JPH0245629U - - Google Patents
Info
- Publication number
- JPH0245629U JPH0245629U JP12498388U JP12498388U JPH0245629U JP H0245629 U JPH0245629 U JP H0245629U JP 12498388 U JP12498388 U JP 12498388U JP 12498388 U JP12498388 U JP 12498388U JP H0245629 U JPH0245629 U JP H0245629U
- Authority
- JP
- Japan
- Prior art keywords
- gas injection
- reactive ion
- ion etching
- chamber
- cylindrical portion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000002347 injection Methods 0.000 claims description 13
- 239000007924 injection Substances 0.000 claims description 13
- 239000007789 gas Substances 0.000 claims 8
- 238000001020 plasma etching Methods 0.000 claims 4
- 239000012495 reaction gas Substances 0.000 claims 2
- 238000005530 etching Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 5
Landscapes
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12498388U JPH0245629U (no) | 1988-09-22 | 1988-09-22 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12498388U JPH0245629U (no) | 1988-09-22 | 1988-09-22 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0245629U true JPH0245629U (no) | 1990-03-29 |
Family
ID=31375186
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12498388U Pending JPH0245629U (no) | 1988-09-22 | 1988-09-22 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0245629U (no) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1998046808A1 (fr) * | 1997-04-11 | 1998-10-22 | Tokyo Electron Limited | Processeur |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6046029A (ja) * | 1983-08-24 | 1985-03-12 | Hitachi Ltd | 半導体製造装置 |
JPS60123033A (ja) * | 1983-12-07 | 1985-07-01 | Hitachi Ltd | プラズマ処理装置 |
JPS61226925A (ja) * | 1985-04-01 | 1986-10-08 | Anelva Corp | 放電反応装置 |
JPS62299031A (ja) * | 1986-06-18 | 1987-12-26 | Nec Corp | 平行平板型エツチング装置の電極構造 |
JPS6317529A (ja) * | 1986-07-09 | 1988-01-25 | Toshiba Corp | エツチング装置 |
-
1988
- 1988-09-22 JP JP12498388U patent/JPH0245629U/ja active Pending
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6046029A (ja) * | 1983-08-24 | 1985-03-12 | Hitachi Ltd | 半導体製造装置 |
JPS60123033A (ja) * | 1983-12-07 | 1985-07-01 | Hitachi Ltd | プラズマ処理装置 |
JPS61226925A (ja) * | 1985-04-01 | 1986-10-08 | Anelva Corp | 放電反応装置 |
JPS62299031A (ja) * | 1986-06-18 | 1987-12-26 | Nec Corp | 平行平板型エツチング装置の電極構造 |
JPS6317529A (ja) * | 1986-07-09 | 1988-01-25 | Toshiba Corp | エツチング装置 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1998046808A1 (fr) * | 1997-04-11 | 1998-10-22 | Tokyo Electron Limited | Processeur |
KR100469047B1 (ko) * | 1997-04-11 | 2005-01-31 | 동경 엘렉트론 주식회사 | 처리장치, 상부전극유니트와 그 사용방법 및 전극유니트와 그 제조방법 |
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