JPH023490B2 - - Google Patents
Info
- Publication number
- JPH023490B2 JPH023490B2 JP18473080A JP18473080A JPH023490B2 JP H023490 B2 JPH023490 B2 JP H023490B2 JP 18473080 A JP18473080 A JP 18473080A JP 18473080 A JP18473080 A JP 18473080A JP H023490 B2 JPH023490 B2 JP H023490B2
- Authority
- JP
- Japan
- Prior art keywords
- microcapsules
- metal layer
- metal
- laser light
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000003094 microcapsule Substances 0.000 claims description 17
- 229910052751 metal Inorganic materials 0.000 claims description 16
- 239000002184 metal Substances 0.000 claims description 16
- 238000000034 method Methods 0.000 claims description 13
- 239000000758 substrate Substances 0.000 claims description 8
- 239000000463 material Substances 0.000 claims description 7
- 150000002736 metal compounds Chemical class 0.000 claims description 2
- 230000001678 irradiating effect Effects 0.000 claims 1
- 239000011521 glass Substances 0.000 description 7
- 150000002902 organometallic compounds Chemical class 0.000 description 7
- 108010010803 Gelatin Proteins 0.000 description 5
- 229920000159 gelatin Polymers 0.000 description 5
- 239000008273 gelatin Substances 0.000 description 5
- 235000019322 gelatine Nutrition 0.000 description 5
- 235000011852 gelatine desserts Nutrition 0.000 description 5
- 239000002904 solvent Substances 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 239000001307 helium Substances 0.000 description 2
- 229910052734 helium Inorganic materials 0.000 description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910001111 Fine metal Inorganic materials 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 239000002775 capsule Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 108010025899 gelatin film Proteins 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/76—Patterning of masks by imaging
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Manufacturing Of Printed Wiring (AREA)
Description
【発明の詳細な説明】
本発明はフオトマスク等の金属パターンを形成
する方法に関するので、特に有機金属化合物の蒸
気を封入したマイクロカプセルを利用する方法に
関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for forming metal patterns for photomasks and the like, and particularly relates to a method using microcapsules encapsulating vapor of an organometallic compound.
フオトマスクのうち、ハードマスクと呼ばれる
種類のものは、通常ガラス基板上に被着したクロ
ムなどの金属層によつて必要なパターンが形成さ
れている。此種のマスクはガラス基板全面にスパ
ツタなどの方法で金属層を被着し、これをフオト
プロセスによつてパターニングするという方法に
よつて製造されている。このような方法では工程
数が多い上に、不要部分に被着した金属材料が無
駄になるといつた問題もあつた。これはフオトマ
スクだけでなく、広く金属層パターンを形成する
場合に共通した問題である。 Among photomasks, a type called a hard mask usually has a necessary pattern formed by a metal layer such as chromium deposited on a glass substrate. This type of mask is manufactured by a method in which a metal layer is deposited on the entire surface of a glass substrate by a method such as sputtering, and this is patterned by a photo process. This method requires a large number of steps and also has the problem that the metal material deposited on unnecessary parts is wasted. This is a common problem not only with photomasks but also with a wide range of metal layer patterns.
本発明はこのような問題の無い新規な金属パタ
ーン形成法を提供するもので、有機金属化合物の
蒸気を封入したマイクロカプセルから成る感光材
を基板表面に塗布し、選択的に紫外レーザ光を照
射することによつて金属層を析出させることを特
徴としている。 The present invention provides a novel method for forming metal patterns free from such problems, in which a photosensitive material consisting of microcapsules containing organic metal compound vapor is applied to the surface of a substrate, and selectively irradiated with ultraviolet laser light. The method is characterized in that a metal layer is deposited by depositing a metal layer.
ジメルチカドミウムやトリメチルアルミニウム
等の有機金属化合物の蒸気に紫外レーザ（以上
UVレーザと記す）を照射することによつてその
化学結合を断ち、カドミウミやアルミニウムのよ
うな金属体を析出させ得ることが知られている。 Ultraviolet laser (or more)
It is known that irradiation with UV laser (hereinafter referred to as UV laser) can break the chemical bonds and precipitate metals such as cadmium and aluminum.
しかしながら、此等の有機金属化合物は烈しい
反応性を示すものであり、不活性ガス（例えばヘ
リウム）に稀釈して使用することが必要である
他、反応系を気密に保つ必要がある等、制約が多
くそのままでは扱い難い材料である。 However, these organometallic compounds exhibit strong reactivity, and they must be diluted with an inert gas (for example, helium) before use, and the reaction system must be kept airtight. This material is difficult to handle as it is.
本発明に於てはこのような材料を容易に且安全
に取扱い得るようにする為、この有機金属化合物
の蒸気をマイクロカプセルに封入し、これを溶媒
中に分散させるものを用いる。 In the present invention, in order to be able to handle such materials easily and safely, the vapor of this organometallic compound is encapsulated in microcapsules, and the microcapsules are dispersed in a solvent.
マイクロカプセル用の材料としては薬品工業の
分野で常用されるゼラチンが利用可能であり、マ
イクロカプセルへの封入も公知技術によればよ
い。前記有機金属化合物の蒸気を１〜10Torr程
度、ヘリウム等の不活性ガスを750Torr程度含有
する混合ガスをマイクロカプセルに封入する。有
機金属化合物の量は、使用温度における飽和蒸気
圧相当量まで増すことができる。 Gelatin, which is commonly used in the pharmaceutical industry, can be used as a material for microcapsules, and encapsulation into microcapsules may be performed using known techniques. A mixed gas containing the vapor of the organometallic compound at about 1 to 10 Torr and an inert gas such as helium at about 750 Torr is sealed in a microcapsule. The amount of organometallic compound can be increased up to the equivalent of the saturated vapor pressure at the temperature of use.
カプセル材料がゼラチンであれば、これは有機
溶剤には不溶なので、マイクロカプセルをアルコ
ール、アセトン等の比較的揮発しやすい溶媒中に
分散させてコロイド状或はペースト状とし、これ
を金属層パターンが形成さるべき基板、例えばガ
ラス板に塗布し、溶媒を蒸発させる。この状態が
第１図に示されており、ガラス板１の表面に多数
のマイクロカプセル２が被着し、層をなしてい
る。 If the capsule material is gelatin, it is insoluble in organic solvents, so the microcapsules are dispersed in a relatively volatile solvent such as alcohol or acetone to form a colloid or paste, and this is used to form a metal layer pattern. It is applied to the substrate to be formed, for example a glass plate, and the solvent is evaporated. This state is shown in FIG. 1, where a large number of microcapsules 2 are adhered to the surface of the glass plate 1, forming a layer.
このような処理をほどこしたガラス板に、第２
図に示すように紫外レーザ光を走査的に照射す
る。UVレーザ光源４から放射されるUVレーザ
光は、図示されていないが光学的機構的偏向装置
によつて偏向され、必要なパターン３を描くよう
に走査される。 A glass plate that has been treated in this way is then coated with a second
As shown in the figure, ultraviolet laser light is applied in a scanning manner. The UV laser light emitted from the UV laser light source 4 is deflected by an optical and mechanical deflection device (not shown) and scanned to draw a required pattern 3.
UVレーザ光に照射されたマイクロカプセル内
の有機金属化合物はレーザ光のエネルギーの為そ
の化学結合を断たれて金属体を析出する。この時
マイクロカプセルも破壊されるのでUVレーザに
照射された部分は微細な金属片を多量に含むゼラ
チン膜がガラス板に被着した状態となる。一方、
レーザ光の照射を受けなかつた部分は塗布された
時の状態のまま残しているので、アルコール等で
洗うことによつて除去される。この除去されたマ
イクロカプセルを再度使用することは可能であ
る。 The organometallic compound inside the microcapsule irradiated with UV laser light breaks its chemical bonds due to the energy of the laser light, and precipitates a metal body. At this time, the microcapsules are also destroyed, so a gelatin film containing a large amount of fine metal pieces adheres to the glass plate in the area irradiated with the UV laser. on the other hand,
The parts that were not irradiated with the laser light remain in the same state as when they were applied, so they can be removed by washing with alcohol or the like. It is possible to use the removed microcapsules again.
このようにして形成された金属層は、層を構成
する金属体が微小片であつてゼラチンと混合して
いる為、このままでは導電性は良好ではないが、
フオトマスクを形成するのに必要な遮光性は十分
に備えている。 The metal layer formed in this way does not have good conductivity as it is because the metal bodies that make up the layer are minute pieces and are mixed with gelatin.
It has sufficient light-shielding properties necessary to form a photomask.
以上説明したように本発明によれば、感光材料
としての有機金属化合物の取扱いが安全且容易と
なる他、直接パターンを作成するので工程が簡略
化されるという効果が得られる。 As explained above, according to the present invention, it is possible to safely and easily handle an organometallic compound as a photosensitive material, and the process is simplified because a pattern is directly created.
なお、本発明の方法によつて形成した金属層の
導電性を上げるには、ゼラチン量を減らしてやれ
ばよいから、層自体が基板からはく離しないよう
にして、表面から温水でゼラチンを溶解除去する
といつた方法を採ればよい。 Note that in order to increase the conductivity of the metal layer formed by the method of the present invention, it is sufficient to reduce the amount of gelatin. Therefore, the gelatin can be dissolved and removed from the surface with hot water without peeling the layer itself from the substrate. All you have to do is use the old method.
第１図、第２図は本発明を説明する図であつ
て、第１図は基板にマイクロカプセルが付着して
いる状態を示す図、第２図はパターン描画の状況
を示す図である。図に於て、１はガラス基板、２
はマイクロカプセル、３は金属層パターン、４は
UVレーザ源である。
1 and 2 are diagrams for explaining the present invention, in which FIG. 1 shows a state in which microcapsules are attached to a substrate, and FIG. 2 shows a state in which a pattern is drawn. In the figure, 1 is a glass substrate, 2
is a microcapsule, 3 is a metal layer pattern, 4 is a
UV laser source.
Claims (1)
プセルから成る感光材を、紫外光領域の電磁波に
対し透明である基板表面に塗布し、選択的に紫外
レーザ光を照射することによつて金属層を析出さ
せると同時に前記マイクロカプセルを溶融破壊
し、破壊されなかつた前記マイクロカプセルを除
去することを特徴とする金属パターン形成法。1 A photosensitive material consisting of microcapsules containing organic metal compound vapor is applied to the surface of a substrate that is transparent to electromagnetic waves in the ultraviolet region, and a metal layer is deposited by selectively irradiating it with ultraviolet laser light. A method for forming a metal pattern, characterized in that the microcapsules are simultaneously melted and destroyed, and the microcapsules that have not been destroyed are removed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18473080A JPS57108850A (en) | 1980-12-25 | 1980-12-25 | Formation of metallic pattern |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18473080A JPS57108850A (en) | 1980-12-25 | 1980-12-25 | Formation of metallic pattern |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57108850A JPS57108850A (en) | 1982-07-07 |
| JPH023490B2 true JPH023490B2 (en) | 1990-01-23 |
Family
ID=16158354
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18473080A Granted JPS57108850A (en) | 1980-12-25 | 1980-12-25 | Formation of metallic pattern |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57108850A (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5998590A (en) * | 1982-11-27 | 1984-06-06 | 株式会社東芝 | Method of producing thin film |
| FR2894691B1 (en) * | 2005-12-13 | 2008-01-18 | Commissariat Energie Atomique | METHOD FOR MANUFACTURING LITHOGRAPHIC MASK IN REFLECTION AND MASK DERIVED FROM THE PROCESS |
| KR102352740B1 (en) * | 2015-04-30 | 2022-01-18 | 삼성디스플레이 주식회사 | Method of manufacturing mask and method of manufacturing display apparatus |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS50459A (en) * | 1973-05-09 | 1975-01-07 |
-
1980
- 1980-12-25 JP JP18473080A patent/JPS57108850A/en active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS50459A (en) * | 1973-05-09 | 1975-01-07 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS57108850A (en) | 1982-07-07 |
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