JPH0233261U - - Google Patents
Info
- Publication number
- JPH0233261U JPH0233261U JP10998588U JP10998588U JPH0233261U JP H0233261 U JPH0233261 U JP H0233261U JP 10998588 U JP10998588 U JP 10998588U JP 10998588 U JP10998588 U JP 10998588U JP H0233261 U JPH0233261 U JP H0233261U
- Authority
- JP
- Japan
- Prior art keywords
- sample
- slow
- wave circuit
- microwave
- comb
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Chemical Vapour Deposition (AREA)
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title | 
|---|---|---|---|
| JP10998588U JPH0623570Y2 (ja) | 1988-08-24 | 1988-08-24 | プラズマ発生装置 | 
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title | 
|---|---|---|---|
| JP10998588U JPH0623570Y2 (ja) | 1988-08-24 | 1988-08-24 | プラズマ発生装置 | 
Publications (2)
| Publication Number | Publication Date | 
|---|---|
| JPH0233261U true JPH0233261U (OSRAM) | 1990-03-01 | 
| JPH0623570Y2 JPH0623570Y2 (ja) | 1994-06-22 | 
Family
ID=31346731
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date | 
|---|---|---|---|
| JP10998588U Expired - Lifetime JPH0623570Y2 (ja) | 1988-08-24 | 1988-08-24 | プラズマ発生装置 | 
Country Status (1)
| Country | Link | 
|---|---|
| JP (1) | JPH0623570Y2 (OSRAM) | 
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title | 
|---|---|---|---|---|
| JPH0627871A (ja) * | 1992-07-06 | 1994-02-04 | Mitsuru Ito | 自動車の運転操作練習台 | 
- 
        1988
        - 1988-08-24 JP JP10998588U patent/JPH0623570Y2/ja not_active Expired - Lifetime
 
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title | 
|---|---|---|---|---|
| JPH0627871A (ja) * | 1992-07-06 | 1994-02-04 | Mitsuru Ito | 自動車の運転操作練習台 | 
Also Published As
| Publication number | Publication date | 
|---|---|
| JPH0623570Y2 (ja) | 1994-06-22 | 
Similar Documents
| Publication | Publication Date | Title | 
|---|---|---|
| ATE41396T1 (de) | Behaelter und verfahren zu seiner herstellung. | |
| KR950701768A (ko) | 균일한 전기장이 유전체 창에 의해 유도되는 플라즈마 처리 장치 및 방법(plasma treatment dapparatus and method in which a uniform electric field is induced by a dielectric window) | |
| HK3193A (en) | Part comprising a substrate provided with a hard and corrosion-resistant coating | |
| JPH0233261U (OSRAM) | ||
| DE3778794D1 (de) | Verfahren und vorrichtung zum ausbilden einer schicht durch plasmachemischen prozess. | |
| JPS5669843A (en) | Manufacture of semiconductor device | |
| KR900017118A (ko) | 플라즈마 처리 장치 및 플라즈마 처리 방법 | |
| JPH0470136U (OSRAM) | ||
| JPH028132U (OSRAM) | ||
| JPS6441297A (en) | Manufacture of wiring board | |
| JPH0741155Y2 (ja) | プラズマエッチング装置 | |
| JPH02113333U (OSRAM) | ||
| JPH0297717U (OSRAM) | ||
| JPS5673915A (en) | Manufacture for quartz oscillator | |
| JPH0255498U (OSRAM) | ||
| KR830008629A (ko) | 고주파 가열 장치 | |
| JPS6329889U (OSRAM) | ||
| JPH01106564U (OSRAM) | ||
| JPS6050523U (ja) | マイクロ波集積回路モジュ−ル | |
| JPH0230623U (OSRAM) | ||
| JPH0251403U (OSRAM) | ||
| JPS5885104U (ja) | 高周波加熱装置 | |
| JPS62198718U (OSRAM) | ||
| JPH0418452U (OSRAM) | ||
| JPS6453337A (en) | Magnetic recording body |