JPH0261083A - Anode for generating oxygen and production thereof - Google Patents
Anode for generating oxygen and production thereofInfo
- Publication number
- JPH0261083A JPH0261083A JP63210187A JP21018788A JPH0261083A JP H0261083 A JPH0261083 A JP H0261083A JP 63210187 A JP63210187 A JP 63210187A JP 21018788 A JP21018788 A JP 21018788A JP H0261083 A JPH0261083 A JP H0261083A
- Authority
- JP
- Japan
- Prior art keywords
- coating layer
- oxide
- mol
- anode
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 title claims abstract description 19
- 239000001301 oxygen Substances 0.000 title claims abstract description 19
- 229910052760 oxygen Inorganic materials 0.000 title claims abstract description 19
- 238000004519 manufacturing process Methods 0.000 title claims description 4
- 239000011247 coating layer Substances 0.000 claims abstract description 23
- HTXDPTMKBJXEOW-UHFFFAOYSA-N dioxoiridium Chemical compound O=[Ir]=O HTXDPTMKBJXEOW-UHFFFAOYSA-N 0.000 claims abstract description 20
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 17
- 229910052718 tin Inorganic materials 0.000 claims abstract description 16
- 239000002345 surface coating layer Substances 0.000 claims abstract description 15
- 229910052715 tantalum Inorganic materials 0.000 claims abstract description 15
- 229910000457 iridium oxide Inorganic materials 0.000 claims abstract description 14
- 229910052758 niobium Inorganic materials 0.000 claims abstract description 14
- 229910052726 zirconium Inorganic materials 0.000 claims abstract description 13
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract description 9
- 150000004706 metal oxides Chemical class 0.000 claims abstract description 9
- 229910052751 metal Inorganic materials 0.000 claims description 20
- 239000002184 metal Substances 0.000 claims description 20
- 239000010936 titanium Substances 0.000 claims description 15
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 14
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 13
- 239000010955 niobium Substances 0.000 claims description 13
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 12
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 12
- 239000000758 substrate Substances 0.000 claims description 12
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 12
- 230000003197 catalytic effect Effects 0.000 claims description 7
- 229910045601 alloy Inorganic materials 0.000 claims description 4
- 239000000956 alloy Substances 0.000 claims description 4
- 238000000034 method Methods 0.000 claims description 4
- 150000003839 salts Chemical class 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 claims description 2
- 230000001590 oxidative effect Effects 0.000 claims 2
- 229910052741 iridium Inorganic materials 0.000 claims 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 claims 1
- 239000010410 layer Substances 0.000 abstract description 22
- 239000000203 mixture Substances 0.000 abstract description 12
- 238000009713 electroplating Methods 0.000 abstract description 5
- 229910052804 chromium Inorganic materials 0.000 abstract description 4
- 229910052725 zinc Inorganic materials 0.000 abstract description 4
- 239000007789 gas Substances 0.000 abstract description 3
- 239000002344 surface layer Substances 0.000 abstract description 3
- 230000007797 corrosion Effects 0.000 abstract description 2
- 238000005260 corrosion Methods 0.000 abstract description 2
- 239000013078 crystal Substances 0.000 abstract description 2
- 230000003628 erosive effect Effects 0.000 abstract description 2
- -1 etc. Inorganic materials 0.000 abstract description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N titanium dioxide Inorganic materials O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 abstract description 2
- 230000001070 adhesive effect Effects 0.000 abstract 1
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 20
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 12
- 239000000243 solution Substances 0.000 description 10
- 238000012360 testing method Methods 0.000 description 9
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 238000007747 plating Methods 0.000 description 5
- 229910052697 platinum Inorganic materials 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- 230000002378 acidificating effect Effects 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 239000003792 electrolyte Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 3
- 230000001680 brushing effect Effects 0.000 description 3
- 239000011651 chromium Substances 0.000 description 3
- 239000007772 electrode material Substances 0.000 description 3
- 238000005868 electrolysis reaction Methods 0.000 description 3
- 239000011133 lead Substances 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 238000005979 thermal decomposition reaction Methods 0.000 description 3
- 239000011701 zinc Substances 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- 229910000978 Pb alloy Inorganic materials 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical class Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 2
- TXUICONDJPYNPY-UHFFFAOYSA-N (1,10,13-trimethyl-3-oxo-4,5,6,7,8,9,11,12,14,15,16,17-dodecahydrocyclopenta[a]phenanthren-17-yl) heptanoate Chemical compound C1CC2CC(=O)C=C(C)C2(C)C2C1C1CCC(OC(=O)CCCCCC)C1(C)CC2 TXUICONDJPYNPY-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 229910001128 Sn alloy Inorganic materials 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 229910021626 Tin(II) chloride Inorganic materials 0.000 description 1
- 238000010306 acid treatment Methods 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- FPCJKVGGYOAWIZ-UHFFFAOYSA-N butan-1-ol;titanium Chemical compound [Ti].CCCCO.CCCCO.CCCCO.CCCCO FPCJKVGGYOAWIZ-UHFFFAOYSA-N 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 239000008151 electrolyte solution Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 230000013011 mating Effects 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- HBEQXAKJSGXAIQ-UHFFFAOYSA-N oxopalladium Chemical compound [Pd]=O HBEQXAKJSGXAIQ-UHFFFAOYSA-N 0.000 description 1
- CMOAHYOGLLEOGO-UHFFFAOYSA-N oxozirconium;dihydrochloride Chemical compound Cl.Cl.[Zr]=O CMOAHYOGLLEOGO-UHFFFAOYSA-N 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- KDLHZDBZIXYQEI-UHFFFAOYSA-N palladium Substances [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 1
- 229910003445 palladium oxide Inorganic materials 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- YHBDIEWMOMLKOO-UHFFFAOYSA-I pentachloroniobium Chemical compound Cl[Nb](Cl)(Cl)(Cl)Cl YHBDIEWMOMLKOO-UHFFFAOYSA-I 0.000 description 1
- 238000005036 potential barrier Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 229910001925 ruthenium oxide Inorganic materials 0.000 description 1
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000001119 stannous chloride Substances 0.000 description 1
- 235000011150 stannous chloride Nutrition 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- OEIMLTQPLAGXMX-UHFFFAOYSA-I tantalum(v) chloride Chemical compound Cl[Ta](Cl)(Cl)(Cl)Cl OEIMLTQPLAGXMX-UHFFFAOYSA-I 0.000 description 1
- DANYXEHCMQHDNX-UHFFFAOYSA-K trichloroiridium Chemical compound Cl[Ir](Cl)Cl DANYXEHCMQHDNX-UHFFFAOYSA-K 0.000 description 1
Landscapes
- Electrodes For Compound Or Non-Metal Manufacture (AREA)
Abstract
Description
【発明の詳細な説明】 (産業上の利用分野) 本発明は酸素発生を伴う電解工程、特にスズ。[Detailed description of the invention] (Industrial application field) The present invention is directed to electrolytic processes involving oxygen evolution, particularly tin.
亜鉛、クロム等の電気メツキに使用される不溶性陽極に
関するものである。It relates to insoluble anodes used for electroplating of zinc, chromium, etc.
(従来の技術及び発明が解決しようとする課題)スズ、
亜鉛、クロム等の電気メツキ用陽極として現在鉛又は鉛
合金が使用されているが、鉛は比咬時消耗が速く、メツ
キ液中に溶出し、メツキ液の汚染、メツキ皮膜の劣化等
の問題がめった。(Problems to be solved by conventional techniques and inventions) Tin,
Lead or lead alloys are currently used as anodes for electroplating of zinc, chromium, etc., but lead wears out quickly during mating and is eluted into the plating solution, causing problems such as contamination of the plating solution and deterioration of the plating film. I was disappointed.
これに代る陽極として白金メツキ陽極や白金箔クラッド
陽極が検討されているが、白金の消耗が大きく未だ解決
に至っていない。そのため消耗の少ない不溶性陽極が種
々提案されている。Platinum plated anodes and platinum foil clad anodes are being considered as alternative anodes, but platinum consumption is large and no solution has yet been reached. For this reason, various insoluble anodes with low consumption have been proposed.
特開昭59−38394号公報では、導電性金属基体上
に4価の原子価数をとるT1及びsnから選ばれた少な
くとも1種の金属酸化物と5価の原子価数をとるTa及
びNbから選ばれた少なくとも1種の酸化物との混合酸
化物からなる中間層を設けて導電性を付与し、その上に
電極活性物質を被覆した電イ々を提案している。In JP-A No. 59-38394, at least one metal oxide selected from T1 and sn having a valence of 4 and Ta and Nb having a valence of 5 are deposited on a conductive metal substrate. They have proposed an electrode in which an intermediate layer made of a mixed oxide with at least one type of oxide selected from the above is provided to impart conductivity, and an electrode active material is coated on the intermediate layer.
中間層は4価の金属と5価の金属の酸化物か混在したも
のであり、一般に知られている原子価制御原理に基づく
N型半導体となっていると考えられるが、未だ十分な電
気伝導性がでていなかった。The intermediate layer is a mixture of oxides of tetravalent metals and pentavalent metals, and is thought to be an N-type semiconductor based on the generally known valence control principle, but it still has insufficient electrical conductivity. The sex wasn't showing.
特公昭51−19429号公報は、導電性支持基材と電
極活物質被覆の中間層にPt−1r合金?Co、Mn、
Pd、Pb、Ptの酸化物からなる酸素不浸透層を設【
ブで電極の不働態化防止を試みている。しかし中間被覆
物質自体が酸素発生に触媒活性があるので、透過してく
る電解液と反応して中間層で酸素発生反応が起り、電極
被覆の密着性及び不働態化防止効果は十分でなかった。Japanese Patent Publication No. 51-19429 discloses that a Pt-1r alloy is used as an intermediate layer between a conductive support base material and an electrode active material coating. Co, Mn,
An oxygen-impermeable layer made of oxides of Pd, Pb, and Pt was established
Attempts are being made to prevent the electrode from becoming passivated. However, since the intermediate coating material itself has a catalytic activity for oxygen generation, it reacts with the permeating electrolyte and an oxygen generation reaction occurs in the intermediate layer, so that the adhesion of the electrode coating and the effect of preventing passivation were insufficient. .
特開昭59−150091号公報では、特開昭59−3
8394号の中間層にptを分散させた電極を提案して
いる。即ち半導体中間層のキャリアー濃度に限界がある
ので更に導電性を付与するためPtを分散させたもので
あるが、pt自体が電解液、特に硫酸酸性液中で電解時
に少しずつ溶解し、長期に使用するには限界があった。In JP-A-59-150091, JP-A-59-3
No. 8394 proposes an electrode in which PT is dispersed in the intermediate layer. In other words, since there is a limit to the carrier concentration in the semiconductor intermediate layer, Pt is dispersed in order to provide further conductivity, but Pt itself dissolves little by little during electrolysis in an electrolytic solution, especially an acidic sulfuric acid solution, and does not last for a long time. There were limits to its use.
特開昭60−184691号公報では、導電性金属基体
と電極活物質との中間層にTi及びSnから選ばれた金
属の酸化物とAI、Ga、Fe。In JP-A-60-184691, an oxide of a metal selected from Ti and Sn and AI, Ga, and Fe are used as an intermediate layer between a conductive metal substrate and an electrode active material.
Co、Ni及びTIから選ばれた少なくとも1種の金属
の酸化物との混合酸化物中にPtを分散した中間層を提
案している。この中間層は4価の金属と2価又は3価の
金属の混合酸化物中にPtを分散したものであり、該酸
化物は原子価制御原理に基づいてP型半導体となり、良
好な導電性を有する上に分散したPtにより高い電子電
導性が付与されると考えられた。しかし白金自体は硫酸
酸性電解液中で徐々に溶解し、電解中は溶解が加速され
るので十分な寿命は期待できない。An intermediate layer in which Pt is dispersed in a mixed oxide with an oxide of at least one metal selected from Co, Ni, and TI is proposed. This intermediate layer is made by dispersing Pt in a mixed oxide of a tetravalent metal and a divalent or trivalent metal, and the oxide becomes a P-type semiconductor based on the valence control principle and has good conductivity. It was thought that high electronic conductivity was imparted by the Pt dispersed in the Pt. However, platinum itself gradually dissolves in the sulfuric acid acidic electrolyte, and the dissolution is accelerated during electrolysis, so a sufficient lifespan cannot be expected.
特開昭62−174394号公報では、電導性基体上に
電気メツキ法により多孔質Pt層を設け、その上に熱分
解で設けた酸化ルテニウム、酸化パラジウム及び酸化イ
リジウムから選ばれた少なくとも1種の酸化物層からな
る電極でPtメツキ層と酸化物層をくり返して形成する
電極を提案している。この場合も電解時、硫酸酸性電解
液に対して白金多孔質層が徐々に溶解する問題か解決さ
れていない。In JP-A No. 62-174394, a porous Pt layer is provided on a conductive substrate by electroplating, and at least one layer selected from ruthenium oxide, palladium oxide, and iridium oxide is formed on the porous Pt layer by thermal decomposition. We have proposed an electrode made of an oxide layer, which is formed by repeating a Pt plating layer and an oxide layer. In this case as well, the problem of the platinum porous layer gradually dissolving in the sulfuric acid acidic electrolyte during electrolysis remains unsolved.
(課題を解決するための手段)
本発明者らは硫酸酸性電解液中で使用する不溶性陽極に
おいて、酸素不浸透な中間層の耐蝕性を付与し、且つ導
電性を高め、表面層の酸素発生触媒活性とガス発生に対
する機械的損傷を防ぐことにより長寿命の電極を完成さ
せるに至ったものである。(Means for Solving the Problems) In an insoluble anode used in a sulfuric acid acidic electrolyte, the present inventors provided corrosion resistance to an oxygen-impermeable intermediate layer, increased conductivity, and oxygen generation in the surface layer. By preventing mechanical damage to catalyst activity and gas generation, we have achieved a long-life electrode.
即ち本発明は、導電性金属基体上に、a)チタン、タン
タル、スズ、ニオブ、ジルコニウムから選ばれた少なく
とも1種の金属酸化物85〜95モル%と酸化イリジウ
ム15〜5モル%の混合酸化物とよりなる導電性を有す
る中間被覆層及び該中間被覆層上にb)チタン、タンタ
ル、スズ、ニオブ。That is, the present invention provides a method of forming a mixed oxide of 85 to 95 mol% of at least one metal oxide selected from titanium, tantalum, tin, niobium, and zirconium and 15 to 5 mol% of iridium oxide on a conductive metal substrate. and b) titanium, tantalum, tin, and niobium on the intermediate coating layer.
ジルコニウムから選ばれた少なくとも1種の金属酸化物
20〜70モル%と酸化イリジウム80〜30モル%と
の混合酸化物からなる酸素発生触媒能を有する表面被覆
層を形成したことを特徴とする酸素発生用陽極及びその
製法である。Oxygen characterized by forming a surface coating layer having oxygen generation catalytic ability consisting of a mixed oxide of 20 to 70 mol% of at least one metal oxide selected from zirconium and 80 to 30 mol% of iridium oxide. A generation anode and its manufacturing method.
本発明の導電性金属基体には、チタン、タンタル、ニオ
ブ、ジルコニウムから選ばれた金属又はこれらの合金等
の不働態皮膜を形成する材料が挙げられる。通常は経済
性、電気的機械的性質や加工性等の点からチタン及び/
又はその合金が使用される。電極形状としては板状、棒
状、エキスバンド状、多孔板等種々の形状が可能である
。The conductive metal substrate of the present invention includes a material that forms a passive film, such as a metal selected from titanium, tantalum, niobium, and zirconium, or an alloy thereof. Usually, titanium and/or
or its alloys are used. Various electrode shapes are possible, such as a plate, a rod, an expanded band, and a perforated plate.
本発明の中間被覆層はチタン、タンタル、スズ。The intermediate coating layer of the present invention is titanium, tantalum, and tin.
ニオブ、ジルコニウムから選ばれた少なくとも1種の酸
化物85〜90モル%と酸化イリジウム15〜5モル%
を含む導電性の混合酸化物であり、酸化イリジウム含有
量が5モル%未満では、電子導電性が小さく逆に15モ
ル%を超えると酸素発生触媒能が強く現われて酸素不浸
透性の機能が損われるので、寿命が短かくなる。85 to 90 mol% of at least one oxide selected from niobium and zirconium and 15 to 5 mol% of iridium oxide
If the iridium oxide content is less than 5 mol%, the electronic conductivity will be low, and if it exceeds 15 mol%, the oxygen generation catalytic ability will be strong and the oxygen impermeable function will be lost. Because it is damaged, its lifespan is shortened.
中間被覆層に酸化イリジウムを入れずに、チタン、タン
タル、スズ、ニオブ、ジルコニウムから選ばれた少なく
とも1種の混合酸化物皮膜を形成した場合、加速電解試
験の寿命はむしろ短かくなる。原因ははっきりしないが
、この中間被覆層は酸素透過に対し十分防御できるもの
の基体と中間層間の電位障壁が高くなり、その結果電解
寿命試験で早く電圧が上昇するものと考えられる。When a mixed oxide film of at least one selected from titanium, tantalum, tin, niobium, and zirconium is formed without containing iridium oxide in the intermediate coating layer, the life of the accelerated electrolytic test is rather shortened. Although the cause is not clear, it is thought that although this intermediate coating layer can sufficiently protect against oxygen permeation, the potential barrier between the substrate and the intermediate layer becomes high, and as a result, the voltage increases quickly in the electrolytic life test.
本発明の表面被覆層はチタン、タンタル、スズ。The surface coating layer of the present invention is made of titanium, tantalum, or tin.
ニオブ、ジルコニウムから選ばれた少なくとも1種の酸
化物20〜70モル%と酸化イリジウム80〜30モル
%の酸素発生触媒能を有する混合酸化物よりなるもので
あって、酸化イリジウムが30モル%未満では酸素発生
触媒能が劣化し、80モル%を超えると皮膜の密着性が
損われる。A mixed oxide having an oxygen generation catalytic ability of 20 to 70 mol% of at least one oxide selected from niobium and zirconium and 80 to 30 mol% of iridium oxide, with less than 30 mol% of iridium oxide. If the content exceeds 80 mol%, the adhesion of the film will be impaired.
本発明の被覆層の形成は次のようにして行われる。The coating layer of the present invention is formed as follows.
導電性金属基体の表面を酸処理、ブラスト処理等の方法
でエツチングを行なって粗面化させた後、塩化チタン、
塩化タンタル、塩化第1スズ、塩化ニオブ、オキシ塩化
ジルコニウム又は塩化イリジウム等の金属塩をエヂルア
ルコール、ブチルアルコール等の溶媒に溶解して所定組
成の混合溶液としたものを刷毛塗り、ロール塗り、スプ
レー法或いは浸漬法等の手段で塗布する。次いで100
〜150℃で数分間乾燥し、空気又は酸素雰囲気の電気
炉中300〜700’Cで10〜20分間熱分解処理を
行う。After etching and roughening the surface of the conductive metal substrate using methods such as acid treatment and blasting, titanium chloride, titanium chloride,
Metal salts such as tantalum chloride, stannous chloride, niobium chloride, zirconium oxychloride or iridium chloride are dissolved in a solvent such as edyl alcohol or butyl alcohol to form a mixed solution of a predetermined composition, which is applied by brushing, rolling, It is applied by means such as spraying or dipping. then 100
It is dried at ~150°C for several minutes, and then subjected to thermal decomposition treatment at 300-700'C for 10-20 minutes in an electric furnace in an air or oxygen atmosphere.
熱処理温度が300℃未満では熱分解が完全に起らず、
また700℃を超えると金属基体の酸化が進行して基体
が損傷を受ける。If the heat treatment temperature is less than 300°C, thermal decomposition will not occur completely;
Further, if the temperature exceeds 700° C., oxidation of the metal substrate progresses and the substrate is damaged.
中間被覆層の厚みは酸素透過防止能力を発揮するために
は3.0g/ m以上がよく、それ以下では効果か少な
い。また表面被覆層の厚みは10.0g#以上おれば、
酸素発生に対する触媒能も、寿命も共に良好となる。The thickness of the intermediate coating layer is preferably 3.0 g/m or more in order to exhibit oxygen permeation prevention ability, and if it is less than that, the effect will be low. Also, if the thickness of the surface coating layer is 10.0 g# or more,
Both the catalytic ability for oxygen generation and the lifespan are improved.
(発明の効果)
本発明陽極における中間被覆層及び表面被覆層は共通の
成分からなり、かつ共通のルチル構造を有する結晶を多
く含み、単位格子体積も相互に類似しているので、両者
の相互密着性は甚だ強固となり、発生ガスによるエロー
ジョンに対しても強い等の特徴を有している。ざらに中
間被覆層と表面被覆層は同じ酸化イリジウムの含有率を
異ならすことにより導電性及び酸素発生触媒能という別
異の機能を持たせるという独特の効果を有している。(Effects of the Invention) The intermediate coating layer and the surface coating layer in the anode of the present invention are made of common components, contain many crystals having a common rutile structure, and have similar unit cell volumes, so the mutual Adhesion is extremely strong, and it has characteristics such as being resistant to erosion due to generated gas. Generally speaking, the intermediate coating layer and the surface coating layer have a unique effect of having different functions of conductivity and oxygen generation catalytic ability by having different contents of the same iridium oxide.
本発明陽極は優れた耐久性を有し、例えば硫酸酸性溶液
中における鋼材のメツキ、すなわちスズ。The anode of the present invention has excellent durability, such as plating of steel material in sulfuric acid solution, that is, tin.
亜鉛、クロム等の電気メツキ等の用途に有効に使用され
る。Effectively used for electroplating of zinc, chromium, etc.
以下実施例により本発明を更に具体的に詳述する。例中
の組成%は特記なき限りモル基準である。The present invention will be described in more detail below with reference to Examples. Composition percentages in the examples are on a molar basis unless otherwise specified.
実施例1 比較例1,2
市販チタン板(1xlOx O,1cm)をアセトン脱
脂後10重量%熱蓚酸溶液中でエツチング処理を行ない
、その表面に下記組成の溶液を刷毛塗りで塗布した。Example 1 Comparative Examples 1 and 2 A commercially available titanium plate (1xlOxO, 1cm) was degreased with acetone and etched in a 10% by weight hot oxalic acid solution, and a solution having the following composition was applied to the surface by brushing.
Taα52.ICI
ブチルチタネート 4.O〃H2I rcj
!a ・6H201,On濃塩酸 1.0 d
n−ブチルアルコール 15〃
これを120’Cで20分間乾燥した後電気炉中500
°Cで10分間焼成することにより、Ta20s30%
とT i 0260%とIrQ210%の混合酸化物よ
りなる皮膜を得た。この操作を4回繰り返して3.(X
l/TItの中間被覆層を得た。Taα52. ICI Butyl Titanate 4. O〃H2I rcj
! a ・6H201,On concentrated hydrochloric acid 1.0 d n-butyl alcohol 15〃 After drying this at 120'C for 20 minutes, it was heated in an electric furnace at 500 °C.
By baking at °C for 10 minutes, Ta20s30%
A film made of a mixed oxide of 60% T i 0 and 10% IrQ was obtained. Repeat this operation 4 times and 3. (X
An intermediate coating layer of l/TIt was obtained.
次に該中間被覆層上に下記組成の溶液を刷毛塗りで塗布
した。Next, a solution having the following composition was applied by brushing onto the intermediate coating layer.
Ta(lfs o、47gH2I
r(j!e ・6H201,Ott濃塩酸 1
.0 d
n−ブチルアルコール 15 rd!これを12
0℃で20分間乾燥した後電気炉中500℃で10分間
焼成することにより、Ta20s40%とIr0260
%の混合酸化物よりなる皮膜を得た。Ta(lfso, 47gH2I
r(j!e ・6H201, Ott concentrated hydrochloric acid 1
.. 0 d n-butyl alcohol 15 rd! This is 12
By drying at 0°C for 20 minutes and then firing at 500°C for 10 minutes in an electric furnace, Ta20s40% and Ir0260
% of mixed oxide was obtained.
この操作を10回繰り返して10.0(1/ triの
表面被覆層を得た。This operation was repeated 10 times to obtain a surface coating layer of 10.0 (1/tri).
この電極を50℃、 100(]/N硫酸溶液中に陽極
として用い、白金線を陰極として電流密度200A/d
m2で加速電解試験したところ320時間使用できた。This electrode was used as an anode in a 100(]/N sulfuric acid solution at 50°C, and the platinum wire was used as a cathode at a current density of 200 A/d.
When an accelerated electrolytic test was conducted at m2, it could be used for 320 hours.
一方比較例1として、表面被覆層塗布液に丁aC1sを
加えなかった以外は実施例1と同様に作製した陽極、及
び比較例2として中間被覆層を形成しなかった以外は実
施例1と同様に作製した陽極について、実施例1と同様
に試験した結果、寿命は夫々85時間、35時間であり
、本発明電極の寿命が格段に長いことが分った。On the other hand, as Comparative Example 1, an anode was prepared in the same manner as in Example 1, except that C1s was not added to the surface coating layer coating solution, and as Comparative Example 2, it was the same as in Example 1, except that no intermediate coating layer was formed. As a result of testing the anode produced in Example 1 in the same manner as in Example 1, the lifespan was 85 hours and 35 hours, respectively, indicating that the electrode of the present invention had a much longer lifespan.
実施例2〜4 比較例3,4
中間被覆層(4回塗布、3.0Mm>の組成比を第1表
記載のように変化させた以外は実施例1と同様に陽極を
作製し、実施例1と同様に試験した結果を第1表に示し
た。Examples 2 to 4 Comparative Examples 3 and 4 Anodes were produced in the same manner as in Example 1, except that the composition ratio of the intermediate coating layer (4 times coated, 3.0 Mm) was changed as shown in Table 1, and the The results of the test conducted in the same manner as in Example 1 are shown in Table 1.
比較のために、中間被覆層(4回塗布、 3.0(+/
ゴ)の組成比を第1表記載のように変化させた以外は実
施例2と同様に陽極を作製し、実施例2と同様に試験し
た結果を第1表に併せて示した。この結果、中間被覆層
のIrO2含有量が3%、 20%では中間被覆層の効
果が十分でないことが分る。For comparison, the intermediate coating layer (4 coats, 3.0 (+/
An anode was prepared in the same manner as in Example 2 except that the composition ratio of (G) was changed as shown in Table 1, and the results of testing in the same manner as in Example 2 are also shown in Table 1. The results show that the effect of the intermediate coating layer is not sufficient when the IrO2 content of the intermediate coating layer is 3% or 20%.
第1表
実施例5〜8 比較例5,6
表面被覆層(10回塗布、 10.OMTIt)の組
成比を第2表記載のように変化させた以外は実施例]と
同様に陽極を作製し、実施例1と同様に試験した結果を
第2表に示した。Table 1 Examples 5 to 8 Comparative Examples 5 and 6 Anodes were produced in the same manner as in Example except that the composition ratio of the surface coating layer (coated 10 times, 10.OMTIt) was changed as shown in Table 2. The results of testing in the same manner as in Example 1 are shown in Table 2.
比較のために、表面被覆層(10回塗布、 io、o
ct/尻)の組成比を第2表記載のように変化させた以
外は実施例5と同様に陽(へを作製し、実施例5と同様
に試験した結果を第2表に併せて示した。For comparison, the surface coating layer (coated 10 times, io, o
A positive plate was prepared in the same manner as in Example 5, except that the composition ratio of ct/butt was changed as shown in Table 2, and the results of testing in the same manner as in Example 5 are also shown in Table 2. Ta.
この結果表面被覆層のIrO2含有遣は30%以上がよ
いこと、90%になると寿命が極端に短くなることが分
る。The results show that the IrO2 content of the surface coating layer is preferably 30% or more, and that when it becomes 90%, the life becomes extremely short.
実施例9〜12 比較例7〜10
中間被覆層(4回塗布、 3.OMTri)及び表面被
覆層(10回塗布、 io、oa/ゴ)の組成比を第
3表記載のように変化させた以外は実施例1と同様に陽
極を作製し、試験した結果を第3表に示した。Examples 9 to 12 Comparative Examples 7 to 10 The composition ratios of the intermediate coating layer (coated 4 times, 3.OMTri) and the surface coating layer (coated 10 times, io, oa/go) were changed as shown in Table 3. An anode was produced in the same manner as in Example 1 except for the above, and the test results are shown in Table 3.
第2表
第3表
この結果、IrO2を含有する中間被覆層を設けた本発
明の電極は、IrO2を含まない中間被覆層を設けた電
極と比べて耐久性の格段に優れた電極であることが分る
。Table 2 Table 3 As a result, the electrode of the present invention provided with an intermediate coating layer containing IrO2 has much better durability than the electrode provided with an intermediate coating layer not containing IrO2. I understand.
Claims (4)
ズ、ニオブ、ジルコニウムから選ばれた少なくとも1種
の金属酸化物85〜95モル%と酸化イリジウム15〜
5モル%との混合酸化物よりなる導電性を有する中間被
覆層及び該中間被覆層上にb)チタン、タンタル、スズ
、ニオブ、ジルコニウムから選ばれた少なくとも1種の
金属酸化物20〜70モル%と酸化イリジウム80〜3
0モル%との混合酸化物からなる酸素発生触媒能を有す
る表面被覆層を形成したことを特徴とする酸素発生用陽
極。(1) On a conductive metal substrate, a) 85-95 mol% of at least one metal oxide selected from titanium, tantalum, tin, niobium, and zirconium and 15-95 mol% of iridium oxide
an electrically conductive intermediate coating layer made of a mixed oxide with 5 mol %; and b) 20 to 70 mol of at least one metal oxide selected from titanium, tantalum, tin, niobium, and zirconium on the intermediate coating layer; % and iridium oxide 80-3
1. An anode for oxygen generation, characterized in that a surface coating layer having an oxygen generation catalytic ability is formed of a mixed oxide with 0 mol %.
ルコニウムから選ばれた金属又はこれらの合金である請
求項1記載の陽極。(2) The anode according to claim 1, wherein the conductive metal substrate is a metal selected from titanium, tantalum, niobium, zirconium, or an alloy thereof.
オブ、ジルコニウムから選ばれた少なくとも1種の金属
塩とイリジウム金属塩とを含む溶液を被覆し、酸化性雰
囲気中で加熱処理してチタン、タンタル、スズ、ニオブ
、ジルコニウムから選ばれた少なくとも1種の金属酸化
物85〜95モル%と酸化イリジウム15〜5モル%と
の混合酸化物よりなる中間被覆層を形成し、次いで上記
と同様の手段でチタン、タンタル、スズ、ニオブ、ジル
コニウムから選ばれた少なくとも1種の金属酸化物20
〜70モル%と酸化イリジウム80〜30モル%との混
合酸化物よりなる表面被覆層とを形成することを特徴と
する酸素発生用電極の製法。(3) A conductive metal substrate is coated with a solution containing at least one metal salt selected from titanium, tantalum, tin, niobium, and zirconium and an iridium metal salt, and then heat-treated in an oxidizing atmosphere to form a titanium , an intermediate coating layer made of a mixed oxide of 85 to 95 mol % of at least one metal oxide selected from tantalum, tin, niobium, and zirconium and 15 to 5 mol % of iridium oxide, and then the same as above. At least one metal oxide selected from titanium, tantalum, tin, niobium, zirconium by means of 20
A method for producing an electrode for oxygen generation, comprising forming a surface coating layer made of a mixed oxide of ~70 mol% and 80-30 mol% iridium oxide.
0℃である請求項3に記載の陽極の製法。(4) Heat treatment temperature in oxidizing atmosphere is 300 to 70
The method for manufacturing an anode according to claim 3, wherein the temperature is 0°C.
Priority Applications (1)
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JP63210187A JP2596807B2 (en) | 1988-08-24 | 1988-08-24 | Anode for oxygen generation and its production method |
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---|---|---|---|
JP63210187A JP2596807B2 (en) | 1988-08-24 | 1988-08-24 | Anode for oxygen generation and its production method |
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JPH0261083A true JPH0261083A (en) | 1990-03-01 |
JP2596807B2 JP2596807B2 (en) | 1997-04-02 |
Family
ID=16585225
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Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2239260A (en) * | 1989-12-22 | 1991-06-26 | Tdk Corp | Oxygen-generating electrolysis electrode and method for the preparation thereof |
JPH03271386A (en) * | 1990-03-20 | 1991-12-03 | Daiso Co Ltd | Anode for generating oxygen and production thereof |
JPH0499294A (en) * | 1990-08-09 | 1992-03-31 | Daiso Co Ltd | Oxygen generating anode and its production |
JPH05148675A (en) * | 1991-11-28 | 1993-06-15 | Permelec Electrode Ltd | Electrolytic electrode base body, electrolytic electrode and production thereof |
US5243427A (en) * | 1991-12-27 | 1993-09-07 | Samsung Electronics Co., Ltd. | Contour correction apparatus and contour correction method |
EP0560338A2 (en) * | 1992-03-11 | 1993-09-15 | TDK Corporation | Oxygen generating electrode |
JPH06146052A (en) * | 1992-11-11 | 1994-05-27 | Permelec Electrode Ltd | Production of metallic foil by electrolysis |
JPH06146051A (en) * | 1992-11-06 | 1994-05-27 | Permelec Electrode Ltd | Production of metallic foil by electrolysis |
WO2003000957A1 (en) * | 2001-06-21 | 2003-01-03 | Sanyo Electric Co., Ltd. | Electrolyzing electrode and production method therefor and electrolysis method using electrolyzing electrode and electrolysis solution producing device |
KR20040042526A (en) * | 2002-11-14 | 2004-05-20 | 주식회사 포스코 | Manufacturing method of electrolytic galvanized iron having excellent surface properties |
JP2010059524A (en) * | 2008-09-05 | 2010-03-18 | Daiki Ataka Engineering Co Ltd | Electrode for producing oxygen |
CN113668010A (en) * | 2021-08-25 | 2021-11-19 | 山西铱倍力科技有限公司 | Oxygen evolution anode for industrial electrolysis and preparation method thereof |
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JPS5636233A (en) * | 1979-08-31 | 1981-04-09 | Toshiba Corp | Automatic frequency control alarm circuit |
JPS5643315A (en) * | 1979-09-18 | 1981-04-22 | Mitsubishi Petrochem Co Ltd | Propylene block copolymer |
-
1988
- 1988-08-24 JP JP63210187A patent/JP2596807B2/en not_active Expired - Lifetime
Patent Citations (2)
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JPS5636233A (en) * | 1979-08-31 | 1981-04-09 | Toshiba Corp | Automatic frequency control alarm circuit |
JPS5643315A (en) * | 1979-09-18 | 1981-04-22 | Mitsubishi Petrochem Co Ltd | Propylene block copolymer |
Cited By (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2239260B (en) * | 1989-12-22 | 1994-02-16 | Tdk Corp | Oxygen-generating electrode and method for the preparation thereof |
GB2239260A (en) * | 1989-12-22 | 1991-06-26 | Tdk Corp | Oxygen-generating electrolysis electrode and method for the preparation thereof |
JPH03271386A (en) * | 1990-03-20 | 1991-12-03 | Daiso Co Ltd | Anode for generating oxygen and production thereof |
JPH0499294A (en) * | 1990-08-09 | 1992-03-31 | Daiso Co Ltd | Oxygen generating anode and its production |
JPH05148675A (en) * | 1991-11-28 | 1993-06-15 | Permelec Electrode Ltd | Electrolytic electrode base body, electrolytic electrode and production thereof |
US5243427A (en) * | 1991-12-27 | 1993-09-07 | Samsung Electronics Co., Ltd. | Contour correction apparatus and contour correction method |
US5294317A (en) * | 1992-03-11 | 1994-03-15 | Tdk Corporation | Oxygen generating electrode |
EP0560338A3 (en) * | 1992-03-11 | 1994-01-05 | Tdk Corp | |
EP0560338A2 (en) * | 1992-03-11 | 1993-09-15 | TDK Corporation | Oxygen generating electrode |
EP0699780A1 (en) | 1992-03-11 | 1996-03-06 | TDK Corporation | Oxygen generating electrode |
JPH06146051A (en) * | 1992-11-06 | 1994-05-27 | Permelec Electrode Ltd | Production of metallic foil by electrolysis |
JPH06146052A (en) * | 1992-11-11 | 1994-05-27 | Permelec Electrode Ltd | Production of metallic foil by electrolysis |
WO2003000957A1 (en) * | 2001-06-21 | 2003-01-03 | Sanyo Electric Co., Ltd. | Electrolyzing electrode and production method therefor and electrolysis method using electrolyzing electrode and electrolysis solution producing device |
US7156962B2 (en) | 2001-06-21 | 2007-01-02 | Sanyo Electric Co., Ltd. | Electrolyzing electrode and production method therefor and electrolysis method using electrolyzing electrode and electrolysis solution producing device |
KR20040042526A (en) * | 2002-11-14 | 2004-05-20 | 주식회사 포스코 | Manufacturing method of electrolytic galvanized iron having excellent surface properties |
JP2010059524A (en) * | 2008-09-05 | 2010-03-18 | Daiki Ataka Engineering Co Ltd | Electrode for producing oxygen |
CN113668010A (en) * | 2021-08-25 | 2021-11-19 | 山西铱倍力科技有限公司 | Oxygen evolution anode for industrial electrolysis and preparation method thereof |
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