JPH0234381B2 - - Google Patents

Info

Publication number
JPH0234381B2
JPH0234381B2 JP57085382A JP8538282A JPH0234381B2 JP H0234381 B2 JPH0234381 B2 JP H0234381B2 JP 57085382 A JP57085382 A JP 57085382A JP 8538282 A JP8538282 A JP 8538282A JP H0234381 B2 JPH0234381 B2 JP H0234381B2
Authority
JP
Japan
Prior art keywords
processing
processing liquid
plate
photosensitive material
tank
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57085382A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58202444A (ja
Inventor
Takeshi Nakamura
Goro Tezuka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP8538282A priority Critical patent/JPS58202444A/ja
Publication of JPS58202444A publication Critical patent/JPS58202444A/ja
Publication of JPH0234381B2 publication Critical patent/JPH0234381B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03D—APPARATUS FOR PROCESSING EXPOSED PHOTOGRAPHIC MATERIALS; ACCESSORIES THEREFOR
    • G03D5/00—Liquid processing apparatus in which no immersion is effected; Washing apparatus in which no immersion is effected
    • G03D5/04—Liquid processing apparatus in which no immersion is effected; Washing apparatus in which no immersion is effected using liquid sprays

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photographic Processing Devices Using Wet Methods (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP8538282A 1982-05-20 1982-05-20 感光材料処理装置 Granted JPS58202444A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8538282A JPS58202444A (ja) 1982-05-20 1982-05-20 感光材料処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8538282A JPS58202444A (ja) 1982-05-20 1982-05-20 感光材料処理装置

Publications (2)

Publication Number Publication Date
JPS58202444A JPS58202444A (ja) 1983-11-25
JPH0234381B2 true JPH0234381B2 (enrdf_load_stackoverflow) 1990-08-02

Family

ID=13857183

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8538282A Granted JPS58202444A (ja) 1982-05-20 1982-05-20 感光材料処理装置

Country Status (1)

Country Link
JP (1) JPS58202444A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6141249U (ja) * 1984-08-18 1986-03-15 コニカ株式会社 感光材料処理装置
ES2209231T3 (es) 1997-12-22 2004-06-16 Asahi Kasei Kabushiki Kaisha Metodo para llevar a cabo el revelado de una placa de resina fotosensible y aparato de revelado.

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5366301U (enrdf_load_stackoverflow) * 1976-11-05 1978-06-03
JPS54113265A (en) * 1978-02-23 1979-09-04 Mitsubishi Electric Corp Resistor developing equipement

Also Published As

Publication number Publication date
JPS58202444A (ja) 1983-11-25

Similar Documents

Publication Publication Date Title
US4521092A (en) Developing light sensitive plates including use of ultrasonic waves
JPH0234381B2 (enrdf_load_stackoverflow)
JP2522818B2 (ja) 感光性平版印刷版処理機
JPH067257B2 (ja) 感光材料現像装置
JP2522822B2 (ja) 感光性平版印刷版現像処理方法および装置
GB1393558A (en) Method of and apparatus for developing photosensitive material
JPH023541Y2 (enrdf_load_stackoverflow)
JPH1012529A (ja) レジスト現像方法およびレジスト現像装置
JPH0244300Y2 (enrdf_load_stackoverflow)
JPH0327038B2 (enrdf_load_stackoverflow)
JPH026448Y2 (enrdf_load_stackoverflow)
JP2514249Y2 (ja) 自動現像機内の渡りロ―ラ洗浄装置
JPH05249693A (ja) 感光性平版印刷版処理装置
JPH0741000Y2 (ja) 自動現像機
JPH07175195A (ja) 液体の分離
JP3685642B2 (ja) フィルム処理装置
JP2595742Y2 (ja) 感光材料処理装置
JPH0643817Y2 (ja) 液体現像装置
JPH0336996Y2 (enrdf_load_stackoverflow)
JPH11194469A (ja) トレイ組立体及び案内経路配置を利用する処理装置並びに方法
JPH0252355A (ja) 感光性平版印刷版現像処理方法および装置
JPH065372B2 (ja) 写真現像方法及び装置
JPH11194466A (ja) 写真材料を処理する方法及び装置
JPH0457052A (ja) 感光性平版印刷版の現像方法及び現像装置
JPS63245924A (ja) 感光性有機膜の現像方法