JPH0231153U - - Google Patents
Info
- Publication number
- JPH0231153U JPH0231153U JP10950588U JP10950588U JPH0231153U JP H0231153 U JPH0231153 U JP H0231153U JP 10950588 U JP10950588 U JP 10950588U JP 10950588 U JP10950588 U JP 10950588U JP H0231153 U JPH0231153 U JP H0231153U
- Authority
- JP
- Japan
- Prior art keywords
- light
- receiving element
- insulating layer
- substrate
- junctions
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims description 2
- 239000011159 matrix material Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 1
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10950588U JPH0231153U (de) | 1988-08-20 | 1988-08-20 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10950588U JPH0231153U (de) | 1988-08-20 | 1988-08-20 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0231153U true JPH0231153U (de) | 1990-02-27 |
Family
ID=31345809
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10950588U Pending JPH0231153U (de) | 1988-08-20 | 1988-08-20 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0231153U (de) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04369273A (ja) * | 1991-06-18 | 1992-12-22 | Fujitsu Ltd | 赤外線検知装置 |
JP2014045198A (ja) * | 2006-04-25 | 2014-03-13 | Koninklijke Philips Nv | (Bi)CMOSプロセスによるアバランシェフォトダイオードの製造方法 |
WO2014109158A1 (ja) * | 2013-01-11 | 2014-07-17 | 株式会社ブイ・テクノロジー | 光インターコネクション装置 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60233851A (ja) * | 1984-04-17 | 1985-11-20 | Olympus Optical Co Ltd | 固体イメ−ジセンサ |
JPS61139061A (ja) * | 1984-12-11 | 1986-06-26 | Hamamatsu Photonics Kk | 半導体光検出装置 |
JPS63248159A (ja) * | 1987-04-03 | 1988-10-14 | Seiko Instr & Electronics Ltd | 半導体受光装置 |
-
1988
- 1988-08-20 JP JP10950588U patent/JPH0231153U/ja active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60233851A (ja) * | 1984-04-17 | 1985-11-20 | Olympus Optical Co Ltd | 固体イメ−ジセンサ |
JPS61139061A (ja) * | 1984-12-11 | 1986-06-26 | Hamamatsu Photonics Kk | 半導体光検出装置 |
JPS63248159A (ja) * | 1987-04-03 | 1988-10-14 | Seiko Instr & Electronics Ltd | 半導体受光装置 |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04369273A (ja) * | 1991-06-18 | 1992-12-22 | Fujitsu Ltd | 赤外線検知装置 |
JP2014045198A (ja) * | 2006-04-25 | 2014-03-13 | Koninklijke Philips Nv | (Bi)CMOSプロセスによるアバランシェフォトダイオードの製造方法 |
WO2014109158A1 (ja) * | 2013-01-11 | 2014-07-17 | 株式会社ブイ・テクノロジー | 光インターコネクション装置 |
CN104919731A (zh) * | 2013-01-11 | 2015-09-16 | 株式会社V技术 | 光互联装置 |