JPH0256343U - - Google Patents
Info
- Publication number
- JPH0256343U JPH0256343U JP13638888U JP13638888U JPH0256343U JP H0256343 U JPH0256343 U JP H0256343U JP 13638888 U JP13638888 U JP 13638888U JP 13638888 U JP13638888 U JP 13638888U JP H0256343 U JPH0256343 U JP H0256343U
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- expansion chamber
- chamber
- microwave
- magnetic field
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000003058 plasma substitute Substances 0.000 claims description 9
- 238000000605 extraction Methods 0.000 claims description 4
- 230000001133 acceleration Effects 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
Landscapes
- Electron Sources, Ion Sources (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13638888U JPH0256343U (US20100056889A1-20100304-C00004.png) | 1988-10-19 | 1988-10-19 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13638888U JPH0256343U (US20100056889A1-20100304-C00004.png) | 1988-10-19 | 1988-10-19 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0256343U true JPH0256343U (US20100056889A1-20100304-C00004.png) | 1990-04-24 |
Family
ID=31396850
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13638888U Pending JPH0256343U (US20100056889A1-20100304-C00004.png) | 1988-10-19 | 1988-10-19 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0256343U (US20100056889A1-20100304-C00004.png) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012524376A (ja) * | 2009-04-16 | 2012-10-11 | ヴァリアン セミコンダクター イクイップメント アソシエイツ インコーポレイテッド | 幅広リボンビームの生成および制御のための複合型icpおよびecrプラズマ源 |
-
1988
- 1988-10-19 JP JP13638888U patent/JPH0256343U/ja active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012524376A (ja) * | 2009-04-16 | 2012-10-11 | ヴァリアン セミコンダクター イクイップメント アソシエイツ インコーポレイテッド | 幅広リボンビームの生成および制御のための複合型icpおよびecrプラズマ源 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US5133825A (en) | Plasma generating apparatus | |
US4713585A (en) | Ion source | |
KR940010844B1 (ko) | 이온 원(源) | |
US5006218A (en) | Sputtering apparatus | |
ITFI940194A1 (it) | Sorgente di plasma a radiofrequenza | |
EP0639939B1 (en) | Fast atom beam source | |
EP0502429B1 (en) | Fast atom beam source | |
JPH0256343U (US20100056889A1-20100304-C00004.png) | ||
JP3504290B2 (ja) | 低エネルギー中性粒子線発生方法及び装置 | |
US6040547A (en) | Gas discharge device | |
JP2567892B2 (ja) | プラズマ処理装置 | |
US4931698A (en) | Ion source | |
JPH09259781A (ja) | イオン源装置 | |
JP2834147B2 (ja) | 荷電粒子ビームの形成方法 | |
WO2001022465A1 (en) | Plasma source of linear ion beam | |
JPS6127053A (ja) | 電子ビ−ム源 | |
JPH01161699A (ja) | 高速原子線源 | |
JPS617542A (ja) | マイクロ波イオン源 | |
JPH0633680Y2 (ja) | 電子サイクロトロン共鳴プラズマ発生装置 | |
JPH0650111B2 (ja) | Rf型イオン源 | |
JPS6271146A (ja) | 高周波イオン源 | |
JPH0636695A (ja) | 高周波イオン源装置 | |
JPS59151737A (ja) | イオン源 | |
JPS6263179A (ja) | Rf型イオン源 | |
JPH02114433A (ja) | イオン処理装置 |