JPH0259086A - Washing method and apparatus - Google Patents

Washing method and apparatus

Info

Publication number
JPH0259086A
JPH0259086A JP20937088A JP20937088A JPH0259086A JP H0259086 A JPH0259086 A JP H0259086A JP 20937088 A JP20937088 A JP 20937088A JP 20937088 A JP20937088 A JP 20937088A JP H0259086 A JPH0259086 A JP H0259086A
Authority
JP
Japan
Prior art keywords
cleaning
organic solvent
boiling point
point organic
cleaned
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP20937088A
Other languages
Japanese (ja)
Other versions
JP2582627B2 (en
Inventor
Toshio Tanaka
利雄 田中
Shinichi Saito
斉藤 慎一
Tadaaki Saeki
佐伯 忠秋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokuyama Corp
Toppan Inc
Original Assignee
Tokuyama Corp
Toppan Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokuyama Corp, Toppan Printing Co Ltd filed Critical Tokuyama Corp
Priority to JP63209370A priority Critical patent/JP2582627B2/en
Publication of JPH0259086A publication Critical patent/JPH0259086A/en
Application granted granted Critical
Publication of JP2582627B2 publication Critical patent/JP2582627B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)

Abstract

PURPOSE:To efficiently wash an object to be washed by a method wherein a washing solution is ejected in a washing solution bath to wash the object to be washed and subsequently taking out the object to be washed from said bath to eject a low b.p. org. solvent thereto. CONSTITUTION:The object 54 to be washed held to a holding bucket 50 is moved within the washing solution bath 100 positioned at the lower part in a washing tank 2 by a moving means 52 and a washing solution containing a low b.p. org. solvent and a high b.p. org. solvent is ejected in said washing solution bath 100 by a jet means 14 and the washing solution bath 100 is heated by a heating means 24 to wash the object 54 to be washed. This washed object 50 to be washed is raised to the finish region 10 positioned at the upper part in the washing tank 2 and the low b.p. org. solvent in a sump 102 is ejected to the object to be washed in the finish region by a finish jet means 30 to finish the object to be washed.

Description

【発明の詳細な説明】 く技術分野〉 本発明は、特に印刷インキ又はペンキの如き塗料が付着
した物品の自動洗浄に適する洗浄方法及び装置に関する
DETAILED DESCRIPTION OF THE INVENTION Technical Field The present invention relates to a cleaning method and apparatus particularly suitable for automatic cleaning of articles to which paint such as printing ink or paint has adhered.

〈従来技術及び問題点〉 一般に、多色前1りに使用されるグラビア印刷機におい
ては、インキ受皿、インキバイブ及びアプリケータ等の
種々の部材が着脱自在に装着されている。かようなグラ
ビア印刷機による多色刷りにおいては、−色毎の印刷が
所要色数繰返し遂行されるが、印刷色を変更する時には
、先の印刷において使用した印刷インキが付着している
種々の部材を取脱して洗浄することが必要である。そこ
で、印1111機における上記部材の洗浄方式として、
(イ)有機溶剤の如き洗浄液浴に洗浄すべき部材を単に
浸漬せしめる単に?U漬法、及び(ロ)洗浄すべき部材
に洗浄液を噴射せしめるスプレー法、が提案され実用に
供されている。
<Prior Art and Problems> Generally, in a gravure printing machine used for multicolor printing, various members such as an ink tray, an ink vibrator, and an applicator are detachably attached. In multi-color printing using such a gravure printing machine, printing for each color is repeated the required number of times, but when changing the printing color, various members to which the printing ink used in the previous printing has adhered are It is necessary to remove and clean it. Therefore, as a cleaning method for the above-mentioned parts in the Mark 1111 machine,
(a) Simply immerse the parts to be cleaned in a bath of cleaning liquid such as an organic solvent? A U-immersion method and (b) a spray method in which a cleaning liquid is sprayed onto the member to be cleaned have been proposed and put into practical use.

然るに、上記単純浸漬法では、洗浄効率が悪く極めて長
時間に渡って浸漬を遂行することが必要であり、またそ
うしても必ずしも充分良好に洗浄することができない。
However, the above-mentioned simple immersion method has poor cleaning efficiency and requires immersion to be carried out for a very long time, and even if it does so, it is not always possible to clean the product sufficiently well.

他方、上記スプレー法では、種々の方向から洗浄液を噴
射せしめても、特に洗浄すべき部材が複雑な形状の場合
、洗浄液が直接衝突せしめられない部分が残留し、従っ
て洗浄が不完全なものになってしまう。かような次第で
あるので、印刷業界においては、上記単純漫ン貞法又は
上記スプレー法による洗浄に加えて、或いはこれらに代
えて、洗浄ブラシを使用する手動洗浄作業を回避するこ
とができなかった。手動洗浄作業には、煩雑であること
に加えて、洗浄液として使用される有機溶剤等による衛
生上の問題もある。
On the other hand, in the spray method described above, even if the cleaning liquid is sprayed from various directions, especially if the part to be cleaned has a complicated shape, some parts may remain where the cleaning liquid cannot directly impinge, resulting in incomplete cleaning. turn into. For this reason, in the printing industry, manual cleaning using a cleaning brush cannot be avoided in addition to or in place of the simple cleaning method or spray method described above. Ta. In addition to being cumbersome, manual cleaning operations also pose hygiene problems due to the organic solvents used as the cleaning liquid.

〈発明の課題〉 従来技術における上記問題を解決するために、本発明者
等は、先に昭和62年特許願第216498号明細書及
び図面において、洗浄すべき部材即ち被洗浄体を洗浄液
浴中に浸漬せしめることに加えて、洗浄液浴中において
被洗浄体を移動せしめると共に、洗浄液浴中に洗浄液を
噴射せしめる独特な洗浄方法、及びかかる洗浄方法の実
施に好都合な洗浄装置を提案した。
<Problem of the Invention> In order to solve the above-mentioned problems in the prior art, the present inventors previously disclosed in the specification and drawings of Patent Application No. 216498 of 1988 that a member to be cleaned, that is, an object to be cleaned, is placed in a cleaning liquid bath. We have proposed a unique cleaning method in which the object to be cleaned is moved in a cleaning liquid bath and the cleaning liquid is sprayed into the cleaning liquid bath in addition to immersion in the cleaning liquid bath, and a cleaning apparatus convenient for carrying out such a cleaning method.

本発明者等が先に提案した上記洗浄方法及び洗浄装置に
よれば、従来の単純浸漬法及びスプレー法に比べて、著
しく良好に被洗浄体を洗浄することができる。しかしな
がら、かかる洗浄方法及び洗浄AA置も未だ充分に満足
し得るものではなく、本発明者等の経験によれば、印刷
インキの種類等によっては充分に良好な結果を得ること
ができないことがあった。
According to the cleaning method and cleaning apparatus previously proposed by the present inventors, objects to be cleaned can be cleaned significantly better than conventional simple dipping methods and spraying methods. However, such cleaning methods and cleaning AA settings are still not fully satisfactory, and according to the experience of the present inventors, it may not be possible to obtain sufficiently good results depending on the type of printing ink, etc. Ta.

従って、本発明の主たる技術的課題は、本発明者等が先
に提案した上記洗浄方法及び洗浄装置に更に改良を加え
て、−層優れた洗浄効率を達成することができるように
なすことである。
Therefore, the main technical problem of the present invention is to further improve the above-mentioned cleaning method and cleaning apparatus proposed by the present inventors so that superior cleaning efficiency can be achieved. be.

〈発明の解決手段〉 本発明者等は、更に鋭意研究及び実験を重ねた結果、洗
浄工程において、被洗浄体が浸漬される洗浄液浴を低沸
点有Ia溶剤と高沸点有機溶剤とを含有するものにせし
めると共に、この洗浄液浴を加熱するという改良を加え
、そして更に、洗浄工程の後に、洗浄液浴から被洗浄体
を取り出してこの被洗浄体に低沸点有機溶剤を噴射する
仕上げ工程を遂行すれば、上記技術的課題を達成するこ
とができることを見出した。
<Means for Solving the Invention> As a result of further extensive research and experiments, the present inventors have determined that in the cleaning process, the cleaning liquid bath in which the object to be cleaned is immersed contains a low boiling point Ia solvent and a high boiling point organic solvent. At the same time, an improvement is added in which the cleaning liquid bath is heated, and furthermore, after the cleaning process, a finishing process is performed in which the object to be cleaned is taken out from the cleaning liquid bath and a low boiling point organic solvent is injected onto the object to be cleaned. For example, we have found that the above technical problem can be achieved.

即ち、本発明によれば、低沸点有m溶剤と高沸点有a?
e剤とを含有する洗浄液浴中に被洗浄体を浸漬すること
、該洗浄液浴を加熱すること、該洗浄液浴中において該
被洗浄体を移動すること、及び該被洗浄体が浸漬されて
いる該洗浄液浴中に洗浄液を噴射することを含む洗浄工
程と、該洗浄工程の後に該洗浄液浴から該被洗浄体を取
り出して、低沸点有機溶剤を該被洗浄体に噴射すること
を含む仕上げ工程と、 から成ることを特徴とする洗浄方法が提供される。
That is, according to the present invention, a low boiling point solvent and a high boiling point solvent are used.
immersing the object to be cleaned in a cleaning liquid bath containing an e-agent; heating the cleaning liquid bath; moving the object to be cleaned in the cleaning liquid bath; and immersing the object in the cleaning liquid bath. a cleaning step comprising injecting a cleaning liquid into the cleaning liquid bath; and a finishing step comprising removing the object to be cleaned from the cleaning liquid bath after the cleaning step and injecting a low boiling point organic solvent onto the object. A cleaning method is provided comprising the following steps.

また、本発明によれば、上記洗浄方法を実施するのに好
適な洗浄装置として、下部に位置する洗浄液及び該洗浄
液の上方に位置する仕上げ域を有する洗浄槽と、該洗浄
槽内に配設された被洗浄体保持パケットと、該パケット
を昇降動せしめるためのパケット昇降手段と、低沸点有
機溶剤と高沸点有機溶剤とを含有する洗浄液を該洗浄液
に噴射する洗浄噴射手段と、低沸点有機溶剤を該仕上げ
域に噴射する仕上げ噴射手段と、該洗浄域に配設された
加熱手段と、を具備することを特徴とする洗浄装置が提
供される。
Further, according to the present invention, a cleaning device suitable for carrying out the above-mentioned cleaning method includes a cleaning tank having a cleaning liquid located at the bottom and a finishing area located above the cleaning liquid, and a cleaning tank disposed in the cleaning tank. a packet for holding an object to be cleaned; a packet lifting means for raising and lowering the packet; a cleaning injection means for spraying a cleaning liquid containing a low boiling point organic solvent and a high boiling point organic solvent onto the cleaning liquid; A cleaning device is provided, comprising a finishing injection means for injecting a solvent into the finishing area, and a heating means disposed in the cleaning area.

〈発明の好適具体例〉 以下、添付図面を参照して、本発明の好適具体例につい
て詳細に説明する。
<Preferred Specific Examples of the Invention> Hereinafter, preferred specific examples of the present invention will be described in detail with reference to the accompanying drawings.

第1図は、本発明に従って構成された洗浄装置の好適具
体例を簡略に図示している。図示の洗浄装置は、全体を
番号2で示す洗浄槽を具備している。この洗浄槽2は、
略直方体形状の槽本体4と、槽本体4の開放された上面
に配設された開閉17ij6とを含んでいる。扉6はそ
の後縁部(第1図において右端部)が槽本体4に旋回自
在に装着されており、実線で示す閉位置と2点鎖線で示
す開位置との間を旋回開閉動される。槽本体4は、下部
に位置する洗浄域8と、この洗浄域8の上方に位置する
仕上げ域lOと、仕上げ域10の更に上方に位置する乾
燥域12とを規定している。
FIG. 1 schematically illustrates a preferred embodiment of a cleaning device constructed in accordance with the present invention. The illustrated cleaning device includes a cleaning tank designated as a whole by number 2. This cleaning tank 2 is
It includes a tank main body 4 having a substantially rectangular parallelepiped shape and an opening/closing member 17ij6 disposed on the open upper surface of the tank main body 4. The rear edge (right end in FIG. 1) of the door 6 is rotatably attached to the tank body 4, and can be pivoted open and closed between a closed position shown by a solid line and an open position shown by a two-dot chain line. The tank body 4 defines a cleaning area 8 located at the bottom, a finishing area 10 located above the cleaning area 8, and a drying area 12 located further above the finishing area 10.

上記洗浄槽2の洗浄域8に関連せしめて、洗浄噴射手段
14が配設されている。この洗浄噴射手段14は複数個
の噴射ノズル16とポンプ18とを含んでいる。複数個
の噴射ノズル16は、槽本体4の下部側壁に横方向及び
縦方向に適宜間隔を置いて配設されている。ポンプ18
の入口側はライン20によって洗浄域8に接続されてお
り、出口側はライン22によって噴射ノズル16に接続
されている。洗浄域8の底部には、加熱手段24が配設
されている。また、洗浄域8の底には、開閉制御弁(図
示していない)を有する廃液ライン25が接続されてい
る。洗浄槽2には、更に、槽本体4の洗浄域8に隣接し
て位置する低沸点有機溶剤タンク26が付設されている
。このタンク26と洗浄域8との間には、所定高さの堰
28が形成されている。
A cleaning spray means 14 is provided in association with the cleaning area 8 of the cleaning tank 2. The cleaning injection means 14 includes a plurality of injection nozzles 16 and a pump 18. The plurality of injection nozzles 16 are arranged on the lower side wall of the tank body 4 at appropriate intervals in the horizontal and vertical directions. pump 18
Its inlet side is connected to the cleaning zone 8 by a line 20, and its outlet side is connected to the injection nozzle 16 by a line 22. At the bottom of the cleaning area 8, heating means 24 are arranged. Furthermore, a waste liquid line 25 having an on-off control valve (not shown) is connected to the bottom of the washing area 8 . The cleaning tank 2 is further provided with a low boiling point organic solvent tank 26 located adjacent to the cleaning area 8 of the tank body 4. A weir 28 of a predetermined height is formed between the tank 26 and the cleaning area 8.

上記洗浄槽2の仕上げ域10には、仕」二げ噴射手段3
0が関連せしめられている。この仕上げ噴射手段30は
複数個の噴射ノズル32とポンプ34とを含んでいる。
In the finishing area 10 of the cleaning tank 2, there is a finishing spraying means 3.
0 is associated. This finishing injection means 30 includes a plurality of injection nozzles 32 and a pump 34.

複数個の噴射ノズル32は、槽本体4の中間部側壁に横
方向及び縦方向に適宜間隔を置いて配設されている。ポ
ンプ34の入口側はライン36によって上記タンク26
に接続されており、出口側はライン38によって噴射ノ
ズル32に接続されている。仕」−げ域lOには、更に
、槽本体4の中間部側壁内面に沿って延在する冷媒循環
パイプ40を有する凝縮用冷却手段42が配設されてい
る。
The plurality of injection nozzles 32 are arranged on the intermediate side wall of the tank body 4 at appropriate intervals in the horizontal and vertical directions. The inlet side of the pump 34 is connected to the tank 26 by a line 36.
The outlet side is connected to the injection nozzle 32 by a line 38. A condensing cooling means 42 having a refrigerant circulation pipe 40 extending along the inner surface of the intermediate side wall of the tank body 4 is further disposed in the processing area IO.

上記洗浄槽2の乾燥域12の前端部及び後端部は仕上げ
域lOよりも前方及び後方に張出せしめられており、乾
燥域12の前端部及び後端部の下端には幅方向に延在す
る収集/#44が形成されている。乾燥域12にも、収
集溝44の上方を槽本体4の上部側壁内面に沿って延在
する冷媒循環パイプ46を有する凝縮用冷却手段48が
配設されている。
The front and rear ends of the drying zone 12 of the cleaning tank 2 are extended forward and rearward of the finishing zone 1O, and the lower ends of the front and rear ends of the drying zone 12 extend in the width direction. The existing collection/#44 has been formed. A condensing cooling means 48 having a refrigerant circulation pipe 46 extending above the collection groove 44 and along the inner surface of the upper side wall of the tank body 4 is also provided in the drying area 12 .

上記洗浄槽2の槽本体4内には、洗浄すべき部材即ち被
洗浄体を保持するためのパケット50が配設されている
。このバケット50は全体を番号52で示すパケット移
動手段52によって昇降動自在に懸下されている。バケ
ツ)50自体は、後述する如く洗浄域8において噴射ノ
ズル16から噴射される洗浄液或いは仕上げ域IOにお
いて噴射ノズル32から噴射される低沸点有機溶剤が被
洗浄体の所要表面に衝突し得るように被洗浄体を保持す
ることができる限り、任意の形態のものでよい6例えば
、バケット50は、必要に応じて複数個の開口(図示し
ていない)を形成することができる底板を有し、この底
板には、印刷機におけるインキ受皿、インキパイプ及び
アプリケータ等である被洗浄体を保持するための丸棒又
は金網等の種々の部材が溶接等の適宜の手段によって固
定される。第1図においては、便宜上、上記底板上に固
定された種々の部材に保持された被洗浄体を全体として
2点l¥線54で略式図示している。
Inside the tank body 4 of the cleaning tank 2, a packet 50 for holding a member to be cleaned, that is, an object to be cleaned, is arranged. This bucket 50 is suspended by a packet moving means 52, generally indicated by the number 52, so as to be movable up and down. The bucket) 50 itself is configured so that the cleaning liquid sprayed from the spray nozzle 16 in the cleaning zone 8 or the low boiling point organic solvent sprayed from the spray nozzle 32 in the finishing zone IO can collide with the desired surface of the object to be cleaned, as will be described later. The bucket 50 may have any form as long as it can hold the object to be cleaned.6 For example, the bucket 50 has a bottom plate in which a plurality of openings (not shown) can be formed as necessary, Various members such as a round bar or wire mesh for holding objects to be cleaned such as an ink tray, an ink pipe, and an applicator in a printing machine are fixed to this bottom plate by appropriate means such as welding. In FIG. 1, for convenience, the object to be cleaned held by various members fixed on the bottom plate is schematically illustrated as a whole by a two-point line 54.

図示の具体例における上記バケット移動手段52は、上
記槽本体4の上端部に幅方向(第1図において紙面に垂
直な方向)に間隔を置いて配設された一対の回転軸5G
(第1図にはその片方のみを図示している)を含んでい
る。一対の回転軸56の各々は、槽本体4の上端部を前
後方向(第1図において左右方向)に実質上水平に延び
、その後端部は槽本体4を貫通して後方へ突出している
The bucket moving means 52 in the illustrated example includes a pair of rotating shafts 5G disposed at the upper end of the tank main body 4 at a distance in the width direction (direction perpendicular to the plane of the paper in FIG. 1).
(only one of which is shown in FIG. 1). Each of the pair of rotating shafts 56 extends substantially horizontally from the upper end of the tank body 4 in the front-rear direction (left-right direction in FIG. 1), and its rear end penetrates through the tank body 4 and projects rearward.

一対の回転軸56の各々の後端部は、適宜の伝動機構(
図示していない)を介して、電動モータでよい回転駆動
源58に駆動連結されている。槽本体4内を延在する一
対の回転軸56の主部の前半部60と後半部62とには
、相互に逆方向の雌螺条が刻設されている。そして、か
かる前半部60と後半部62とは、夫々、対応する雌螺
条が形成されている滑動ブロック64及び66が螺着さ
れている。滑動ブロック64及び66は、リンク機構6
8を介して、上記パケット50の底板の両側部に形成さ
れている直立連結片70に連結されている。上記リンク
機構68は、第1のリンク対72及び74、第2のリン
ク対76及び78及び第3のリンク対80及び82を有
する。第1のリンク対72及び74の上端は、夫々、上
記滑動ブロック64及び66に旋回自在に連結され、第
1のリンク対72及び74の中間部は、相互に旋回自在
に連結されている。第2のリンク対76及び78の上端
は、夫々、第1のリンク対72及び74の下端に旋回自
在に連結され、第2のリンク対76及び78の中間部は
、相互に旋回自在に連結されている。更に、第2のリン
ク対76及び78の下端は、夫々、第3のリンク対80
及び82の上端に旋回自在に連結され、第3のリンク対
80及び82の下端は、上記直立連結片70に旋回自在
に連結されている。かくの通りであるので、回転駆動源
58によって一対の回転軸56が例えば第1図において
左方から見て時計方向に回転せしめられると、滑動ブロ
ック64及び66が夫々矢印84で示す方向に移動され
、かくしてバケット50が実質上鉛直な方向に上昇にせ
しめられる。逆に、回転駆動源58によって一対の回転
軸58が第1図において左方から見て反時計方向に回転
せしめられると、滑動ブロック64及び66が夫々矢印
86で示す方向に移動され、かくしてバケット50が実
質上鉛直な方向に下降せしめられる。
The rear end portion of each of the pair of rotating shafts 56 is connected to a suitable transmission mechanism (
(not shown) to a rotary drive source 58, which may be an electric motor. The front half 60 and rear half 62 of the main parts of the pair of rotating shafts 56 extending inside the tank body 4 are provided with internal threads running in mutually opposite directions. Sliding blocks 64 and 66 having corresponding internal threads are screwed to the front half 60 and rear half 62, respectively. The sliding blocks 64 and 66 are connected to the link mechanism 6
8 to upright connecting pieces 70 formed on both sides of the bottom plate of the packet 50. The link mechanism 68 has a first pair of links 72 and 74, a second pair of links 76 and 78, and a third pair of links 80 and 82. The upper ends of the first pair of links 72 and 74 are pivotally connected to the sliding blocks 64 and 66, respectively, and the intermediate portions of the first pair of links 72 and 74 are pivotally connected to each other. The upper ends of the second link pairs 76 and 78 are pivotally connected to the lower ends of the first link pairs 72 and 74, respectively, and the intermediate portions of the second link pairs 76 and 78 are pivotally connected to each other. has been done. Further, the lower ends of the second link pairs 76 and 78 are connected to the third link pairs 80, respectively.
and 82, and the lower ends of the third link pair 80 and 82 are pivotally connected to the upright connecting piece 70. As described above, when the pair of rotary shafts 56 are rotated clockwise when viewed from the left in FIG. 1 by the rotary drive source 58, the sliding blocks 64 and 66 move in the directions indicated by arrows 84, respectively. The bucket 50 is thus forced to rise in a substantially vertical direction. Conversely, when the pair of rotating shafts 58 are rotated counterclockwise when viewed from the left in FIG. 50 is lowered in a substantially vertical direction.

図示の洗浄装置には、更に、水分離器88及び排気体冷
却器90が装備されている。水分離器88の入口側はラ
イン92によって上記槽本体4の乾燥域12の下端に形
成されている収集溝44に接続されており、出口側はラ
イン94によって上記タンク26に接続されている。排
気体冷却器90の入口側はライン96によって上記槽本
体4の乾燥域12の上部に接続されており、出口側はラ
イン98によって上記タンク26に接続されている。
The illustrated cleaning device is further equipped with a water separator 88 and an exhaust cooler 90. The inlet side of the water separator 88 is connected by a line 92 to the collecting groove 44 formed at the lower end of the drying zone 12 of the tank body 4, and the outlet side is connected to the tank 26 by a line 94. The inlet side of the exhaust body cooler 90 is connected to the upper part of the drying area 12 of the tank body 4 by a line 96, and the outlet side is connected to the tank 26 by a line 98.

次に、上記洗浄装置を使用して実施することができる、
本発明に従う洗浄方法の好適例について説明する。
Next, it can be carried out using the above cleaning device,
A preferred example of the cleaning method according to the present invention will be described.

最初に、槽本体4の洗浄液8に洗浄液を充填して洗浄液
浴100を生成する。かかる洗浄液は、低沸点有機溶剤
と高沸点有機溶剤とを含有することが重要である。低沸
点有機溶剤としては、一般に、沸点が100℃以下であ
る有機溶剤、例えばメタノール、エタノール、イソプロ
ピルアルコール等のアルコール類、メチレンクロライド
、1゜1.1−トリクロロエタン等の塩素系炭化水素類
等が好適に使用され得る。また、高沸点有機溶剤として
は、一般に、沸点が100℃以上である有機溶剤、例え
ばエチレングリコール千ツメチルエーテル、ジエチレン
グリコールモノメチルエーテル、トリエチレングリコー
ルモノメチルエーテル、ポリエチレングリコールモノメ
チルエーテル、ジエチレンジオキサイド等のグリコール
エーテル類が好適に使用され得る。これらの低沸点有機
溶剤と高沸点有機溶剤とは、互いに相溶性を有する限り
特に制限されることなく、被洗浄体に付着したインキの
種類等に応じて適宜に選択して混合することができる。
First, the cleaning liquid bath 100 is generated by filling the cleaning liquid 8 in the tank body 4 with cleaning liquid. It is important that such a cleaning liquid contains a low boiling point organic solvent and a high boiling point organic solvent. Examples of low-boiling organic solvents generally include organic solvents with a boiling point of 100°C or less, such as alcohols such as methanol, ethanol, and isopropyl alcohol, and chlorinated hydrocarbons such as methylene chloride and 1°1.1-trichloroethane. It can be suitably used. The high boiling point organic solvent is generally an organic solvent with a boiling point of 100°C or higher, such as glycol ethers such as ethylene glycol methyl ether, diethylene glycol monomethyl ether, triethylene glycol monomethyl ether, polyethylene glycol monomethyl ether, and diethylene dioxide. can be suitably used. These low boiling point organic solvents and high boiling point organic solvents are not particularly limited as long as they are compatible with each other, and can be appropriately selected and mixed depending on the type of ink attached to the object to be cleaned. .

低沸点有機溶剤と高沸点有機溶剤との混合割合は、一般
に、重量割合で3=7乃至7:3程度でよい。洗浄液の
充填量は、第1図に図示する如く、洗浄液浴lOOの液
面が堰28の上縁よりも幾分下方になる程度であるのが
好ましい。
The mixing ratio of the low boiling point organic solvent and the high boiling point organic solvent may generally be about 3=7 to 7:3 in terms of weight ratio. The filling amount of the cleaning liquid is preferably such that the liquid level of the cleaning liquid bath lOO is somewhat below the upper edge of the weir 28, as shown in FIG.

更に、槽本体4に付設されたタンク26に低沸点有i溶
剤を充填して低沸点有機溶剤102を生成する。この低
沸点有機溶剤は上記洗浄液100中の低沸点有機溶剤と
同一であるのが好ましい。
Further, a tank 26 attached to the tank body 4 is filled with a low boiling point organic solvent 102 to produce a low boiling point organic solvent 102. This low boiling point organic solvent is preferably the same as the low boiling point organic solvent in the cleaning liquid 100 described above.

低沸点有機溶剤はその液面が堰28の上縁に合致するま
で充填することができる。
The low boiling point organic solvent can be filled until its liquid level matches the upper edge of the weir 28.

上述した通りにして所謂前準備操作が完了すると、被洗
浄体の洗浄操作を開始することができる。
When the so-called preparatory operation is completed as described above, the cleaning operation of the object to be cleaned can be started.

最初に、バケット移動手段52によってバケット50を
2点鎖線50Aで示す上昇位置まで上昇せしめる。そし
て、扉6を開動せしめ、印刷機におけるインキ受皿、イ
ンキパイプ、アプリケータ等の洗浄すべき被洗浄体54
をバケット50に装填する。次いで、扉6を閉じて洗浄
槽2を密閉し、しかる後に、バケット50を例えば実線
で示す最下降位置まで下降せしめて、洗浄域8に存在す
る洗浄液浴100中に被洗浄体54を浸漬せしめ、かく
して洗浄工程を開始する。洗浄効果の向上のため、被洗
浄体54の浸漬に先立って或いはその後に、加熱手段2
4を付勢して洗浄液浴100を加熱する。洗浄液浴10
0中の低沸点有機溶剤の沸点より高く高沸点有機溶剤の
沸点より低い温度、一般に50″乃至90℃、特に55
°乃至80℃に洗浄液浴100を加熱するのが好ましい
。洗浄工程の際には、パケット50を例えば実線で示す
最下降位置と2点鎖線50Bで示す位置との間で適宜昇
降動せしめる、かくすると、洗浄液浴100中で被洗浄
体54が移動せしめられて、被洗浄体54の表面を洗浄
液が適宜に流動し、これによって溶解洗浄作用及び分離
洗浄作用が促進される。
First, the bucket 50 is raised by the bucket moving means 52 to the raised position indicated by the two-dot chain line 50A. Then, the door 6 is opened and the objects 54 to be cleaned, such as the ink tray, ink pipe, and applicator in the printing machine, are opened.
is loaded into the bucket 50. Next, the door 6 is closed to seal the cleaning tank 2, and then the bucket 50 is lowered, for example, to the lowest position shown by the solid line, and the object to be cleaned 54 is immersed in the cleaning liquid bath 100 present in the cleaning area 8. , thus starting the cleaning process. In order to improve the cleaning effect, the heating means 2 is heated before or after the object to be cleaned 54 is immersed.
4 to heat the cleaning liquid bath 100. Cleaning liquid bath 10
temperature higher than the boiling point of the low-boiling point organic solvent and lower than the boiling point of the high-boiling point organic solvent in
Preferably, the cleaning liquid bath 100 is heated to between 80°C and 80°C. During the cleaning process, the packet 50 is moved up and down as appropriate, for example, between the lowest position shown by the solid line and the position shown by the two-dot chain line 50B.In this way, the object to be cleaned 54 is moved in the cleaning liquid bath 100. As a result, the cleaning liquid flows appropriately over the surface of the object to be cleaned 54, thereby promoting the dissolution cleaning action and the separation cleaning action.

洗浄液浴100中での被洗浄体54の往復昇降動距離は
5乃至30CIl、特に10乃至20cmであるのが好
ましく、往復昇降動速度は5乃至20m/分であるのが
好ましく、往復昇降周期は20乃至40秒であるのが好
ましい。洗浄工程の際には、更に、ポンプ18が付勢さ
れて、洗浄液浴100からライン20を介して吸引され
た洗浄液がライン22を通して噴射ノズル16に送給さ
れ、噴射ノズル16から被洗浄体54に向けて噴射され
る。
The reciprocating lifting distance of the object to be cleaned 54 in the cleaning liquid bath 100 is preferably 5 to 30 CIl, particularly 10 to 20 cm, the reciprocating lifting speed is preferably 5 to 20 m/min, and the reciprocating lifting period is Preferably it is 20 to 40 seconds. During the cleaning process, the pump 18 is further energized, and the cleaning liquid sucked from the cleaning liquid bath 100 through the line 20 is fed through the line 22 to the injection nozzle 16, and from the injection nozzle 16 to the object to be cleaned 54. is sprayed towards.

噴射された洗浄液は被洗浄体54に衝突して、機械的洗
浄作用を被洗浄体54に加える。洗浄液の噴射は、被洗
浄体54の浸漬と同時或いはその数分後に開始すればよ
い。洗浄液の噴射速度は、5乃至20m/秒程度でよい
。所望ならば、更に、洗浄液中の被洗浄体54に超音波
を投射して超音波洗浄作用を生成することもできる。
The sprayed cleaning liquid collides with the object to be cleaned 54 and applies a mechanical cleaning action to the object to be cleaned 54 . The spraying of the cleaning liquid may be started at the same time as the object to be cleaned 54 is immersed, or several minutes later. The spraying speed of the cleaning liquid may be about 5 to 20 m/sec. If desired, ultrasonic waves can also be projected onto the object 54 in the cleaning liquid to create an ultrasonic cleaning action.

洗浄域8における上記洗浄工程が終了すると、パケット
50が2点鎖線50Cで示す位置まで上昇せしめられ、
被洗浄体54が洗浄液浴100から取り出されて仕上げ
域10に位置せしめられる。
When the cleaning process in the cleaning area 8 is completed, the packet 50 is raised to the position indicated by the two-dot chain line 50C,
The object to be cleaned 54 is removed from the cleaning liquid bath 100 and placed in the finishing area 10 .

そして、この仕上げ域IOにおいて仕上げ工程が遂行さ
れる。仕上げ工程においては、ポンプ34が付勢されて
、ライン36を介して低沸点有機溶剤溜102から吸引
された低沸点有機溶剤がライン38を通して噴射ノズル
32に送給され、噴射ノズル32から被洗浄体54に向
けて噴射される。
A finishing process is then performed in this finishing area IO. In the finishing process, the pump 34 is energized, and the low boiling point organic solvent sucked from the low boiling point organic solvent reservoir 102 through the line 36 is delivered to the injection nozzle 32 through the line 38, and from the injection nozzle 32, the low boiling point organic solvent is sucked from the low boiling point organic solvent reservoir 102 through the line 36. It is injected towards the body 54.

低沸点有機溶剤の噴射速度は2乃至8m/秒程度でよい
。仕上げ工程においては、噴射ノズル32から噴射され
る低沸点有機溶剤によって被洗浄体54が仕上げ洗浄さ
れると共に、洗浄域8に存在する洗浄液浴100から発
揮して上昇する気化低沸点有機溶剤も被洗浄体54に作
用し、かくして被洗浄体54は充分良好に仕上げ洗浄さ
れる。噴射ノズルから噴射された低沸点有機溶剤は、被
洗浄体54に衝突した後に洗浄液浴100に流下する。
The injection speed of the low boiling point organic solvent may be about 2 to 8 m/sec. In the finishing step, the object to be cleaned 54 is finished cleaned by the low-boiling organic solvent injected from the injection nozzle 32, and the vaporized low-boiling organic solvent rising from the cleaning liquid bath 100 present in the cleaning area 8 is also exposed. It acts on the body 54 to be cleaned, and thus the body 54 to be cleaned is sufficiently thoroughly cleaned. The low boiling point organic solvent injected from the injection nozzle collides with the object to be cleaned 54 and then flows down into the cleaning liquid bath 100 .

また、仕上げ域10中の気化低沸点有機溶剤の一部も、
凝縮用冷却手段42によって冷却されて液化され洗浄液
浴100中に流下する。所望ならば、仕上げ工程の際に
も仕上げ域lOにおいて被洗浄体54を周期的に昇降動
せしめることができる。
In addition, a portion of the vaporized low-boiling organic solvent in the finishing zone 10 is also
It is cooled and liquefied by the condensing cooling means 42 and flows down into the cleaning liquid bath 100. If desired, the object to be cleaned 54 can be periodically moved up and down in the finishing area IO during the finishing process.

仕上げ工程が終了すると、パケット50が2点鎖線50
Aで示す位置まで上昇せしめられて、被洗浄体54が乾
燥域I2に位置せしめられる。そして、この乾燥域I2
で遂行される乾燥工程においては、被洗浄体54が所要
時間乾燥域12に維持されて、充分に乾燥される。乾燥
域12まで上昇した気化低沸点有機溶剤の一部は、凝縮
用冷却手段48によって冷却されて液化され、収集溝4
4に流下する。収集溝44に収集された低沸点有機溶剤
は、ライン92を通って水分離器88に流入し、ここで
水分離作用を受けた後にライン94を通して低沸点有a
 ?8剤タンク26に戻される。また、乾燥域12に存
在する、気化低沸点有機溶剤を含有する気体は、ライン
96を通って排気体冷却器90に排出され、ここで冷却
されて液化された低沸点有機溶剤は、ライン98を通し
て低沸点有機溶剤タンク26に戻される。低沸点有機溶
剤タンク26内の低沸点有機溶剤が過剰になると、堰2
8を越えて洗浄域8中の洗浄液浴100に流入する。被
洗浄体54が充分に乾燥せしめられると、5i6を開動
せしめてバケット50から被洗浄体54を取り出す。
When the finishing process is completed, the packet 50 is shown along the two-dot chain line 50.
The object to be cleaned 54 is raised to the position indicated by A and positioned in the drying area I2. And this dry area I2
In the drying process carried out in , the object to be cleaned 54 is maintained in the drying area 12 for a required period of time to be sufficiently dried. A part of the vaporized low-boiling point organic solvent that has risen to the drying zone 12 is cooled and liquefied by the condensing cooling means 48, and then flows into the collection groove 4.
Flows down to 4. The low boiling point organic solvent collected in the collecting groove 44 flows through a line 92 to the water separator 88, where it is subjected to water separation, and then passes through the line 94 to the low boiling point organic solvent.
? It is returned to the 8-drug tank 26. Further, the gas containing the vaporized low-boiling organic solvent present in the drying zone 12 is discharged to the exhaust body cooler 90 through a line 96, and the low-boiling organic solvent cooled and liquefied here is discharged through a line 98. is returned to the low boiling point organic solvent tank 26 through. When the low boiling point organic solvent in the low boiling point organic solvent tank 26 becomes excessive, the weir 2
8 into the cleaning liquid bath 100 in the cleaning zone 8 . When the object to be cleaned 54 is sufficiently dried, the object to be cleaned 54 is taken out from the bucket 50 by opening 5i6.

上述した取りの洗浄方法を繰り返し遂行することによっ
て洗浄液浴100自体が汚染された場合には、廃液ライ
ン25を通して槽本体4の洗浄域8から洗浄液を排出し
、そして新しい洗浄液を洗a■域8に供給すればよい。
If the cleaning liquid bath 100 itself becomes contaminated by repeatedly performing the above-described cleaning method, the cleaning liquid is drained from the cleaning area 8 of the tank body 4 through the waste liquid line 25, and a new cleaning liquid is added to the cleaning area 8. It should be supplied to

〈実施例及び比較例〉 実施例 東洋インキ株式会社から販売されているゴム系及び硝化
綿糸インキが付着した、グラビア印刷機の付属61tt
品であるインキ皿、インキパイプ、及びアプリケータを
含む複数個の部材を、第1図に図示する通りの洗浄装置
を使用し、第1図を参照して説明した通りの洗浄方法に
準じて、下記条件下で洗浄した。
<Examples and Comparative Examples> Example 61 tt attached to a gravure printing machine coated with rubber-based and nitrified cotton yarn ink sold by Toyo Ink Co., Ltd.
A plurality of parts including the ink pan, ink pipe, and applicator are cleaned using the cleaning device shown in Figure 1 and in accordance with the cleaning method described with reference to Figure 1. , and washed under the following conditions.

+11洗浄槽の規模(奥行・幅) 洗浄域・・・1100龍X2400龍 仕上げ域・・1100龍×2400軸 乾燥域・・ 1200mmX2400mm(2)噴射ノ
ズル本数・間隔 垂直方向 水平方向 洗浄域・・・66本 2001@  200 mm仕上
げ域・・30本 250■−2501層(3)噴射速度 洗浄域(洗浄液)・・・・・・10m/秒仕上げ域(低
沸点有機溶剤)・・5m/秒(4)バケットの昇降 距離・・・・10cvA 周期・・・・20秒 速度・・・・6m/分 (5)洗浄液浴 組成           重量割合 塩化メチレン・・・・・・・・50% ジエチレングリコール千ツメチルエーテル・・・・50
% 温度・・・・・(io”c (6)に程時間 洗浄工程(洗浄域滞在時間)・・・・5分仕上げ工程(
仕上げ域l:fi在時間)・・1分乾燥工程(乾燥域滞
在時間)・・・・1分被洗浄体の洗浄効果は、下記第1
表に示す通りであった。
+11 Scale of cleaning tank (depth/width) Cleaning area...1100 Dragons x 2400 Dragons Finishing area...1100 Dragons x 2400 Axis drying area... 1200mm x 2400mm (2) Number of injection nozzles/interval Vertical direction Horizontal cleaning area... 66 pieces 2001 @ 200 mm Finishing area...30 pieces 250■-2501 layer (3) Injection speed Cleaning area (cleaning liquid)...10 m/sec Finishing area (low boiling point organic solvent)...5 m/sec ( 4) Bucket lifting distance: 10 cvA Period: 20 seconds Speed: 6 m/min (5) Cleaning liquid bath composition Weight percentage: Methylene chloride: 50% Diethylene glycol 1,000 methyl ether ...50
% Temperature...(io"c (6) Approx. time Washing process (cleaning area residence time)...5 minutes Finishing process (
Finishing area l: fi residence time)... 1 minute Drying process (drying area residence time)... 1 minute The cleaning effect of the object to be cleaned is as follows:
It was as shown in the table.

此1■生1 洗浄液浴を加熱することなく20℃に維持した以外は実
施例と同様にして洗浄を遂行した。被洗浄体の洗浄効果
は、下記第1表に示す通りであった。
This 1 Fresh 1 Washing was carried out in the same manner as in Example except that the washing liquid bath was maintained at 20° C. without heating. The cleaning effect on the object to be cleaned was as shown in Table 1 below.

壮士■汁て 実施例と同様にして洗浄を遂行した。その洗浄効果は、
下記第1表に示す通りであった。
Cleaning was carried out in the same manner as in the Example using Soji Soup. Its cleaning effect is
The results were as shown in Table 1 below.

ル較桝ユ 塩化メチレンのみから成る洗浄液浴を使用した以外は実
施例と同様にして洗浄を遂行した。被洗浄体の洗浄効果
は、下記第1表に示す通りであった。
Cleaning was carried out in the same manner as in the Examples except that a cleaning solution bath consisting only of methylene chloride was used. The cleaning effect on the object to be cleaned was as shown in Table 1 below.

仕上げ域における仕上げ工程を省略した以外は第 表 34・・・・・・ポンプ 42・・・・・・凝縮用冷却手段 44・・・・・・収集溝 48・・・・・・凝縮用冷却手段 50・・・・・・バケット 52・・・・・・バケット移動手段 54・・・・・・被洗浄体 88・・・・・・水分離器 90・・・・・・排気体冷却器 100・・・・・・洗浄液浴 102・・・・・・低沸点有機溶剤溜Except for omitting the finishing process in the finishing area. table 34...Pump 42... Condensing cooling means 44... Collection groove 48... Condensing cooling means 50...Bucket 52...Bucket transportation means 54...Object to be cleaned 88...Water separator 90...Exhaust body cooler 100...Cleaning liquid bath 102...Low boiling point organic solvent reservoir

Claims (1)

【特許請求の範囲】 1、低沸点有機溶剤と高沸点有機溶剤とを含有する洗浄
液浴中に被洗浄体を浸漬すること、該洗浄液浴を加熱す
ること、該洗浄液浴中において該被洗浄体を移動するこ
と、及び該被洗浄体が浸漬されている該洗浄液浴中に洗
浄液を噴射することを含む洗浄工程と、 該洗浄工程の後に該洗浄液浴から該被洗浄体を取り出し
て、低沸点有機溶剤を該被洗浄体に噴射することを含む
仕上げ工程と、 から成ることを特徴とする洗浄方法。 2、該洗浄工程において該洗浄液浴中の該低沸点有機溶
剤の沸点より高く該洗浄液浴中の該高沸点有機溶剤の沸
点より低い温度に該洗浄液浴を加熱する、請求項1記載
の洗浄方法。 3、該仕上げ工程において該被洗浄体に噴射される該低
沸点有機溶剤は該洗浄液浴中の該低沸点有機溶剤と同一
のものである、請求項1又は2記載の洗浄方法。 4、下部に位置する洗浄域及び該洗浄域の上方に位置す
る仕上げ域を有する洗浄槽と、該洗浄槽内に配設された
被洗浄体保持バケットと、該バケットを昇降動せしめる
ためのバケット昇降手段と、低沸点有機溶剤と高沸点有
機溶剤とを含有する洗浄液を該洗浄域に噴射する洗浄噴
射手段と、低沸点有機溶剤を該仕上げ域に噴射する仕上
げ噴射手段と、該洗浄域に配設された加熱手段と、を具
備することを特徴とする洗浄装置。 5、該洗浄槽は該仕上げ域の上方に位置する乾燥域を有
し、該仕上げ域及び該乾燥域には凝縮用冷却手段が配設
されている、請求項4記載の洗浄装置。 6、該洗浄槽には所定高さの堰を介して該洗浄域に隣接
する低沸点有機溶剤タンクが付設されており、該乾燥域
において該凝縮用冷却手段によって凝縮された低沸点有
機溶剤は該低沸点有機溶剤溜に送給され、該低沸点有機
溶剤タンクから該仕上げ噴射手段に低沸点有機溶剤が供
給される、請求項5記載の洗浄装置。 7、該洗浄槽の乾燥域に接続された排気体冷却手段が配
設されており、該乾燥域から該排気体冷却手段に流入し
た排気体中の気化低沸点有機溶剤は該排気体冷却手段に
て冷却されて該低沸点有機溶剤タンクに送給される、請
求項6記載の洗浄装置。
[Scope of Claims] 1. Immersing the object to be cleaned in a cleaning liquid bath containing a low boiling point organic solvent and a high boiling point organic solvent, heating the cleaning liquid bath, and immersing the object to be cleaned in the cleaning liquid bath. and injecting a cleaning liquid into the cleaning liquid bath in which the object to be cleaned is immersed; A cleaning method comprising: a finishing step including spraying an organic solvent onto the object to be cleaned. 2. The cleaning method according to claim 1, wherein in the cleaning step, the cleaning liquid bath is heated to a temperature higher than the boiling point of the low-boiling organic solvent in the cleaning liquid bath and lower than the boiling point of the high-boiling organic solvent in the cleaning liquid bath. . 3. The cleaning method according to claim 1 or 2, wherein the low boiling point organic solvent sprayed onto the object to be cleaned in the finishing step is the same as the low boiling point organic solvent in the cleaning liquid bath. 4. A cleaning tank having a cleaning area located at the bottom and a finishing area located above the cleaning area, a bucket for holding objects to be cleaned disposed in the cleaning tank, and a bucket for moving the bucket up and down. a lifting means, a cleaning injection means for injecting a cleaning liquid containing a low boiling point organic solvent and a high boiling point organic solvent into the cleaning area, a finishing injection means for injecting a low boiling point organic solvent into the finishing area, and a cleaning injection means for injecting a low boiling point organic solvent into the finishing area; A cleaning device comprising: a heating means provided therein. 5. The cleaning device according to claim 4, wherein the cleaning tank has a drying area located above the finishing area, and a condensing cooling means is provided in the finishing area and the drying area. 6. The cleaning tank is equipped with a low-boiling organic solvent tank adjacent to the cleaning area via a weir of a predetermined height, and the low-boiling organic solvent condensed by the condensation cooling means in the drying area is 6. The cleaning device according to claim 5, wherein the low boiling point organic solvent is fed to the low boiling point organic solvent reservoir and the low boiling point organic solvent is supplied from the low boiling point organic solvent tank to the finishing injection means. 7. An exhaust body cooling means connected to the drying area of the cleaning tank is provided, and the vaporized low boiling point organic solvent in the exhaust body that has flowed into the exhaust body cooling means from the drying area is absorbed by the exhaust body cooling means. 7. The cleaning device according to claim 6, wherein the low boiling point organic solvent is cooled in a tank and then fed to the low boiling point organic solvent tank.
JP63209370A 1988-08-25 1988-08-25 Cleaning method and apparatus Expired - Lifetime JP2582627B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63209370A JP2582627B2 (en) 1988-08-25 1988-08-25 Cleaning method and apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63209370A JP2582627B2 (en) 1988-08-25 1988-08-25 Cleaning method and apparatus

Publications (2)

Publication Number Publication Date
JPH0259086A true JPH0259086A (en) 1990-02-28
JP2582627B2 JP2582627B2 (en) 1997-02-19

Family

ID=16571807

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63209370A Expired - Lifetime JP2582627B2 (en) 1988-08-25 1988-08-25 Cleaning method and apparatus

Country Status (1)

Country Link
JP (1) JP2582627B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05123658A (en) * 1991-10-17 1993-05-21 Japan Field Kk Method for cleaning body to be cleaned and apparatus therefor
JP2016538111A (en) * 2013-10-10 2016-12-08 ドリーム ヒート トリーティング カンパニー,リミテッド Waste water recycling device and waste water recycling and cleaning equipment including the same
JP7305239B1 (en) * 2023-02-17 2023-07-10 ジャパン・フィールド株式会社 Cleaning equipment for objects to be cleaned

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05123658A (en) * 1991-10-17 1993-05-21 Japan Field Kk Method for cleaning body to be cleaned and apparatus therefor
JP2016538111A (en) * 2013-10-10 2016-12-08 ドリーム ヒート トリーティング カンパニー,リミテッド Waste water recycling device and waste water recycling and cleaning equipment including the same
JP2017192941A (en) * 2013-10-10 2017-10-26 ドリーム ヒート トリーティング カンパニー,リミテッド Waste water recycling and cleaning apparatus
JP7305239B1 (en) * 2023-02-17 2023-07-10 ジャパン・フィールド株式会社 Cleaning equipment for objects to be cleaned

Also Published As

Publication number Publication date
JP2582627B2 (en) 1997-02-19

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