JPH0257299B2 - - Google Patents

Info

Publication number
JPH0257299B2
JPH0257299B2 JP11842084A JP11842084A JPH0257299B2 JP H0257299 B2 JPH0257299 B2 JP H0257299B2 JP 11842084 A JP11842084 A JP 11842084A JP 11842084 A JP11842084 A JP 11842084A JP H0257299 B2 JPH0257299 B2 JP H0257299B2
Authority
JP
Japan
Prior art keywords
photosensitive
acid
photosensitive composition
present
group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP11842084A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60262154A (ja
Inventor
Toshuki Sekya
Norimasa Aotani
Hiroshi Misu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP11842084A priority Critical patent/JPS60262154A/ja
Publication of JPS60262154A publication Critical patent/JPS60262154A/ja
Publication of JPH0257299B2 publication Critical patent/JPH0257299B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/016Diazonium salts or compounds
    • G03F7/021Macromolecular diazonium compounds; Macromolecular additives, e.g. binders

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
JP11842084A 1984-06-08 1984-06-08 感光性組成物 Granted JPS60262154A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11842084A JPS60262154A (ja) 1984-06-08 1984-06-08 感光性組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11842084A JPS60262154A (ja) 1984-06-08 1984-06-08 感光性組成物

Publications (2)

Publication Number Publication Date
JPS60262154A JPS60262154A (ja) 1985-12-25
JPH0257299B2 true JPH0257299B2 (fr) 1990-12-04

Family

ID=14736198

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11842084A Granted JPS60262154A (ja) 1984-06-08 1984-06-08 感光性組成物

Country Status (1)

Country Link
JP (1) JPS60262154A (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0823693B2 (ja) * 1985-12-04 1996-03-06 コニカ株式会社 感光性組成物及び感光性平版印刷版材料

Also Published As

Publication number Publication date
JPS60262154A (ja) 1985-12-25

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term