JPH0232781B2 - - Google Patents
Info
- Publication number
- JPH0232781B2 JPH0232781B2 JP58222929A JP22292983A JPH0232781B2 JP H0232781 B2 JPH0232781 B2 JP H0232781B2 JP 58222929 A JP58222929 A JP 58222929A JP 22292983 A JP22292983 A JP 22292983A JP H0232781 B2 JPH0232781 B2 JP H0232781B2
- Authority
- JP
- Japan
- Prior art keywords
- cell
- molecular beam
- source material
- substrate
- thin film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/02631—Physical deposition at reduced pressure, e.g. MBE, sputtering, evaporation
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22292983A JPS60115218A (ja) | 1983-11-26 | 1983-11-26 | 分子ビームエピタキシャル成長装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22292983A JPS60115218A (ja) | 1983-11-26 | 1983-11-26 | 分子ビームエピタキシャル成長装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60115218A JPS60115218A (ja) | 1985-06-21 |
| JPH0232781B2 true JPH0232781B2 (en:Method) | 1990-07-23 |
Family
ID=16790072
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP22292983A Granted JPS60115218A (ja) | 1983-11-26 | 1983-11-26 | 分子ビームエピタキシャル成長装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60115218A (en:Method) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08117472A (ja) * | 1994-10-21 | 1996-05-14 | Hirose Mfg Co Ltd | 全回転かまの外かま |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61236112A (ja) * | 1985-04-12 | 1986-10-21 | Hitachi Ltd | 分子線源 |
| JPS61251116A (ja) * | 1985-04-30 | 1986-11-08 | Fujitsu Ltd | 分子線結晶成長装置用分子線源 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5812233A (ja) * | 1981-06-15 | 1983-01-24 | 松下電工株式会社 | ラツチングリレ−駆動回路 |
-
1983
- 1983-11-26 JP JP22292983A patent/JPS60115218A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08117472A (ja) * | 1994-10-21 | 1996-05-14 | Hirose Mfg Co Ltd | 全回転かまの外かま |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60115218A (ja) | 1985-06-21 |
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