JPH0232668Y2 - - Google Patents
Info
- Publication number
- JPH0232668Y2 JPH0232668Y2 JP15721784U JP15721784U JPH0232668Y2 JP H0232668 Y2 JPH0232668 Y2 JP H0232668Y2 JP 15721784 U JP15721784 U JP 15721784U JP 15721784 U JP15721784 U JP 15721784U JP H0232668 Y2 JPH0232668 Y2 JP H0232668Y2
- Authority
- JP
- Japan
- Prior art keywords
- quartz glass
- base material
- seed rod
- diameter part
- enlarged diameter
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 68
- 239000000463 material Substances 0.000 claims description 36
- 238000009423 ventilation Methods 0.000 claims description 11
- 238000004519 manufacturing process Methods 0.000 claims description 6
- 150000003377 silicon compounds Chemical class 0.000 claims description 5
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- 239000010453 quartz Substances 0.000 description 8
- 238000010438 heat treatment Methods 0.000 description 6
- 239000010419 fine particle Substances 0.000 description 5
- 239000000377 silicon dioxide Substances 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 238000004017 vitrification Methods 0.000 description 3
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000010574 gas phase reaction Methods 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- -1 photomask substrates Chemical compound 0.000 description 2
- 239000005049 silicon tetrachloride Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000003779 heat-resistant material Substances 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- AIFMYMZGQVTROK-UHFFFAOYSA-N silicon tetrabromide Chemical compound Br[Si](Br)(Br)Br AIFMYMZGQVTROK-UHFFFAOYSA-N 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 1
- 239000005052 trichlorosilane Substances 0.000 description 1
Landscapes
- Glass Melting And Manufacturing (AREA)
- Manufacture, Treatment Of Glass Fibers (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15721784U JPH0232668Y2 (enrdf_load_stackoverflow) | 1984-10-19 | 1984-10-19 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15721784U JPH0232668Y2 (enrdf_load_stackoverflow) | 1984-10-19 | 1984-10-19 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6173628U JPS6173628U (enrdf_load_stackoverflow) | 1986-05-19 |
| JPH0232668Y2 true JPH0232668Y2 (enrdf_load_stackoverflow) | 1990-09-04 |
Family
ID=30715215
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15721784U Expired JPH0232668Y2 (enrdf_load_stackoverflow) | 1984-10-19 | 1984-10-19 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0232668Y2 (enrdf_load_stackoverflow) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003212549A (ja) * | 2002-01-22 | 2003-07-30 | Sumitomo Metal Ind Ltd | 合成石英ガラス母材の製造用反応炉およびその製造方法ならびに合成石英ガラス母材の製造用種棒 |
| JP7701195B2 (ja) | 2021-06-04 | 2025-07-01 | 株式会社ミツトヨ | プローブユニットの補正方法 |
-
1984
- 1984-10-19 JP JP15721784U patent/JPH0232668Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6173628U (enrdf_load_stackoverflow) | 1986-05-19 |