JPH0247030U - - Google Patents
Info
- Publication number
- JPH0247030U JPH0247030U JP12585888U JP12585888U JPH0247030U JP H0247030 U JPH0247030 U JP H0247030U JP 12585888 U JP12585888 U JP 12585888U JP 12585888 U JP12585888 U JP 12585888U JP H0247030 U JPH0247030 U JP H0247030U
- Authority
- JP
- Japan
- Prior art keywords
- cylindrical
- electrode
- processing apparatus
- plasma processing
- chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims description 8
- 230000005684 electric field Effects 0.000 claims 2
- 239000007789 gas Substances 0.000 claims 1
- 239000012495 reaction gas Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 1
Landscapes
- Chemical Vapour Deposition (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12585888U JPH0247030U (US08063081-20111122-C00044.png) | 1988-09-26 | 1988-09-26 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12585888U JPH0247030U (US08063081-20111122-C00044.png) | 1988-09-26 | 1988-09-26 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0247030U true JPH0247030U (US08063081-20111122-C00044.png) | 1990-03-30 |
Family
ID=31376835
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12585888U Pending JPH0247030U (US08063081-20111122-C00044.png) | 1988-09-26 | 1988-09-26 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0247030U (US08063081-20111122-C00044.png) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008181704A (ja) * | 2007-01-23 | 2008-08-07 | National Institute Of Advanced Industrial & Technology | 高密度プラズマ処理装置 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58200538A (ja) * | 1982-05-19 | 1983-11-22 | Hitachi Ltd | ドライエツチング装置 |
| JPS6063919A (ja) * | 1983-09-17 | 1985-04-12 | Anelva Corp | 表面処理装置 |
| JPS60195939A (ja) * | 1984-03-19 | 1985-10-04 | Hitachi Ltd | プラズマ処理装置 |
| JPS61226925A (ja) * | 1985-04-01 | 1986-10-08 | Anelva Corp | 放電反応装置 |
-
1988
- 1988-09-26 JP JP12585888U patent/JPH0247030U/ja active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58200538A (ja) * | 1982-05-19 | 1983-11-22 | Hitachi Ltd | ドライエツチング装置 |
| JPS6063919A (ja) * | 1983-09-17 | 1985-04-12 | Anelva Corp | 表面処理装置 |
| JPS60195939A (ja) * | 1984-03-19 | 1985-10-04 | Hitachi Ltd | プラズマ処理装置 |
| JPS61226925A (ja) * | 1985-04-01 | 1986-10-08 | Anelva Corp | 放電反応装置 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008181704A (ja) * | 2007-01-23 | 2008-08-07 | National Institute Of Advanced Industrial & Technology | 高密度プラズマ処理装置 |
