 1975-08-25 1977-02-28 Hitachi Ltd Method of making photomask pattern
JPS56111212A (en) * 1979-12-31 1981-09-02 Thompson David L Dispersing tube supporting collar
JPS63161612A (ja) * 1986-12-25 1988-07-05 Toshiba Ceramics Co Ltd 縦型炉
JPS6343422B2 (ru) * 1980-05-24 1988-08-30 Japan Synthetic Rubber Co Ltd

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4863046U (ru) * 1971-11-16 1973-08-10
JPS6343422U (ru) * 1986-09-04 1988-03-23

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4917191U (ru) * 1972-05-17 1974-02-13
JPS5046080A (ru) * 1973-08-28 1975-04-24
JPS5226902A (en) * 1975-08-25 1977-02-28 Hitachi Ltd Method of making photomask pattern
JPS56111212A (en) * 1979-12-31 1981-09-02 Thompson David L Dispersing tube supporting collar
JPS6343422B2 (ru) * 1980-05-24 1988-08-30 Japan Synthetic Rubber Co Ltd
JPS63161612A (ja) * 1986-12-25 1988-07-05 Toshiba Ceramics Co Ltd 縦型炉

Also Published As

Publication number Publication date
JPS63288014A (ja) 1988-11-25

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