JPH0243867Y2 - - Google Patents
Info
- Publication number
- JPH0243867Y2 JPH0243867Y2 JP1986065062U JP6506286U JPH0243867Y2 JP H0243867 Y2 JPH0243867 Y2 JP H0243867Y2 JP 1986065062 U JP1986065062 U JP 1986065062U JP 6506286 U JP6506286 U JP 6506286U JP H0243867 Y2 JPH0243867 Y2 JP H0243867Y2
- Authority
- JP
- Japan
- Prior art keywords
- discharge
- pressure
- vacuum chamber
- gas introduction
- introduction mechanism
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Physical Vapour Deposition (AREA)
- Electrodes Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986065062U JPH0243867Y2 (OSRAM) | 1986-05-01 | 1986-05-01 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986065062U JPH0243867Y2 (OSRAM) | 1986-05-01 | 1986-05-01 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61183965U JPS61183965U (OSRAM) | 1986-11-17 |
| JPH0243867Y2 true JPH0243867Y2 (OSRAM) | 1990-11-21 |
Family
ID=30596712
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1986065062U Expired JPH0243867Y2 (OSRAM) | 1986-05-01 | 1986-05-01 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0243867Y2 (OSRAM) |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52104476A (en) * | 1976-03-01 | 1977-09-01 | Hitachi Ltd | Ion spattering apparatus |
| JPS56152973A (en) * | 1980-04-30 | 1981-11-26 | Tokuda Seisakusho Ltd | Sputter etching device |
-
1986
- 1986-05-01 JP JP1986065062U patent/JPH0243867Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61183965U (OSRAM) | 1986-11-17 |
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